Claims
- 1. A process of photopolymerizing a material polymerizable to higher molecular weights by cationic polymerization, comprising: forming a mixture of (1) a monomeric or prepolymeric epoxide material, selected from the group consisting of glycidyl ethers of bisphenol A, epoxy-cycloalkanes, epoxy-cycloalkenes, epoxy-alkanes, glycidyl alkyl ethers, epoxy-novolacs and allyl glycidyl ether-glycidyl methacrylate copolymer with (2) a phototropic aromatic compound containing at least one nitro radical in a position ortho to an alkyl substituent selected from compounds having the formula: ##STR7## wherein R.sub.1 and R.sub.2 are selected from the group consisting of hydrogen, alkyl, aryl, carbalkoxy, pyridyl, carbazolyl, N-oxidopyridyl, nitroalkyl, nitroaryl, dinitrophenyl, alkaryl, aralkyl, haloalkyl and haloaryl radicals and R.sub.3 is selected from the group consisting of hydrogen, alkyl, aryl, nitroalkyl, nitroaryl, alkaryl, aralkyl, haloalkyl, haloaryl radicals and electron-withdrawing groups selected from --NO.sub.2, --CN, --COOR, --COR, --NR.sub.3, --Br, --Cl, --F, --I, --RCOX, --RX.sub.3, --NO, RCO-- and R.sub.2 NCO-- wherein X is halogen and R is alkyl;
- and subsequently exposing the resulting mixture to sufficient actinic or electron beam radiation to activate said phototropic compound to an acid form effective to initiate polymerization of said epoxide material.
- 2. The process of claim 1 wherein the epoxide material is allyl glycidyl ether-glycidyl methacrylate copolymer.
- 3. The process of claim 1 wherein the epoxide material is an epoxy cresol novolac.
- 4. The process of claim 2 wherein said phototropic compound is ethyl bis(2,4-dinitrophenyl) acetate, 2,4-dinitrotoluene, tris(2,4-dinitrophenyl) methane or 2-(2',4'-dinitrobenzyl-pyridine.
- 5. The process of claim 3 wherein said phototropic compound is ethyl bis(2,4-dinitrophenyl) acetate, 2,4-dinitrotoluene, tris(2,4-dinitrophenyl) methane or 2-(2',4' -dinitrobenzyl)-pyridine.
- 6. A process of photopolymerizing a material polymerizable to higher molecular weight by cationic polymerization which comprises:
- forming a mixture of (1) a monomeric or prepolymeric epoxide material selected from the group consisting of glycidyl ethers of bisphenol A, epoxy-cycloalkanes, epoxy-cycloalkenes, epoxy-alkanes, glycidyl alkyl ethers, epoxy-novolacs and allyl glycidyl ether-glycidyl methacrylate copolymer with (2) a phototropic aromatic compound containing at least one nitro radical in a position ortho to an alkyl substituent selected from compounds having the formula: ##STR8## wherein R.sub.1 and R.sub.2 are selected from the group consisting of hydrogen, alkyl, aryl, carbalkoxy, pyridyl, carbazolyl, N-oxidopyridyl, nitroalkyl, nitroaryl, dinitrophenyl, alkaryl, aralkyl haloalkyl and haloaryl radicals and R.sub.3 is selected from the group consisting of hydrogen, alkyl, aryl, nitroalkyl, nitroaryl, alkaryl, aralkyl, haloalkyl, haloaryl radicals and electron-withdrawing groups selected from --NO.sub.2, --CN, --COOR, --COR, --NR.sub.3, --Br, --Cl, --F, --I, --RCOX, --RX.sub.3, --NO, RCO-- and R.sub.2 NCO-- wherein X is halogen and R is alkyl;
- applying said mixture to a substrate; exposing said substrate imagewise to actinic or electron beam radiation to effect polymerization of said epoxide in exposed areas of the substrate, and thereafter applying a solvent for removal of unpolymerized portions of said mixture.
- 7. The process of claim 6 wherein the mixture is subjected to heat after exposure to said radiation.
- 8. The process of claim 6 wherein R.sub.1 and R.sub.2 are hydrogen and R.sub.3 is a nitro group.
- 9. The process of claim 6 wherein R.sub.1 is hydrogen, R.sub.2 is a pyridyl radical and R.sub.3 is a nitro group.
- 10. The process of claim 6 wherein R.sub.1 and R.sub.2 are dinitrophenyl and R.sub.3 is a nitro group.
- 11. The process of claim 6 wherein R.sub.1 and R.sub.2 are dinitrophenyl and R.sub.3 is a carbethoxy radical.
- 12. The process of claim 6 wherein the mixture contains from about 1% to about 70% by weight of the phototropic compound.
Parent Case Info
This is a division of application Ser. No. 331,179, filed Feb. 9, 1973 now U.S. Pat. No. 3,895,952.
US Referenced Citations (7)
Divisions (1)
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Number |
Date |
Country |
Parent |
331179 |
Feb 1973 |
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