Electrical sensors, such as resistive pulse sensors, also known as Coulter sensors, are commonly integrated into microfluidic devices through micro-machined surface electrodes to create integrated systems for applications such as counting, sizing, and characterizing (including electrically) of micro/nanoparticles suspended in fluid. These types of sensors rely on modulation of impedance when a particle suspended in an electrolyte basses between two oppositely charged electrodes. In most of these implementations, electrodes are placed on the floor of microfluidic channels in a coplanar arrangement using a self-aligned fabrication process compatible with soft lithography. However, constricting electrodes to a plane not only leads to non-uniform electric fields affecting the sensor performance, but also complicates the design and scaling of multiplexed electrical sensor networks (e.g., the Microfluidic CODES system), by requiring the routing of three different coplanar electrodes on the same plane leading to excessively long traces with high electrical resistance.
Electrodes in parallel form can solve some of these issues, but their fabrication can be complex. For example, building Coulter sensors with parallel-electrodes in microfluidic devices typically rely on forming a grass-polyimide-glass sandwich structure. Such a structure not only involves a complex fabrication process that requires a critical alignment between layers, but also lacks the benefits of soft-lithography processes.
Therefore, there is a need for simple and robust fabrication methods, compatible with soft lithography, to create parallel-electrode sensors in microfluidic devices.
Parallel electrode sensors for use with microfluidic devices are described herein. An example parallel electrode sensor may comprise a first electrode, a second electrode, a substrate and a microchannel. The electrodes may be singular or may comprise a plurality of sets of electrodes. The electrodes may comprise a metallic layer. The substrate may have an upper surface upon which the first electrode may be deposited. The upper surface of the substrate may be lithographically patterned, for example by applying a photoresist, to form a pattern before the electrode is deposited thereon. The pattern may comprise an array. The microchannel may comprise an interior surface and the second electrode may be deposited on the interior surface of the microchannel. The interior surface of the microchannel may include side walls and a ceiling. The microchannel may be oriented above and bonded to the substrate to form a fluidic channel so that the interior surface of the microchannel and the upper surface of the substrate are facing each other, placing the first and second electrodes parallel to one another. The microchannel may be formed of a biocompatible material.
In another aspect, the invention is directed at a method of forming a parallel electrode sensor for use with microfluidic devices including lithographically patterning a first set of electrodes on an upper surface of a substrate, depositing a second set of electrodes on an interior surface of a microchannel, and bonding the microchannel with the substrate to form a fluidic channel with the first and second sets of electrodes being in parallel relation to one another. The microchannel can be formed from a biocompatible polymer molded a mold to have a ceiling and side walls. In some aspects, the mold can include a pattern, on which a metallic layer may be deposited to form the second set of electrodes. The metallic layer may be deposited by sputtering, with excess metallic layering can be removed to prevent short circuiting. The microchannel can be formed to have an electric port. The lithographically patterning of the first set of electrodes includes applying another metallic layer on the upper surface of the substrate after a lithographic pattern is applied to the upper surface. In some aspects, the pattern of the upper surface of the substrate and the imprinted pattern of the microchannel substantially match one another.
The details of the present disclosure, both as to its structure and operation, can best be understood by referring to the accompanying drawings, in which like reference numbers and designations refer to like elements.
Systems and methods for fabricating parallel-electrode sensors in microfluidic devices that are compatible with soft lithography are disclosed herein. In an aspect, the present invention is directed towards a first set of electrodes that are placed in parallel relationship with a second set of electrodes within a microfluidic channel. In such aspects, the electrodes can be arranged within a microchannel and substrate, with a first electrode being placed within the microchannel, and the counter-electrode on a glass substrate, utilizing soft-lithography. With minimal fabrication complexity, the present systems and methods produce more uniform electric fields than conventional coplanar electrodes, and are also more suitable for the construction of complex electrical sensor networks in microfluidic devices due to greater layout flexibility. On one plane (e.g., a substrate in microfluidic device), at most two electrodes can be arranged freely. If there is a third electrode, the third electrode has to be placed according to the other two electrodes geometrically. In such instances, the arrangement of the third electrode is difficult, and sometimes even impossible. When another plane is presented in a parallel structure, the third electrode has the freedom to be arranged according the demand, providing more layout flexibility comparing to coplanar structure.
A metal film/metallic layer may be selectively deposited onto the inner surface of a microchannel as one of the sensor electrodes. This metal-coated microchannel may be bonded to a glass substrate containing micro-patterned surface electrodes to form parallel-electrode sensors. The electrode covering the microfluidic channel is conceptually analogous to ground planes in printed circuit boards and significantly simplifies the sensor network layout. Microfluidic devices may be integrated with sensors as formed as above to be used as Coulter sensors/resistive pulse sensors in counting and characterizing micro/nanoparticles suspended in fluids. In some aspects, the parallel-electrode sensors formed in the manner as discussed above can provide as much as 5x sensitivity improvement over conventional coplanar electrodes. This sensors modulate impedance when a particle suspended in an electrolyte passes between two oppositely charged electrodes.
As discussed above, in most microfluidic devices utilize micro-machined coplanar electrodes on the floor of microfluidic channels rather than utilizing the full channel geometry. While coplanar electrodes have a simple fabrication process compatible with the soft lithography, they generate non-uniform electric field affecting sensor performance and have complicated designs in large-scale multiplexed electrical sensor networks (e.g., Microfluidic CODES sensors) because of multiple electrode traces on a plane.
The invention is directed at the use of counter-facing parallel electrodes in microfluidic channels manufactured as discussed above while utilizing soft lithography process. Typical parallel electrode construction is very complex, with each device being fabricated separately. Therefore, most prior art systems have utilized coplanar construction. The present systems and methods provide a soft lithography-compatible fabrication method to create parallel-electrode Coulter sensors in microfluidic devices. In an aspect, one of the electrodes of the Coulter sensor is formed by a thin metal film blanket-deposited on the inner walls of a microfluidic channel via a soft lithography, while the other electrodes are lithographically patterned on the substrate according to the desired arrangement.
In an aspect, the current invention is directed at a parallel electrode sensor 100 for use with microfluidic devices. The parallel electrode sensor 100 includes a first set of electrodes 200 and a second set of electrodes 300, as shown in
In an aspect, the first set of electrodes 200 is configured to be placed on a substrate 210. In an aspect, the substrate 210 is a glass substrate 210. However, in other aspects, the substrate can be of any material that is compatible to bond with the microchannel 310 and can be deposited with metals. Such materials include, but are not limited to, silicon-based materials (including glass), plastic, polymers, and the like. The glass substrate 210 includes an upper surface 212 and a lower surface 214.
The upper surface 212 of glass substrate 210 can be lithographically treated to receive the first set of electrodes 200. In an aspect, the substrate 210 is lithographically treated with a pattern that substantially matches the layout of the electrode(s) 200. In an aspect, the pattern can include an array. In an exemplary aspect, the pattern utilized on the substrate 210 can match a pattern implanted on the microchannel 310. In other aspects, the pattern can be any electrode structure needed. For example, single electrode with regular or non-regular shape, multiple electrodes encoded or non-encoded with different sequences can be used. No pattern needs to be avoided. In an aspect, the pattern is a single rectangular electrode pattern. In other aspects, a pattern for a Microfluidic CODES structure multiplexed electrode is used.
In an aspect, the pattern can be generated by using a photoresist. In such aspects, a photoresist 216 can be spun and patterned on the upper surface 212 of the glass substrate 210. A positive or negative photoresist 216 can be used. The photoresist 216 can be applied via an optical lithography process, producing a pattern 218 on the surface 212.
After the photoresist 216 is applied, a metallic layer 220 can be applied, with the metallic layer 220 covering the remaining photoresist and pattern on the upper surface 212 of the glass substrate 210. In an aspect, the metal of the metallic layer 220 is conductive and anti-corrosive. In some aspects, the metal can be biocompatible. The metallic layer 220 can be applied as a thin metal film. In such aspects, the metal film can have a thickness of 50 nm to 500 nm. In an aspect, the metallic layer 220 can include gold. In such aspects, a stack including gold (e.g., 20/80 Cr/Au) can be utilized. However, in other aspects, any common electrode metal, including, but not limited to, gold, silver, and platinum can be used. In aspects in which stacks are used, the adhesive layer (Cr in a Cr/Au stack) can include, but is not limited to, Cr, Ti, and the like.
In an aspect, the metallic layer 220 is deposited on the substrate 210. The metallic layer 220 can be deposited in various ways, including, but not limiting to, evaporation, sputtering, spun, and other commonly known methods. In an aspect, a 20/80 nm Cr/Au is evaporated to be applied to the substrate 210. After applied, the substrate is subjected to a process to remove the photoresist 216 (e.g., acetone bath), leaving the metallic layer 220 on the upper surface 212 on the substrate 210 to form the first set of electrodes 200.
In an aspect, the microchannel 310 is formed from a polymer. In an exemplary aspect, the polymer is selected from a biocompatible polymer. In some such aspects, polydimethylsiloxane (PDMS) can be used. However, other polymers can be used. In other aspects, other materials, including, but not limited to, gels, organic monolayers, and the like can be utilized to form the microchannel 310. In other aspects, the microchannel 310 can be formed of a composite of various materials. In an aspect, the microchannel 310 can be formed from a film, or other forms of extruded polymers. In other aspects, the thickness of the microchannel can range between 10 to 100 μm. In exemplary aspects, the thickness can range between 15 μm to 25 μm. While the thickness can vary, the dimensions should be on the same scale of the particle size that is to be monitored, so it can range from mm to nm.
In an aspect, the polymer is placed within a mold to form the microchannel 310. The microchannel 310 is formed to an interior surface 312 and an exterior surface 314. In an exemplary aspect, the microchannel 310 is molded, using a mold 301, to form sidewalls 314, 316, and a ceiling 318, which, in combination, form the majority of the fluidic channel 110 of the sensor 100. In an aspect, the microchannel 310 can be formed so that the fluidic channel 110 has a width of approximately 35 μm, and a height ranging between 14 μm to 65 μm. In other aspects, the fluidic channel 110 can widths and heights of various dimensions. In another aspect, the width and height of the fluidic channel 110 can be based upon the size of the suspended materials in the fluid.
In an aspect, the mold is patterned with photolithography, imprinting the same pattern on the interior surface 312 of the microchannel 310 (i.e., soft-lithography). The pattern on the mold and imprinted on the interior surface 310 of the microchannel 312 is selected for the ultimate determination of the layout of the second set of electrodes 300. Once the second microchannel 310 has been formed, the microchannel 310 can have ports 305 inserted. In such aspects, inlet, outlet, and electrical ports can be provided. While soft-lithography is preferred to be used for the formation of the microchannel, other known fabrication techniques used to shape plastics can be used.
In an aspect, the second set of electrodes 300 is formed from a metallic layer 320 deposited on the interior surface 312 of the microchannel 300. In an aspect, the metallic layer 320 is a thin metallic layer 320. In such aspects, when deposited, the metallic layer 320 has a thickness ranging between 50 nm to 500 nm. In an exemplary aspect, the metallic layer 320 has a thickness of approximately 500 nm. In an aspect, the metallic layer 320 is made of a metal similar to that used in the substrate 210, and is highly conductive and anti-corrosive. In addition, the metallic layer 320 is formed from a metal that can sputtered. Such metals can include, but are not limited to, gold, platinum, silver, and the like. In an exemplary aspect, the second set of electrodes 300 is formed from a metallic layer 320 of gold approximately 500 nm thick applied via sputtering on the interior surface 312. In an exemplary aspect, the metallic layer 320 is deposited on the pattern imprinted through the photolithography on the mold. In an aspect, metallic layer 320 is applied to only the ceiling 318 of the microchannel 310 along the inner surface 312. In such aspects, evaporation depositing and sputtering can work. In other aspects, the metallic layer 320 is applied to both the ceiling 318 and the side walls 314, 316. In such aspects, sputtering can be used.
While the application of metal 220, 320 to the substrate 210 and microchannel 310 respectively has been focused on their use as electrodes for use in a parallel electrode sensor, the methods of depositing of metals on these components can be utilized for other purposes as well. For example, the metals 220, 320 can be used to assist in functionality and chemical interactions of the surfaces of microchannels 310 and substrates 210 for other uses. surfaces in their functionality.
In an aspect, once the metallic layer 320 has been deposited on the interior surface 312 of the microchannel 310, the interior surface 312 is treated to prevent short circuits from the second set of electrodes 300 by removing excessive amounts 321 of the metallic layer 320. In an exemplary aspect, the interior surface 312 is treated by selectively removing the unnecessary metal. For example, when the microchannel 310 has been imprinted with a pattern, sticky tape can be applied to remove all the metal not found on the pattern.
After both the substrate 210 and the microchannel 310 have been treated to form the first set of electrodes 200 and the second set of electrodes 300, the substrate 210 and microchannel 310 are bonded together to form the sensor 100. The substrate 210 and microchannel 310 are bonded together so that the first set of electrodes 200 are aligned in parallel with a portion of the second set of electrodes 300. In an aspect, in applications in which the substrate 210 and the microchannel 310 are relatively small (e.g., microscale), a microscope can be used to assist with the alignment. In an aspect, once the substrate 210 and microchannel 310 are bonded. In an aspect, oxygen plasma can be used to treat the microchannel 310 and substrate 210 to bond them together, but other means can be used. Vacuums and/or clamps can be used to seal the device directly. After the bonding occurs, the inlet, outlet, and electric ports can be connected to a fluids and a power supply respectively. In an aspect, the electrodes 300 on the microchannel 310 are connected to a power source through a wire inserted through the electrical port, and the electrodes 200 on the substrate 210 are connected via contact pads. Once connected, the interior, that is the fluidic channel 110, is activated.
Finite element analysis may be used to simulate the electric field distribution within the microfluidic channel generated by different types of sensors and calculate impedance variations for different particles. The performance of parallel electrodes and coplanar-electrode Coulter sensors is compared by fabricating the sensors on the same microfluidic platform and using cell suspensions to verify simulation results.
To quantitatively analyze the sensor performance, the electrical current flow in the microfluidic channel was calculated and compared the amplitude of electrical current modulation in response to particles flowing between the electrodes. For these calculations, phosphate buffer saline (PBS) was assumed as the electrolyte and human cells as suspended particles. Corresponding electrical parameters used in the simulations for modeling particle-electrode interaction are summarized in Table 1 below:
The effect of the cell size on the sensitivity of coplanar- and parallel-electrode sensors was also investigated.
The effect of cell transverse position in the microfluidic channel on the current modulation amplitude for blanket electrodes with or without sidewalls was investigated.
As shown in
In an exemplary embodiment, the process may start the pattern of an SU-8 photoresist on a silicon wafer using photolithography to create a mold. Next, PDMS polymer is poured on the mold, degassed and baked. Then, the cured PDMS layer is peeled from the mold and holes are created using a biopsy punch to form fluidic inlet and outlet as well as an electrical port. A PDMS microchannel is then coated with gold via sputtering and transferred onto an adhesive tape to selectively remove the gold on the PDMS surface to prevent short circuits. Next, electrodes are fabricated on a glass substrate using a lift-off process. Photoresist is patterned on a glass slide with photolithography, evaporated using a Cr/Au film stack, and the resist is etched in acetone. Gold-coated PDMS microchannel and glass substrate with micro-patterned electrodes are then activated in oxygen plasma, aligned and bonded. Finally, a conductive epoxy-coated wire from the punched electrical port is injected.
To experimentally compare the performance of coplanar- and parallel-electrode Coulter sensors, a microfluidic device that integrates two sensors based on coplanar electrodes and parallel electrodes along the same microfluidic channel was fabricated as shown in
As shown, the device consists of a glass substrate with micropatterned gold electrodes fabricated using a lift-off process and a polydimethylsiloxane (PDMS) microfluidic channel fabricated with a soft lithography process. A thin layer of negative photoresist was spun and patterned on a glass wafer using an optical lithography process, followed by the evaporation of a 20/80 nm Cr/Au stack. The wafer was then transferred to an acetone bath to remove the non-patterned region and diced into individual chips. The PDMS layer was created from a 15 μm-thick SU-8 mold patterned with photolithography. After the fluidic inlet, outlet and the electrical auxiliary holes were created using a biopsy punch, the inner walls of the PDMS microchannel was coated with a 500 nm-thick gold film with sputtering as coplanar-electrode-sensor-side (left side in
Based on both computer simulation results and experiments with cell suspensions, it was discovered that the parallel-electrode Coulter sensor yields a higher sensitivity than the coplanar-electrode Coulter sensor, and the sensitivity enhancement is a function of the cell size, elevation, and microfluidic channel geometry.
Although specific embodiments of the present invention have been described, it will be understood by those of skill in the art that there are other embodiments that are equivalent to the described embodiments. Accordingly, it is to be understood that the invention is not to be limited by the specific illustrated embodiments, but only by the scope of the appended claims.
This application claims priority to U.S. Provisional Application No. 62/757,533, filed on Nov. 8, 2018, which is relied upon and incorporated in its entirety by reference.
This invention was made with government support under Award Nos. 1610995 and 1752170 awarded by the National Science Foundation. The government has certain rights in the invention.
Filing Document | Filing Date | Country | Kind |
---|---|---|---|
PCT/US2019/060510 | 11/8/2019 | WO | 00 |
Number | Date | Country | |
---|---|---|---|
62757533 | Nov 2018 | US |