The present application claims the benefit of priorities under the Paris Convention to Chinese Patent Application No. 202210611082.8 filed on Jun. 1, 2022 and Chinese Patent Application No. 202210611083.2 filed on Jun. 1, 2022, each of which is incorporated herein by reference in its entirety.
Embodiments of the present disclosure relate in general to photovoltaic technology, and more specifically to a photovoltaic cell and a photovoltaic module.
Conventional fossil fuels of photovoltaic modules are increasingly depleted, and solar energy is undoubtedly the cleanest, most common and most promising alternative energy sources among all sustainable energy sources. Generally, among all the photovoltaic cells, crystalline silicon photovoltaic cells are one of the most widely commercially available photovoltaic cells, since silicon is extremely abundant in the crust and the crystalline silicon photovoltaic cells have excellent electrical and mechanical properties compared with other types of photovoltaic cells. Therefore, the crystalline silicon photovoltaic cells play an important role in photovoltaic field.
With the development of photovoltaic cell technology, recombination loss of the metal contact region becomes one of important factors which restrict further improvement of conversion efficiency of the photovoltaic cell. In order to improve the conversion efficiency of the photovoltaic cell, the photovoltaic cell is passivated by passivated contact to reduce recombination of an interior and a surface of the photovoltaic cell. Conventional passivation contact cells include heterojunction with intrinsic thin-layer (HIT) cells and tunnel oxide passivated contact (TOPCon) cells. However, conversion efficiency of existing passivated contact cells requires to be improved.
Some embodiments of the present disclosure provide a photovoltaic cell and a photovoltaic module, which improve passivation effect and conversion efficiency of the photovoltaic cell.
Some embodiments of the present disclosure provide a photovoltaic cell including: a substrate; a tunneling layer, a field passivation layer, and a first passivation film that are sequentially disposed on a rear surface of the substrate; and a first electrode, where the first electrode penetrates the first passivation film and is in contact with the field passivation layer; where each of the substrate, the tunneling layer and the field passivation layer includes a first doping element, a doping concentration of the first doping element in the tunneling layer is less than a doping concentration of the first doping element in the field passivation layer, and the doping concentration of the first doping element in the tunneling layer is greater than a doping concentration of the first doping element in the substrate; where the field passivation layer includes a first doped region and a second doped region, and the second doped region is closer to the tunneling layer relative to the first doped region; where a doping curve slope of the first doped region is greater than a doping curve slope of the second doped region, the first doping element has been annealed and activated to obtain an activated first doping element, and the doping curve slope indicates a slope of a curve in which a doping concentration of the activated first doping element changes with a doping depth of the activated first doping element; and where a doping curve slope of the tunneling layer gradually decreases in a depth direction of the tunneling layer toward the substrate.
In some embodiments, a doping curve slope of the substrate gradually increases and tends to be stable in a depth direction of the rear surface of the substrate toward an interior of the substrate.
In some embodiments, the doping curve slope of the substrate is less than or equal to an average value of the doping curve slope of the second doped region.
In some embodiments, a doping concentration of the activated first doping element in the field passivation layer is in a range of 1×1020 atom/cm3 to 5×1020 atom/cm3; and an activation rate of the first doping element in the field passivation layer is in a range of 50% to 70%, and the activation rate is a ratio of the doping concentration of the activated first doping element to a concentration of the first doping element totally implanted.
In some embodiments, the doping curve slope of the first doped region is in a range of 5×1018 to 1×1019, and the doping curve slope of the second doped region is in a range of −5×1018 to 5×1018.
In some embodiments, the doping curve slope of the tunneling layer is in a range of −2.5×1019 to −2.5×1018, and a doping curve slope of the substrate is in a range of −2.5×1019 to 0.
In some embodiments, a thickness of the field passivation layer is in a range of nm to 130 nm in a direction perpendicular to a surface of the substrate, and a thickness of the tunneling layer is in a range of 0.5 nm to 3 nm in the direction perpendicular to the surface of the substrate.
In some embodiments, the photovoltaic cell further includes an emitter and a second passivation film that are sequentially disposed on a front surface of the substrate; and a second electrode, where the second electrode penetrates the second passivation film and is in contact with the emitter; where the substrate further includes a second doping element.
In some embodiments, the second doping element is annealed and activated to obtain an activated second doping element, and a doping concentration of the activated second doping element on the front surface of the substrate is in a range of 5×1018 atom/cm3 to 1.5×1019 atom/cm3; and a concentration of the second doping element totally implanted is in a range of 1.5×1019 atom/cm3 to 1×1020 atom/cm3.
In some embodiments, the substrate includes a first region, a second region, and a third region in a depth direction of the front surface of the substrate toward the rear surface of the substrate; the second region is disposed between the first region and the third region, the first region is closer to the front surface of the substrate relative to the second region, and the third region is closer to the rear surface of the substrate relative to the second region; and a doping concentration of the second doping element in the second region and a doping concentration of the second doping element in the third region are both less than a doping concentration of the second doping element in the first region.
In some embodiments, a doping concentration of the activated second doping element in the first region is in a range of 5×1018 atom/cm3 to 1.5×1019 atom/cm3.
In some embodiments, a distance between a rear surface of the first region and the front surface of the substrate is in a range of 350 nm to 450 nm, a distance between a rear surface of the second region and the front surface of the substrate is in a range of 1000 nm to 1200 nm, and a distance between a rear surface of the third region and the front surface of the substrate is in a range of 1200 nm to 1600 nm.
In some embodiments, an activation rate of the second doping element in the first region is in a range of 20% to 40%, an activation rate of the second doping element in the second region is in a range of 60% to 90%, and an activation rate of the second doping element in the third region is in a range of 5% to 90%; and the activation rate is a ratio of the doping concentration of the activated second doping element to the concentration of the second doping element totally implanted.
Some embodiments of the present disclosure further provide a photovoltaic module, including: a cell string connected by a plurality of photovoltaic cells, where each of the plurality of photovoltaic cells includes the photovoltaic cell according to the above embodiments; an encapsulation layer configured to cover a surface of the cell string; and a cover plate configured to cover a surface of the encapsulation layer away from the cell string.
Generally, TOPCon cells have attracted continuous attention due to their excellent surface passivation effect, high theoretical efficiency and good compatibility with conventional production lines. The most prominent feature of TOPCon technology is its high-quality laminated structure of ultra-thin silicon oxide and heavily doped polysilicon (poly-Si). Therefore, phosphorus diffusion doping is an important part of the TOPCon technology, and excellent passivated contact on a rear surface of the TOPCon cell needs to be achieved through field effect formed by the phosphorus diffusion doping.
Current study of phosphorus doping mainly focuses on the distribution of phosphorus in Poly-Si. The study on concentration change and distribution of phosphorus in Poly-Si—SiOx—Si is not perfect, which is unable to essentially improve the field effect and passivated contact, so as to further improve the photovoltaic cell.
In order to improve conversion efficiency of the photovoltaic cell and essentially improve the field effect and the passivated contact, some embodiments of the present disclosure provides a photovoltaic cell in which a doping concentration of a first doping element in a field passivation layer is greater than a doping concentration of the first doping element in a tunneling layer as well as in a substrate, and the first doping element achieves a high activation rate in the field passivation layer, which is conducive to improving the passivation effect and the conversion efficiency of the photovoltaic cell. Some embodiments in the present disclosure further analyzes distribution of a doping concentration of phosphorus in Poly-Si—SiOx—Si of the photovoltaic cell, thereby providing a basis for improving a phosphorus doping process and the efficiency of the photovoltaic cell.
Referring to
The substrate 10 is configured to receive incident light and generate photogenerated carriers. In some embodiments, the rear surface of the substrate 10 is disposed opposite a front surface of the substrate 10, and both the rear surface and the front surface of the substrate 10 may be configured to receive incident or reflected light.
In some embodiments, the substrate 10 may be a silicon substrate, and a material of the silicon substrate may include at least one of single crystal silicon, polysilicon, amorphous silicon, or microcrystalline silicon. The substrate 10 may be an N-type semiconductor substrate, i.e., the substrate 10 is doped with an N-type first doping element. The first doping element may be any one of phosphorus, arsenic, or antimony. Specifically, in the case where the first doping element is phosphorus, phosphorus diffusion may be performed on the rear surface of the substrate 10 by a doping process (e.g., thermal diffusion, ion implantation, etc.) so that the tunneling layer 121, the field passivation layer 122, and the substrate 10 are all doped with phosphorus, and phosphorus is activated by an annealing treatment to obtain activated phosphorus.
The tunneling layer 121 is configured to achieve interface passivation of the rear surface of the substrate 10 and facilitate carrier migration through a tunneling effect. In some embodiments, a deposition process may be used to form the tunneling layer 121, e.g., a chemical vapor deposition process. In some embodiments, the tunneling layer 121 may also be formed using an in-situ generation process. Specifically, the tunneling layer 121 may include a dielectric material that provides passivation and tunneling effects, such as oxides, nitrides, semiconductors, conductive polymers, etc. For example, a material of the tunneling layer 121 may include at least one of silicon oxide, silicon nitride, silicon oxynitride, intrinsic amorphous silicon, intrinsic polysilicon, etc. In some examples, the tunneling layer 121 may not be a perfect tunneling barrier in practice because the tunneling layer 121 may include defects such as pinholes, resulting in other charge carrier transmission mechanisms, such as drift, diffusion, to dominate over the tunneling effect.
The field passivation layer 122 is configured to form field passivation. In some embodiments, a material of the field passivation layer 122 may be doped silicon. Specifically, in some embodiments, the field passivation layer 122 may have a doping element of the same conductivity type as the substrate 10, and the doped silicon may include one or more of N-type doped polysilicon, N-type doped microcrystalline silicon, or N-type doped amorphous silicon. As an improvement, the material of the field passivation layer 122 is a phosphorus-doped polysilicon layer. In some embodiments, a deposition process may be used to form the field passivation layer 122. Specifically, the intrinsic polysilicon may be deposited on a rear surface of the tunneling layer 121 away from the substrate 10 to form a polysilicon layer, and the first doping element is doped by ion implantation and source diffusion to form an N-type doped polysilicon layer as the field passivation layer 122. In some embodiments, N-type doped amorphous silicon may be formed on the rear surface of the tunneling layer 121 away from the substrate 10 first, and the N-type doped polysilicon layer is then formed after the N-type doped amorphous silicon is subjected to a high temperature treatment.
Referring to
The first passivation film 123 passivates defects present in the field passivation layer 122 on the rear surface of the substrate 10 and removes minority recombination portions of carriers, thereby increasing an open-circuit voltage of the photovoltaic cell. In addition, a first antireflection film may be further provided on a side of the first passivation film 123 away from the rear surface of the substrate 10, and the first antireflection film reduces reflectance of light incident on the rear surface of the substrate 10, so as to increase the amount of light reaching a tunnel junction formed by the substrate 10 and the tunneling layer 121, thereby increasing a short-circuit current (Isc) of the photovoltaic cell. Therefore, the first passivation film 123 and the first antireflection film are able to increase the open-circuit voltage and the short-circuit current of the photovoltaic cell, thereby improving the conversion efficiency of the photovoltaic cell.
In some embodiments, the first antireflection film may be formed from various materials capable of preventing reflection of the surface. For example, a material of the first antireflection film may be one or more of silicon nitride, silicon nitride containing hydrogen, silicon oxide, silicon oxynitride, aluminum oxide, MgF2, ZnS, TiO2 or CeO2. Specifically, in some embodiments, the first antireflection film may be a single layer structure. In some embodiments, the first antireflection film may also be a multilayer structure. In some embodiments, the first antireflection film may be formed using the PECVD method.
In some embodiments, the first electrode 124 penetrates the first passivation film 123 to be electrically connected to the field passivation layer 122. Specifically, the first electrode 124 is electrically connected to the field passivation layer 122 via an opening formed in the first passivation film 123 (i.e., at the time the first electrode 124 penetrates the first passivation film 123).
In some embodiments, the operation of forming the first electrode 124 may include printing a conductive paste on a surface of the first passivation film 123 in a preset region, and a conductive material in the conductive paste may include at least one of silver, aluminum, copper, tin, gold, lead, or nickel. The conductive paste may be sintered, for example, at a peak temperature of 750° C. to 850° C., to form the first electrode 124.
In some embodiments, for the photovoltaic cell shown in
Referring to
As shown in
As an example, combining ECV and SIMS tests, it is found that interface depths of Poly-Si—SiOx and SiOx—Si are about 94 nm and 101 nm, respectively. As shown in
It should be noted that the doping curve is a relationship between a doping concentration (in a unit of atom/cm3) of phosphorus and a doping depth (in a unit of nm) of phosphorus. The doping curve slope is a slope of a doping concentration of annealed and activated phosphorus changing with the doping depth of the annealed and activated phosphorus.
In some embodiments, a doping curve slope of the substrate 10 gradually increases and tends to be stable as the rear surface of the substrate 10 faces an interior of the substrate 10. As shown in
In some embodiments, the doping curve slope of the substrate 10 is less than or equal to an average value of the doping curve slope of the second doped region. With continued reference to
In some embodiments, the doping concentration of the activated first doping element in the field passivation layer 122 is in a range of 1×1020 atom/cm3 to 5×1020 atom/cm3. An activation rate of the first doping element in the field passivation layer 122 is in a range of 50% to 70%. The activation rate is a ratio of the doping concentration of the activated first doping element to a concentration of totally implanted first doping element.
As shown in
In some embodiments, the doping curve slope of the first doped region is in a range of 5×1018 to 1×1019. The doping curve slope of the second doped region is in a range of −5×1018 to 5×1018.
As shown in
In some embodiments, the doping curve slope of the tunneling layer 121 is in a range of −2.5×1019 to −2.5×1018. The doping curve slope of the substrate 10 is in a range of −2.5×1019 to 0.
With continued reference to
In some embodiments, a thickness of the field passivation layer 122 is in a range of 60 nm to 130 nm and a thickness of the tunneling layer 121 is in a range of 0.5 nm to 3 nm in a direction perpendicular to the surface of the substrate 10.
In some embodiments, in order to provide sufficient passivation and tunneling effects, the thickness of the tunneling layer 121 may be in a range of 0.5 nm to 3 nm. When the thickness of the tunneling layer 121 exceeds 3 nm, tunneling is unable to be effectively performed, and the photovoltaic cell may be unable to operate. When the thickness of the tunneling layer 121 is less than 0.5 nm, the passivation performance may deteriorate. In order to further improve the tunneling effect, the thickness of the tunneling layer 121 may be in a range of 0.5 nm to 2 nm, or the thickness of the tunneling layer 121 may be in a range of 0.5 nm to 1 nm.
In some embodiments, a thickness of the substrate 10 is in a range of 130 μm to 250 μm.
The embodiments of the present disclosure provide a photovoltaic cell and a photovoltaic module. A theoretical basis is provided for improving the field effect and the passivated contact as well as improving the efficiency of the photovoltaic cell by analyzing the activation rate and the doping curve slope of phosphorus in the phosphorus diffusion doping process of the photovoltaic cell. It is known form the above that the activation rate of phosphorus in the field passivation layer 122 is in the range of 50% to 70%, the doping curve slope of phosphorus is first decreased and then is stable in the range of 5×1018 to −5×1018 in the Poly-Si film, the doping curve slope of phosphorus is decreased from about −1×1018 to about −3×1019 in the SiOx film, and the doping curve slope of phosphorus is gradually increased and is stable in the range of −1×1017 to −1×1018 in the crystalline silicon.
In some embodiments, the photovoltaic cell further includes an emitter 111 and a second passivation film 112 that are sequentially disposed on a front surface of the substrate and a second electrode 114. The second electrode 114 penetrates the second passivation film 112 and is in contact with the emitter 111. The substrate 10 further includes a second doping element.
In some embodiments, the second doping element includes at least one of boron, oxygen, silicon, chlorine, nitrogen, and carbon.
Specifically, the manufacturing process of the photovoltaic cell described above includes the following operations. First, a P-type doping source is deposited on the front surface of the substrate 10 to form a film layer. And then, the P-type doping source in the film layer of a preset region is diffused into the substrate 10 by a doping process to form the emitter 111 inside the substrate 10 of the preset region.
In some embodiments, the P-type doping source is a simple substance containing a trivalent element or a compound containing the trivalent element such as boron tribromide or boron trichloride. In some embodiments, when the P-type doping source is a boron source, the second doping element is boron. The simple substance containing the trivalent element or the compound containing the trivalent element such as boron tribromide or boron trichloride may be used as the doping source. Specifically, the second doping element in the preset region may be diffused into the front surface of the substrate 10 by a doping process, such as a laser doping process, a plasma positioning doping process, or an ion implantation process.
In some embodiments, before the film layer is formed on the front surface of the substrate 10, an operation of pretreating the front surface of the substrate 10 includes cleaning the substrate 10 and texturing the front surface of the substrate 10. Specifically, a pyramidal texture structure may be formed on the front surface of the substrate 10 by chemical etching, laser etching, mechanical etching, plasma etching, etc. On the one hand, roughness of the front surface of the substrate 10 is increased, so that the reflectivity of the front surface of the substrate 10 to the incident light is small, thereby increasing absorption utilization of the incident light. On the other hand, the presence of the pyramidal texture structure increases a surface area of the front surface of the substrate 10 compared to the front surface of the substrate being a flat surface, so that more second doping elements are able to be stored in the front surface of the substrate 10, which is conductive to forming the emitter 111 with a higher concentration. In some embodiments, the emitter 111 is a doping layer diffused to a certain depth on the front surface of the substrate 10, which forms a PN junction within the substrate 10.
Referring to
In addition, a second antireflection film may be further provided on a side of the second passivation film 112 away from the front surface of the substrate 10, and the second antireflection film reduces reflectance of light incident on the front surface of the substrate 10, so as to increase the amount of light reaching a tunnel junction formed by the substrate 10 and the emitter 111, thereby increasing a short-circuit current (Isc) of the photovoltaic cell. Therefore, the second passivation film 112 and the second antireflection film are able to increase the open-circuit voltage and the short-circuit current of the photovoltaic cell, thereby improving the conversion efficiency of the photovoltaic cell.
In some embodiments, a material of the second antireflection film is the same as that of the first antireflection film. For example, the material of the second antireflection film may be one or more of silicon nitride, silicon nitride containing hydrogen, silicon oxide, silicon oxynitride, aluminum oxide, MgF2, ZnS, TiO2 or CeO2. Specifically, in some embodiments, the second antireflection film may be a single layer structure. In some embodiments, the second antireflection film may also be a multilayer structure. In some embodiments, the second antireflection film may be formed using the PECVD method.
In some embodiments, the second electrode 114 penetrates the second passivation film 112 to form an electrical connection with the emitter 111. Specifically, the second electrode 114 is electrically connected to the emitter 111 via an opening formed in the second passivation film 112 (i.e., at the time the second electrode 114 penetrates the second passivation film 112). Specifically, the operation of forming the second electrode 114 may be the same as the operation of forming the first electrode 124, and the material of the second electrode 114 may be the same as the material of the first electrode 124.
In some embodiments, for the photovoltaic cell shown in
In some embodiments, the doping concentration of the activated second doping element on the front surface of the substrate 10 may be, for example, 5×1018 atom/cm3, 9×1018 atom/cm3, 1×1019 atom/cm3, 1.2×1019 atom/cm3, or 1.5×1019 atom/cm3. The concentration of the second doping element totally implanted on the front surface of the substrate 10 may be, for example, 1.5×1019 atom/cm3, 3×1019 atom/cm3, 6×1019 atom/cm3, 8×1019 atom/cm3, or 1×1020 atom/cm3.
As an improvement, the doping concentration of the activated second doping element on the front surface of the substrate 10 is 1×1019 atom/cm3. The concentration of the second doping element totally implanted on the front surface of the substrate 10 is in a range of 3×1019 atom/cm3 to 5×1019 atom/cm3.
In some embodiments, for the photovoltaic cell shown in
In some embodiments, the substrate 10 includes a first region, a second region, and a third region in a depth direction of the front surface of the substrate 10 toward a rear surface of the substrate 10. The second region is disposed between the first region and the third region. The first region is closer to the front surface of the substrate 10 relative to the second region, and the third region is closer to the rear surface of the substrate 10 relative to the second region. A doping concentration of the second doping element in the second region and a doping concentration of the second doping element in the third region are both less than a doping concentration of the second doping element in the first region.
In some embodiments, the doping concentration of the activated second doping element in the first region is in a range of 5×1018 atom/cm3 to 1.5×1019 atom/cm3.
In some embodiments, a distance between the rear surface of the first region and the front surface of the substrate 10 (i.e., an interface depth of the first region) is in a range of 350 nm to 450 nm. A distance between the rear surface of the second region and the front surface of the substrate (i.e., an interface depth of the second region) is in a range of 1000 nm to 1200 nm. A distance between the rear surface of the third region and the front surface of the substrate 10 (i.e., an interface depth of the third region) is in a range of 1200 nm to 1600 nm.
In some embroilments, the interface depth of the first region may be 350 nm, 370 nm, 400 nm, 430 nm, 450 nm, etc. In some embroilments, the interface depth of the second region may be 1000 nm, 1050 nm, 1100 nm, 1105 nm, 1200 nm, etc. In some embroilments, the interface depth of the third region may be 1200 nm, 1300 nm, 1400 nm, 1500 nm, 1600 nm, etc.
As an example, referring to
As shown in
In some embodiments, an activation rate of the second doping element in the first region is in a range of 20% to 40%, an activation rate of the second doping element in the second region is in a range of 60% to 90%, and an activation rate of the second doping element in the third region is in a range of 5% to 90%. The activation rate is a ratio of the doping concentration of the activated second doping element to the concentration of the second doping element totally implanted.
As shown in
Referring to
In some embodiments, the photovoltaic cells may be electrically connected as a whole or in pieces to form a plurality of cell strings 101 that are electrically connected in series and/or in parallel.
Specifically, in some embodiments, the plurality of cell strings 101 may be electrically connected to each other by a conductive tape 104. The encapsulation layer 102 covers the front side and the rear side of the photovoltaic cell. Specifically, the encapsulation layer 102 may be an organic encapsulation adhesive film such as an ethylene-vinyl acetate copolymer (EVA) adhesive film, a polyethylene octene co-elastomer (POE) adhesive film, a polyethylene terephthalate (PET) adhesive film, etc. In some embodiments, the cover plate 103 may be a glass cover, a plastic cover, or the like having a light transmitting function. Specifically, a surface of the cover plate 103 facing the encapsulation layer 102 may include a concave-convex surface, thereby increasing utilization of incident light.
Embodiments of the present disclosure provide a photovoltaic cell and a photovoltaic module. The first doping element is doped on the rear surface of the substrate 10, the second doping element is doped on the front surface of the substrate 10, the doping concentration of the first doping element in the field passivation layer is greater than that in the tunneling layer and the substrate, and a high activation rate of the first doping element is achieved in the surface layer of the field passivation layer, which is conducive to improving the passivation effect and conversion efficiency of the photovoltaic cell. In addition, the doping distribution of the second doping element in the surface layer of the substrate and the shallow junction region is improved by increasing the activation rate of the second doping element in the surface layer of the front surface of the substrate, so that influence of the dead layer is reduced, the overall performance of the photovoltaic cell is improved, and the conversion efficiency of the photovoltaic cell is improved.
Furthermore, it is known that in the manufacturing process of the photovoltaic cell, the doping process affects the quality of the PN junction and the photoelectric conversion efficiency of the photovoltaic cell.
Presently photovoltaic cells are widely concerned in the industry and production planning is gradually increasing. In order to improve the photoelectric conversion efficiency of the photovoltaic cell, the boron diffusion doping process is being studied. However, conventional boron diffusion doping processes are characterized by square resistance test, so that it is impossible to know the distribution of boron in the photovoltaic cell and a distribution relationship of the activation rate of boron changing with the doping depth in the boron diffusion doping process. For example, it is impossible to know the distribution of boron doping in the dead layer, which makes it impossible to adjust the diffusion process of the dead layer to improve the conversion efficiency of the photovoltaic cell.
In order to improve the doping distribution of boron in the photovoltaic cell as well as increase the doping concentration and activation rate of boron in a bottom layer, embodiments of the present disclosure provide a photovoltaic cell. By increasing a doping concentration and an activation rate of a first doping element on a front surface of a substrate, the doping distribution of the first doping element in a surface layer of the substrate and the shallow junction region is improved, the influence of a dead layer is reduced, overall performance of the photovoltaic cell is improved, and conversion efficiency of the photovoltaic cell is improved. It should be noted that the terms “first” and “second” herein are used only to distinguish elements and facilitate understanding of the present disclosure, which do not constitute any limitation to the present disclosure. The first doping element mentioned in this paragraph and hereinafter is the second doping element mentioned above, the second doping element mentioned in this paragraph and hereinafter is the first doping element mentioned above, the first passivation film mentioned hereinafter is the second passivation film mentioned above, the second passivation film mentioned hereinafter is the first passivation film mentioned above, the first electrode mentioned hereinafter is the second electrode mentioned above, and the second electrode mentioned hereinafter is the first electrode mentioned above.
Some embodiments provide a photovoltaic cell including: a substrate 10; an emitter 111 and a first passivation film 112 that are sequentially disposed on a front surface of the substrate 10; and a first electrode 114, where the first electrode 114 penetrates the first passivation film 112 and is in contact with the emitter 111; where the substrate 10 includes a first doping element; where the first doping element is annealed and activated to obtain an activated first doping element, a doping concentration of the activated first doping element on the front surface of the substrate 10 is in a range of 5×1018 atom/cm3 to 1.5×1019 atom/cm3, an activation rate of the activated first doping element on the front surface of the substrate 10 is in a range of 20% to 40%, and the activation rate is a ratio of the doping concentration of the activated first doping element to a concentration of the first doping element totally implanted.
In some embodiments, the doping concentration of the activated first doping element in the substrate 10 increases first and then decreases as a doping depth of the activated first doping element increases.
In some embodiments, a changing tendency of the concentration of the first doping element totally implanted in the substrate 10 as a doping depth of the first doping element increases is the same as a changing tendency of the doping concentration of the activated first doping element in the substrate 10 as a doping depth of the activated first doping element increases.
In some embodiments, the substrate 10 includes a first region, a second region, and a third region in a depth direction of the front surface of the substrate 10 toward a rear surface of the substrate 10; where the second region is disposed between the first region and the third region, the first region is closer to the front surface of the substrate 10 relative to the second region, and the third region is closer to the rear surface of the substrate 10 relative to the second region; and where a doping concentration of the second doping element in the second region and a doping concentration of the second doping element in the third region are both less than a doping concentration of the second doping element in the first region.
In some embodiments, an interface depth of the first region is in a range of 1.8% to 2.4% of a thickness of the substrate 10, and the interface depth of the first region is a vertical distance between a side of the first region away from the front surface of the substrate 10 and the front surface of the substrate 10.
In some embodiments, the interface depth of the first region is in a range of 350 nm to 450 nm.
In some embodiments, an interface depth of the second region is in a range of to 6.3% of the thickness of the substrate 10, and the interface depth of the second region is in a range of 1000 nm to 1200 nm. An interface depth of the third region is in a range of 6.3% to 8.4% of the thickness of the substrate 10, and the interface depth of the third region is in a range of 1200 nm to 1600 nm.
In some embodiments, the activation rate of the activated first doping element increases first and then decreases as the doping depth increases, an activation rate of the first doping element in the second region is in a range of 60% to 90%, and an activation rate of the first doping element in the third region is in a range of 5% to 90%.
In some embodiments, the photovoltaic cell further includes a tunneling layer 121, a field passivation layer 122 and a second passivation film 123 that are sequentially disposed on a rear surface of the substrate 10, and a second electrode 124, where the second electrode 124 penetrates the second passivation film 123 and is in contact with the field passivation layer 122; where the substrate 10, the tunneling layer 121 and the field passivation layer 122 all include a same first doping element, a doping concentration of the second doping element in the tunneling layer 121 is less than a doping concentration of the second doping element in the field passivation layer 122, and the doping concentration of the second doping element in the tunneling layer 121 is greater than a doping concentration of the second doping element in the substrate 10; where the field passivation layer 122 includes a first doped region and a second doped region, and the second doped region is closer to the tunneling layer 121 relative to the first doped region; where a doping curve slope of the first doped region is greater than a doping curve slope of the second doped region, the second doping element is annealed and activated to obtain an activated second doping element, and the doping curve slope indicates a slope of a curve in which a doping concentration of the activated second doping element changes with a doping depth of the activated second doping element; and where a doping curve slope of the tunneling layer 121 gradually decreases in a depth direction of the tunneling layer 121 toward the substrate 10.
In some embodiments, the doping concentration of the activated second doping element in the field passivation layer 122 is in a range of 1×1020 atom/cm3 to 5×1020 atom/cm3, an activation rate of the second doping element in the field passivation layer 122 is in a range of 50% to 70%, and the activation rate is a ratio of the doping concentration of the activated second doping element to a concentration of the second doping element totally implanted.
In some embodiments, the doping curve slope of the first doped region is in a range of 5×1018 to 1×1019, and the doping curve slope of the second doped region is in a range of −5×1018 to 5×1018.
In some embodiments, the doping curve slope of the tunneling layer 121 is in a range of −2.5×1018 to −2.5×1018, and a doping curve slope of the substrate 10 is in a range of −2.5×1019 to 0.
Some embodiments of the present disclosure further provide a photovoltaic module including a cell string 101 connected by a plurality of photovoltaic cells, wherein each of the plurality of photovoltaic cells includes the photovoltaic cell according to the above embodiments; an encapsulation layer 102 configured to cover a surface of the cell string 101; and a cover plate 103 configured to cover a surface of the encapsulation layer (102) away from the cell string 101.
Those of ordinary skill in the art should appreciate that the embodiments described above are specific embodiments of the present disclosure, and in practical application, various changes may be made thereto in form and detail without departing from the spirit and scope of the present disclosure. Any one of those skilled in the art may make their own changes and modifications without departing from the spirit and scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the scope defined in the claims.
Number | Date | Country | Kind |
---|---|---|---|
202210611082.8 | Jun 2022 | CN | national |
202210611083.2 | Jun 2022 | CN | national |