1. Field of the Invention
The present invention relates to a photoelectric conversion device and a method for fabricating the photoelectric conversion device.
2. Description of the Related Art
A photoelectric conversion device where an amorphous semiconductor thin film, microcrystalline semiconductor thin film, and the like are laminated is used as a power generation system using solar light.
As illustrated in
A sealing member 128 such as ethylene vinyl acetate (EVA) is placed on the photoelectric conversion cells 150 formed on the glass substrate 110, thereby forming the photoelectric conversion device 300. Here, a current-collecting wiring 118, an insulating member 120 and an output wiring 122 are held and sealed between the photoelectric conversion cells 150 and a back-side protective member 130 by the sealing member 128.
In the above-described photoelectric conversion device 300, a single-layered body made of a resin, such as polyethylene terephthalate (PET), or a layered product with a metallic foil held by the resin is used as the back-side protective member 130. The single-layered body or layered product formed of such resin and the like does not serve as a structure. Thus, a frame formed of aluminum or the like is attached around the photoelectric conversion device 300 to increase the strength of the photoelectric conversion device 300.
However, provision of the frame formed of aluminum or the like adds to the cost of the photoelectric conversion device 300. Thus, a method is proposed where glass is used for the back-side protective member 130 and thereby the back-side protective member 130 can also serve as the structure.
In the photoelectric conversion device 300, the current-collecting wiring 118 and the output wiring 122 are connected to each other in an overlapped manner and therefore a raised portion is formed in a joint region 170 where the current-collecting wiring 118 is connected to the output wiring 122 over the glass substrate 110. If glass is used as the back-side protective member 130, the back-side protective member 130 will not be flexibly deformed according to the irregularity caused by the raised portion, unlike the resin or the like. Thus, when a pressure is applied to the glass substrate 110 from a back-side protective member 130 side in a vacuum laminating process carried out when a module is to be formed, the force is exerted, in a concentrated manner, on the back-side protective member 130 near the raised portion. Thus the back-side protective member 130 may be warped and a crack may occur. This creates a problem of reduced yield.
A photoelectric conversion device according to one embodiment of the present invention includes: a substrate; a plurality of photoelectric conversion cells formed on a main surface of the substrate; a current-collecting wiring formed on the plurality of photoelectric conversion cells; an output wiring connected to the current-collecting wiring; and a back-side protective member bonded to the plurality of photoelectric conversion cells via a sealing member in a manner such that the plurality of photoelectric conversion cells formed on the main surface of the substrate are interposed between the substrate and the back-side protective member via the sealing member, wherein the current-collecting wiring and the output wiring are positioned such that the current-collecting wiring and the output wiring do not overlap with each other above the main surface of the substrate.
A method, for fabricating a photoelectric conversion device, according to another embodiment of the present invention includes: forming a plurality of photoelectric conversion cells on a main surface of a substrate; forming a current-collecting wiring for collecting currents generated by the plurality of photoelectric conversion cells; forming an output wiring for outputting power generated by the current-collecting wiring to the outside; bonding a back-side protective member to the plurality of photoelectric conversion cells via sealing member in a manner such that the plurality of photoelectric conversion cells formed on the main surface of the substrate are interposed between the substrate and the back-side protective member via the sealing member, wherein the current-collecting wiring and the output wiring are placed on the main surface of the substrate and connected to each other in a manner such that the current-collecting wiring and the output wiring do not overlap with each other.
Embodiments will now be described by way of examples only, with reference to the accompanying drawings which are meant to be exemplary, not limiting, and wherein like elements are numbered alike in several Figures in which:
Hereinbelow, the preferred embodiments will be described with reference to the accompanying drawings. Note that in all of the figures the same reference numerals are given to the same components and the description thereof is omitted as appropriate.
(Structure of Photoelectric Conversion Device)
As illustrated in
The substrate 10 is a member used to support the photoelectric conversion device 100, and glass is used for the substrate 10.
The transparent electrode layers 12 are configured, in a rectangular strip shaped manner, on a main surface of the substrate 10. In the transparent electrodes 12, a first slit S1 is formed so that a plurality of photoelectric conversion cells 50 can be configured by connecting them in series. Also, the photoelectric conversion cells 50 are patterned in a rectangular strip shape. Also, a second slit S2 is formed so that the photoelectric conversion cells 50 can be configured in parallel with each other in a divided manner. The transparent electrode layer 12 may preferably be made of at least one of transparent conductive oxides or made of a combination of two or more of transparent conductive oxides in which tin oxide (SnO2), zinc oxide (ZnO), indium tin oxide (ITO), or the like is doped with tin (Sn), antimony (Sb), fluorine (F), aluminum (Al) or the like. Among them, zinc oxide in particular is high in translucency, low in resistivity, and excellent in the plasma-resistant characteristics. Thus, zinc oxide is used for the transparent electrode layers 12 in the present embodiment.
The photoelectric conversion layer 14 is configured such that silicon-based thin films, which are a p-type layer, an i-type layer, and an n-type layer, are stacked on the transparent electrode layer 12 in this order. The photoelectric conversion layer 14 may be a thin-film photoelectric conversion layer such as an amorphous silicon thin-film photoelectric conversion layer and a microcrystalline silicon thin-film photoelectric conversion layer. Also, the photoelectric conversion layer 14 may be a photoelectric conversion layer of tandem type or triple type where such the thin-film photoelectric conversion layers are laminated.
The back-side electrode 16 is formed on top of the photoelectric conversion layer 14. The back-side electrode 16 may be a single-layered body or layered produce having an electric conductivity and may preferably be configured such that a transparent conductive oxide and a reflective metal are stacked in this order. The transparent conductive oxide as used herein may be a transparent conductive oxide, such as tin oxide, zinc oxide, or indium tin oxide (ITO), or such a transparent conductive oxide doped with an impurity. For example, the transparent conductive oxide may be zinc oxide doped with aluminum as an impurity. The reflective metal as used herein may be a metal such as silver (Ag) or aluminum (Al). It is preferable that asperities for enhancing the effect of trapping the light are provided in at least one of the transparent conductive oxide and the reflective metal. In the present embodiment, silver, which is laminated on zinc oxide as the reflective metal, functions as the back-side electrode 16.
In the photoelectric conversion layer 14, a third slit S3, which extends in a direction of the first slit S1, is formed such that the transparent electrode 12 is exposed. Also, the photoelectric conversion layer 14 is buried underneath the back-side electrode 16. Hence, the transparent electrode 12 and the back-side electrode 16 are electrically connected to each other. Further, in the photoelectric conversion layer 14 and the back-side electrode 16, a fourth slit S4, which extends in a first slit S1 extending direction, is formed. More specifically, the fourth slit S4 is formed on a side opposite to the first slit S1 relative to the third slit S3, so that the a plurality of photoelectric conversion cells 50 are configured in series with each other.
The current-collecting wirings 18 are formed on top of the back-side electrodes 16 located at both ends of the photoelectric conversion device 100. The current-collecting wirings 18 are interconnection lines used to collect the current generated by the photoelectric conversion cells 50 divided in parallel. Thus the current-collecting wiring 18 extends along the first slit S1 extending direction of the photoelectric conversion layer 14. With the current-collecting wiring 18, the positive electrodes of a plurality of photoelectric conversion cells 50 connected in series are connected to each other, and the negative electrodes thereof are connected to each other. The current-collecting wiring as used herein may be a copper wiring coated with solder whose width and thickness are 2 mm and 200 μm, respectively.
Then, the insulating member 20 is disposed in order to form an electrical insulation between the output wiring 22 described later and the back-side electrode 16. The insulating member 20 extends, on top of the back-side electrode 16, from near the current-collecting wiring 18 provided along a distal edge of the photoelectric conversion device 100 to the placement position of the terminal box 32 in the center thereof. And the insulating member 20 extends along a second slit S2 extending direction in a manner such that the insulating member 20 lies across the fourth slit S4. As illustrated in
The insulating member 20 may preferably be formed of an insulating material whose resistivity is 1016 (Ωcm) or above. Such an insulating material constituting the insulating member 20 may preferably be polyester (PE), polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyimide (PI), or polyvinyl fluoride (PVF), for instance. Also, the insulating member 20 may preferably be of a tape-, sheet- or film-shaped and be one to which an adhesive is applied on the reverse side in a seal shape. Thus a PET tape is used as the insulating member 20 in the present embodiment.
As illustrated in
As illustrated in
The insulating coating material 24 is provided so that the insulating coating material 24 can partially cover at least the transparent electrode 12, the photoelectric conversion layer 14, the back-side electrode 16, the current-collecting wiring 18 and the output wiring 22 located near the end-sealing material 26 described later.
As illustrated in
The insulating coating material 24 may preferably be formed of an insulating material whose resistivity is 1016 (Ωcm) or above. Such an insulating material constituting the insulating coating material 24 may preferably be PE, PET, PEN, PI, or PVF, for instance. Also, the insulating coating material 24 may preferably be of a tape-, sheet- or film-shaped and be one to which an adhesive is applied on the reverse side in a seal shape. Thus a PET tape is used as the insulating coating material 24 in the present embodiment.
The end-sealing material 26 is disposed in a region where a photoelectric conversion cell 50 at the distal periphery of the photoelectric conversion device 100 is not formed. Here, such a region where the end-sealing material 26 is to be provided is about 7 mm to about 15 mm in width. Assume herein that the end-sealing material 26 is formed of an insulating material whose resistivity is 1010 (Ωcm) or above. Also, the end-sealing material 26 may preferably be formed of a substance, whose permeability of water is low, in order to prevent the moisture content from entering from the ends of the photoelectric conversion device 100. In particular, the end-sealing material 26 may preferably be formed of a substance, whose permeability of water is lower than that of the sealing member 28. Further, the end-sealing material 26 may preferably have elasticity by which to mitigate a force or pressure occurring in the photoelectric conversion device 100 when a mechanical force is applied to the end portion of the photoelectric conversion device 100. For example, an epoxy-based resin or butyl-based resin may preferably be used for the end-sealing material 26. More specifically, a hot-melt butyl is preferably used since it can be easily applied and bonded at high temperature. Note that the end-sealing material 26 is formed such that the width thereof is about 6 mm to about 10 mm and the thickness thereof is greater than that of the sealing member 28 by about 0.05 mm to about 0.2 mm.
Regions surrounded by the end-sealing material 26 are sealed by the substrate 10 and the back-side protective member 30. The back-side protective member 30 is preferably formed of a substance that has electrically insulating properties, is low in the permeability of water and is high in corrosion resistance.
The sealing member 28 fills the regions sealed by the substrate 10, the end-sealing material 26 and the back-side protective member 30. An environmentally-resistant substance is often used as the back-side protective member 30. In the present embodiment, glass is used as the back-side protective member 30. Assume herein that the sealing member 28 is an insulating material. More specifically, the sealing member 28 is preferably an insulating resin whose resistivity is about 1014 (Ωcm) and may preferably be ethylene-vinyl acetate copolymer (EVA) or polyvinyl butyral (PVB), for instance. Thus, EVA is used for the sealing member 28 in the present embodiment.
Then, the output wiring 22 is led out from the back-side protective member 30 and is connected to the terminal box 32 formed on the back-side protective member 30.
In this manner, the photoelectric conversion device 100 according to the present embodiment is configured.
Though a glass substrate is used as the substrate 10 in the above-described embodiment, this should not be considered as limiting and the material used for the substrate 10 may be arbitrary as long as it has permeability at least in a visible light wavelength region so that light can enter from a substrate 10 side in the photoelectric conversion device 100. Accordingly, a plastic substrate or the like may be applicable, for instance.
In the above-described embodiment, the photoelectric conversion layer 14 has a p-i-n junction structure but this should not be considered as limiting and, for example, a pn junction may constitute the basic structure. Further, for example, a photoelectric conversion layer formed of a non-silicon-based substance such as cadmium telluride, CIS (copper, indium and selenium) or CIGS (copper, indium, gallium and selenium) may be used instead of the silicon-based photoelectric conversion layer used in the above-described examples.
In the above-described embodiment, the current-collecting wirings 18 are formed on the photoelectric conversion cells 50 at the both ends of the photoelectric conversion device 100. However, the position in which the current-collecting wirings 18 are to be provided is not limited to the photoelectric conversion cells 50 at the both ends of the photoelectric conversion device 100.
In the present embodiment, the output wiring 22 is connected to the current-collecting wiring 18 such that a flat surface of the ribbon-shaped output wiring 22 comes in contact with a flat sidewall of the ribbon-shape current-collecting wiring 18 that extends on top of the photoelectric conversion cell 50. However, this should not be considered as limiting. For example, as illustrate in
Furthermore, the current-collecting wiring 18 and the output wiring 22 may be such that at least one of the current-collecting wiring 18 and the output wiring 22 has asperities on a joint surface between the current-collecting wiring 18 and the output wiring 22. With the asperities formed on at least one of the current-collecting wiring 18 and the output wiring 22, much solder can be held and kept in the joint surface. Thus, the current-collecting wiring 18 and the output wiring 22 can be connected to each other more reliably through such much solder placed in the joint surface.
“At least one of the current-collecting wiring 18 and the output wiring 22 has asperities on a joint surface between the current-collecting wiring 18 and the output wiring 22” as used herein may mean as follows. That is, the respective joint surfaces of the current-collecting wiring 18 and the output wiring 22 are such that the surfaces thereof are of a shape that allows the generation of gaps in a joint area when the current-collecting wiring 18 and the output wiring 22 are connected with each other. For example, the joint surface (side surface) of at least one of the current-collecting wiring 18 and the output wiring 22 may be tilted and the joint surface of the current-collecting wiring 18 may not be parallel to the joint surface of the output wiring 22. Also, a curved surface may be formed on the joint surface of at least one of the current-collecting wiring 18 and the output wiring 22.
A description is given hereunder of modifications of the shape of the joint surface of the current-collecting wiring 18 and the output wiring 22 of the first embodiment.
A side surface 22b of an output wiring 22 shown in
An output wiring 22 shown in
A side surface 22d of an output wiring 22 shown in
In the cross section of an output wiring 22 shown in
In the cross section of a current-collecting wiring 18 shown in
(A Method for Fabricating a Photoelectric Conversion Device)
A description is given hereinbelow of a method for fabricating a photoelectric conversion device 100 according to the first embodiment using
As illustrated in
Then, as illustrated in
To achieve a structure where a plurality of photoelectric conversion cells 50 are connected in series, the photoelectric conversion layer 14 is patterned in a rectangular strip shape by use of laser. The photoelectric conversion layer 14 is patterned in a rectangular strip shape formed by the third slit S3. The third slit S3 is formed such that YAG laser is irradiated in position lateral to the first slit S1, by which the transparent electrode layer 12 is segmentalized, by 50 μm, for instance. The YAG laser as used herein may preferably be such that the energy density is 0.7 J/cm2 and the pulse frequency is 3 kHz, for instance.
As illustrated in
To achieve a structure where a plurality of photoelectric conversion layer 14 are connected in series, the back-side electrode 16 is then patterned in a rectangular strip shape. The back-side electrode 16 is patterned in a rectangular strip shape formed by the fourth slit S4. The fourth slit S4 is formed such that YAG laser is irradiated in position lateral to the third slit S3, where the photoelectric conversion layer 14 is patterned, by 50 μm, for instance. To achieve a structure where the photoelectric conversion layer 14 is segmentalized in parallel, formed is a fifth slit S5 by which the photoelectric conversion layer 14 and the back-side electrode 16 formed within the second slit S2 used to segmentalized the transparent electrode layer 12 is segmentalized. The YAG laser as used herein may preferably be such that the energy density is 0.7 J/cm2 and the pulse frequency is 4 kHz, for instance.
As described above, a photoelectric conversion cell 50 is formed by laminating the transparent electrode layer 12, the photoelectric conversion layer 14 and the back-side electrode 16 on the substrate 10.
Subsequently, as illustrated in
Then, as illustrated in
As illustrated in
Then, as illustrated in
Then, as illustrated in
After the end-sealing material 26 has been applied, the back side of the photoelectric conversion device 100 is sealed by a back-side protective member 30. The sealing member 28 is filled into between the photoelectric conversion layer 14 and the back-side protective member 30, so that the back side of the photoelectric conversion device 100 is sealed by the back-side protective member 30. The sealing member 28 is first set in a region surrounded by the end-sealing material 26 of the back side of the photoelectric conversion device 100 such that the sealing member 28 having the same size as that of the region surrounded by the end-sealing material 26 or smaller than that thereof by 1 mm both in the vertical and horizontal directions. Then the back-side protective member 30 is so placed as to cover the back side of the photoelectric conversion device 100. Then an end of the output wiring 22 is pulled out of the back-side protective member 30 in order to connect the end of the output wiring 22 to the terminal box 32. Then a pressure is applied from a back-side protective member 30 side, and the back-side protective member 30 undergoes a vacuum laminating processing. Furthermore, the photoelectric conversion device 100 is heated and a bridge is formed by ethylene vinyl acetate (EVA), which is used as the sealing member 28. The heating process to form the bridge may preferably be done at 150° C. for about 30 minutes, for instance.
Then, as illustrated in
Through the processes described as above, the photoelectric conversion device 100 according to the present embodiment is formed.
Advantageous Effects
The following three advantageous effects are at least gained by employing the above-described photoelectric conversion device 100 and the method for fabricating the photoelectric conversion device 100.
1. As shown in
2. A peripheral part is sealed by the end-sealing material 26. This structure can prevent water content or corrosive material from entering the distal periphery. Thus, the environment resistance of the photoelectric conversion device 100 can be enhanced.
3. The insulating coating material 24 is provided so that the insulating coating material 24 can cover the transparent electrode 12, the photoelectric conversion layer 14, the back-side electrode 16, the current-collecting wiring 18 and the output wiring 22 located near the end-sealing material 26. Thereby, any possible adverse effect of a chemical reaction between the end-sealing material 26 and the sealing member 28 can be suppressed by provision of a portion covered with the insulating coating material 24. Thus, the environment resistance of the photoelectric conversion device 100 can be enhanced.
(Structure of Photoelectric Conversion Device)
In the first embodiment, the current-collecting wiring 18 and the output wiring 22 are positioned such that the current-collecting wiring 18 and the output wiring 22 do not overlap with each other above the main surface of the substrate 10. Also, provided in the first embodiment is the photoelectric conversion device 100 having a high yield and a high productivity. However, these should not be considered as limiting. In a photoelectric conversion device according to a second embodiment, an output wiring 34 may have a connecting component 34a, at one end, whose width is larger than that of other part of the output wiring 34. Thereby, also provided in the second embodiment is a photoelectric conversion device 200 having a high yield and a high productivity. A description is hereunder given centering around features different from those of the first embodiment.
Similar to the second embodiment, in the second embodiment, a photoelectric conversion cell 50 comprised of a transparent electrode layer 12, a photoelectric conversion layer 14 and a back-side electrode 16 is formed on a substrate 10. And a current-collecting wiring 18 extends on the photoelectric conversion cells 50 located at the both ends of the substrate 10. Also, an insulating member 20 extends from near the current-collecting wiring 18 to the placement position of a terminal box 32 in the center of the current-collecting wiring 18, along a direction of a second slit S2.
The second embodiment differs from the first embodiment in that an output wiring 34 has the connecting component 34a, at one end, formed such the width is larger than that of the other part of the connecting component 34a. In contrast, the output wiring 22 according to the first embodiment has a fixed width. More specifically, if in the second embodiment a copper wiring covered with solder is used as the output wiring 34, the output wiring 34 has the connecting component 34a, at one end, whose width is larger than that of the copper wiring with copper used as a base material and whose thickness is smaller than that of the copper wiring.
The current-collecting wiring 18 and the output wiring 34 are positioned such that the current-collecting wiring 18 and the output wiring 22 overlap with each other. And the current-collecting wiring 18 and the output wiring 22 are electrically connected to each other.
After the output wiring 34 is connected to the current-collecting wiring 18, an insulating coating material 24 and an end-sealing material 26 are formed and the photoelectric conversion layer 14 is sealed between the substrate 10 and the back-side protective member 30 through the medium of the sealing member 28. Then the other end of the output wiring 34 pulled out of the back-side protective member 30 is connected to the terminal box 32.
Through the processes described as above, the photoelectric conversion device 200 according to the present embodiment is formed.
(A Method for Fabricating a Photoelectric Conversion Device)
In a method for fabricating the photoelectric conversion device 200 according to the second embodiment, the photoelectric conversion device 200 is fabricated such that an end of the output wiring 34 press-rolled and then the output wiring 34 is connected to the current-collecting wiring 18. A description is hereunder given centering around differences from the first embodiment.
Similar to the first embodiment, the photoelectric conversion cells 50 are formed by stacking the transparent electrode layer 12, the photoelectric conversion layer 14 and the back-side electrode 16 on the substrate 10, and then the current-collecting wiring 18 extends on the photoelectric conversion cells 50 located at the both ends of the substrate 10. Then, the insulating member 20 extends from near the current-collecting wiring 18 to the placement position of the terminal box 32 in the center thereof along the second slit S2 extending direction. In this manner, the photoelectric conversion device as shown in
Then, an output wiring 34 used in the second embodiment is prepared. A copper wiring, coated with solder, which has been cut to a predetermined length is prepared. Then a force or pressure enough to perform the press-rolling the copper wiring used as a base material is applied to an end of the copper wiring coated with solder. Thereby, the connecting component 34a can be formed at one end of the copper wiring coated with solder. The connecting component 34a is press-rolled such that the width of the connecting component 34a is larger than that of the copper wiring and the thickness thereof is smaller than that of the copper wiring.
The output wiring 34 prepared as above extends along the surface of the insulating member 20, from top of the current-collecting wirings 18 towards the center of the photoelectric conversion device 100 along the second slit S2 extending direction. The output wiring 34 is configured such that the connecting component 34a of the output wiring 34 is electrically connected to the current-collecting wiring 18 by use of solder that has been melted by ultrasound and such that the connecting component 34a thereof overlaps with the current-collecting wiring 18.
Then, similar to the first embodiment, the insulating coating material 24 is formed and the end-sealing material 26 is placed between the substrate 10 and the back-side protective member 30, thereby achieving a structure where a plurality of photoelectric conversion cells 50 are sealed. And the sealing member 28 is filled into the structure. Then the other end of the output wiring 34 pulled out of the back-side protective member 30 is connected to the terminal box 32, thereby forming the photoelectric conversion device 200 of the second embodiment.
(Advantageous Effects)
The following two advantageous effects are at least gained by employing the above-described photoelectric conversion device 200 and the method for fabricating the photoelectric conversion device 200.
1. The connecting component 34a is formed by press-rolling one end of the copper wiring coated with solder. As shown in
2. The connecting component 34a is formed at one end of the copper wiring coated with solder such that the width of the connecting component 34a is wider than that of the copper wiring. As shown in
A photoelectric conversion device and a method for fabricating the photoelectric conversion device as combined in the following Items 1 to 8.
(Item 1) A photoelectric conversion device including:
a substrate;
a plurality of photoelectric conversion cells formed on a main surface of the substrate;
a current-collecting wiring formed on the plurality of photoelectric conversion cells;
an output wiring connected to the current-collecting wiring; and
a back-side protective member bonded to the plurality of photoelectric conversion cells via a sealing member in a manner such that the plurality of photoelectric conversion cells formed on the main surface of the substrate are interposed between the substrate and the back-side protective member via the sealing member,
wherein the current-collecting wiring and the output wiring are positioned and connected such that the current-collecting wiring and the output wiring do not overlap with each other above the main surface of the substrate, and
wherein at least one of the current-collecting wiring and the output wiring has asperities on a joint surface between the current-collecting wiring and the output wiring.
(Item 2) A photoelectric conversion device according to Item 1, wherein the current-collecting wiring is such that the current-collecting wiring has a first connecting component, which is recessed from an edge of the current-collecting wiring facing a center of the substrate, in a part of the current-collecting wiring with which the output wiring is connected,
wherein the output wiring has a second connecting component corresponding to the first connecting component, and
wherein the first connecting component and the second connecting component are placed such that the first connecting component and the second connecting component are in mesh with each other.
(Item 3) A photoelectric conversion device according to Item 1 or Item 2, wherein the current-collecting wiring is formed of a plurality of members and is configured such that the output wiring is placed among the plurality of members constituting current-collecting wiring and such that the output wiring is electrically connected to the current-collecting wiring.
(Item 4) A photoelectric conversion device according to any one of Item 1 to Item 3, wherein surfaces of the output wiring and the current-collecting wiring are covered with a solder, and
wherein the output wiring and the current-collecting wiring are connected via the solder.
(Item 5) A method for fabricating a photoelectric conversion device, the method including:
a process of forming a plurality of photoelectric conversion cells on a main surface of a substrate;
a process of forming a current-collecting wiring for collecting the currents generated by the plurality of photoelectric conversion cells;
a process of forming an output wiring for outputting power generated by the current-collecting wiring to the outside; and
bonding a back-side protective member to the plurality of photoelectric conversion cells via sealing member in a manner such that the plurality of photoelectric conversion cells formed on the main surface of the substrate are interposed between the substrate and the back-side protective member via the sealing member,
wherein the current-collecting wiring and the output wiring are positioned and connected such that the current-collecting wiring and the output wiring do not overlap with each other above the main surface of the substrate, and
wherein at least one of the current-collecting wiring and the output wiring has asperities on a joint surface between the current-collecting wiring and the output wiring.
(Item 6) A method, for fabricating a photoelectric conversion device, according to Item 5, wherein the current-collecting wiring is such that the current-collecting wiring has a first connecting component, which is recessed from an edge of the current-collecting wiring facing a center of the substrate, in a part of the current-collecting wiring with which the output wiring is connected,
wherein the output wiring has a second connecting component corresponding to the first connecting component, and
wherein the first connecting component and the second connecting component are placed and connected to each other such that the first connecting component and the second connecting component are in mesh with each other.
(Item 7) A method, for fabricating a photoelectric conversion device, according to Item 5 or Item 6, wherein the current-collecting wiring is formed of a plurality of members and is configured such that the output wiring is placed among the plurality of members constituting current-collecting wiring and such that the output wiring is electrically connected to the current-collecting wiring.
(Item 8) A method, for fabricating a photoelectric conversion device, according to any one of Item 5 to Item 7, wherein surfaces of the output wiring and the current-collecting wiring are covered with a solder, and
wherein the output wiring and the current-collecting wiring are connected via the solder.
Number | Date | Country | Kind |
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2010-184726 | Aug 2010 | JP | national |
This application is based upon and claims the benefit of priority from the prior Japanese Patent Application No. 2010-184726, filed on Aug. 20, 2010, and International Patent Application No. PCT/JP2011/004509, filed on Aug. 9, 2011, the entire content of each of which is incorporated herein by reference.
Number | Date | Country | |
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Parent | PCT/JP2011/004509 | Aug 2011 | US |
Child | 13770707 | US |