Claims
- 1. A plasma discharge truing apparatus comprising a conductive grindstone for processing a workpiece, a circular disk discharge electrode with an outer rim that can access a surface to be processed by the conductive grindstone, an electrode rotating device that drives and rotates the discharged electrode around shaft center Z thereof, a position controlling device for controlling the relative position between the outer rim of the electrode and the grindstone, a voltage applying device to apply predetermined voltage pulses between the grindstone and the electrode, and a mist-supplying device for supplying pressurized conductive mist between the grindstone and the electrode, wherein the pressurized conductive mist comprises a mixture of low-conductivity aqueous liquid and compressed air.
- 2. A fine-machining method, comprising:(A) plasma discharge truing a conductive grindstone with a circular disk electrode having an outer rim that can access a surface to be processed of a conductive grindstone, and an electrode rotating device that drives and rotates the discharge electrode around shaft center Z thereof, wherein while a pressurized conductive mist is supplied between the grindstone and the electrode, DC voltage pulses are applied between the conductive grindstone and the discharge electrode, thereby trimming the surface to be processed, wherein said pressurized conductive mist comprises a mixture of low-conductivity aqueous solution and compressed air; (B) electrolytically dressing the conductive grindstone with a dressing electrode having a surface opposite the surface to be processed on the conductive grindstone and having a spacing, said dressing achieved by supplying a conductive liquid between the grindstone and the pressing electrode while a DC voltage is applied between the conductive grindstone and the dressing electrode, whereby the conductive grindstone is electrolytically dressed; and (C) grinding a workpiece with the conductive grindstone.
- 3. A plasma discharge truing apparatus comprising a conductive grindstone for processing a workpiece, a circular disk discharge electrode with an outer rim that can access a surface to be processed by the conductive grindstone, an electrode rotating device that drives and rotates the discharged electrode around shaft center Z thereof, a position controlling device for controlling the relative position between the outer rim of the electrode and the grindstone, a voltage applying device to apply predetermined voltage pulses between the grindstone and the electrode, and a mist-supplying device for supplying pressurized conductive mist between the grindstone and the electrode, wherein the mist-supplying device supplies a mixture of low-conductivity aqueous liquid and compressed air.
Priority Claims (1)
Number |
Date |
Country |
Kind |
11-055907 |
Mar 1999 |
JP |
|
Parent Case Info
This application claims priority of Japanese Patent Application No. 11-055907, filed Mar. 3, 1999, the entire disclosure of which is incorporated herein by reference.
Foreign Referenced Citations (5)
Number |
Date |
Country |
63-283861 |
Nov 1988 |
JP |
4-53677 |
Feb 1992 |
JP |
5-277937 |
Oct 1993 |
JP |
6-114732 |
Apr 1994 |
JP |
6-114733 |
Apr 1994 |
JP |