Plasma processing method and color filter manufactured by using the same and process for manufacturing color filter by using the same

Abstract

The present invention provides a plasma processing method capable of being used for manufacturing color filters which are substantially free from defects such as white spots and color mixture of inks and color filters manufactured by using the same. A plasma processing device according to the present invention comprises a stage mainly acting also as a lower electrode; and a head electrode in which an upper electrode is stored and from which plasma raw material gas is ejected. By ejecting plasma raw material gas from the head electrode, applying voltage between the stage and the head electrode by an alternate power source to induce plasma electric discharge and by scanning over a workpiece material (glass substrate) by the head electrode, the workpiece material (glass substrate) is subjected to the plasma processing. When delivering the workpiece material (glass substrate) to the next process after the plasma processing has been completed, a lifting frame contacting with the periphery of the workpiece material (glass substrate) is used.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a view showing the outline of the essential parts of a plasma processing device 10 used in a plasma processing method according to an embodiment of the present invention;

FIG. 2 is a perspective view showing a plasma processing device 10 used in a plasma processing method according to an embodiment of the present invention;

FIG. 3 is an enlarged sectional view schematically showing a workpiece material (glass substrate) 16;

FIG. 4 is an enlarged sectional view schematically showing a state in which a head electrode 11 is scanning over the workpiece material (glass substrate) 16 with being driven by a driving source (not shown);

FIG. 5 is an enlarged sectional view showing the workpiece material (glass substrate) 16 which has been subjected to an ink film forming step;

FIG. 6 is an enlarged sectional view schematically showing the head electrode 11 arranged opposed to a stage (lower electrode) 13;

FIG. 7 is a view showing a state in which the workpiece material (glass substrate) 16 is lifted by a lifting frame 14 in the plasma processing device 10 used in the plasma processing method according to the present embodiment;

FIG. 8 is a view showing the outline of the essential parts of a plasma processing device 10′ in a plasma processing method according to another embodiment of the present invention;

FIG. 9 is a perspective view showing the plasma processing device 10′ in the plasma processing method according to another embodiment of the present invention;

FIG. 10 is a view showing the outline of the essential parts of a conventional normal pressure plasma processing device 50 having been used in the manufacturing step of color filters;

FIG. 11 is a view showing a state in which the workpiece material (glass substrate) 56 having been lifted by a lift pin 54 in the conventional normal pressure plasma processing device 50;

FIG. 12A is a perspective showing the conventional normal pressure plasma processing device 50 used in the manufacturing step of color filters; and

FIG. 12B is an enlarged view showing the workpiece material (glass substrate) 56 laid on the stage (lower electrode) 53 on the periphery of the lift pin 54.

Claims

1. A plasma processing method, comprising the steps of: laying a workpiece material on a lower electrode of opposing electrode composed of an upper electrode and a lower electrode;plasma-processing the workpiece material by means of plasma generated by introducing gas for plasma processing between the upper electrode and the lower electrode and applying voltage between the upper electrode and the lower electrode; andlifting the plasma-processed workpiece material by lifting means from the lower electrode on which the workpiece material is placed,wherein the lifting means contacts with the portion of the workpiece material other than effective utilization areas thereof.

2. The plasma processing method according to claim 1, wherein the lifting means contacts with the periphery of the workpiece material that is an area other than the effective utilization areas thereof.

3. The plasma processing method according to claim 2, wherein the lifting means contacts with two sides of the periphery of the workpiece material that is an area other than the effective utilization areas thereof.

4. The plasma processing method according to claim 2, wherein the lifting means contacts with four sides of the periphery of the workpiece material that is an area other than the effective utilization areas thereof.

5. The plasma processing method according to any of claims 1 to 4, wherein the lifting means does not come into contact with the workpiece material at the time of plasma processing.

6. The plasma processing method according to any of claims 1 to 5, wherein the lifting means includes a lift pin coming into contact with the workpiece material in the area of the lower electrode.

7. A color filter manufactured by means of a plasma processing method according to any of claims 1 to 6.

8. Process for manufacturing color filter by means of a plasma processing method according to any of claims 1 to 6.