Claims
- 1. The product comprising a platinum film resistor produced by the process comprising the steps of:
- providing a silicon substrate;
- growing a layer of silicon dioxide upon at least one surface of said substrate;
- sputter etching said layer of silicon dioxide to produce a plurality of etch pits upon one surface thereof;
- sputtering depositing a first quantity of platinum upon said surface of said layer of silicon dioxide at a first sputter power level and first time period;
- sputter depositing a second quantity of platinum upon said first quantity of platinum at a second sputter power level and second time period;
- sputter depositing a layer of quartz over said platinum;
- producing openings in said layer of quartz in a predetermined configuration;
- sputter etching portions of said platinum through said openings in said layer of quartz; and
- attaching one or more leads to the remaining portions of said platinum.
- 2. The product of claim 1 wherein said first power level is greater than said second power level and said first time period is less than said second time period.
- 3. The product of claim 2 further comprising the step of: annealing said platinum.
- 4. The product of claim 3 further comprising the step of: depositing a second layer of quartz.
- 5. The product of claim 3 wherein said step of sputter etching said layer of silicon dioxide comprises:
- sputter etching said layer of silicon dioxide with a minimum sputtering power level of 2 watts per square inch.
- 6. The product of claim 5 wherein said first power level is in the range of 50 to 100 watts per square inch and said first time period is in the range of 2 to 20 seconds.
Parent Case Info
This application is a continuation of Ser. No. 610,012, filed Sept. 3, 1975 now abandoned.
Government Interests
The invention herein described was made in the course of or under a contract or subcontract thereunder with the Department of Defense.
US Referenced Citations (5)
Non-Patent Literature Citations (1)
Entry |
Bolker, B. F. T. and Sidles, P. H.; Thin-Film Platinum Resistance Thermometers--Fabrication and Use; J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. 1977, pp. 205-209. |
Continuations (1)
|
Number |
Date |
Country |
Parent |
610012 |
Sep 1975 |
|