Claims
- 1. A paraffin inhibitor composition comprising:
(a) a polymer having the characteristic of inhibiting paraffin crystalline growth; (b) a first solvent selected from the weak to moderate wax solvents; and (c) a second solvent selected from the strong wax solvents; wherein component (a) is dissolved in an admixture of components (b) and (c).
- 2. The composition of claim 1 wherein the first solvent is selected from the group consisting of benzene, toluene, xylene, ethyl benzene, propyl benzene, trimethyl benzene and mixtures thereof.
- 3. The composition of claim 2 wherein the first solvent is toluene.
- 4. The composition of claim 1 wherein the second solvent selected from the group consisting of cyclopentane, cyclohexane, carbon disulfide, decalin and mixtures thereof.
- 5. The composition of claim 4 wherein the second solvent is cyclohexane.
- 6. The composition of claim 4 wherein the second solvent is cyclopentane.
- 7. The composition of claim 4 wherein the second solvent is decalin.
- 8. The composition of claim 1 wherein the polymer having the characteristic of inhibiting paraffin crystalline growth in formation fluid is selected from the group consisting of olefin/maleic esters, olefin/maleic imides, ethylene vinyl acetates, modified ethylene vinyl acetates, alky phenol resins, alkyl acrylates, and mixtures thereof.
- 9. The composition of claim 1 wherein the weight ratio of the weak to moderate wax solvent to the strong wax solvent is from about 6:1 to about 1:6.
- 10. The composition of claim 9 wherein the weight ratio of the weak to moderate wax solvent to the strong wax solvent is from about 4:1 to about 1:4.
- 11. The composition of claim 10 wherein the weight ratio of the weak to moderate wax solvent to the strong wax solvent is about 3:1.
- 12. The composition of claim 1 wherein the composition has a pour point at least 5° F. lower than a composition of the same polymer at the same concentration in only the strong wax solvent.
- 13. The composition of claim 12 wherein the composition has a pour point at least 10° F. lower than a composition of the same polymer at the same concentration in only the strong wax solvent.
- 14. The composition of claim 13 wherein the composition has a pour point at least 15° F. lower than a composition of the same polymer at the same concentration in only the strong wax solvent.
- 15. A method for treating formation fluid from an oil and gas well comprising admixing a paraffin inhibitor composition of claim 1 with a formation fluid.
- 16. The method of claim 15 wherein the paraffin inhibitor composition of claim 1 is admixed with a formation fluid within a wellbore or flowline.
- 17. The method of claim 16 wherein the paraffin inhibitor composition of claim 1 is admixed with a formation fluid by injecting the paraffin inhibitor composition into process devices handling hydrocarbons from formation fluids.
- 18. A composition of a formation fluid that has been treated to inhibit paraffin crystal growth comprising an admixture of a formation fluid and the paraffin inhibitor of claim 1.
- 19. The composition of claim 18 wherein the formation fluid includes both the aqueous and hydrocarbon components of the formation fluid.
- 20. The composition of claim 19 wherein the formation fluid is crude oil.
- 21. The composition of claim 19 wherein the formation fluid is gas condensate.
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] This application claims priority from U.S. Provisional Patent Application No. 60/413,082 filed Sep. 24, 2002.
Provisional Applications (1)
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Number |
Date |
Country |
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60413082 |
Sep 2002 |
US |