Plasma generation electrode, plasma reactor, and exhaust gas cleaning apparatus

Abstract

A plasma generation electrode capable of subjecting predetermined components contained in a fluid to be treated to their respective reaction treatments with plasmas having different intensities optimized on a reaction basis, by passing merely once the fluid to be treated, is provided. In the plasma generation electrode, a unit electrode is composed of a tabular ceramic material serving as a dielectric material and an electrically conductive film disposed in the inside of the ceramic material, a plurality of unit electrodes are layered at a constant spacing, the distance between the electrically conductive films disposed in the unit electrodes adjacent to each other is varied partly or the dielectric constant of the ceramic material constituting the unit electrode is varied partly, and plasmas having different intensities can be generated partly in the spaces.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1( a)(b) schematically show a plasma generation electrode according to an embodiment of the present invention, FIG. 1(a) is a sectional view of the section cut along a plane perpendicular to one direction (gas passing direction), and FIG. 1(b) is a sectional view of the section taken along a line A-A′ shown in FIG. 1(a);

FIG. 2 shows a part of a plasma generation electrode according to an embodiment of the present invention, and is a sectional view schematically showing three unit electrodes adjacent to each other;

FIG. 3 is a plan view schematically showing an electrically conductive film constituting a plasma generation electrode according to an embodiment of the present invention;

FIG. 4 shows a part of a plasma generation electrode according to another embodiment of the present invention, and is a sectional view schematically showing three unit electrodes adjacent to each other;

FIG. 5 shows a part of a plasma generation electrode according to another embodiment of the present invention, and is a sectional view schematically showing three unit electrodes adjacent to each other;

FIG. 6 shows a part of a plasma generation electrode according to another embodiment of the present invention, and is a sectional view schematically showing three unit electrodes adjacent to each other;

FIG. 7 is a plan view schematically showing a unit electrode to be used in a plasma generation electrode according to another embodiment of the present invention;

FIG. 8 shows a part of a plasma generation electrode according to another embodiment of the present invention, and is a sectional view schematically showing three unit electrodes adjacent to each other;

FIG. 9 is a sectional view schematically showing the state, in which unfired ceramic materials and an electrically conductive film are layered, for explaining a production step of a plasma generation electrode according to the present invention;

FIG. 10 is a sectional view schematically showing a plasma reactor according to an embodiment of the present invention;

FIG. 11 is an explanatory diagram schematically showing an exhaust gas cleaning apparatus according to an embodiment of the present invention;

FIGS. 12( a)(b) schematically show a known plasma generation electrode, FIG. 12(a) is a sectional view of the section cut along a plane perpendicular to one direction (gas passing direction), and FIG. 12(b) is a sectional view of the section taken along a line B-B′ shown in FIG. 12(a); and

FIGS. 13( a) (b) schematically show a known plasma generation electrode, FIG. 13(a) is a sectional view of the section cut along a plane perpendicular to one direction (gas passing direction), and FIG. 13(b) is a sectional view of the section taken along a line C-C′ shown in FIG. 13(a).

Claims

1. A plasma generation electrode comprising: a plurality of unit electrodes hierarchically layered at a predetermined spacing, andspaces, which are disposed between the unit electrodes and in which at least one end in one direction (gas passing direction) is opened and both ends of the other direction are closed,

2. The plasma generation electrode according to claim 1, wherein the dielectric constant of the ceramic material in the portion from the one end side up to a 10-percent to 90-percent point of the entire length of each of the unit electrodes in the gas passing direction is different from the dielectric constant of the ceramic material in the remaining portion of the unit electrode.

3. The plasma generation electrode according to claim 1, wherein the distance between the electrically conductive films adjacent to each other in the portion from the one end side up to a 10-percent to 90-percent point of the entire length-in the gas passing direction is different from the distance between the electrically conductive films adjacent to each other in the remaining portion.

4. The plasma generation electrode according to claim 3, wherein with respect to the electrically conductive films in the remaining portion, the distance between the electrically conductive films adjacent to each other is further varied partly.

5. The plasma generation electrode according to claim 1, wherein at least a part of successive three layers of unit electrodes are disposed in such a way that the distance between an electrically conductive film disposed in a unit electrode (second unit electrode) constituting the middle layer and an electrically conductive film disposed in a unit electrode (first unit electrode) constituting the layer on one surface side of the second unit electrode is different from the distance between the electrically conductive film disposed in the second unit electrode and an electrically conductive film disposed in a unit electrode (third unit electrode) constituting the layer on the other surface side of the second unit electrode,one end side in the gas passing direction of a space (first space) disposed between the first unit electrode and the second unit electrode is closed and the other end side in the gas passing direction of a space (second space) disposed between the second unit electrode and the third unit electrode is closed,at least one through hole in the direction of the normal is disposed in the second unit electrode, anda gas is allowed to enter from the non-closed end side of the first space, pass the through hole, and exit from the non-closed end side of the second space.

6. The plasma generation electrode according to claim 1, wherein the distance between the electrically conductive films adjacent to each other is constant throughout the electrically conductive films, andthe distance between a part of the electrically conductive films adjacent to each other is different from the distance between the other electrically conductive films adjacent to each other.

7. A plasma reactor comprising the plasma generation electrode according to claim 1, wherein when a gas containing predetermined components is introduced into the spaces disposed between the plurality of unit electrodes constituting the plasma generation electrode, the predetermined components in the gas can be reacted by plasmas generated in the spaces.

8. The plasma reactor according to claim 7, wherein when the gas containing the predetermined components is introduced into the spaces, each of the gas components is reacted in a portion where the intensity of a plasma is suitable for the reaction of each of the gas components, while plasmas having different intensities are generated partly in the spaces.

9. An exhaust gas cleaning apparatus comprising the plasma reactor according to claim 7 and a catalyst, wherein the plasma reactor and the catalyst are disposed in the inside of an exhaust system of an internal-combustion engine.