Claims
- 1. Apparatus for effecting a plasma treatment of a resin molding to improve surface quality, comprising:
- a treatment chamber for containing said resin molding,
- means for introducing a remotely formed plasma into said chamber for developing ions in said chamber,
- means for measuring ion density in said chamber,
- means for integrating the measured ion density, and
- means for stopping the introduction of remotely formed plasma into said chamber by said introducing means when ion density integration reaches a predetermined value.
- 2. Apparatus as in claim 1, further including means for presetting said predetermined value and comparator means for receiving said predetermined value and an output from said integrating means for applying a stop signal to said plasma introducing means when said output reaches said predetermined value.
Priority Claims (1)
Number |
Date |
Country |
Kind |
1-225078 |
Aug 1989 |
JPX |
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Parent Case Info
This is a division of application Ser. No. 07/572,624, filed Aug. 27, 1990.
US Referenced Citations (6)
Foreign Referenced Citations (2)
Number |
Date |
Country |
63-069987 |
Mar 1988 |
JPX |
2052339 |
Jan 1981 |
GBX |
Non-Patent Literature Citations (1)
Entry |
"Plasma Etching in Semiconductor Fabrication"; Russ A. Morgan; .COPYRGT.1985 pp. 143-203. |
Divisions (1)
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Number |
Date |
Country |
Parent |
572624 |
Aug 1990 |
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