Perpendicular magnetic recording media and methods for producing the same

Information

  • Patent Grant
  • 9472227
  • Patent Number
    9,472,227
  • Date Filed
    Wednesday, June 22, 2011
    12 years ago
  • Date Issued
    Tuesday, October 18, 2016
    7 years ago
Abstract
[Problem] An object is to provide a perpendicular magnetic recording medium that can realize both improvement in crystal orientation and refinement of crystal grain size and can achieve a higher recording density and a higher SN ratio, and a method of manufacturing the same.
Description
TECHNICAL FIELD

The present invention relates to a perpendicular magnetic recording medium installed in an HDD (hard disk drive) or the like of a perpendicular magnetic recording type, and a method of manufacturing the same.


BACKGROUND ART

With increase in capacity of information processing in recent years, various information recording technologies have been developed. In particular, the surface recording density of an HDD using a magnetic recording technology is continuously increasing at an annual rate of approximately 100%. Recently, an information recording capacity exceeding 320 gigabytes/platter with a 2.5-inch diameter of a magnetic recording medium for use in an HDD or the like has been demanded, and in order to satisfy such a demand, an information recording density exceeding 500 gigabytes/square inch is required to be realized.


In order to achieve high recording density in a magnetic recording medium for use in an HDD or the like, a perpendicular magnetic recording type has been suggested in recent years. In a perpendicular magnetic recording medium used for the perpendicular magnetic recording type, an easy axis of magnetization of a granular magnetic layer (a magnetic layer having a granular structure) is adjusted so as to be oriented in a perpendicular direction with respect to a base surface. The perpendicular magnetic recording type is more suitable for increasing a recording density than a conventional in-plane magnetic recording type, since the perpendicular magnetic recording type can suppress a so-called thermal fluctuation phenomenon that a recording signal is lost due to the thermal stability of the recording signal is impaired by a superparamagnetic phenomenon.


As a perpendicular magnetic recording medium used for the perpendicular magnetic recording type, a magnetic recording medium where a backing layer, an orientation control layer, a magnetic recording layer, and a protective layer are stacked on a non-magnetic base plate has been suggested (for example, see Patent Document 1). In such a magnetic recording medium, the magnetic recording layer is constituted with use of a Co alloy material having a hexagonal close packed structure (hcp structure), and the orientation control layer is composed of an intermediate layer that improves the characteristics of the magnetic recording layer and a seed layer that adjusts the crystal orientations of the intermediate layer and the magnetic recording layer. The intermediate layer is deposited by sputtering using Ru or a Ru alloy having the hcp structure, and composed of a first intermediate layer (first ground layer) that is formed under a low-pressure condition, and a second intermediate layer (second ground layer) that is formed under a high-pressure condition.


PRIOR ART DOCUMENT
Patent Document

Patent Document 1: Japanese Unexamined Patent Application Publication No. 2009-059431


SUMMARY OF THE INVENTION
Problem to be Solved by the Invention

By the way, for the magnetic recording medium of the perpendicular magnetic recording type, improvement of crystal orientation and refinement of crystal grain size (particle separation) of the magnetic recording layer are important in order to realize a higher recording density and a higher SN ratio. In the magnetic recording medium according to Patent Document 1, the crystal orientation is refined by forming the first intermediate layer under a low-pressure condition and the crystal grain size of the magnetic recording layer is refined by forming the second intermediate layer under a high-pressure condition to suppress bonding between crystal grains by a void generated therebetween.


In the magnetic recording medium according to Patent Document 1, however, since forming the second intermediate layer under a high-pressure condition is required for refinement of crystal grain size of the magnetic recording layer, there is the problem that the crystal orientation of a Co alloy material or the like used as a material of the magnetic recording layer degrades as the pressure at the time of film formation increases. This causes the problem that improvement of the crystal orientation of the magnetic recording layer cannot necessarily be sufficient, since the contribution of the second intermediate layer to improvement of the crystal orientation of the magnetic recording layer is smaller than that of the first intermediate layer.


The present invention has been made in view of these circumstances, and an object thereof is to provide a perpendicular magnetic recording medium that can realize both improvement of crystal orientation and refinement of crystal grain size and can achieve a higher recording density and a higher SN ratio, and a method of manufacturing the same.


Means for Solving the Problem

A perpendicular magnetic recording medium of the present invention is a perpendicular magnetic recording medium having a base plate, and a laminate film including a first ground layer provided on the base plate, a second ground layer provided on the first ground layer, and a magnetic layer provided on the second ground layer and containing a magnetic material having a granular structure, wherein the magnetic material which constitutes the magnetic layer contains a CoCrPt alloy, and a material which constitutes the second ground layer contains an Ru—Co oxide alloy.


Regarding the perpendicular magnetic recording medium of the present invention, it is preferred that the material which constitutes the second ground layer be an Ru-xCoO alloy, where x ranges from 0.2 mol to 5 mol.


Regarding the perpendicular magnetic recording medium of the present invention, it is preferred that the film thickness of the second ground layer ranges from 2 nm to 20 nm.


Regarding the perpendicular magnetic recording medium of the present invention, it is preferred that the second ground layer be formed by sputtering using an Ru—CoO alloy or an Ru—Co3O4 alloy as a target.


Regarding the perpendicular magnetic recording medium of the present invention, it is preferred that the second ground layer be formed under the condition of an Ar atmosphere at a gas pressure in the range of 3 Pa to 10 Pa.


A method of manufacturing a perpendicular magnetic recording medium of the present invention is a method of manufacturing a perpendicular magnetic recording medium having a base plate, and a laminate film including a first ground layer provided on the base plate, a second ground layer provided on the first ground layer, and a magnetic layer provided on the second ground layer and containing a magnetic material having a granular structure, wherein the second ground layer is formed by sputtering using an Ru—Co oxide alloy as a target.


Effect of the Invention

According to the present invention, it is possible to provide a perpendicular magnetic recording medium that can realize both improvement in crystal orientation and refinement of crystal grain size and can achieve a higher recording density and a higher SN ratio, and a method of manufacturing the same.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 is a descriptive diagram of a laminate structure of a perpendicular magnetic recording medium according to an embodiment of the present invention;



FIG. 2 is a graph showing a relationship between the film thickness of a second ground layer and a coercive force (Hc);



FIG. 3 is a graph showing a relationship between the film thickness of the second ground layer and a nucleation magnetic field (Hn);



FIG. 4 is a graph showing a relationship between the coercive force (Hc) and the nucleation magnetic field (Hn); and



FIG. 5 is a graph showing a relationship between the film thickness of the second ground layer and crystal orientation dispersion (Δ50).





EMBODIMENT OF THE INVENTION

An embodiment of the present invention will be described in detail below with reference to the attached drawings.



FIG. 1 is a diagram for describing the configuration of a perpendicular magnetic recording medium 100 according to the embodiment of the present invention. The perpendicular magnetic recording medium 100 shown in FIG. 1 has a laminate film including at least a magnetic layer on a base plate 110. The laminate film is mainly composed of a adhesive layer 120, a soft magnetic layer 130, a preliminary ground layer 140, a ground layer 150 (a first ground layer 150a, a second ground layer 150b), a main recording layer 160, a split layer 170, an auxiliary recording layer 180, a protective layer 190, and a lubricating layer 200.


As the base plate 110, for example, a glass disk molded in a disk shape by direct-pressing amorphous aluminosilicate glass can be used. Note that the kind, size, thickness, and others of the glass disk are not particularly restricted. A material of the glass disk can be, for example, aluminosilicate glass, soda lime glass, soda aluminosilicate glass, aluminoborosilicate glass, borosilicate glass, quartz glass, chain silicate glass, or glass ceramic, such as crystallized glass. This glass disk is sequentially subjected to grinding, polishing, and chemical strengthening, thereby allowing the smooth non-magnetic base plate 110 made of a chemically-strengthened glass disk to be obtained.


On the base plate 110, the adhesive layer 120 to the auxiliary recording layer 180 are sequentially formed by DC magnetron sputtering, and the protective layer 190 can be formed by CVD. Thereafter, the lubricating layer 200 can be formed by dip coating. The configuration of each layer will be described below.


The adhesive layer 120 is formed in contact with the base plate 110, and provided with a function of increasing adhesion strength between the soft magnetic layer 130 formed thereon and the base plate 110. It is preferred that the adhesive layer 120 be a film of amorphous alloy, such as a CrTi-type amorphous alloy, a CoW-type amorphous alloy, a CrW-type amorphous alloy, a CrTa-type amorphous alloy, or a CrNb-type amorphous alloy. The film thickness of the adhesive layer 120 can be set, for example, in the range of approximately 2 nm to 20 nm. The adhesive layer 120 may be a single layer or may have a laminate structure.


The soft magnetic layer 130 acts to converge a writing magnetic field from the head when a signal is recorded in a perpendicular magnetic recording type, thereby supporting easy writing of the signal to a magnetic recording layer and density growth. As a soft magnetic material, not only a cobalt-type alloy, such as CoTaZr, but also a material that exhibits a soft magnetic property, such as an FeCo-type alloy, such as FeCoCrB, FeCoTaZr, or FeCoNiTaZr, or a NiFe-type alloy, can be used. The soft magnetic layer 130 can be configured to be provided with AFC (antiferro-magnetic exchange coupling) by interposing a spacer layer made of Ru approximately in the middle of the soft magnetic layer 130. This configuration can reduce perpendicular components of magnetization extremely, thereby reducing noise generated from the soft magnetic layer 130. In the configuration of interposition of the spacer layer in the soft magnetic layer 130, the film thickness of the soft magnetic layer 130 can be set to about 0.3 nm to 0.9 nm for the spacer layer and about 10 nm to 50 nm for each of upper and lower layers of the soft magnetic material.


The preliminary ground layer 140 is provided with a function of promoting crystal orientation of the ground layer 150 formed thereon and a function of controlling a fine structure, such as grain size. Though the preliminary ground layer 140 may have an hcp structure, it is preferred that the preliminary ground layer 140 have a face-centered cubic structure (fcc structure) in which a (111) face is oriented so as to be parallel to a main surface of the base plate 110. As a material of the preliminary ground layer 140, for example, Ni, Cu, Pt, Pd, Ru, Co, Hf, or an alloy containing these metals as a main component and added with at least one of V, Cr, Mo, W, Ta, and the like can be selected. Specifically, NiV, NiCr, NiTa, NiW, NiVCr, CuW, CuCr, or the like can be suitably selected. The film thickness of the preliminary ground layer 140 can be set in the range of about 1 nm to 20 nm. The preliminary ground layer 140 may also have a laminate structure.


The ground layer 150 has an hcp structure, is provided with a function of promoting crystal orientation of magnetic crystal grains in the hcp structure of the main recording layer 160 formed thereon, and a function of controlling a fine structure, such as grain size, and serves as a so-called foundation for a granular structure of the main recording layer. Ru has the same hcp structure as Co, and has a crystal lattice space close to that of Co, and therefore Ru can successfully orient magnetic particles containing Co as a main component. Therefore, higher crystal orientation of the ground layer 150 can improve the crystal orientation of the main recording layer 160 more, and refinement of grain size of the ground layer 150 can cause refinement of grain size of the main recording layer. Though Ru is a typical material of the ground layer 150, a metal, such as Cr or Co, or an oxide can also be added to the ground layer 150. The film thickness of the ground layer 150 can be set in the range of about 5 nm to 40 nm, for example.


The ground layer 150 is composed of an Ru-containing film of a two-layer structure, and includes the first ground layer 150a deposited on the preliminary ground layer 140 and the second ground layer 150b deposited on the first ground layer 150a. The first ground layer 150a and the second ground layer 150b are formed under different film formation conditions. An Ar gas pressure is made relatively higher when the second ground layer 150b on the upper side is formed than when the first ground layer 150a on the lower side is formed. Since a free travel distance of sputtered plasma ions becomes shorter as the gas pressure increases, a film formation rate becomes slower, and crystal orientation can be improved. Further, as the gas pressure increases, the size of a crystal lattice becomes smaller. Since the size of a crystal lattice of Ru is larger than that of Co, the crystal orientation of a granular layer of Co can be improved further by making the crystal lattice of Ru smaller so as to become closer to that of Co.


The second ground layer 150b is composed of a material containing an Ru—Co oxide alloy. Since the second ground layer 150b contains an Ru—Co oxide alloy, a crystal grain boundary made of oxide is formed in the second ground layer 150b to promote interparticle separation, and also functioning to improve crystal orientations of Ru which constitutes the ground layer 150 and the main recording layer 160. This is presumably because Co atoms generated by partial decomposition (reduction) of a Co oxide combines with Ru atoms to form an Ru—Co compound (alloy) at a step of film formation of the second ground layer 150b by sputtering.


Further, it is preferred that the second ground layer 150b be an Ru-xCoO alloy (x ranges from 0.2 mol to 5 mol). The second ground layer 150b having a composition in this range makes both an effect of promotion of interparticle separation and an effect of improvement of crystal orientation possible.


It is preferred that the film thickness of the second ground layer 150b be in the range of 2 nm to 20 nm. Since the film thickness of the second ground layer 150b in the range of 2 nm to 20 nm maximizes both the effect of promotion of interparticle separation and the effect of improvement of crystal orientation, recording and reproduction characteristics of the medium are improved. It is particularly preferred that the film thickness of the second ground layer 150b be in the range of 5 nm to 15 nm, and it is further preferred that it be in the range of 5 nm to 10 nm.


Further, it is preferred that the second ground layer 150b be formed by sputtering with use of an Ru—CoO alloy or an Ru—Co3O4 alloy as a target. Since sputtering with use of these targets causes the Co oxide to segregate in an Ru crystal grain boundary, separation or isolation of Ru crystal grains, or Co crystal grains grown thereon is promoted. Therefore, a perpendicular magnetic recording medium having a high SN ratio can be realized.


Further, it is preferred that the second ground layer 150b be formed under the condition of an Ar atmosphere at a gas pressure of 3 Pa to 10 Pa. Since formation of the second ground layer 150b under this condition causes a void between crystal grains of the second ground layer 150b, separation or isolation between the grains is achieved, so that a medium noise characteristic can be reduced.


Further, the gas pressure for sputtering of the first ground layer 150a and the gas pressure for sputtering of the second ground layer 150b may be made different from each other. Specifically, by making the gas pressure for sputtering of forming the second ground layer 150b higher than the Ar gas pressure for forming the first ground layer 150a side, the grain size of a magnetic particle can be refined with crystal orientation of the main recording layer 160 thereon kept well.


The main recording layer 160 has a columnar granular structure in which a grain boundary is formed by segregation of a non-magnetic substance containing an oxide as a main component around magnetic particles of a ferromagnetic body containing a Co—Pt-type alloy as a main component. For example, by film formation using a target obtained by mixing SiO2 or TiO2 into a CoCrPt-type alloy, a granular structure in which a grain boundary is formed by segregation of SiO2 or TiO2 that is a non-magnetic substance around magnetic particles (grains) made of the CoCrPt-type alloy and in which the magnetic particles are grown in a columnar shape can be formed.


Note that the above-described substances used in the main recording layer 160 are examples, not limitations. The CoCrPt-type alloy may be an alloy obtained by adding at least one of B, Ta, Cu, and the like in CoCrPt. Further, the non-magnetic substance for forming a grain boundary can be an oxide, such as silicon oxide (SiO2), titanium oxide (TiO2), chrome oxide (Cr2O3), zirconium oxide (ZrO2), tantalum oxide (Ta2O5), cobalt oxide (CoO or Co3O4), by way of example. It is also possible to use not only one kind of oxide but also two or more kinds of oxides in combination.


The split layer 170 is provided between the main recording layer 160 and the auxiliary recording layer 180, and has a function of adjusting the strength of exchange coupling between these layers. Since this can adjust the strength of magnetic coupling between the main recording layer 160 and the auxiliary recording layer 180 and between adjacent magnetic particles in the main recording layer 160, it is possible to improve recording and reproduction characteristics, such as an overwrite characteristic or an SNR characteristic while keeping a magnetostatic value, such as Hc or Hn relating to an anti-thermal-fluctuation characteristic.


It is preferred that, in order to prevent inheritance of crystal orientation from lowering, the split layer 170 be a layer containing Ru or Co with an hcp structure as a main component. As an Ru-type material, other than Ru, a material obtained by adding another metal element, oxygen, or an oxide in Ru can be used. As a Co-type material, a CoCr alloy or the like can be used. Specifically, Ru, RuCr, RuCo, Ru—SiO2, Ru—WO3, Ru—TiO2, CoCr, CoCr—SiO2, CoCr—TiO2, or the like can be used. Note that, though a non-magnetic material is generally used for the split layer 170, the split layer 170 may have weak magnetism. Further, in order to obtain a good exchange coupling strength, it is preferred that the film thickness of the split layer 170 be in the range of 0.2 nm to 1.0 nm.


The auxiliary recording layer 180 is a magnetic layer magnetically approximately continuous in an in-plane direction of the main surface of the base plate. Since the auxiliary recording layer 180 has magnetic interaction (exchange coupling) with the main recording layer 160, it is possible to adjust a magnetostatic characteristic, such as a coercive force Hc or an inverted magnetic domain nucleation magnetic field Hn, which aims at improving the anti-thermal-fluctuation characteristic, the OW (overwrite) characteristic, and the SNR. As a material of the auxiliary recording layer 180, a CoCrPt-type alloy can be used, and further an additive, such as B, Ta, or Cu, may be added therein. Specifically, CoCrPt, CoCrPtB, CoCrPtTa, CoCrPtCu, CoCrPtCuB, or the like can be used. The film thickness of the auxiliary recording layer 180 can be set, for example, in the range of 3 nm to 10 nm.


Note that “magnetically continuous” means that magnetism is continuous without interruption. “Approximately continuous” means that, when seen as a whole, the auxiliary recording layer 180 does not have to be a single magnet and may have partially-discontinuous magnetism. That is, the auxiliary recording layer 180 is only required to have magnetism continuous over (so as to cover) a plurality of aggregates of magnetic particles. As long as this condition is satisfied, the auxiliary recording layer 180 may have a structure in which Cr has been segregated, for example.


The protective layer 190 is a layer for protecting the perpendicular magnetic recording medium 100 from an impact from the magnetic head or corrosion. The protective layer 190 can be formed by forming a film containing carbon by CVD. A carbon film formed by CVD is preferred, since in general it is improved in film hardness as compared with one formed by sputtering, and therefore can protect the perpendicular magnetic recording medium 100 more effectively from an impact from the magnetic head. The film thickness of the protective layer 190 can be set, for example, in the range of 2 nm to 6 nm.


The lubricating layer 200 is formed to prevent the protective layer 190 from being damaged when the magnetic head comes in contact with the surface of the perpendicular magnetic recording medium 100. For example, the lubricating layer 200 can be formed by dip-coating PFPE (perfluoropolyether). The film thickness of the lubricating layer 200 can be set, for example, in the range of 0.5 nm to 2.0 nm.


Here, a relationship between the film thickness of the second ground layer 150b and coercive force (Hc) was examined. The result is shown in FIG. 2. FIG. 2 shows a case where the second ground layer 150b contained RuO, a case where the second ground layer 150b contained Ru-1.25SiO2, a case where the second ground layer 150b contained Ru-0.6Co3O4, and a case where the second ground layer 150b contained Ru-1.25Co3O4. Note that the coercive force was measured at room temperature by using a Kerr-effect-type magnetometer. At that time, the magnetic field was swept from +15000 Oe (1000/(4π) A/m) to −15000 Oe(1000/(4π) A/m) at a constant rate for 20 seconds. As can be seen from FIG. 2, the coercive forces in the cases where the second ground layer 150b contained an Ru—Co oxide alloy were approximately equal to those in the cases where the second ground layer 150b contained RuO or Ru—SiO2.


Next, a relationship between the film thickness of the second ground layer 150b and a nucleation magnetic field (Hn) was examined. The result is shown in FIG. 3. As shown in FIG. 3, the nucleation magnetic field was weaker in the case where the second ground layer 150b contained Ru-1.25SiO2 than in the case where the second ground layer 150b contained RuO (the absolute value lowered by up to 100 Oe (1000/(4π) A/m)). Further, the nucleation magnetic field was stronger in the case where the second ground layer 150b contained Ru-0.6Co3O4 or in the case where the second ground layer 150b contained Ru-1.25Co3O4 than in the case where the second ground layer 150b contained RuO (the absolute value increased by 50 Oe (1000/(4π) A/m) to 100 Oe (1000/(4π) A/m)). The nucleation magnetic field was measured at room temperature by using a Kerr effect evaluation apparatus. As can be seen from FIG. 3, a stronger nucleation magnetic field than in the cases where the second ground layer 150b contained RuO or Ru—SiO2 was obtained by the second ground layer 150b was an Ru—Co oxide alloy. Since a medium fringe characteristic (an anti-erase characteristic at the time of writing on an adjacent track) is improved more as the nucleation magnetic field becomes stronger, the second ground layer 150b containing the Ru—Co oxide alloy can be expected to improve the medium fringe characteristic.


Next, a relationship between the coercive force (Hc) and the nucleation magnetic field (Hn) was examined. The result is shown in FIG. 4. As shown in FIG. 4, even at the gas pressure of 4.5 Pa and even at the gas pressure of 6 Pa, an absolute value |Hn| of the nucleation magnetic field at the same Hc increased (+50 Oe (1000/(4π) A/m) to 100 Oe (1000/(4π) A/m)) in the case where the second ground layer 150b contained Ru-0.6Co3O4 as compared with the case where the second ground layer 150b contained RuO. As described above, since the increase of the nucleation magnetic field (Hn) is obtained even at an equal coercive force (Hc), the second ground layer 150b containing the Ru—Co oxide alloy can be expected to improve the fringe characteristic without causing deterioration of the OW characteristic of the medium.


Next, a relationship between the film thickness of the second ground layer 150b and crystal orientation dispersion (Δ50) was examined. The result is shown in FIG. 5. FIG. 5 shows a case where the second ground layer 150b contained RuO (2 kppm) (a gas pressure of 4.5 Pa), a case where the second ground layer 150b contained Ru-1.9SiO2 (a gas pressure of 4.5 Pa), and a case where the second ground layer 150b contained Ru-0.6Co3O4 (a gas pressure of 4.5 Pa). Note that the crystal orientation dispersion was measured by using SmartLab, an X-ray diffractometer, manufactured by RIGAKU Corporation with an X-ray power of 45 kV and 200 mA. As can be seen from FIG. 5, the crystal orientation dispersion (Δ50) was lower and accordingly the orientation was higher in the case where the second ground layer 150b contained an Ru—Co oxide alloy than in the cases where the second ground layer 150b was RuO or Ru—SiO2.


Thus, it was found that, in the case where a material which constituted the second ground layer contained the Ru—Co oxide alloy, magnetic characteristics equivalent to those in the case where the second ground layer 150b was RuO or Ru—SiO2 were produced and refinement of crystal grain size was achieved. It was also found that, in the case where a material which constituted the second ground layer contained the Ru—Co oxide alloy, crystal orientation higher than that in the case where the second ground layer 150b was RuO or Ru—SiO2 was produced. Therefore, a perpendicular magnetic recording medium having such a second ground layer can realize both improvement in crystal orientation and refinement of crystal grain size and can achieve a higher recording density and a higher SN ratio.


(Example)


Next, an example performed to clarify the effect of the present invention will be described.


A glass disk was formed by molding amorphous aluminosilicate glass in a disk shape by direct-pressing. This glass disk was sequentially subjected to grinding, polishing, and chemical strengthening, and thus a base plate which was a smooth non-magnetic disk base made of a chemically-strengthened glass disk was obtained. The base plate was a base plate for a 2.5-inch magnetic disk being 65 mm in diameter, 20 mm in inner diameter, and 0.635 mm in disk thickness. From observation of surface roughness of the base plate obtained with an AFM (atomic force microscope), it was confirmed that the base plate had a smooth surface with 2.18 nm in Rmax and 0.18 in Ra. Note that Rmax and Ra adhere to Japanese Industrial Standards (JIS).


Next, the adhesive layer 120, the soft magnetic layer 130, the preliminary ground layer 140, the first ground layer 150a, the second ground layer 150b, the main recording layer 160, the split layer 170, and the auxiliary recording layer 180 were sequentially formed on the base plate 110 in an Ar atmosphere by DC magnetron sputtering with use of a vacuumed film forming device. Note that an Ar gas pressure at the film formation time was 0.6 Pa, unless otherwise described.


Specifically, as the adhesive layer 120, a 10 nm-thick Cr-50Ti film was formed. As the soft magnetic layer 130, 20 nm-thick 92(40Fe-60Co)-3Ta-5Zr films were formed with a 0.7 nm-thick Ru layer interposed therebetween. As the preliminary ground layer 140, an 8 nm-thick Ni-5W film was formed. As the first ground layer 150a, a 10 nm-thick Ru film was formed at an Ar gas pressure of 0.6 Pa. As the second ground layer 150b, an 8 nm-thick Ru—Co3O4 was formed at an Ar gas pressure of 4.5 Pa. As the main recording layer 160, a 2 nm-thick 90(70Co-10Cr-20Pt)-10(Cr2O3) film was formed at an Ar gas pressure of 3 Pa, and thereon a 12 nm-thick 90(72Co-10Cr-18Pt)-5(SiO2)-5(TiO2) film was further formed at an Ar gas pressure of 3 Pa. As the split layer 170, a 0.3 nm-thick Ru film was formed. As the auxiliary recording layer 180, a 6 nm-thick 62Co-18Cr-15Pt-5B film was formed.


The protective layer 190 with a thickness of 4 nm was formed on the auxiliary recording layer 180 by using C2H4 by CVD, and a superficial layer thereof was subjected to nitriding treatment. Next, the lubricating layer 200 was formed to have a thickness of 1 nm by using PFPE (perfluoropolyether) by dip coating. In this manner, a perpendicular magnetic recording medium according to the example was manufactured.


(Comparative Example)


A perpendicular magnetic recording medium of a comparative example was formed in the same manner as the example, except that, as the first ground layer 150a, a 10 nm-thick Ru film was formed at an Ar gas pressure of 0.6 Pa, and, as the second ground layer 150b, an 8 nm-thick Ru film was formed thereon at an Ar gas pressure of 4.5 Pa.


In examination of the SNRs of the manufactured perpendicular magnetic recording medium of the example and the manufactured perpendicular magnetic recording medium of the comparative example, it was found that the SNR of the former was 18.4 dB and that of the latter was 18.0 dB, respectively. Note that the SNRs were measured by using a spin stand manufactured by Hitachi High-Technologies Corporation under a condition of 1500 kfci.


Thus, the SNR in the case where a material that constitutes the second ground layer contained the Ru—Co oxide alloy (the example) was much better than that in the case where a material that constitutes the second ground layer contained Ru (the comparative example). This is presumably because the second ground layer containing the Ru—Co oxide alloy caused high crystal orientation. Therefore, it is found that the perpendicular magnetic recording medium of the present invention could achieve a higher recording density and a higher SN ratio.


The preferred embodiment of the present invention has been described above with reference to the appended drawings, but it goes without saying that the present invention is not limited to the embodiment. It is obvious that a person skilled in the art can arrive at various modifications or alterations within the scope of claims, and those are of course understood as belonging to the technical scope of the present invention.


INDUSTRIAL APPLICABILITY

The present invention can be applied to a perpendicular magnetic recording medium installed in an HDD or the like of a perpendicular magnetic recording type and a method of manufacturing the same.


DESCRIPTIONS OF REFERENCE NUMERALS


100: Perpendicular magnetic recording medium



110: Base plate



120: Adhesive layer



130: Soft magnetic layer



140: Preliminary ground layer



150: Ground layer



150
a: First ground layer



150
b: Second ground layer



160: Main recording layer



170: Split layer



180: Auxiliary recording layer



190: Protective layer



200: Lubricating layer

Claims
  • 1. A perpendicular magnetic recording medium comprising: a base plate, anda laminate film including a first ground layer provided on the base plate, a second ground layer provided on the first ground layer, and a magnetic layer provided on the second ground layer and containing a magnetic material having a granular structure,wherein the magnetic layer contains a CoCrPt alloy, and the second ground layer consists of Ru-xCo3O4, where x ranges from 0.2 mol to 5 mol,wherein the first ground layer consists of Ru and is thicker than the second ground layer,wherein a film thickness of the second ground layer is 8 nm-15nm,wherein a total film thickness of the first and second ground layers is 11 nm-40 nm, andwherein the first ground layer is formed under a first gas pressure, the second ground layer is formed under a second gas pressure, and the second gas pressure is higher than the first gas pressure.
  • 2. The perpendicular magnetic recording medium according to claim 1, wherein the film thickness of the second ground layer ranges from 8 nm to less than 10 nm.
  • 3. The perpendicular magnetic recording medium according to claim 1, wherein the second ground layer has a granular structure with voids formed between crystal grains that provides separation of the crystal grains and that results from formation under the condition of an Ar atmosphere at a gas pressure in the range of 3 Pa to 10 Pa, being filled with an oxide.
  • 4. The perpendicular magnetic recording medium according to claim 1, further comprising a preliminary ground layer disposed between the base and the first ground layer.
  • 5. The perpendicular magnetic recording medium according to claim 4, wherein the preliminary ground layer has a thickness in a range from 1 nm to 20 nm.
  • 6. The perpendicular magnetic recording medium according to claim 4, wherein the preliminary ground layer comprises Cu, Pt, Pd, Co, Hf or an alloy containing these materials as a main component and added with at least one of V, Cr, Mo and W.
  • 7. The perpendicular magnetic recording medium according to claim 6, wherein the preliminary ground layer comprises Co.
  • 8. The perpendicular magnetic recording medium according to claim 1, wherein x ranges from 0.2 mol to less than 3 mol.
  • 9. The perpendicular magnetic recording medium according to claim 1, wherein the film thickness of the second ground layer is 10 nm-15 nm.
  • 10. The perpendicular magnetic recording medium according to claim 1, wherein x ranges from 0.2 mol to 1.25 mol.
  • 11. The perpendicular magnetic recording medium according to claim 1, wherein x ranges from 0.2 mol to 0.6 mol.
Priority Claims (1)
Number Date Country Kind
2010-141238 Jun 2010 JP national
US Referenced Citations (331)
Number Name Date Kind
6013161 Chen et al. Jan 2000 A
6063248 Bourez et al. May 2000 A
6068891 O'Dell et al. May 2000 A
6086730 Liu et al. Jul 2000 A
6099981 Nishimori Aug 2000 A
6103404 Ross et al. Aug 2000 A
6117499 Wong et al. Sep 2000 A
6136403 Prabhakara et al. Oct 2000 A
6143375 Ross et al. Nov 2000 A
6145849 Bae et al. Nov 2000 A
6146737 Malhotra et al. Nov 2000 A
6149696 Jia Nov 2000 A
6150015 Bertero et al. Nov 2000 A
6156404 Ross et al. Dec 2000 A
6159076 Sun et al. Dec 2000 A
6164118 Suzuki et al. Dec 2000 A
6200441 Gornicki et al. Mar 2001 B1
6204995 Hokkyo et al. Mar 2001 B1
6206765 Sanders et al. Mar 2001 B1
6210819 Lal et al. Apr 2001 B1
6216709 Fung et al. Apr 2001 B1
6221119 Homola Apr 2001 B1
6248395 Homola et al. Jun 2001 B1
6261681 Suekane et al. Jul 2001 B1
6270885 Hokkyo et al. Aug 2001 B1
6274063 Li et al. Aug 2001 B1
6283838 Blake et al. Sep 2001 B1
6287429 Moroishi et al. Sep 2001 B1
6290573 Suzuki Sep 2001 B1
6299947 Suzuki et al. Oct 2001 B1
6303217 Malhotra et al. Oct 2001 B1
6309765 Suekane et al. Oct 2001 B1
6358636 Yang et al. Mar 2002 B1
6362452 Suzuki et al. Mar 2002 B1
6363599 Bajorek Apr 2002 B1
6365012 Sato et al. Apr 2002 B1
6381090 Suzuki et al. Apr 2002 B1
6381092 Suzuki Apr 2002 B1
6387483 Hokkyo et al. May 2002 B1
6391213 Homola May 2002 B1
6395349 Salamon May 2002 B1
6403919 Salamon Jun 2002 B1
6408677 Suzuki Jun 2002 B1
6426157 Hokkyo et al. Jul 2002 B1
6429984 Alex Aug 2002 B1
6482330 Bajorek Nov 2002 B1
6482505 Bertero et al. Nov 2002 B1
6500567 Bertero et al. Dec 2002 B1
6528124 Nguyen Mar 2003 B1
6548821 Treves et al. Apr 2003 B1
6552871 Suzuki et al. Apr 2003 B2
6565719 Lairson et al. May 2003 B1
6566674 Treves et al. May 2003 B1
6571806 Rosano et al. Jun 2003 B2
6628466 Alex Sep 2003 B2
6664503 Hsieh et al. Dec 2003 B1
6670055 Tomiyasu et al. Dec 2003 B2
6682807 Lairson et al. Jan 2004 B2
6683754 Suzuki et al. Jan 2004 B2
6730420 Bertero et al. May 2004 B1
6743528 Suekane et al. Jun 2004 B2
6759138 Tomiyasu et al. Jul 2004 B2
6778353 Harper Aug 2004 B1
6795274 Hsieh et al. Sep 2004 B1
6855232 Jairson et al. Feb 2005 B2
6857937 Bajorek Feb 2005 B2
6893748 Bertero et al. May 2005 B2
6899959 Bertero et al. May 2005 B2
6916558 Umezawa et al. Jul 2005 B2
6939120 Harper Sep 2005 B1
6946191 Morikawa et al. Sep 2005 B2
6967798 Homola et al. Nov 2005 B2
6972135 Homola Dec 2005 B2
7004827 Suzuki et al. Feb 2006 B1
7006323 Suzuki Feb 2006 B1
7016154 Nishihira Mar 2006 B2
7019924 McNeil et al. Mar 2006 B2
7045215 Shimokawa May 2006 B2
7070870 Bertero et al. Jul 2006 B2
7090934 Hokkyo et al. Aug 2006 B2
7099112 Harper Aug 2006 B1
7105241 Shimokawa et al. Sep 2006 B2
7119990 Bajorek et al. Oct 2006 B2
7147790 Wachenschwanz et al. Dec 2006 B2
7161753 Wachenschwanz et al. Jan 2007 B2
7166319 Ishiyama Jan 2007 B2
7166374 Suekane et al. Jan 2007 B2
7169487 Kawai et al. Jan 2007 B2
7174775 Ishiyama Feb 2007 B2
7179549 Malhotra et al. Feb 2007 B2
7184139 Treves et al. Feb 2007 B2
7196860 Alex Mar 2007 B2
7199977 Suzuki et al. Apr 2007 B2
7208236 Morikawa et al. Apr 2007 B2
7220500 Tomiyasu et al. May 2007 B1
7229266 Harper Jun 2007 B2
7239970 Treves et al. Jul 2007 B2
7252897 Shimokawa et al. Aug 2007 B2
7277254 Shimokawa et al. Oct 2007 B2
7281920 Homola et al. Oct 2007 B2
7292329 Treves et al. Nov 2007 B2
7301726 Suzuki Nov 2007 B1
7302148 Treves et al. Nov 2007 B2
7305119 Treves et al. Dec 2007 B2
7314404 Singh et al. Jan 2008 B2
7320584 Harper et al. Jan 2008 B1
7329114 Harper et al. Feb 2008 B2
7375362 Treves et al. May 2008 B2
7420886 Tomiyasu et al. Sep 2008 B2
7425719 Treves et al. Sep 2008 B2
7471484 Wachenschwanz et al. Dec 2008 B2
7498062 Calcaterra et al. Mar 2009 B2
7531485 Hara et al. May 2009 B2
7537846 Ishiyama et al. May 2009 B2
7549209 Wachenschwanz et al. Jun 2009 B2
7569490 Staud Aug 2009 B2
7597792 Homola et al. Oct 2009 B2
7597973 Ishiyama Oct 2009 B2
7608193 Wachenschwanz et al. Oct 2009 B2
7632087 Homola Dec 2009 B2
7656615 Wachenschwanz et al. Feb 2010 B2
7682546 Harper Mar 2010 B2
7684152 Suzuki et al. Mar 2010 B2
7686606 Harper et al. Mar 2010 B2
7686991 Harper Mar 2010 B2
7695833 Ishiyama Apr 2010 B2
7722968 Ishiyama May 2010 B2
7733605 Suzuki et al. Jun 2010 B2
7736768 Ishiyama Jun 2010 B2
7755861 Li et al. Jul 2010 B1
7758732 Calcaterra et al. Jul 2010 B1
7833639 Sonobe et al. Nov 2010 B2
7833641 Tomiyasu et al. Nov 2010 B2
7910159 Jung Mar 2011 B2
7911736 Bajorek Mar 2011 B2
7924519 Lambert Apr 2011 B2
7944165 O'Dell May 2011 B1
7944643 Jiang et al. May 2011 B1
7955723 Umezawa et al. Jun 2011 B2
7983003 Sonobe et al. Jul 2011 B2
7993497 Moroishi et al. Aug 2011 B2
7993765 Kim et al. Aug 2011 B2
7998912 Chen et al. Aug 2011 B2
8002901 Chen et al. Aug 2011 B1
8003237 Sonobe et al. Aug 2011 B2
8012920 Shimokawa Sep 2011 B2
8038863 Homola Oct 2011 B2
8057926 Ayama et al. Nov 2011 B2
8062778 Suzuki et al. Nov 2011 B2
8064156 Suzuki et al. Nov 2011 B1
8076013 Sonobe et al. Dec 2011 B2
8092931 Ishiyama et al. Jan 2012 B2
8100685 Harper et al. Jan 2012 B1
8101054 Chen et al. Jan 2012 B2
8125723 Nichols et al. Feb 2012 B1
8125724 Nichols et al. Feb 2012 B1
8137517 Bourez Mar 2012 B1
8142916 Umezawa et al. Mar 2012 B2
8163093 Chen et al. Apr 2012 B1
8171949 Lund et al. May 2012 B1
8173282 Sun et al. May 2012 B1
8178480 Hamakubo et al. May 2012 B2
8206789 Suzuki Jun 2012 B2
8218260 Iamratanakul et al. Jul 2012 B2
8247095 Champion et al. Aug 2012 B2
8257783 Suzuki et al. Sep 2012 B2
8298609 Liew et al. Oct 2012 B1
8298689 Sonobe et al. Oct 2012 B2
8309239 Umezawa et al. Nov 2012 B2
8316668 Chan et al. Nov 2012 B1
8331056 O'Dell Dec 2012 B2
8354618 Chen et al. Jan 2013 B1
8367228 Sonobe et al. Feb 2013 B2
8383209 Ayama Feb 2013 B2
8394243 Jung et al. Mar 2013 B1
8397751 Chan et al. Mar 2013 B1
8399809 Bourez Mar 2013 B1
8402638 Treves et al. Mar 2013 B1
8404056 Chen et al. Mar 2013 B1
8404369 Ruffini et al. Mar 2013 B2
8404370 Sato et al. Mar 2013 B2
8406918 Tan et al. Mar 2013 B2
8414966 Yasumori et al. Apr 2013 B2
8425975 Ishiyama Apr 2013 B2
8431257 Kim et al. Apr 2013 B2
8431258 Onoue et al. Apr 2013 B2
8453315 Kajiwara et al. Jun 2013 B2
8488276 Jung et al. Jul 2013 B1
8491800 Dorsey Jul 2013 B1
8492009 Homola et al. Jul 2013 B1
8492011 Itoh et al. Jul 2013 B2
8496466 Treves et al. Jul 2013 B1
8517364 Crumley et al. Aug 2013 B1
8517657 Chen et al. Aug 2013 B2
8524052 Tan et al. Sep 2013 B1
8530065 Chernyshov et al. Sep 2013 B1
8546000 Umezawa Oct 2013 B2
8551253 Na'im et al. Oct 2013 B2
8551627 Shimada et al. Oct 2013 B2
8556566 Suzuki et al. Oct 2013 B1
8559131 Masuda et al. Oct 2013 B2
8562748 Chen et al. Oct 2013 B1
8565050 Bertero et al. Oct 2013 B1
8570844 Yuan et al. Oct 2013 B1
8580410 Onoue Nov 2013 B2
8584687 Chen et al. Nov 2013 B1
8591709 Lim et al. Nov 2013 B1
8592061 Onoue et al. Nov 2013 B2
8596287 Chen et al. Dec 2013 B1
8597723 Jung et al. Dec 2013 B1
8603649 Onoue Dec 2013 B2
8603650 Sonobe et al. Dec 2013 B2
8605388 Yasumori et al. Dec 2013 B2
8605555 Chernyshov et al. Dec 2013 B1
8608147 Yap et al. Dec 2013 B1
8609263 Chernyshov et al. Dec 2013 B1
8619381 Moser et al. Dec 2013 B2
8623528 Umezawa et al. Jan 2014 B2
8623529 Suzuki Jan 2014 B2
8634155 Yasumori et al. Jan 2014 B2
8658003 Bourez Feb 2014 B1
8658292 Mallary et al. Feb 2014 B1
8665541 Saito Mar 2014 B2
8668953 Buechel-Rimmel Mar 2014 B1
8674327 Poon et al. Mar 2014 B1
8685214 Moh et al. Apr 2014 B1
8696404 Sun et al. Apr 2014 B2
8711499 Desai et al. Apr 2014 B1
8743666 Bertero et al. Jun 2014 B1
8758912 Srinivasan et al. Jun 2014 B2
8787124 Chernyshov et al. Jul 2014 B1
8787130 Yuan et al. Jul 2014 B1
8791391 Bourez Jul 2014 B2
8795765 Koike et al. Aug 2014 B2
8795790 Sonobe et al. Aug 2014 B2
8795857 Ayama et al. Aug 2014 B2
20020034665 Nakazawa et al. Mar 2002 A1
20020060883 Suzuki May 2002 A1
20030022024 Wachenschwanz Jan 2003 A1
20040022387 Weikle Feb 2004 A1
20040132301 Harper et al. Jul 2004 A1
20040202793 Harper et al. Oct 2004 A1
20040202865 Homola et al. Oct 2004 A1
20040209123 Bajorek et al. Oct 2004 A1
20040209470 Bajorek Oct 2004 A1
20050036223 Wachenschwanz et al. Feb 2005 A1
20050142990 Homola Jun 2005 A1
20050150862 Harper et al. Jul 2005 A1
20050151282 Harper et al. Jul 2005 A1
20050151283 Bajorek et al. Jul 2005 A1
20050151300 Harper et al. Jul 2005 A1
20050155554 Saito Jul 2005 A1
20050167867 Bajorek et al. Aug 2005 A1
20050214588 Iwasaki Sep 2005 A1
20050263401 Olsen et al. Dec 2005 A1
20060057431 Tamai et al. Mar 2006 A1
20060147758 Jung et al. Jul 2006 A1
20060181697 Treves et al. Aug 2006 A1
20060207890 Staud Sep 2006 A1
20070070549 Suzuki et al. Mar 2007 A1
20070245909 Homola Oct 2007 A1
20080057348 Shimizu Mar 2008 A1
20080075845 Sonobe et al. Mar 2008 A1
20080093760 Harper et al. Apr 2008 A1
20090117408 Umezawa et al. May 2009 A1
20090136784 Suzuki et al. May 2009 A1
20090142624 Takahoshi et al. Jun 2009 A1
20090169922 Ishiyama Jul 2009 A1
20090191331 Umezawa et al. Jul 2009 A1
20090197119 Kong et al. Aug 2009 A1
20090202866 Kim et al. Aug 2009 A1
20090311557 Onoue et al. Dec 2009 A1
20100067149 Bian Mar 2010 A1
20100143752 Ishibashi et al. Jun 2010 A1
20100188772 Sasaki Jul 2010 A1
20100190035 Sonobe et al. Jul 2010 A1
20100196619 Ishiyama Aug 2010 A1
20100196740 Ayama et al. Aug 2010 A1
20100209601 Shimokawa et al. Aug 2010 A1
20100215992 Horikawa et al. Aug 2010 A1
20100232065 Suzuki et al. Sep 2010 A1
20100247965 Onoue Sep 2010 A1
20100261039 Itoh et al. Oct 2010 A1
20100279151 Sakamoto et al. Nov 2010 A1
20100296200 Iwasaki Nov 2010 A1
20100300884 Homola et al. Dec 2010 A1
20100304186 Shimokawa Dec 2010 A1
20110097603 Onoue Apr 2011 A1
20110097604 Onoue Apr 2011 A1
20110111257 Kurokawa et al. May 2011 A1
20110171495 Tachibana et al. Jul 2011 A1
20110206947 Tachibana et al. Aug 2011 A1
20110212346 Onoue et al. Sep 2011 A1
20110223446 Onoue et al. Sep 2011 A1
20110244119 Umezawa et al. Oct 2011 A1
20110299194 Aniya et al. Dec 2011 A1
20110311841 Saito et al. Dec 2011 A1
20120069466 Okamoto et al. Mar 2012 A1
20120070692 Sato et al. Mar 2012 A1
20120077060 Ozawa Mar 2012 A1
20120127599 Shimokawa et al. May 2012 A1
20120127601 Suzuki et al. May 2012 A1
20120129009 Sato et al. May 2012 A1
20120140359 Tachibana Jun 2012 A1
20120141833 Umezawa et al. Jun 2012 A1
20120141835 Sakamoto Jun 2012 A1
20120148875 Hamakubo et al. Jun 2012 A1
20120156523 Seki et al. Jun 2012 A1
20120164488 Shin et al. Jun 2012 A1
20120170152 Sonobe et al. Jul 2012 A1
20120171369 Koike et al. Jul 2012 A1
20120175243 Fukuura et al. Jul 2012 A1
20120189872 Umezawa et al. Jul 2012 A1
20120196049 Azuma et al. Aug 2012 A1
20120207919 Sakamoto et al. Aug 2012 A1
20120225217 Itoh et al. Sep 2012 A1
20120251842 Yuan et al. Oct 2012 A1
20120251846 Desai et al. Oct 2012 A1
20120276417 Shimokawa et al. Nov 2012 A1
20120308722 Suzuki et al. Dec 2012 A1
20130040167 Alagarsamy et al. Feb 2013 A1
20130071694 Srinivasan et al. Mar 2013 A1
20130165029 Sun et al. Jun 2013 A1
20130175252 Bourez Jul 2013 A1
20130216865 Yasumori et al. Aug 2013 A1
20130230647 Onoue et al. Sep 2013 A1
20130314815 Yuan et al. Nov 2013 A1
20140011054 Suzuki Jan 2014 A1
20140044992 Onoue Feb 2014 A1
20140050843 Yi et al. Feb 2014 A1
20140151360 Gregory et al. Jun 2014 A1
Foreign Referenced Citations (3)
Number Date Country
2009-059431 Mar 2009 JP
2009059431 Mar 2009 JP
2010035810 Apr 2010 WO
Non-Patent Literature Citations (1)
Entry
Japanese Office Action dated Jun. 17, 2014 for related Japanese Application No. 2010-141238, pp. 1-5.
Related Publications (1)
Number Date Country
20120164488 A1 Jun 2012 US