Claims
- 1. A photocurable film that will cure upon exposure to actinic radiation comprising:
- a non-liquid, tack-free thermoplastic material which can be embossed until it is photocured consisting essentially of:
- (1) a photoinitiator, and
- (2) a moisture-cured linear polyurethane, having sites of unsaturation only in its polymer backbone, said polyurethane being produced by the reaction of a diisocyanate and an unsaturated polyester diol, and then moisture-curing the polyurethane produced further providing that the polyester diol was prepared by reacting a diol and an unsaturated diacid in an amount needed to give an unsaturation level of at least about 3 mole percent to the linear polyurethane.
- 2. A film as described in claim 1 wherein the diisocyanate is an aromatic, aliphatic or acyclic diisocyanate of the general formula:
- OCN--R--NCO
- wherein R is either R1 or R2-CH.sub.2 -R3 wherein R1, represents, and R2 and R3 can independently represent, organic radicals selected from the group consisting of:
- (a) a straight or branched chain alkyl group having from 1 to 6 carbon atoms;
- (b) a cycloalkyl group having from 3 to 7 carbon atoms;
- (c) a phenyl radical;
- (d) a naphthhyl radical;
- (e) a toluyl radical; and
- (f) a xylyl radical; and wherein the unsaturation level is provided by the diacid in an amount of from about 3 to about 6 mole percent.
- 3. The film of claim 1 wherein the photoinitiator is benzophenone, phenylacetophenone or a derivative thereof.
- 4. A photocureable coating system which is adaptable to being crosslinked upon exposure to actinic radiation, said system consisting essentially of:
- (a) a moisture-cured linear polyurethane that contains sites of unsaturation only in its polymeric backbone, said polyurethane being produced by the reaction of a diisocyanate and an unsaturated polyester diol said diol having sites of unsaturation in its backbone, followed by moisture-curing; further providing that the unsaturated polyester diol is a random copolymer with a number average molecular weight in the range of from about 1,500 to about 2,500; and was produced by the reaction of a diol and an unsaturated diacid in an amount needed to give at least about 3 mole percent unsaturation, to the polyurethane and
- (b) a photoinitiator further providing that (a) and (b) together provide a non-liquid tack-free embossable thermoplastic which can be embossed before it is crosslinked.
- 5. The coating system of claim 4 wherein the unsaturated diacid provides an unsaturation level of from about 3 to about 6 mole percent of unsaturated sites.
- 6. The coating system of claim 4 wherein the unsaturated diacid is fumaric or maleic acid.
- 7. The coating system of claim 4 wherein the photoinitiator is benzophenone, phenylacetophenone or a derivative thereof.
- 8. A photocurable film that will cure upon exposure to actinic radiation, comprising
- a non-liquid, tack-free, thermoplastic material which can be embossed before it is crosslinked, the said material consisting essentially of:
- (1) a photoinitiator, and
- (2) a moisture-cured linear polyurethane having sites of unsaturation only in its polymer backbone, said polyurethane being produced by the reaction of a diisocyanate and an unsaturated polyester diol and then moisture curing, wherein the diisocyanate is an aromatic, aliphatic or acylic diisocyanate of the general formula:
- OCN--R--NCO
- wherein R is either R1 or R2-CH.sub.2 -R3 wherein R1, represents, and R2 and R3 can independently represent, organic radicals selected from the group consisting of:
- (a) a straight or branched chain alkyl group having from 1 to 6 carbon atoms;
- (b) a cycloalkyl group having from 3 to 7 carbon atoms;
- (c) a phenyl radical;
- (d) a naphthyl radical;
- (e) a toluyl radical; and
- (f) a xylyl radical; and wherein the unsaturated polyester diol is a random copolymer having sites of unsaturation in its backbone, and a number average molecular weight in the range of from about 1,500 to about 2,500, wherein further the said polyester diol was produced by the reaction of a diol and an unsaturated diacid.
- 9. A photocurable coating system which is adaptable to being crosslinked upon exposure to actinic radiation, said system consisting essentially of:
- (a) a moisture-cured linear polyurethane that contains sites of unsaturation only in its polymeric backbone, said polyurethane being produced by the reaction of a diisocyanate and an unsaturated polyester diol followed by moisture-curing, wherein further the unsaturated polyester diol is a random copolymer having sites of unsaturation in its backbone provided by an unsaturated diacid, the said polyester diol having a number average molecular weight in the range of from about 1,500 to about 2,500; and
- (b) a photoinitiator, further providing that (a) and (b) together provide a non-liquid, tack-free, embossable thermoplastic which can be embossed before it is crosslinked.
- 10. The coating system of claim 9 wherein the photoinitiator is benzophenone, phenylacetophenone or a derivative thereof.
- 11. The coating system as described in claim 9 which also includes a fire-retardant.
- 12. The coating system as described in claim 9 wherein the unsaturated diacid is maleic acid or fumaric acid.
- 13. The coating system as described in claim 9 wherein the photoinitiator is used in an amount of from about 1 to about 20 weight percent.
- 14. The coating system as described in claim 13 wherein the linear polyurethane has an unsaturation level in an amount of from about 3 to about 6 mole percent of unsaturated sites from the unsaturated diacid.
Parent Case Info
This is a continuation-in-part of U.S. application Ser. No. 819,421 now abandoned, filed Jan. 16, 1986, which was a division of our earlier application Ser. No. 650,208 filed Sep. 13, 1984 now U.S. Pat. No. 4,598,009.
US Referenced Citations (13)
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Country |
82503 |
Jul 1978 |
JPX |
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Entry |
Derwent Abstract 78-61292A/34 for Mitsubishi 82503 of Jul. 1978, & Translation. |
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Divisions (1)
|
Number |
Date |
Country |
Parent |
650208 |
Sep 1984 |
|
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
819421 |
Jan 1986 |
|