Claims
- 1. A photopolymerizable mixture consisting essentially of
- (a) an epoxide compound or a mixture of epoxide compounds, said epoxide compound containing no ethylenically unsaturated group,
- (b) an aromatic iodonium salt as the polymerization catalyst, and
- (c) an aromatic carbonyl compound as the cocatalyst which is a ketone of formula I ##STR5## in which n is a 1 or 2 and Ar, if n is 1, is phenyl, diphenyl, tetrahydronaphthyl or phenyl which is substituted by one or more of the radicals F, Cl, Br, C.sub.1 -C.sub.12 -alkyl, --O--phenyl or --OAlk and, if n is 2, is C.sub.6 -C.sub.12 -arylene or a -phenylene-T-phenylene group in which T is --O--, --S-- or --CH.sub.2 --, and Alk is C.sub.1 -C.sub.4 -alkyl, X is OH, R.sup.1 is C.sub.1 -C.sub.8 -alkyl or --CH.sub.2 CH.sub.2 COOAlk and R.sup.2 is C.sub.1 -C.sub.8 -alkyl or allyl, or R.sup.1 and R.sup.2 together are C.sub.4 -C.sub.7 -alkylene.
- 2. A photopolymerisable mixture according to claim 1, wherein component (a) is a mixture of a polyglycidylether type epoxide resin with an epoxidised soybean oil.
- 3. A photopolymerisable mixture according to claim 1, wherein component (b) is an aromatic iodonium salt of the formula IV
- [Ar.sup.1 --I--Ar.sup.2 ].sup.+ [MQ.sub.n ].sup.- IV
- in which Ar.sup.1 and Ar.sup.2 independently of one another are phenyl, naphthyl or phenyl which is substituted by one or more of the radicals C.sub.1 -C.sub.8 -alkyl, phenyl, phenoxy, halogen, nitro or C.sub.1 -C.sub.4 -alkoxy, or Ar.sup.1 and Ar.sup.2 together are a divalent radical of the formula V ##STR6## in which Y is a direct bond, --O--, --CH.sub.2 -- or --CO-- and R is C.sub.1 -C.sub.4 -alkyl, halogen, nitro or C.sub.1 -C.sub.4 -alkoxy, M is a metal atom or metalloid atom from the series comprising B, P, As, Sb, Sn, Bi and Fe, Q is fluorine or chlorine and n is 4, 5 or 6 and 1 larger than the valency of M.
- 4. A photopolymerisable mixture according to claim 2, wherein component (b) is a diphenyliodonium salt.
- 5. A photopolymerisable mixture according to claim 2, wherein the anion [MQ.sub.n ].sup.- of the iodonium salt is one of the anions BF.sub.4.sup.-, PF.sub.6.sup.-, AsF.sub.6.sup.- or SbF.sub.6.sup.-.
- 6. A photopolymerisable mixture according to claim 1, wherein component (c) is a compound of the formula I, in which n is 1, Ar is phenyl, chlorophenyl or C.sub.7 -C.sub.10 -alkylphenyl, R.sup.1 and R.sup.2 are either both methyl or together are pentamethylene and X is --OH.
- 7. A photopolymerisable mixture according to claim 1, wherein the mixture contains a photosensitiser.
- 8. A process for the photochemical polymerization of cationically polymerizable compounds or mixtures of compounds which comprises
- exposing a mixture of
- (a) an epoxide compound or a mixture of epoxide compounds, said epoxide compound containing no ethylenically unsaturated group,
- (b) an aromatic iodonium salt as the polymerization catalyst, and
- (c) an aromatic carbonyl compound as the cocatalyst which is a ketone of formula I ##STR7## in which n is a 1 or 2 and Ar, if n is 1, is phenyl, diphenyl, tetrahydronaphthyl or phenyl which is substituted by one or more of the radicals F, Cl, Br, C.sub.1 -C.sub.12 -alkyl, --O--phenyl or --OAlk and, if n is 2, is C.sub.6 -C.sub.12 -arylene or a -phenylene-T-phenylene group in which T is --O--, --S-- or --CH.sub.2 --, and Alk is C.sub.1 -C.sub.4 -alkyl, X is OH, R.sup.1 is C.sub.1 -C.sub.8 -alkyl or --CH.sub.2 CH.sub.2 COOAlk and R.sup.2 is C.sub.1 -C.sub.8 -alkyl or allyl, or R.sup.1 and R.sup.2 together are C.sub.4 -C.sub.7 -alkylene, to irradiation by short-wave light.
- 9. A process according to claim 8, wherein an aromatic iodonium salt of the formula IV
- [Ar.sup.1 --I--Ar.sup.2 ].sup.+ [MQ.sub.n ].sup.- IV
- in which Ar.sup.1 and Ar.sup.2 independently of one another are phenyl, naphthyl or phenyl which is substituted by one or more of the radicals C.sub.1 -C.sub.8 -alkyl, phenyl, phenoxy, halogen, nitro or C.sub.1 -C.sub.4 -alkoxy, or Ar.sup.1 and Ar.sup.2 together are a divalent radical of the formula V ##STR8## in which Y is a direct bond, --O--, --CH.sub.2 -- or --CO-- and R is C.sub.1 -C.sub.4 -alkyl, halogen, nitro or C.sub.1 -C.sub.4 -alkoxy, M is a metal atom or metalloid atom from the series comprising B, P, As, Sb, Sn, Bi and Fe, Q is fluorine or chlorine and n is 4, 5 or 6 and 1 larger than the valency of M, is used as component (b).
Priority Claims (1)
Number |
Date |
Country |
Kind |
1628/80 |
Feb 1980 |
CHX |
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Parent Case Info
This is a continuation of application Ser. No. 419,120, dated Sept. 16, 1982, now abandoned, which in turn is a continuation of application Ser. No. 261,424, filed May 8, 1981, now abandoned, which in turn is a continuation-in-part of application Ser. No. 236,464, filed Feb. 20, 1981, now abandoned.
US Referenced Citations (12)
Foreign Referenced Citations (2)
Number |
Date |
Country |
3002 |
Dec 1978 |
EPX |
1491539 |
Nov 1977 |
GBX |
Non-Patent Literature Citations (1)
Entry |
F. A. M. Abdul-Rasoul et al, Polymer, 1978, 1219. |
Continuations (2)
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Number |
Date |
Country |
Parent |
419120 |
Sep 1982 |
|
Parent |
261434 |
May 1981 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
236464 |
Feb 1981 |
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