Claims
- 1. A diazotype intermediate assembly which is easily erasable with a conventional soft rubber pencil eraser comprising a transparentized paper base coated with a barrier layer of a rubber-like polymeric material which barrier layer is overcoated with a sensitizing layer; in which said sensitizing layer is obtained by overcoating the barrier layer with an aqueous sensitizing solution consisting essentially of 2-6% by weight of a water soluble cellulose derivative; 0.5-4% by weight of a water soluble melamine-formaldehyde or urea-formaldehyde cross-linking resin; a light sensitive aromatic diazonium compound; an azo coupling agent; an organic acid having a pKa.sup.25 value of from 2.5 to 4.5; and 1-8% by weight of silica having a particle size of 1-10 microns in an amount sufficient to improve the erasability of said diazotype intermediate assembly compared to the assembly containing no silica; water and an amount of a lower alcohol equal to or less than the amount of water.
- 2. A process for preparing an erasable photosensitive diazotype assembly comprising steps of:
- a. coating a transparentized base with an aqueous emulsion of a rubber-like polymer material and drying to form a barrier layer;
- b. overcoating said barrier layer with a sensitizing layer by passing said barrier layer over a fountain of an aqueous sensitizing solution having a maximum viscosity of 75 centipoises at 20.degree. C in contact therewith, such that the top of the fountain contacts the barrier layer surface; said aqueous sensitizing solution consisting essentially of 2-6% by weight of a water soluble cellulose derivative; 0.5-4% by weight of a water soluble melamine-formaldehyde or urea-formaldehyde cross-linking resin; a light sensitive aromatic diazonium compound; an azo coupling agent; an organic acid having a pKa.sup.25 value of from 2.5 to 4.5; and 1-8% by weight of silica having a particle size of 1-10 microns sufficient to improve the erasability of said diazotype intermediate assembly compared to the assembly containing no silica; water and an amount of a lower alcohol equal to or less than the amount of water.
RELATED APPLICATION
This application is a continuation of our application Ser. No. 366,137 filed June 1, 1973, now abandoned, which in turn is a continuation-in-part of application Ser. No. 104,991 filed Jan. 8, 1971, now abandoned.
US Referenced Citations (11)
Foreign Referenced Citations (4)
Number |
Date |
Country |
1,915,759 |
Oct 1969 |
DT |
966,258 |
Aug 1964 |
UK |
1,169,227 |
Oct 1969 |
UK |
1,268,666 |
Mar 1972 |
UK |
Non-Patent Literature Citations (2)
Entry |
Kosar; J., "Light-Sensitive Systems", Wiley & Sons, 1965, pp. 300-301. |
Poudrier; D., "Tappi", July 1963, vol. 46, No. 7, pp. 147A-150. |
Continuations (1)
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Number |
Date |
Country |
Parent |
366137 |
Jun 1973 |
|
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
104991 |
Jan 1971 |
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