BRIEF DESCRIPTION OF THE DRAWINGS
In the accompanying drawings:
FIG. 1 is a vertical sectional view showing an outline of a plasma processing apparatus according to a first embodiment for embodying a plasma processing method of the present invention;
FIG. 2 is a cross sectional view showing a structure of a scanning head having a first electrode shown in FIG. 1;
FIG. 3 is a cross sectional view taken along the line III-III in FIG. 1;
FIG. 4 is a cross sectional view showing an elemental structure of a second embodiment according to the present invention as viewed in the same manner as in FIG. 3;
FIG. 5 is cross sectional view showing an elemental structure of a third embodiment according to the present invention as viewed in the same manner as in FIG. 3;
FIG. 6 is a schematically enlarged cross sectional view of a color filter, in which FIG. 6A is a cross sectional view showing a normal color filter, FIG. 6B is a cross sectional view showing a color filter causing a color void, and FIG. 6C is a cross sectional view showing a color filter causing a color mixing; and
FIG. 7 is a cross sectional view showing an outline of a conventional plasma processing apparatus for embodying a conventional plasma processing method as viewed in the same manner as in FIG. 3.