The present invention relates to a piezoelectric film, an ink jet head, a n angular velocity sensor and a piezoelectric generating element.
One example of lead-free piezoelectric materials that are currently under development is a perovskite-type composite oxide (Bi,Na)TiO3—BaTiO3 as disclosed in Patent Literature 1 and Patent Literature 2 (which corresponds to U.S. Pat. No. 7,870,787). This piezoelectric material is referred to as “BNT-BT”.
The purpose of the present invention is to provide a BNT-BT piezoelectric film having a higher crystalline orientation, a higher piezoelectric constant, and a higher ferroelectric property.
Another purpose of the present invention is to provide an ink jet head, an angular velocity sensor, and a piezoelectric generating element, each including the BNT-BT piezoelectric film Still another purpose of the present invention is to provide a method of forming an image by this ink jet head, a method of measuring an angular velocity by this angular velocity sensor, and a method of generating electric power using this piezoelectric generating element.
A piezoelectric film of the present invention comprises:
The present invention provides a BNT-BT piezoelectric film having a higher crystalline orientation, a higher piezoelectric constant, and a higher ferroelectric property.
Hereinafter, embodiments of the present invention will be described. In the following description, the same reference numerals are used to designate the same elements and parts, and therefore the overlapping description thereof can be omitted.
[Piezoelectric Film]
The (Bi,Na)TiO3—BaTiO3 layer 15 has a small leak current property, high crystallinity, and a high (110) orientation. This allows the piezoelectric film la to have a low dielectric loss property and high piezoelectric performance comparable to that of PZT, although it contains no lead.
(Regarding First Electrode 13)
An example of the first electrode 13 having only a (110) orientation is described below:
(1) a metal layer such as a platinum (Pt) layer, a palladium (Pd) layer, or a gold (Au) layer, or
(2) a conductive oxide layer such as a nickel oxide (NiO) layer, a ruthenium oxide (RuO2) layer, an iridium oxide (IrO9) layer, a strontium ruthenate (SrRuO3) layer, or a lanthanum-nickelate (LaNiO3) layer.
A platinum layer is preferred. Two or more of these layers may also be used.
(Regarding (NaxBi0.5)TiO0.5x+2.75—BaTiO3 Layer 14)
The (NaxBi0.5)TiO0.5x+2.75—BaTiO3layer 14 (0.29≦x≦0.4) has a plane orientation of (110) on its surface. The (NaxBi0.5)TiO0.5x+2.75—BaTiO3layer 14 (0.29≦x≦0.4) is an interface layer. The (NaxBi0.5)TiO0.5x+2.75—BaTiO3 layer 14 (0.29≦x≦0.4) is sandwiched between the first electrode 13 and the (Bi,Na)TiO3—BaTiO3 layer 15. The (NaxBi0.5)TiO0.5x+2.75—BaTiO3layer 14 (0.29≦x≦0.4) is necessary to improve the crystalline orientation, the piezoelectric constant, and the ferroelectric property of the (Bi,Na)TiO3—BaTiO3 layer 15. For more detail, see Examples 1 to 3 and Comparative Examples 1 to 10, which are described later.
A value of “0.5x+2.75”, which represents an oxygen amount in sodium bismuth titanate, may include an error. For example, in a case where x=0.4, the value of “0.5x+2.75” is equal to 2.95. However, in the case where x=0.4, the oxygen amount in sodium bismuth titanate does not always correspond with 2.95 completely.
It is difficult to estimate the composition of the interface layer suitable for improving the crystalline orientation, the piezoelectric constant, and the ferroelectric property of the (Bi,Na)TiO3—BaTiO3 layer 15, based on the similarity of the lattice constants or the compositions of these piezoelectric layer and interface layer. In other words, such a piezoelectric layer cannot always be obtained simply by providing an interface layer having a lattice constant or a composition similar to that of the piezoelectric layer. This is because it is generally difficult to form a multicomponent composite oxide having high crystallinity and a high orientation, like (Bi,Na)TiO3—BaTiO3, due to a difference in the vapor pressure of constituent elements (except for oxygen) of the oxide. The present inventors have discovered that the (NaxBi0.5)TiO0.5x+2.75—BaTiO3 layer 14 (0.29≦x≦0.4) improves the crystalline orientation, the piezoelectric constant, and the ferroelectric property of the (Bi,Na)TiO3—BaTiO3 layer 15.
The thickness of the (NaxBi0.5)TiO0.5x+2.75—BaTiO3layer 14 (0.29≦x≦0.4) is not limited. The thickness of at least several lattice units (about 2 nm) is large enough to improve the crystalline orientation and the piezoelectric constant of the (Bi,Na)TiO3—BaTiO3 layer 15.
The (NaxBi0.5)TiO0.5x+2.75—BaTiO3layer 14 (0.29≦x≦0.4) has a perovskite-type crystal structure represented by the chemical formula ABO3. The main component of the site of A is Na, Bi and Ba. The main component of the site of B is Ti. The (NaxBi0.5)TiO0.5x+2.75—BaTiO3layer 14 (0.29≦x≦0.4) may contain a small amount of impurities. The impurities may be typically K, Li, or Ag, which substitutes for Na.
A (110)-oriented layer (not shown) further may be sandwiched between the first electrode 13 and the (NaxBi0.5)TiO0.5x+2.75—BaTiO3layer 14 (0.29≦x≦0.4) as necessary. The (110)-oriented layer is, for example, a LaNiO3 layer or a SrRuO3 layer.
(Regarding (Bi,Na)TiO3—BaTiO3 Layer 15)
The (Bi,Na)TiO3—BaTiO3 layer 15 is made of (Bi,Na)TiO3—BaTiO3. The (Bi,Na)TiO3—BaTiO3 layer 15 has a plane orientation of (110) on its surface.
The thickness of the (Bi,Na)TiO3—BaTiO3 layer 15 is not limited. The thickness thereof is at least 0.5 micrometers but not more than 10 micrometers, for example. Although the (Bi,Na)TiO3—BaTiO3 layer 15 is such a thin layer, it has a low dielectric loss property and high piezoelectric performance.
The (Bi,Na)TiO3—Ba TiO3 layer 15 has a perovskite-type crystal structure represented by the chemical formula ABO3. The A site and B site in the perovskite structure have average valences of 2 and 4, respectively, depending on the placement of a single element or a plurality of elements. The A site is Bi, Na, and Ba. The B site is Ti. The (Bi,Na)TiO3—BaTiO3 layer 15 may contain a minute amount of impurities. The impurities typically are Li and K to substitute for Na, and Sr and Ca to substitute for Ba, in the A site. The impurities typically are Zr to substitute for Ti in the B site. Examples of the other impurities include Mn, Fe, Nb, and Ta. Some of these impurities can improve the crystalline orientation and piezoelectric performance of the (Bi,Na)TiO3—BaTiO3 layer 15.
A (110)-oriented layer further may be sandwiched between the (NaxBi0.5)TiO0.5x+2.75—BaTiO3layer 14 and the(Bi,Na)TiO3—BaTiO3 layer 15 as necessary.
(Regarding Second Electrode 17)
The second electrode 17 is composed of a conductive material. An example of the material is a metal having low electric resistant. The material may be a conductive oxide such as NiO, RuO2, IrO3, SrRuO3, or LaNiO3. The second electrode 17 may be composed of two or more of these materials.
The first electrode 13 and the second electrode 17 are used for applying a voltage to the (Bi,Na)TiO3—BaTiO3 layer 15.
An adhesive layer improving adhesion between the second electrode 17 and the (Bi,Na)TiO3—BaTiO3 layer 15 may be provided therebetween. Examples of the material of the adhesive layer include titanium (Ti), tantalum (Ta), iron (Fe), cobalt (Co), nickel (Ni), chrome (Cr), and a compound thereof. The adhesive layer may be composed of two or more of these materials. The adhesive layer may be omitted depending on the adhesion between the second electrode 17 and the (Bi,Na)TiO3—BaTiO3 layer 15.
The substrate 11 may be a silicon (Si) substrate or a magnesium oxide (MgO) substrate. It is preferred that the substrate 11 is a monocrystalline substrate having only a (110) orientation.
An adhesive layer improving adhesion between the substrate 11 and the first electrode 13 may be provided therebetween. Examples of the material of the adhesive layer include titanium (Ti), tantalum (Ta), iron (Fe), cobalt (Co), nickel (Ni), chrome (Cr), and a compound thereof. The adhesive layer may be composed of two or more of these materials. The adhesive layer may be omitted depending on the adhesion between the substrate 11 and the multilayer structure 16a.
The ink jet head, the angular velocity sensor, and the piezoelectric power generation element each comprising the above-mentioned piezoelectric film are described. For more detail, see Patent Literature 3. Patent Literature 4 and Patent Literature 5 are the United States patent publication and the Chinese laid-open patent application publication which correspond to Patent Literature 3, respectively.
[Ink Jet Head]
An ink jet head of the present invention will be described below with reference to
The reference character A in
The actuator part B has piezoelectric films and vibration layers that are aligned over the corresponding pressure chambers 102 respectively in plan view. In
The ink passage member C has the common liquid chambers 105 arranged in stripes in plan view. In
In
As surrounded by the dashed-line in
[Image Forming Method by Ink Jet Head]
An image forming method of the present invention includes, in the above-described ink jet head of the present invention, a step of applying a voltage to the piezoelectric layer through the first and second electrodes (that is, the individual electrode layer and the common electrode layer) to displace, by the piezoelectric effect, the vibration layer in its film thickness direction so that the volumetric capacity of the pressure chamber changes; and a step of ejecting the ink from the pressure chamber by the displacement.
The voltage to be applied to the piezoelectric layer is changed with the relative position between the ink jet head and an object like a sheet of paper, on which an image is to be formed, being changed, so as to control the timing of ink ejection from the ink jet head and the amount of ink ejected therefrom. As a result, an image is formed on the surface of the object. The term “image” used in the present description includes characters. In other words, according to the present method of forming an image, characters, a picture, or a figure is printed on a print target such as a sheet of paper. With this method, a picturesque image can be printed.
[Angular Velocity Sensor]
The angular velocity sensor 21a shown in
The substrate 200 has a stationary part 200a and a pair of arms (vibration parts 200b) extending in a predetermined direction from the stationary part 200a. The direction in which the vibration parts 200b extend is the same as the direction in which the central axis of rotation L of the angular velocity detected by the angular velocity sensor 21a extends. Particularly, it is the Y direction in
The material of the substrate 200 is not limited. The material is, for example, Si, glass, ceramic, or metal. A monocrystalline Si substrate can be used as the substrate 200. The thickness of the substrate 200 is not limited as long as the functions of the angular velocity sensor 21a can develop. More particularly, the substrate 200 has a thickness of at least 0.1 mm but not more than 0.8 mm. The thickness of the stationary part 200a can be different from that of the vibration part 200b.
The piezoelectric film 208 is bonded to the vibration part 200b. The piezoelectric film 208 is the piezoelectric film described in the item titled as “Piezoelectric Film”. As shown in
The second electrode 205 has an electrode group including a drive electrode 206 and a sense electrode 207. The drive electrode 206 applies a driving voltage that oscillates the vibration part 200b to the piezoelectric layer 15. The sense electrode 207 measures the deformation of the vibration part 200b caused by an angular velocity applied to the vibration part 200b. That is, the vibration part 200b usually oscillates in the width direction thereof (the X direction in
In the angular velocity sensor of the present invention, one electrode selected from the first electrode and the second electrode can be composed of an electrode group including the drive electrode and the sense electrode. In the angular velocity sensor 21a shown in
The first electrode 202, the drive electrode 206, and the sense electrode 207 have connection terminals 202a, 206a, and 207a, respectively, formed at the end portions thereof. The shape and position of each of the connection terminals are not limited. In
In the angular velocity sensor shown in
The angular velocity sensor of the present invention may have two or more vibration part groups each consisting of a pair of vibration parts 200b. Such an angular velocity sensor can serve as a biaxial or triaxial angular velocity sensor capable of measuring angular velocities with respect to a plurality central axes of rotation. The angular velocity sensor shown in
[Method of Measuring Angular Velocity by Angular Velocity Sensor]
The angular velocity measuring method of the present invention uses the angular velocity sensor of the present invention, and includes the steps of applying a driving voltage to the piezoelectric layer to oscillate the vibration part of the substrate; and measuring the deformation of the vibration part caused by an angular velocity applied to the oscillating vibration part to obtain a value of the applied angular velocity. The driving voltage is applied between the drive electrode and one of the first electrode and the second electrode (the other electrode) that serves neither as the drive electrode nor as the sense electrode, and thus the driving voltage is applied to the piezoelectric layer. The sense electrode and the other electrode measure the deformation of the oscillating vibration part caused by the angular velocity.
Hereinafter, the angular velocity measuring method by the angular velocity sensor 21a shown in
When an angular velocity co with respect to the central axis of rotation L is applied to the angular velocity sensor 21a in which the vibration parts 200b are oscillating, the vibration parts 200b are deflected respectively in their thickness directions (the Z direction) by Coriolis force. In the case where the respective vibration parts 200b are oscillating in the mode in which they vibrate in the directions opposite to each other, they are deflected in the opposite directions by the same degree. The piezoelectric layer 15 bonded to the vibration part 200b is also deflected according to this deflection of the vibration part 200b. As a result, a potential difference is generated between the first electrode 202 and the sense electrode 207 in accordance with the deflection of the piezoelectric layer 15, that is, the magnitude of the generated Coriolis force. The angular velocity co applied to the angular velocity sensor 21a can be measured by measuring the magnitude of the potential difference.
The following relationship between a Coriolis force Fc and an angular velocity ω is true:
Fc=2mvω
where v is the velocity of the oscillating vibration part 200b in the oscillation direction, and m is the mass of the vibration part 200b. As shown in this equation, the angular velocity w can be calculated from the Coriolis force Fc.
[Piezoelectric Generating Element]
The piezoelectric generating element 22a shown in
The substrate 300 has a stationary part 300a, and the vibration part 300b having a beam extending in a predetermined direction from the stationary part 300a. The material of the stationary part 300a can be the same as the material of the vibration part 300b. These materials may, however, be different from each other. The stationary part 300a and the vibration part 300b made of materials different from each other may be bonded to each other.
The material of the substrate 300 is not limited. The material is, for example, Si, glass, ceramic, or metal. A monocrystalline Si substrate can be used as the substrate 300. The substrate 300 has a thickness of, for example, at least 0.1 mm but not more than 0.8 mm. The stationary part 300a may have a thickness different from that of the vibration part 300b. The thickness of the vibration part 300b can be adjusted for efficient power generation by changing the resonance frequency of the vibration part 300b.
A weight load 306 is bonded to the vibration part 300b. The weight load 306 adjusts the resonance frequency of the vibration part 300b. The weight load 306 is, for example, a vapor-deposited thin film of Ni. The material, shape, and mass of the weight load 306, as well as the position to which the weight load 306 is bonded can be adjusted according to a desired resonance frequency of the vibration part 300b. The weight load 306 may be omitted. The weight load 306 is not necessary when the resonance frequency of the vibration part 300b is not adjusted.
The piezoelectric film 308 is bonded to the vibration part 300b. The piezoelectric film 308 is the piezoelectric film described in the item titled as “Piezoelectric Film”. As shown in
In the piezoelectric generating element shown in
In the piezoelectric generating element shown in
When the piezoelectric generating element of the present invention has a plurality of vibration parts 300b, an increased amount of electric power can be generated. Such a piezoelectric generating element can be applied to mechanical vibrations containing a wide range of frequency components if the plurality of vibration parts 300b have different resonance frequencies.
[Method of Generating Electric Power Using Piezoelectric Generating Element]
The above-described piezoelectric generating element of the present invention is vibrated to obtain electric power through the first electrode and the second electrode.
When mechanical vibration is applied externally to the piezoelectric generating element 22a, the vibration part 300b starts vibrating to produce vertical deflection with respect to the stationary part 300a. The piezoelectric effect produced by this vibration generates an electromotive force across the piezoelectric layer 15. As a result, a potential difference is generated between the first electrode 302 and the second electrode 305 that sandwich the piezoelectric layer 15 therebetween. Higher piezoelectric performance of the piezoelectric layer 15 generates a larger potential difference between the first and second electrodes. Particularly in the case where the resonance frequency of the vibration part 300b is close to the frequency of mechanical vibration to be applied externally to the element, the amplitude of the vibration part 300b increases and thus the electric power generation characteristics are improved. Therefore, the weight load 306 is preferably used to adjust the resonance frequency of the vibration part 300b to be close to the frequency of mechanical vibration applied externally to the element.
Hereinafter, the present invention is described in more detail with reference to the following examples.
In Example 1, the piezoelectric film shown in
11 First, a Pt layer having only a (110) orientation was formed on a MgO (110) monocrystalline substrate 11 by a sputtering technique. The Pt layer had a thickness of 250 nm. The Pt layer was the first electrode 13. The condition in the sputtering technique was as follows.
Target: metal platinum
Gas atmosphere: Argon
RF power: 15 W
Substrate temperature: 300° C.
Next, a 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350) having only a (110) orientation was formed on the Pt layer (the first electrode 13) by a sputtering technique. The 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350) had a thickness of 100 nanometers. The 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350) was an interface layer. The condition in the sputtering technique was as follows.
Target: the same composition as described above
Gas flow ratio: Ar/O2=50/50
RF power: 170 W
Substrate temperature: 650° C.
Here, the composition of the formed 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350) was analyzed by an energy dispersive X-ray analysis method (SEM-EDX). In the measurement with use of SEM-EDX, it was difficult to quantify a light element such as oxygen accurately, since the analysis accuracy of the light element was low. However, it was confirmed that the composition of Na, Bi, Ba, and Ti contained in the formed 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350) was identical to the composition of the target.
Then, a 0.93(Bi0.5Na0.5)TiO3-0.07BaTiO3 layer 15 having only a (110) orientation was formed on the 0.93(NaxBi0.5)TiO0.5x+2.75−0.07BaTiO3 layer 14 (x=0.350) by a sputtering technique. The formed 0.93(Bi0.5Na0.5)TiO3-0.07BaTiO3 layer 15 had a thickness of 2.7 micrometers. The 0.93(Bi0.5Na0.5)TiO3-0.07BaTiO3 layer 15 was a piezoelectric layer. The condition in the sputtering technique was as follows.
Target: the same composition as described above
Gas flow ratio: Ar/O2=50/50
RF power: 170 W
Substrate temperature: 650° C.
The composition of the formed 0.93(Bi0.5Na0.5)TiO3-0.07BaTiO3 layer 15 was analyzed by an energy dispersive X-ray analysis method (SEM-EDX). It was confirmed that the composition of Na, Bi, Ba, and Ti contained in the formed 0.93(Bi0.5Na0.5)TiO3-0.07BaTiO3 layer 15 was identical to the composition of the target.
Finally, a Au layer (the second electrode 17) having a thickness of 100 nanometers was formed on the 0.93(Bi0.5Na0.5)TiO3-0.07BaTiO3 layer 15 by a vapor deposition technique. Thus, the piezoelectric film according to Example 1 was obtained.
(X-ray Diffraction Analysis) The formed 0.93(Bi0.5Na0.5)TiO3-0.07BaTiO3 layer 15 was subjected to an X-ray diffraction analysis to analyze the crystal structure thereof. The X-ray diffraction analysis was carried out in such a manner that the 0.93(Bi0.5Na0.5)TiO3-0.07BaTiO3 layer 15 was irradiated with X-ray beam.
As shown in
(Measurement of Piezoelectric Constant d31)
The piezoelectric performance of the piezoelectric film was evaluated in the following manner. The piezoelectric film was cut into a strip with a width of 2 mm and worked into a cantilever shape. A potential difference was applied between the first electrode 13 and the second electrode 17, and the resulting displacement of the cantilever was measured with a laser displacement meter. The measured displacement was converted into a piezoelectric constant d31. The piezoelectric constant d31 of the piezoelectric film according to Example 1 was −123 pC/N.
(Measurement of Leak Current)
An impedance analyzer was used to measure the dielectric loss (tangent delta) at 1 kHz. The dielectric loss (tangent delta) of the piezoelectric film according to Example 1 was 5.2%. This means that the piezoelectric film according to Example 1 had a small leak current property.
(Evaluation of Ferroelectric Property)
A potential difference was applied between the first electrode 13 and the second electrode 17 to evaluate the ferroelectric property of the piezoelectric film according to Example 1.
The experiment identical to that of Example 1 was performed except that x=0.40.
The experiment identical to that of Example 1 was performed except that x=0.29.
The experiment identical to that of Example 1 was performed except that the 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350) was not formed.
The piezoelectric property of the piezoelectric film according to Comparative Example 1 is shown in
The experiment identical to that of Example 1 was performed except that an interface layer made of (Na0.5Bi0.5)TiO3 was used instead of the 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350).
The experiment identical to that of Example 1 was performed except that x=0.425.
The experiment identical to that of Example 1 was performed except that x=0.280.
The experiment identical to that of Example 1 was performed except that an interface layer made of TiO2 was used instead of the 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350).
The experiment identical to that of Example 1 was performed except that an interface layer made of Bi4TiO3O12 was used instead of the 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350).
The experiment identical to that of Example 1 was performed except that an interface layer made of Na2TiO3 was used instead of the 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350).
The experiment identical to that of Example 1 was performed except that an interface layer made of BaTiO3 was used instead of the 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350).
The experiment identical to that of Example 1 was performed except that an interface layer made of Bi4Ti3O12—BaTiO3 was used instead of the 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350).
The experiment identical to that of Example 1 was performed except that an interface layer made of Na2TiO3—BaTiO3 was used instead of the 0.93(NaxBi0.5)TiO0.5x+2.75-0.07BaTiO3 layer 14 (x=0.350).
The experimental results of Examples 1 to 3 and Comparative Examples 1 to 10 are summarized in Table 1.
Table 1 shows that the (NaxBi0.5)TiO0.5x+2.75—BaTiO3 layer 14 (0.29≦x≦0.40) having only a (110) orientation improves the (110) peak intensity and the piezoelectric constant of the (Bi0.5Na0.5)TiO3—BaTiO3 layer 15 having only a (110) orientation.
Example 2 and Comparative Example 3 mean that the value of x is required to be not more than 0.4.
Example 3 and Comparative Example 4 mean that the value of x is required to be not less than 0.29.
The BNT-BT piezoelectric film according to the present invention is used for an ink jet head, an angular velocity sensor, and a piezoelectric generating element.
Number | Date | Country | Kind |
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2011-089868 | Apr 2011 | JP | national |
This is a continuation of International Application No. PCT/JP2012/000135, with an international filing date of Jan. 12, 2012, which claims priority of Japanese Patent Application No. 2011-089868, filed on Apr. 14, 2011, the contents of which are hereby incorporated by reference.
Number | Date | Country | |
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Parent | PCT/JP2012/000135 | Jan 2012 | US |
Child | 13616125 | US |