This is a division of application Ser. No. 177,288 filed Aug. 11, 1980, now U.S. Pat. No. 4,478,967.
Number | Name | Date | Kind |
---|---|---|---|
3060023 | Burg et al. | Oct 1962 | |
3203805 | Burg et al. | Aug 1965 | |
3247162 | Newland et al. | Apr 1966 | |
3353955 | Colgrove | Nov 1967 | |
3445229 | Webers | May 1969 | |
3469982 | Celeste | Sep 1969 | |
3591377 | Alsup | Jul 1971 | |
3607264 | Celeste et al. | Sep 1971 | |
3745188 | Bottorff | Jul 1983 | |
3770438 | Celeste | Nov 1973 | |
3840579 | Fan | Oct 1974 | |
3849137 | Barzynski et al. | Nov 1974 | |
3926636 | Barzynski et al. | Dec 1975 | |
3954826 | Sugimoto et al. | May 1976 | |
3997349 | Sanders | Dec 1976 | |
4050936 | Takeda et al. | Sep 1977 | |
4075175 | Foss | Feb 1978 | |
4086210 | Petropoulos | Apr 1978 | |
4205989 | Moriya et al. | Jun 1980 | |
4287255 | Wong et al. | Sep 1981 | |
4288479 | Brack | Sep 1981 |
Number | Date | Country |
---|---|---|
629495 | Jan 1963 | FRX |
655612 | Nov 1964 | FRX |
8102261 | Aug 1981 | WOX |
968848 | Sep 1964 | GBX |
Entry |
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Woodruff et al., Photographic Science and Engineering, vol. 11, No. 2, pp. 93-97, Mar.-Apr. (1967). |
Chem. Abs. 79-42074 Babayan et al. (1973). |
Rosen, Surfactants & Interfaced Phenomena, 1978, Wiley & Son, pp. 83-86. |
Rajasekharan, Photoremovable Protecting Group in Organic Synthesis, 1980 (1) 1-26 Synthesis. |
Nakayama et al, Society of Photographic Scientists and Engineers, vol. 22, No. 3, pp. 138-141, May-Jun. (1978). |
Amit et al, Photosensitive Protecting Groups, Israel J. of Chem. 12 (1-2), 103-113 (1974). |
Inou et al, Nippon Shashin Gakkai-Shi, vol. 41, No. 4, pp. 245-249 (1978). |
Homma et al, Nippon Shashin Gakkai-Shi, vol. 41, No. 4, pp. 250-253 (1978). |
Komoto and Co. Ltd., Tokio (German Pat. No. 2,716,422). |
Berkower et al., Photographic Science and Engineering, vol. 12, No. 6, Nov.-Dec., pp. 283-287 (1967). |
Number | Date | Country | |
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Parent | 177288 | Aug 1980 |