Claims
- 1. A method of enhancing the growth of CdS microcrystals, comprising the step of uniformly heating a nucleating substrate to a temperature effective to promote CdS crystal growth in a layer of microcrystalline CdS on said substrate, and
- irradiating said layer of microcyrstalline CdS with high intensity ultra-violet light during said heating to improve uniformity of crystal axis orientation during said CdS crystal growth.
- 2. A method according to claim 1, wherein said CdS layer is grown to a thickness of 1.0 to 2.0 microns.
Parent Case Info
This is a continuation, of application Ser. No. 645,461, filed Dec. 30, 1975 and now abandoned.
US Referenced Citations (5)
Continuations (1)
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Number |
Date |
Country |
Parent |
645461 |
Dec 1975 |
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