Claims
- 1. A process for the photocuring of an organopolysiloxane composition, comprising subjecting to a photocross-linking amount of ultravoilet radiation, admixture of (i) a polysiloxane comprised of hydroxysilyl groups devoid of Si-H bonds and containing no organic radicals which include sites of activated ethylenic unsaturation, and (ii) an aminopolyalkoxysilane, with said admixture being in the form of a thin layer thereof, in a gaseous atmosphere comprised of at least traces of oxygen.
- 2. The process as defined by claim 1, said gaseous atmosphere having a relative humidity of between 5 and 95%.
- 3. The process as defined by claim 2, said gaseous atmosphere comprising air.
- 4. The process as defined by claim 1, the polysiloxane (i) comprising an .alpha.,.omega.-dihydroxypolydiorganopolysiloxane which comprises units of the formula (Z.sub.2 SiO), wherein each Z, which may be the same or different, is a saturated aliphatic or cycloaliphatic hydrocarbon radical having from 1 to 6 carbon atoms, or a substituted such radical bearing from 1 to 6 chlorine and/or fluorine atom substituents; an alkenyl radical having from 2 to 4 carbon atoms and representing at most 5% by number of the total number of hydrocarbon radicals comprising said organopolysiloxane (i); or a phenyl, alkylphenyl or phenylalkyl radical having from 6 to 8 carbon atoms, or a substituted such radical bearing from 1 to 4 chlorine and/or fluorine atom substituents.
- 5. The process as defined by claim 4, each Z being methyl; ethyl; propyl; isopropyl; butyl; isobutyl; .alpha.-pentyl, t-butyl; chloromethyl; dichloromethyl; .alpha.-chloroethyl; .alpha.,.beta.-dichloroethyl; fluoromethyl; difluoromethyl; .alpha.,.beta.-difluoroethyl; 3,3,3-trifluoropropyl; trifluorocyclopropyl; 4,4,4-trifluorobutyl; 3,3,3,4,4,5,5-heptafluoropentyl; vinyl; allyl; phenyl; p-chlorophenyl; m-chlorophenyl; 3,5-dichlorophenyl; trichlorophenyl; tetrachlorophenyl; o-, p- or m-tolyl; .alpha.,.alpha.,.alpha.-trifluorotyl; xylyl; 2,3-dimethylphenyl; or 3,4-dimethylphenyl.
- 6. The process as defined by claim 4, the polysiloxane (i) comprising admixture of said .alpha.,.omega.-dihydroxypolydiorganopolysiloxane together with an organopolysiloxane resin which comprises units of the formulae ZSiO.sub.3, SiO.sub.2, (Z.sub.2 SiO) and (Z).sub.2 (OH)SiO.sub.0.5 in any proportions thereof.
- 7. The process as defined by claim 4, each Z being methyl, phenyl or vinyl, or a chlorinated and/or fluorinated such radical.
- 8. The process as defined by claim 4, the aminopolyalkoxysilane (ii) having the formula: ##STR13## or being comprised of recurring units of the formula: ##STR14## or being comprised of the recurring units (II) and units of the formula --Z.sub.2 SiO).sub.n, wherein a is an integer of from 1 to 2; b is an integer of from 0 to 1, with the sum (a+b) being no greater than 2; c is an integer of from 0 to 1; X is oxygen or --NR.sub.2 --; R.sub.1 and R'.sub.1, identical or different, are hydrogen or an alkyl radical having from 1 to 4 carbon atoms; R' and R" are each alkylene radicals having from 1 to 6 carbon atoms; R.sub.2 is hydrogen or an alkyl radical having from 1 to 4 carbon atoms; and R is an alkyl radical having from 1 to 4 carbon atoms or an alkoxyalkyl radical of the formula --R"'--O--R.sub.3, in which R.sub.3 is an alkyl radical having from 1 to 4 carbon atoms and R"' is an alkylene radical having from 2 to 4 carbon atoms.
- 9. The process as defined by claim 8, the aminopolyalkoxysilane (ii) having the formula (I), in which a is 1; Z is methyl, phenyl or vinyl, or a chlorinated and/or fluorinated such radical; X is --NR.sub.2 --; R.sub.1, R'.sub.1 and R.sub.2 are hydrogen; R' and R" are alkylene radicals having from 2 to 6 carbon atoms; R"' is ethylene; and R and R.sub.3 are methyl or ethyl radicals.
- 10. The process as defined by claim 1, wherein said admixture the ratio of the number of hydroxyl groups bonded to a silicon atom to the number of alkoxy groups bonded to silicon atoms ranges from 0.1 to 1.
- 11. The process as defined by claim 1, said admixture comprising a precondensate of the polysiloxane (i) and aminopolyalkoxysilane (ii).
- 12. The process as defined by claim 1 said photocross-linking being carried out in air having a relative humidity ranging from 20 to 80%.
- 13. The process as defined by claim 1, said admixture further comprising a photoinitiating amount of a photosensitizer.
- 14. The process as defined by claim 1, said photosensitizer comprising a benzophenone, acetophenone, benzoin, xanthone or thioxanthone.
- 15. The process as defined by claim 1, said admixture further comprising a monomeric or polymeric polyalkoxysilyl compound.
- 16. The process as defined by claim 1, said admixture further comprising an epoxypolyalkoxysilane.
- 17. The product of the process as defined by claim 1.
- 18. A substrate coated with a non-stick coating of the photocured product of the process as defined by claim 1.
Priority Claims (1)
Number |
Date |
Country |
Kind |
81 23134 |
Dec 1981 |
FRX |
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CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of U.S. patent application Ser. No. 447,482, filed Dec. 7, 1982, now abandoned.
US Referenced Citations (4)
Foreign Referenced Citations (2)
Number |
Date |
Country |
3006167 |
Sep 1980 |
DEX |
1526934 |
May 1968 |
FRX |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
447482 |
Dec 1982 |
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