Pattern sewing machine

BACKGROUND OF THE INVENTION

This invention relates to a pattern sewing machine, a pattern sewing method, and a pattern display method.

Hitherto, a sewing pattern, such as an embroidered pattern, has been prepared assuming that it is formed by one sewing within the sewable range of an embroidery frame (cloth holding frame). However, a large-sized pattern or an embroidered pattern of a long character string, etc., may be sewn, in which case the large-sized pattern or the embroidered pattern of a long character string, etc., cannot all be formed by one sewing since the pattern to be sewn is too large to be accepted within the frame. Thus, upon completion of formation of a predetermined part of the pattern by the first sewing, the cloth is removed from the embroidery frame and is slid so that the pattern part to be formed by the next sewing enters the embroidery frame, then again set on the embroidery frame for the next sewing.

To once remove the cloth from the embroidery frame and slide the cloth, then again set the cloth on the embroidery frame, the relative positions of the already formed embroidered pattern and the subsequent embroidered pattern to be sewn need to be matched. Therefore, when again setting the cloth on the embroidery frame, the worker visually checks that the already formed embroidered pattern is parallel to the embroidery frame and that the first stitch point position of the subsequent embroidered pattern to be sewn is placed at a position spaced at a predetermined pattern distance apart from the already formed embroidered pattern in X and Y directions. Of course, because of visual checking, the precision is poor and a desired fine embroidered pattern cannot be provided.

SUMMARY OF THE INVENTION

It is therefore an object of the invention to provide a pattern sewing machine, a pattern sewing method, and a pattern display method capable of finely matching the relative positions of an already formed sewing pattern and a subsequent sewing pattern to be sewn and improving the sewing quality.

To accomplish the object, according to a first aspect of the invention, there is provided a pattern sewing machine comprising: a cloth holding frame having a predetermined area, for holding a cloth; a driving member for moving said cloth holding frame in X and Y directions; display means having a display screen, for displaying a pattern to be sewn, wherein the pattern displayed on said display screen is stitched on the cloth held by said cloth holding frame which is moved in the X and Y directions; rotation direction shift detection means for detecting a rotation direction shift of the cloth set in said cloth holding frame; recognition means for recognizing a reference point of the cloth in said cloth holding frame; and correction means for instructing a correction to said drive member based on the reference point recognized by said recognition means and the cloth rotation direction shift detected by said rotation direction shift detection means.

According to a second aspect of the invention, there is provided the pattern sewing machine of the first aspect, further comprising: means for setting a reference line on the cloth to form embroidery sewing; means for forming a part of an embroidery based on embroidery data on the cloth held in said cloth holding frame such that the reference line is placed along one side of said cloth holding frame; means for changing the holding position of the cloth in the cloth holding frame so as to enable a different part of the embroidery to be successively formed in a different place of the cloth; means for setting two points on the reference line of the cloth held in said cloth holding frame; means for correcting sewn embroidery data by transforming the sewn embroidery data so that the data corresponds to a rotated pattern with a predetermined reference point as a center of a line extending between the two setup points; and means for forming the different part of the embroidery based on the corrected embroidery data.

According to a third aspect of the invention, there is provided the pattern sewing machine of the second aspect, wherein the predetermined reference point is read before or after the two points are read, whereby the reference point is set.

According to a fourth aspect of the invention, there is provided the pattern sewing machine of the second or third aspect, wherein the two points or the predetermined reference point is set on said display screen.

According to a fifth aspect of the invention, there is provided a pattern sewing machine for forming an embroidery of a size that cannot be sewn in an embroidery frame without repositioning the workpiece with respect to the frame, said pattern sewing machine comprising: means for displaying a reference line set on a cloth to form embroidery sewing; means for displaying an embroidery to be sewn on the cloth held in the embroidery frame along the displayed reference line based on embroidery data; means for displaying two points on a new reference line of the cloth held in the embroidery frame; and means for correcting sewn embroidery data by transforming the sewn embroidery data so that the data corresponds to a rotated pattern with a predetermined reference point as the center of a line extending between the two points.

According to a sixth aspect of the invention, there is provided the pattern sewing machine of the fifth aspect, wherein the predetermined reference point is displayed before or after the two points are displayed.

According to a seventh aspect of the invention, there is provided a pattern sewing machine comprising: a cloth holding frame having a predetermined area, for holding a cloth; a driving member for moving said cloth holding frame in X and Y directions; display means having a display screen, for displaying a pattern to be sewn, wherein the pattern displayed on said display screen is stitched on the cloth held by said cloth holding frame which is moved in the X and Y directions; means for assigning an absolute position of the cloth hold by said cloth holding frame; means for rearranging the pattern displayed on said display screen such that the pattern corresponds to the absolute position; means for controlling said driving member to form the pattern corresponding to the pattern rearranged on the display screen.

According to an eighth aspect of the invention, there is provided the pattern sewing machine of the seventh aspect, wherein the absolute position is a rotational direction position.

According to a ninth aspect of the invention, there is provided the pattern sewing machine according to claim

7

or

8

, wherein the absolute position is a particular reference position on the part of pattern which has been sewn.

The pattern sewing machine of the invention recognizes the reference point of the cloth in the cloth holding frame by the recognition means, can space the stitch point data of the current sewing pattern to be sewn in the cloth holding frame at a predetermined pattern distance apart from the already formed embroidered pattern in the X and Y directions by the correction means based on the reference point, detects a rotation direction shift of the cloth set in the cloth holding frame by the rotation direction shift detection means, and corrects the stitch point data spaced at the predetermined pattern distance apart from the already formed embroidered pattern in the X and Y directions in the rotation direction with the reference point as the center by the correction means based on the reference point and the cloth rotation direction shift. Therefore, the relative positions of the already formed sewing pattern and the subsequent sewing pattern to be sewn can be matched finely.

According to the pattern sewing machine, to form an embroidery of a size that cannot go in the embroidery frame at a time, the relative positions of the already formed sewing pattern and the subsequent sewing pattern to be sewn can be matched finely.

According to the pattern sewing machine, the steps are displayed, so that operability can be improved.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1

is a block diagram to show the configuration of a pattern sewing machine in one embodiment of the invention;

FIG. 2

is a flowchart to show an operation sequence of the pattern sewing machine in the embodiment of the invention;

FIG. 3

is a flowchart to show an operation sequence following

FIG. 2

;

FIG. 4

is a flowchart to show an operation sequence following

FIG. 3

;

FIG. 5

is a flowchart to show an operation sequence of preparing layout screen display data in

FIG. 2

in detail;

FIG. 6

is a front view to show an LCD screen as display means;

FIGS.

7

(

a

) to

7

(

c

) are illustrations to show one embodiment of a layout screen;

FIG. 8

is an illustration to show a state in which a cloth on which a reference line is drawn is set on a cloth holding frame;

FIG. 9

is a front view to show the LCD screen on which a character string “JU” is displayed;

FIG. 10

is an illustration to show two arbitrary points P and Q set on the reference line of the cloth;

FIG. 11

is an illustration to show a state in which the cloth is again set on the cloth holding frame to sew a character string following the character string “JU;”

FIG. 12

is a front view to show the LCD screen on which a character string “UK” is displayed;

FIG. 13

is a front view to show the first displayed LCD screen when a reference point is specified for character “U” on the LCD screen;

FIG. 14

is a front view to show a state in which the reference point is specified for the character “U” on the LCD screen;

FIG. 15

is a front view to show the LCD screen on which a part containing the reference point of the already formed character “U” and a character string “KI” are displayed;

FIG. 16

is an illustration to show the final character string “JUKI” formed on the cloth; and

FIG. 17

is a perspective view of a sewing machine.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Referring now to the accompanying drawings, there is shown a preferred embodiment of the invention.

FIG. 1

is a block diagram to show the configuration of a pattern sewing machine in one embodiment of the invention.

FIG. 17

is a perspective view of a sewing machine. The pattern sewing machine of the embodiment comprises a main motor

1

for moving a needle

101

of a sewing machine

100

up and down, a x-y stepping motors

3

on which a cloth holding frame (embroidery frame)

2

is mounted for moving the cloth holding frame

2

in the X and Y directions, and a ROM (read-only memory) card

4

detachably installed for storing pattern data such as stitch point data of embroidered pattern.

The pattern sewing machine of the embodiment further includes an LCD screen

5

as display means for displaying an embroidered pattern, etc., and an operation panel having an input switch, etc., required for displaying an embroidered pattern, etc., on the LCD screen

5

.

The operation panel

5

comprises pattern selection means

6

for selecting an embroidered pattern, information input means

7

for entering information indicating the size of a cloth holding frame which has been selected from among a plurality of cloth holding frames, scaling factor input means

8

for enabling the operator to set any scaling factor for the embroidered pattern displayed on the LCD screen

5

, layout setting means

9

for enabling the operator to set a layout of the embroidered pattern displayed on the LCD screen

5

and specifying enlargement of a predetermined partition in the LCD screen

5

in the layout, shift input means

10

for entering two predetermined points of a cloth in the cloth holding frame

2

to detect a shift of the cloth set in the cloth holding frame

2

in the rotation direction, recognition means

11

for specifying a cloth reference point in the cloth holding frame

2

on the LCD screen

5

to recognize the reference point and driving the x-y stepping motors

3

so that the reference point matches a given stitch point position, and intraframe pattern selection means

12

for selecting one embroidered pattern to be sewn if a plurality of embroidered patterns exist in the cloth holding frame displayed on the LCD screen

5

.

The pattern sewing machine of the embodiment further includes control means (CPU)

13

for receiving signals from the ROM card

4

, the pattern selection means

6

, the information input means

7

, the scaling factor input means

8

, the layout setting means

9

, the shift input means

10

, the recognition means

11

, and the intraframe pattern selection means

12

and sending operation signals to the main motor

1

, the x-y stepping motors

3

, and the LCD screen

5

.

A programmable ROM

14

for storing an operation control program is connected to the control means

13

so that the program can be input to the control means

13

. Also, a RAM edit buffer

15

for temporarily storing read stitch point data, enlarged or reduced stitch point data for display, display data, and the calculated cloth rotation direction shift amount and a VRAM

16

for temporarily storing LCD display data are connected to the control means

13

so that data, etc., can be input to and output from the control means

13

.

The control means

13

roughly has a first function of enlarging or reducing the embroidered pattern selected through the pattern selection means

6

based on stitch point data and displaying the resultant pattern on the LCD screen

5

and enabling the worker to set a layout of the embroidered pattern while seeing the LCD screen

5

and a second function of correcting stitch point data so as to finely match the relative position of the subsequent embroidered pattern to be sewn with the already sewn embroidered pattern when bridge embroidery (sewing a large-sized embroidered pattern or an embroidered pattern of a character string, etc., over multiple times) is executed.

That is, as the first function, the control means

13

comprises an internal ROM

13

a

for storing pattern data such as stitch point data of embroidered pattern different from the pattern data stored in the ROM card

4

, read means

13

b

for reading the stitch point data of the embroidered pattern selected through the pattern selection means

6

from the ROM card

4

or the internal ROM

13

a

, determination means

13

c

for determining the enlargement or reduction factor of an embroidered pattern displayed on a reference screen based on the size of the cloth holding frame

2

entered through the information input means

7

and the size of the cloth holding frame displayed on the LCD screen

5

, display stitch point data preparation means

13

d

for enlarging or reducing the stitch point data read by the read means

13

b

based on the scaling factor determined by the determination means

13

c

, the scaling factor entered through the scaling factor input means

8

, or the partition (enlargement factor) whose enlargement is specified through the layout setting means

9

, display data preparation means

13

e

for converting stitch point data enlarged or reduced by the display stitch point data preparation means

13

d

into display data that can be displayed on the LCD screen

5

, and display control means

13

f

for controlling the operation of the LCD screen

5

so that the display data provided by the display data preparation means

13

e

can be displayed on the LCD screen

5

.

As the second function, the control means

13

comprises calculation means

13

g

for calculating the shift amount of a set cloth in the rotation direction based on two predetermined points of the cloth within the cloth holding frame

2

entered through the shift input means

10

and detection means

13

h

for detecting an embroidered pattern within the cloth holding frame displayed on the LCD screen

5

under the control of the display control means

13

f.

As the second function, the control means

13

further includes pattern control means (containing correction means)

13

i

for reading the stitch point data of the subsequent embroidered pattern to be sewn, displayed on the LCD screen (the stitch point data of the already sewn embroidered pattern may be read together with that stitch point data) from the RAM edit buffer

15

based on the embroidered pattern within the cloth holding frame on the screen detected by the detection means

13

h

if one embroidered pattern is displayed within the cloth holding frame on the LCD screen or based on the embroidered pattern within the cloth holding frame on the screen selected through the intraframe pattern selection means

12

if two or more embroidered patterns are displayed within the cloth holding frame on the LCD screen.

When the display control means

13

f

is controlled and a reference point on the LCD screen

5

(in the embodiment, one point in an already formed embroidered pattern) is specified by the recognition means

11

(at this time, the recognition means

11

sends a command to stepping motor control means

13

k

(described later) for manually controlling the x-y stepping motors

3

so that a given stitch point position matches the reference point), the pattern control means

13

i

recognizes the reference point on the LCD screen

5

, grasps the move coordinates from the reference point to the first stitch point position of the subsequent embroidered pattern to be sewn based on the display data, the enlarged or reduced stitch point data for display, and the read stitch point data temporarily stored in the RAM edit buffer

15

(based on the correlation among the data pieces), and makes a rotation correction of the read stitch point data about the reference point based on the cloth rotation direction shift amount found by the calculation means

13

g.

The pattern control means

13

i

sends a drive command to the stepping motor control means

13

k

for controlling drive of the x-y stepping motors

3

based on the read stitch point data or the corrected stitch point data and a drive command to the main motor control means

13

j

for controlling drive of the main motor

1

. On the other hand, upon completion of sewing the embroidered pattern in the cloth holding frame on the screen detected by the detection means

13

h

or the embroidered pattern in the cloth holding frame on the screen selected through the intraframe pattern selection means

12

, the pattern control means

13

i

sends a stop command to the stepping motor control means

13

k

and a stop command to the main motor control means

13

j.

Here, the ROM card

4

and the internal ROM

13

a

make up storage means

20

; the information input means

7

, the determination means

13

c

, the scaling factor input means

8

, and the layout setting means

9

make up scaling factor setting means

21

; and the shift input means

10

and the calculation means

13

g

make up cloth rotation direction shift detection means

22

.

The operation functions of the means will be discussed later in more detail.

Next, the operation of the pattern sewing machine thus configured will be discussed with reference to flowcharts shown in

FIGS. 2

to

5

. The program depicted by these flowcharts is stored in the programmable ROM

14

. First, when a pattern is selected through the pattern selection means

6

at step S

1

, layout screen display data is prepared at step S

2

.

FIG. 5

shows a subroutine for preparing the layout screen display data.

That is, as shown at step S

1

in

FIG. 5

, first the size of the cloth holding frame

2

and the size of the embroidered pattern selected through the pattern selection means

6

(the size is stored in embroidered pattern data) are entered through the information input means

7

, the sizes of the cloth holding frame and the embroidered pattern displayed on the LCD screen

5

are found at step S

2

. Here, assuming that the dots making up the LCD screen

5

are arranged like a lattice with 0.6-mm pitches and that the size of the LCD screen is 96 mm×96 mm, the LCD screen

5

is made up of (96 mm÷0.6 mm)×(96 mm ÷0.6 mm)=25600 pixels. If the size of the selected cloth holding frame

2

is 64 mm×64 mm and is represented as 32 mm×32 mm on the LCD screen

5

, the scale becomes ½. That is, the display pattern scale also becomes ½.

Then, control goes to step S

3

and the absolute address of the stitch point position is found from the stitch point data of the embroidered pattern. Since the origin of the embroidered pattern is set to the lower-left corner, the lower-left corner is also considered as the origin for dot data on the LCD screen

5

. Since the stitch point data is represented as the move distance from the current sewing position to the next sewing position, a relative position from one reference position cannot be recognized. Therefore, to display the stitch point data on the LCD screen

5

, it is necessary to represent each stitch point position by a relative position from the pattern origin (lower-left corner). That is, the absolute address of the stitch point position needs to be found. It is found according to the following equations:

The coordinates of the n-th stitch, (Xn, Yn), are

Xn = \frac{1}{2} \cdot Xmax + \sum_{k = 1}^{n} xk

Yn = \frac{1}{2} \cdot Ymax + \sum_{k = 1}^{n} yk

where Xmax and Ymax are the embroidered pattern size, (xk, yk) is the move distances of the k-th stitch in X and Y directions, and ((½) Xmax, (½) Ymax) is the center coordinates of the embroidered pattern (sewing is started at the position indicated by the coordinates).

When the absolute address of the stitch point position is thus found, control goes to step S

4

at which the found absolute address is multiplied by the scaling factor found at step S

2

to find the dot position corresponding to the stitch point position.

Then, control goes to step S

5

at which whether or not the dot positions for all stitch points have been found is determined. If the dot position to be found remains, control returns to step S

4

. If the dot positions for all stitch points have been found, control goes to step S

6

at which the data prepared in the dot image is converted into bitwise display data, and control goes to step S

3

shown in FIG.

2

.

At step S

3

in

FIG. 2

, the cloth holding frame and the embroidered pattern are displayed on the LCD screen

5

so that they can be laid out. In the embodiment, a screen as shown in

FIG. 6

is displayed as a layout screen

30

. The layout screen (96 mm×96 mm)

30

is partitioned into nine screens and a frame

31

corresponding to a cloth holding frame

2

is displayed in the size 32 mm×32 mm, as described above. Likewise, the display pattern found based on stitch point data and scaled is also displayed on the layout screen

30

. In the prior art, the display pattern can be displayed only within the frame

31

displayed on the screen; in the embodiment, it can also be displayed outside the frame

31

displayed on the screen, facilitating layout. An X axis line

32

, a Y axis line

33

, and an auxiliary line

34

are also displayed on the layout screen

30

, furthermore facilitating layout.

Then, control goes to step S

4

at which the embroidered pattern is edited, laid out, enlarged, reduced, etc. That is, the displayed embroidered pattern can be scrolled to a desired position according to input of the layout setting means

9

; as shown in

FIG. 7

(

a

), the frame

31

displayed on the screen and the embroidered pattern in the frame

31

can be enlarged so as to match the layout screen

30

; and as shown in

FIG. 7

(

b

), the embroidered pattern enlarged fully on the layout screen

30

can be furthermore enlarged according to partitions as shown in

FIG. 7

(

c

). The frame

31

and the embroidered pattern on the layout screen

30

can also be enlarged or reduced according to any scaling factor entered through the scaling factor input means

8

. At the enlargement or reduction time, the display data is enlarged or reduced according to the setup (entered) scaling factor. The enlarged embroidered pattern shown in

FIG. 7

(

b

) corresponds to partition (iv) shown in

FIG. 7

(

c

).

Now, assume that a character string of “JUKI” that extends off the cloth holding frame

2

is sewn as an embroidered pattern. That is, as shown in

FIG. 9

, only the character string part “JU” can be entered within the frame

31

on the layout screen

30

and can be sewn by one sewing.

Then, control goes to step S

5

at which whether or not the layout is complete is determined. If the layout is not complete, control returns to step S

1

; if the layout is complete, control goes to step S

7

shown in FIG.

3

.

Here, before control goes to step S

7

, a horizontal reference line

36

is drawn on a cloth

35

, for example, with a French chalk pen at step S

6

, as shown in FIG.

8

. The reference line

36

is a reference line for making the cloth parallel to the X axis of the cloth holding frame

2

. This time, the embroidered pattern is sewn along the reference line

36

.

When the reference line

36

is thus drawn on the cloth

35

, the cloth

35

is set in the cloth holding frame

2

at step S

7

, as shown in FIG.

8

. At this time, the cloth

35

is set so that the reference line

36

enters the cloth holding frame

2

and becomes almost parallel to the X direction of the cloth holding frame

2

. Upon completion of setting the cloth

35

, the cloth holding frame

2

holding the cloth

35

is mounted on the pattern sewing machine.

Then, control goes to step S

8

at which a parameter according to which a rotation direction shift of the cloth

35

can be grasped is entered through the shift input means

10

. To do this, first a switch of the shift input means

10

is set to a cloth correction mode, next a frame move key forming a part of the shift input means

10

is operated, thereby moving the cloth holding frame

2

so that the tip of the needle

101

comes on an arbitrary point (P) on the reference line

36

, as shown in FIG.

10

. Next, the needle rod is moved up and down at this position for checking to ensure that the point (P) is on the reference line

36

. Next, a determination key forming a part of the shift input means

10

is turned on, thereby storing the coordinates of the point P from the origin. Next, the frame move key is operated, thereby moving the cloth holding frame

2

so that the tip of the needle

101

comes on an arbitrary point (Q) other than the point P on the reference line

36

. Next, the needle rod is moved up and down at this position for checking to ensure that the point (Q) is on the reference line

36

. Next, the determination key is turned on, thereby storing the coordinates of the point Q from the origin. Thus grasping the coordinates of the points P and Q on the reference line

36

results in parameter input that can grasp the rotation direction shift of the cloth

35

for the control means

13

.

Then, control goes to step S

9

at which the rotation direction shift of the set cloth

35

relative to the cloth holding frame

2

, namely, cloth

35

inclination angle

θ

is found. It can be found by the calculation means

13

g

which performs the following operation: For example, assuming that the coordinates of the point P are (3.8, 12.2) and that the coordinates of the point Q are (75.8, 13.5), the inclination angle

θ

is

θ = \tan^{- 1} (\frac{13.5 - 12.2}{75.8 - 3.8}) = {1.03}^{°}

Then, control goes to step S

10

at which if different embroidered patterns are laid out in the frame

31

on the layout screen

30

, the embroidered pattern to be sewn is selected through the intraframe pattern selection means

12

; if only one embroidered patterns is laid out as in the embodiment, the embroidered pattern detected by the detection means

13

h

(in the embodiment, “JU”) is specified automatically.

Then, control goes to step S

11

at which a sewing start switch (not shown) is turned on and control goes to step S

12

at which the pattern control means

13

i

rotates the stitch point data of the character string “JU” at the inclination angle θ so that the character string “JU” to be sewn is placed along the reference line

36

. At this time, the rotation correction of the stitch point data is made with the center of the cloth holding frame

2

as the rotation center.

If a part of the stitch point data is placed out of the cloth holding frame

2

by rotating the stitch point data, an alarm is produced to inform the worker of the event and the operation is stopped. Before sewing, rotation corrections of the stitch point data of all embroidered patterns can be previously made based on the inclination angle θ and the patterns which go in the cloth holding frame

2

are displayed at the pattern selection time for the worker to select a desired embroidered pattern which goes in the cloth holding frame

2

.

Upon completion of sewing the character string “JU” based on the stitch point data subjected to the rotation correction, the system is stopped at step S

13

and whether all intraframe patterns have been sewn is determined at step S

14

. If different embroidered patterns are laid out in the frame

31

on the layout screen

30

, it is determined that another embroidered pattern needs to be sewn, and control returns to step S

10

. On the other hand, if all the intraframe pattern has been sewn as in the embodiment, control goes to step S

15

at which whether all patterns have been sewn is determined.

If all patterns have been sewn, the control operation flow is terminated. In the embodiment, it is necessary to sew the character string “KI” following the character string “JU”. Thus, control goes to step S

16

at which the cloth holding frame

2

is removed from the pattern sewing machine and the cloth

35

is once removed from the cloth holding frame

2

, then control returns to step S

7

.

At step S

7

, as shown in

FIG. 11

, the cloth

35

is slid from the previous position and set in the cloth holding frame

2

so that the subsequent character string “KI” to be sewn can be sewn following the already sewn character string “JU.” At this time, as shown in

FIG. 11

, the cloth

35

is set so that the reference line

36

enters the cloth holding frame

2

and becomes almost parallel to the X direction of the cloth holding frame

2

as at the preceding time; in addition, the cloth

35

is set so that at least a part of the last sewn “U” character enters the cloth holding frame

2

. Upon completion of setting the cloth

35

, the cloth holding frame

2

holding the cloth

35

is mounted on the pattern sewing machine.

Then, control goes to step S

8

at which the coordinates of two arbitrary points on the reference line

36

on the current set cloth

35

are stored by a similar method to the previous method. Control goes to step S

9

at which inclination angle θ of the current set cloth

35

relative to the cloth holding frame

2

is found by a similar method to the previous method.

Then, control goes to step S

10

at which first display data is scrolled so that the character “U” enters the frame

31

on the layout screen

30

, as shown in FIG.

12

. Next, a stitch point display switch forming a part of the recognition means

11

is turned on for setting a stitch point display mode. Next, the character “U” for which stitch point display is produced is specified in the mode. Then, the stitch point position of the target character is displayed as a hollow part. Just after the specification, the stitch point position of the first stitch of the target character “U” is displayed as a hollow part indicated by R as shown in FIG.

13

. At this time, the character “K” other than the specified character is displayed at halftone. Then, a forward switch, a back switch, etc., of the stitch point display switch forming a part of the recognition means

11

is operated for moving the handling of the needle to the reference point of the character “U” in the frame

31

on the layout screen

30

.

In the embodiment, the last stitch point position of the last sewn character “U” is used as the reference point. Thus, when the handling of the needle is moved to the reference point S (see FIG.

14

), a position specification key forming a part of the recognition means

11

is turned on for storing the position of the reference point S.

Then, the frame move key is operated for moving the cloth

35

held on the cloth holding frame

2

so that the tip of the needle

101

is positioned on the reference point S of the already formed character “U,” namely, is positioned on the last stitch point position of “U.” The needle rod is moved up and down for checking to ensure that the tip of the needle

101

matches the reference point. Next, a cloth position determination key forming a part of the recognition means

11

is turned on, thereby storing the set position of the cloth

35

relative to the cloth holding frame

2

.

In the embodiment, the reference point is used as the last stitch point position of “U.” Thus, if the stitch point data of the character string “KI” is read, “KI” can be sewn without any shift in the X or Y direction from “U” (a rotation direction shift exists). The reference point is set to any other stitch point position than the last stitch point position of “U,” the reference point is specified on the layout screen

30

, the cloth holding frame

2

is moved so that the tip of the needle

101

is positioned on the reference point, and the cloth position determination key is turned on, as described above. In doing so, the pattern control means

13

i

reads the stitch point position corresponding to the reference point on the layout screen

30

from the data stored in the RAM edit buffer

15

, and the first stitch point position of the next character to be sewn “K” (also at this time, stitch point position with no shift in the X or Y direction, but with a rotation direction shift) can be found from the stored data.

The character string is furthermore scrolled on the layout screen

30

so that the character string “KI” goes in the frame

31

on the screen, as shown in FIG.

15

. At this time, a part of the character “U” which goes in the frame

31

on the screen, but is not yet sewn is displayed at halftone. In the embodiment, only one embroidered pattern is laid out. Thus, the embroidered pattern detected by the detection means

13

h

(in the embodiment, “KI”) is specified automatically.

Then, as at the preceding time, the sewing start switch is turned on at step S

11

and the pattern control means

13

i

rotates the stitch point data of the character string “KI” at the inclination angle θ occurring by again setting the cloth so that the character string “KI” to be sewn is placed along the reference line

36

. At this time, the rotation correction of the stitch point data of “KI” is made with the reference point as the rotation center. The subsequent operation is the same as the operation at the preceding time. Finally, the character string pattern “JUKI” with no shift in the X, Y, or rotation direction is formed on the cloth

35

with a predetermined character spacing, as shown in FIG.

16

.

Thus, in the embodiment, an enlarged or reduced embroidered pattern displayed on the LCD screen

5

is formed from the stitch point data of the embroidered pattern. The display pattern data concerning enlargement or reduction (image display data) need not previously be stored in the ROM. Therefore, a small-capacity ROM can be used and costs can be reduced.

When a large-sized embroidered pattern or an embroidered pattern of a character string, etc., is sewn, if sewing of the embroidered pattern is not completed by one sewing (the embroidered pattern does not go in the cloth holding frame

2

), the relative positions of the already formed embroidered pattern and the subsequent embroidered pattern to be sewn are not shifted in the X, Y, or rotation direction. Thus, the complete embroidered pattern can be sewn in fine matching and the sewing quality can be improved.

Having described our invention as related to the embodiment shown in the accompanying drawings, it is our intention that the invention be not limited by any of the details of description, unless otherwise specified, but rather be constructed broadly within its spirit and scope as set out in the accompanying claims.

For example, in the embodiment, if an enlargement factor is large to particularly enlarge a part of an embroidered pattern for display, its outline (silhouette) may be unclear simply by producing dot display from the stitch point data. In such a case, if the dot display is turned on so as to connect the stitch point points in order, for example, linearly, a fine outline can be provided.

The dot display may be black points on white background, hollow black points, or halftone display and is not limited. If color display can be produced, the dot display color may be changed for each thread color.

Enlarged or reduced stitch point display data needs to be rounded (approximated) so as to match the pixels of the LCD screen

5

depending on the scaling factor; such operation is extremely easy.

In the embodiment, the drive form of the cloth holding frame

2

is the X, Y drive form, but the pattern sewing machine of the invention can also be applied to R-θ drive form.

In the embodiment, the inclination angle θ of the cloth

35

to the cloth holding frame

2

is found as the opening angle between the X axis and the horizontally drawn reference line

36

, but may be found as the opening angle between the Y axis and a vertically drawn reference line or both may be used.

In the embodiment, the French chalk line

36

is drawn on the cloth

35

as the reference line and two arbitrary points P and Q on the reference line

36

are used to find the inclination angle θ, but any may be used if it can become a reference on the cloth

35

; for example, two or more reference marks may be previously sewn for use as the reference, a pattern on the cloth

35

may be used, or a line used as a reference line may be temporarily sewn with thread for use as the reference.

In the embodiment, the reference point S is the position of the last stitch of the last sewn embroidered pattern or may be any stitch point position of the last sewn embroidered pattern, but a reference point may be previously formed on the cloth

35

(at a position other than an embroidered pattern) for use as the reference.

In the embodiment, the worker sets the reference point S, but the reference point may be fixed rather than selected. In this case, the reference point may be the position of the last stitch of the formed embroidered pattern as described above or may be the rightmost position of the formed embroidered pattern.

In the embodiment, the two points P and Q are arbitrary points, but may be fixed depending on the pattern. That is, for example, the point moved a predetermined distance (fixed distance) in the X or Y direction after point P is selected may be adopted as point Q.

In the embodiment, the two points P and Q are specified, whereby the inclination angle θ is found by performing an operation. However, for example, an inclination angle is entered and the cloth holding frame

2

is moved according to the angle and if the tip of the needle

101

runs in parallel with the French chalk line

36

, the angle can also be determined the inclination angle. In this case, whenever the tip of the needle

101

does not run in parallel with the French chalk line

36

, the inclination angle is changed and a similar determination is made.

In the embodiment, the cloth holding frame

2

is a known embroidery frame, but may be any if it can hold the cloth

35

.

In the embodiment, the two points P and Q are specified and the data is read, then the reference point is set. However, after the reference point is set, the two points P and Q may be specified and the data may be read.

In addition to the reference point, the two points P and Q may be set on point display of the LCD screen

5

.

All the operation described above may be displayed on the LCD screen

5

by executing the following steps of (1) displaying the reference line set on the cloth to form an embroidered pattern, (2) displaying the embroidered pattern to be sewn on the cloth held in the cloth holding frame along the displayed reference line based on embroidered pattern data (stitch point data), (3) displaying the two points P and Q on the reference line of the cloth held in the cloth holding frame, and (4) correcting sewn embroidered pattern data by rotating the sewn embroidered pattern data with the reference point as the center based on the two points P and Q and displaying the corrected data.

As we have discussed, the pattern sewing machine of the invention recognizes the reference point of the cloth in the cloth holding frame by the recognition means, can space the stitch point data of the current sewing pattern to be sewn in the cloth holding frame at a predetermined pattern distance apart from the already formed embroidered pattern in the X and Y directions by the correction means based on the reference point, detects a rotation direction shift of the cloth set in the cloth holding frame by the rotation direction shift detection means, and corrects the stitch-point data spaced at the predetermined pattern distance apart from the already formed embroidered pattern in the X and Y directions in the rotation direction with the reference point as the center by the correction means based on the reference point and the cloth rotation direction shift, thereby finely matching the relative positions of the already formed sewing pattern and the subsequent sewing pattern to be sewn. Thus, the sewing quality can be improved.

According to the pattern sewing method of the invention, like the pattern sewing machine, to form an embroidery of a size that cannot go in the embroidery frame at a time, the relative positions of the already formed sewing pattern and the subsequent sewing pattern to be sewn can be matched finely. Thus, the sewing quality can be improved.

According to the pattern display method of the invention, the steps are displayed, so that operability can also be improved.

Number	Name	Date
4520745	Shinomiya et al.	Jun 1985
4660488	Hanyu et al.	Apr 1987
4742786	Hashimoto et al.	May 1988
4915041	Takenoya	Apr 1990
5553559	Inoue et al.	Sep 1996
5791270	Mori	Aug 1998

Pattern sewing machine

Information

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Date Filed

Date Issued

Inventors

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CPC

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Abstract

Description

Claims

Priority Claims (1)

US Referenced Citations (6)