There is a growing need for the development of environmental, health safety, and clinical microfabricated biosensors for many analytes such as DNA, RNA, proteins, antigens, and other bio-molecules, which allow for lower cost, smaller sample volumes, massive parallelism and ultra high sensitivity. Many of these biosensing systems rely on binding the analyte to individual label particles, such as quantum dots, gold particles, and fluorescent dye molecules. Current systems for ultra sensitive bio-detection using these labels are either complex, large, or lack the desired level of sensitivity. The challenge of improving the sensitivity of integrated systems is due to the low cross-section (emission or absorption) of the labels that are often bound to the analyte.
A strong light confining nano-cavity in a photonic structure enhances the effective extinction cross-section of metal nano-particles. As a result of strong light confinement, precisely where the particle is located, the presence of a single metal nano-particle with a diameter as small or smaller than 10 nm may be detected by measuring the decrease in transmission of light propagating through the photonic structure. In one embodiment, gold particles may be used as a sensing probe due to their large extinction coefficient in a wavelength range of (1450-1600 nm) and their mature use as labels in biosensing systems.
In one embodiment, the photonic structure comprises a one-dimensional photonic crystal consisting of a high index contrast silicon waveguide having nanometer size dimensions with nm range diameter holes filled with a lower index material in the waveguide to create Distributed Bragg Reflectors (DBR's) on either side of a cavity. A small nm range diameter nano-cavity filled hole having a low index is embedded in the center of the cavity. The addition of this defect at the center of the cavity creates a local discontinuity in the field, increasing the strength of the field in the center of the cavity.
In the following description, reference is made to the accompanying drawings that form a part hereof, and in which is shown by way of illustration specific embodiments which may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention, and it is to be understood that other embodiments may be utilized and that structural, logical and electrical changes may be made without departing from the scope of the present invention. The following description is, therefore, not to be taken in a limited sense, and the scope of the present invention is defined by the appended claims.
In
The photonic structure 100 may be fabricated in a number of different ways. One example manner of fabricating photonic structure 100 comprises using Silicon on Insulator (SOI) wafers with 250 nm of crystalline silicon 130 on top of a three microns thick buried oxide layer 120. The structure may be defined using electron-beam lithography using FOx-12 spin-on glass as a negative resist and etch mask and etched by Chlorine based reactive ion etching (RIE). The holes 140 may be filled and the structure clad with SiO2 using plasma enhanced chemical vapor deposition.
In
A side cross-section of the 3-D FDTD simulations (
In order to verify that the field in the device is indeed localized in the center of the cavity and to investigate the degree of confinement, the spectral response of several fabricated devices may be measured. In one embodiment, all devices have the same dimensions except for varying the diameter D of the central nano-cavity.
Transmission losses due to the presence of gold metal nano-particles may be measured using the same devices with a 100 nm diameter nano-cavity. Various size particles and particles of different strongly absorbing material such as other metals like silver, etc. The signal would be stronger or weaker depending on material and size.
Due to the use of a top cladding for optimal operation of fiber to waveguide couplers the upper cladding was only removed above the cavity devices. The upper cladding was removed by patterning 20 micron diameter holes using photolithography. It was etched close to the surface of the cavity using CHF3 based RIE, followed by highly selective HF wet chemistry in order to remove the remaining cladding down to the top surface above the cavity without allowing possible roughness from the RIE process. Once the cavities were exposed, the transmission through the devices was measured with water and various depositions of colloidal gold particles on top of the cavities. These depositions were achieved by placing small amounts of water-based solutions of 10 nm gold particles (1.9×1013 particles per ml) on top of the devices and allowing them to dry by evaporation. Each deposition step deposited approximately 30.0 particles per micron2 on the entire structure, corresponding to approximately 1.25±0.2 particles in the sensing area of 0.04 μm2 per additional deposition step. After each evaporation, the device was again covered in water. Careful placement allowed the particles to remain settled on the surface while transmission measurements were made. The optical sensing area may be calculated as the area of the top surface of the device weighted by the field intensities in each region.
In order to theoretically analyze the structure as a sensor, the presence of gold nano-particles in the 2-D FDTD simulations assume that they are bound to the top surface of the cavity. These simulations assumed that the top oxide cladding had been replaced with water. The top of the structure may be assumed to be unclad and covered by water (n=1.33, k=1.48×10−4, at 25° C. and at a wavelength of 1550 nm).
Due to the characteristic modal volume of this cavity along with the presence of the low index nano-cavity in the center of the micro-cavity, the gradient of the field is small over the area of the selected sensing region. Therefore similar results were achieved when the particles in the simulation were randomly placed away from the center, but still on the top surface of the nano-cavity, resulting in less than a 2% change in absorption losses as compared to when the particles were placed only in the very center of the sensing area. This change is shown as the grey solid line in
A micron-size planar silicon photonic device may be used to detect ultra low concentrations of metal nano-particles. A high detection sensitivity is achieved by using a strong light confining structure that enhances the effective extinction cross-section of metal nano-particles. 10 nm diameter gold particles with a density of fewer than 1.25 particles per 0.04 μm2 may be detected. Such a device may detect the presence of single metal nano-particles specifically bound to various analytes, enabling ultra-sensitive detection of analytes including DNA, RNA, proteins, and antigens.
The Abstract is provided to comply with 37 C.F.R. §1.72(b) to allow the reader to quickly ascertain the nature and gist of the technical disclosure. The Abstract is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
This application claims priority to U.S. Provisional Application Ser. No. 60/627,938 (entitled NANO-CAVITY IN A SILICON WAVEGUIDE FOR ULTRA SENSITIVE NANO-PARTICLE DETECTION, filed Nov. 15, 2004) which is incorporated herein by reference.
The invention described herein was made with U.S. Government support under cooperative agreements DMR-0079992, DMR-0120967 with the National Science Foundation and Grant Number ECS-9731293 awarded by the National Science Foundation. The United States Government has certain rights in the invention.
Number | Date | Country | |
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60627938 | Nov 2004 | US |