Claims
- 1. A photo-imageable composition comprising an acrylate-norbornene copolymer comprising from about 15 to about 90 mole % acrylate-type units and from about 85 to about 10 mole % norbornene-type units, one or the other of the acrylate-type units or norbornene-type units comprising an acid labile moiety.
- 2. The photo-imageable composition of claim 1, where the norbornene-type units comprise norbornene, norbornadiene and compounds conforming to the general formulae I or Ia:
- 3. The photo-imageable composition of claim 2, further comprising a photo acid generator and a solvent.
- 4. The photo-imageable composition of claim 3, further comprising at least one of a dissolution rate modifier, a base quencher and/or a sensitizer.
- 5. The photo-imageable composition of claim 4, where the acrylate-type units and/or the norbornene-type units comprise more than one type of acrylate-type unit and/or norbornene-type unit, respectively, and at least one of the acrylate-type units and/or the norbornene-type units comprise an acid labile moiety.
- 6. A photo-imageable composition comprising a polymer having from about 15 to about 90 mole % of acrylate-type units and from about 85 to about 10 mole % of norbornene-type units, where the acrylate-type units and/or the norbornene-type units comprise more than one type of acrylate-type unit and/or norbornene-type unit, respectively, and at least one of the acrylate-type units and/or the norbornene-type units comprise an acid labile moiety.
- 7. The photo-imageable composition of claim 6, further comprising one or more additives selected from the group consisting of a photoacid generator, a solvent, a sensitizer, a base quencher and a dissolution rate modifier.
- 8. A method of forming a photo-imageable composition comprising:
causing an acrylate-type monomer and a norbornene-type monomer to polymerize to form a polymer, one or the other of the acrylate-type monomer or the norbornene-type monomer comprising an acid labile moiety; dissolving the polymer in a solvent to form a solution; and adding to the solution an additive selected from the group consisting of a photoacid generator, a solvent, a sensitizer, a base quencher and a dissolution rate modifier.
- 9. The method of claim 8, where the norbornene-type monomer comprises norbornene, norbornadiene and compounds conforming to the general formulae I or Ia:
- 10. The method of claim 9, where the causing to form a polymer comprises an addition polymerization using a neutral or cationic Pd catalyst.
- 11. The method of claim 10, where the causing to form a polymer comprises forming a polymer having from about 15 to about 90 mole % of acrylate units and from about 85 to about 10 mole % of norbornene units
- 12. The method of claim 9, where the causing to form a polymer comprises forming a polymer having from about 15 to about 90 mole % of acrylate units and from about 85 to about 10 mole % of norbornene units, where the acrylate units and/or the norbornene units comprise more than one type of acrylate unit and/or norbornene unit, respectively, and at least one of the types of acrylate units and/or the norbornene units comprise an acid labile moiety.
- 13. A method of forming a patterned structure on a substrate, comprising:
providing a substrate; applying a photo-imageable composition to said substrate to form a layer of the photo-imageable composition on said substrate, the photo-imageable composition comprising:
an imageable polymer consisting essentially of from about 15 to about 90 mole % acrylate-type units and from about 85 to about 10 mole % norbornene-type units, one or the other of the acrylate-type units or norbornene-type units comprising an acid labile moiety; and a photo acid generator; patternwise exposing the layer to radiation whereby acid is generated by said photosensitive acid generator in exposed regions of the layer by the radiation; and contacting the layer with an aqueous alkaline developer solution, whereby the exposed regions of the layer are selectively dissolved by said developer solution to form the patterned structure.
- 14. The method of forming a patterned structure of claim 13, further comprising:
before providing the substrate, forming a material layer on the substrate, the material layer comprising a material selected from the group consisting of a semiconductor material, an insulating material and a conductive material; applying the photo-imageable composition comprises applying the photo-imageable composition on the material layer; and transferring the patterned structure to the material layer to form a patterned material layer structure.
- 15. The method of forming a patterned structure of claim 14, where the transferring comprises a reactive ion etch process.
- 16. The method of forming a patterned structure of claim 14, where the norbornene-type units of the imageable polymer comprise norbornene, norbornadiene and compounds conforming to the general formulae I or Ia:
RELATED APPLICATIONS
[0001] This application is a continuation-in-part of Ser. No. 09/930,197 filed Aug. 16, 2001, now U.S. Pat. No. 6,593,440, which is a continuation-in-part of Ser. No. 09/565,137, filed May 5, 2000, now U.S. Pat. No. 6,300,440, which is a division of Ser. No. 09/099,070, filed Jun. 17, 1998, now U.S. Pat. No. 6,111,041, which claims the benefit of U.S. Provisional No. 60/050,107, filed Jun. 18, 1997.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60050107 |
Jun 1997 |
US |
Divisions (1)
|
Number |
Date |
Country |
Parent |
09099070 |
Jun 1998 |
US |
Child |
09565137 |
May 2000 |
US |
Continuation in Parts (2)
|
Number |
Date |
Country |
Parent |
09930197 |
Aug 2001 |
US |
Child |
10614502 |
Jul 2003 |
US |
Parent |
09565137 |
May 2000 |
US |
Child |
09930197 |
Aug 2001 |
US |