Polarizing beam splitter

Information

  • Patent Grant
  • 7289267
  • Patent Number
    7,289,267
  • Date Filed
    Thursday, July 29, 2004
    20 years ago
  • Date Issued
    Tuesday, October 30, 2007
    17 years ago
Abstract
A polarizing beam splitter having a film made of a high-refractivity material and a film made of a low-refractivity material alternately stacked on a substrate. When an incidence angle with respect to a film surface in a particular wavelength is set as θ (°), the following conditional expressions are satisfied in the range of 40≦θ≦50(°):0.99≦Rs(45)/Rs(θ)≦1.04, 0.96≦Tp(45)/Tp(θ)≦1.05, where Rs(θ): reflectivity of polarized light s at a θ incidence; Tp(θ) transmissivity of polarized light p at a θ incidence angle; Rs(45): reflectivity of polarized light s at a 45° incidence angle; and, Tp(45) transmissivity of polarized light p at a 45° incidence angle. The transmissivity of the polarized light p does not decrease and the reflectivity of the polarized light s is nearly 100% with respect to even a broad angle region.
Description

The present application claims priority to Japanese Patent Application No. 2003-284722 filed Aug. 1, 2003, the entire content of which is hereby incorporated by reference.


BACKGROUND OF THE INVENTION

1. Field of the Invention


The present invention relates to a polarizing beam splitter, and more particularly to a polarizing beam splitter and a polarizing beam splitter film. The polarizing beam splitter may be suitable for, for example, a light pickup optical system using a blue laser, a projection optical system, or the like.


2. Description of the Related Art


A light pickup optical system for a blue region requires a polarizing beam splitter having polarization separation characteristics such that a transmissivity of a polarized light p and a reflectivity of a polarized light s in a wavelength region of around 405 nm are both nearly 100%. Currently, however, the divergence angle of a blue laser is significant. Therefore, when an ordinary polarizing beam splitter film is used, the transmissivity of the polarized light p is largely decreased due to varying the angle of incidence.


Japanese Unexamined Patent Publication Nos. 08-146218 and 09-184916 disclose polarizing beam splitters having predetermined polarization separation characteristics with respect to even a broad angle region, where a divergence angle of incident light is ±5° or above. For example, a polarizing beam splitter film disclosed in No. 09-184916 includes a first stack constituting 0.8×λ/4≦H≦1×λ/4 and 0.7×λ/4≦L≦1×λ/4, and a second stack constituting 1.3×λ/4≦H≦1.5×λ/4 and 1.2×λ/4≦L≦1.5×λ/4, where λis central wavelength of a split light, H is an optical film thickness of a film made of a high-refractivity material, and L is an optical film thickness of a film made of a low-refractivity material.


However, in the case of the polarizing beam splitter films disclosed in No. 08-146218 and No. 9-184916, an angle dependency of the polarized light scan only be controlled at approximately 20% in terms of the transmissivity, which shows insufficient polarization separation characteristics. Thus, when the polarizing beam splitter film is used in a light pickup optical system using a blue laser, projection optical system, or the like, there is a problem of a decreased light quantity.


SUMMARY OF THE INVENTION

A main object of the present invention is to provide a polarizing beam splitter and a polarizing beam splitter film capable of preventing a transmissivity of a polarized light p from decreasing while maintaining a reflectivity of a polarized light s at nearly 100% with respect to even a broad angle region, where a divergence angle of an incident light is ±5° or above.


In order to achieve the foregoing object and other objects as well, a polarizing beam splitter is disclosed having a multilayer structure, wherein a film made of a high-refractivity material and a film made of a low-refractivity are alternately stacked on a substrate, satisfying the following conditional expressions 1A and 1B in an entire range of 40≦θ≦50 (°) when an incidence angle with respect to a film surface in a particular wavelength is set to be θ (°).

0.99≦Rs(45)/Rs(θ)≦1.04  1A
0.96≦Tp(45)/Tp(θ)≦1.05  1B


providing that,


Rs(θ): reflectivity of polarized light s at an incidence angle of θ


Tp(θ): transmissivity of polarized light p at an incidence angle of θ


Rs(45): reflectivity of polarized light s at the incidence angle of 45°.


Tp(45): transmissivity of polarized light p at the incidence angle of 45°.


The invention itself, together with further objects and attendant advantages, will best be understood by reference to the following detailed description taken in conjunction with the accompanying drawings.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 is a graph showing a spectral characteristic with respect to an incidence angle according to an embodiment 1 of the present invention;



FIG. 2 is a graph showing a spectral characteristic with respect to a wavelength according to the embodiment 1;



FIG. 3 is a graph showing a spectral characteristic with respect to an incidence angle according to an embodiment 2 of the present invention; and



FIG. 4 is a graph showing a spectral characteristic with respect to a wavelength according to the embodiment 2.





In the following description, like components are designated by like reference numbers throughout the several drawings.


DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Hereinafter, a polarizing beam splitter and a polarizing beam splitter film embodied by the present invention are described referring to the drawings. Tables 1 and 2 respectively show multilayer films according to embodiments 1 and 2 (QWOT=4·n·d/λ, d: physical film thickness, n: refractivity, λ: wavelength) as the polarizing beam splitter film according to the present invention. In the embodiment 1, a film made of a high-refractivity material, such as TiO2 (titanium oxide), and a film made of a low-refractivity material, such as SiO2 (silicon oxide), are alternately stacked to thereby form 33 layers on a glass substrate having the refractivity of 1.64 in the order of layer numbers. In the embodiment 2, a film made of a blended material TX including a high-refractivity material, such as TiO2 (titanium oxide), and a film made of a low-refractivity material, such as MgF2 (magnesium fluoride) or SiO2 (silicon oxide), are alternately stacked to thereby form 25 layers on a glass substrate having the reflectivity of 1.64 in the order of the layer numbers.


In the case of the polarizing beam splitter film comprised of the film made of the high-refractivity material and the film made of the low-refractivity material alternately stacked as in the embodiments 1 and 2, it is preferable to satisfy the following conditional expressions 1A and 1B in an entire range of 40≦θ≦50 (°) when an incidence angle with respect to a film surface in a particular wavelength is set to be θ (°).

0.99≦Rs(45)/Rs(θ)≦1.04  1A
0.96≦Tp(45)/Tp(θ)≦1.05  1B


providing that,


Rs(θ): reflectivity of polarized light s at an incidence angle of θ


Tp(θ): transmissivity of polarized light p at an incidence angle of θ


Rs(45): reflectivity of polarized light s at the incidence angle of 45°


Tp(45): transmissivity of polarized light p at the incidence angle of 45°


Tables 3 and 4 show data according to respective embodiments in the case of wavelength λ=405 nm and 40≦θ≦50 (°): reflectivity Rs (θ) of polarized light s and transmissivity Tp (θ) of polarized light p, and data corresponding to parameters regulated in the conditional expressions 1A and 1B. As shown in tables 3 and 4, the embodiments 1 and 2 satisfy the conditional expressions 1A and 1B in the entire range of 40≦θ≦50 (°) Thus, when the conditional expressions 1A and 1B are satisfied in the entire range of 40≦θ≦50 (°), the transmissivity of the polarized light p can be prevented from decreasing while maintaining the reflectivity of the polarized light s at nearly 100% with respect to even a broad angle region, where a divergence angle of an incident light is ±5° or above.


As described, in order to satisfy the conditional expressions 1A and 1B in the entire range of 40≦θ≦50 (°), it is preferable to have at least a stack comprised of a film made of a high-refractivity material satisfying the following conditional expression 2A and a film made of a low-refractivity material satisfying the following conditional expression 2B alternately stacked in two or more repetitive cycles, providing that a pair of a layer of the film made of the high-refractivity material and a layer of the film made of the low-refractivity material constitutes a cycle.

0.7×λ/4≦H≦1×λ/4  2A
1×λ/4≦L≦2×λ/4  2B


providing that,


H: optical film thickness of film made of high-refractivity material


L: optical film thickness of film made of low-refractivity material


λ: central wavelength of split light


In the embodiment 1, a multilayer structure comprised of layers from a 16th layer through a 27th layer (layer No. 16-27) constitutes a stack. The stack is comprised of a film made of TiO2 satisfying the conditional expression 2A and a film made of SiO2 satisfying the conditional expression 2B alternately stacked in six repetitive cycles. In the embodiment 2, a multilayer structure comprised of layers from a 3rd layer through a 14th layer (layer No. 3-14) constitutes a stack. The stack is comprised of a film made of TX satisfying the conditional expression 2A and a film made of SiO2 or MgF2 satisfying the conditional expression 2B alternately stacked in six repetitive cycles. The adoption of such a configuration having a discriminative stack is capable of arranging an angle dependency of the polarized light s to invariably lead to the transmissivity of approximately 0%. Therefore, in an optical system, in which the polarized lights p and s are required to be sufficiently polarized and separated despite the divergence angle of the incident light being large (for example, light pickup optical system using blue laser, projection optical system, or the like), a quantity of light and optical performance can be dramatically improved.



FIGS. 1 and 2 show the polarization separation characteristics according to the embodiment 1 by means of the transmissivity T (%). FIG. 1 shows Tp (θ), which is the transmissivity of the polarized light p, and Ts (θ), which is the transmissivity of the polarized light s where the wavelength λ=405 nm and the incidence angle with respect to the film surface θ=40-50° FIG. 2 shows Tp (θ), which is the transmissivity of the polarized light p, and Ts (θ), which is the transmissivity of the polarized light s where the wavelength θ=300-500 nm and the incidence angle with respect to the film surface θ=40°, 45°, and 50°. FIGS. 3 and 4 show the polarization separation characteristics according to the embodiment 2 by means of the transmissivity T (%). FIG. 3 shows Tp (θ), which is the transmissivity of the polarized light p, and Ts (θ), which is the transmissivity of the polarized light s where the wavelength λ=405 nm and the incidence angle with respect to the film surface θ=40-50°. FIG. 4 shows Tp (θ), which is the transmissivity of the polarized light p and Ts (θ), which is the transmissivity of the polarized light s in where the wavelength λ=300-500 nm and the incidence angle with respect to the film surface θ=40°, 45°, and 50°. As shown in FIGS. 1 through 4, any of the embodiments have the polarization separation characteristics suitable for the polarizing beam splitter using a blue laser.









TABLE 1







Example 1














Physical film




Layer

thickness
QWOT



No.
Material
d (nm)
(4 · n · d/λ)
















1
SiO2
131.17
1.900



2
TiO2
77.41
1.924



3
SiO2
122.38
1.773



4
TiO2
58.06
1.443



5
SiO2
129.01
1.869



6
TiO2
66.92
1.663



7
SiO2
110.94
1.607



8
TiO2
55.71
1.385



9
SiO2
110.13
1.595



10
TiO2
65.6
1.631



11
SiO2
140.19
2.031



12
TiO2
62.1
1.543



13
SiO2
95.96
1.390



14
TiO2
34.82
0.865



15
SiO2
65.77
0.953



16
TiO2
32.51
0.808



17
SiO2
78.93
1.143



18
TiO2
39.28
0.976



19
SiO2
87.41
1.266



20
TiO2
37.04
0.921



21
SiO2
82.48
1.195



22
TiO2
32.38
0.805



23
SiO2
84.14
1.219



24
TiO2
34.71
0.863



25
SiO2
88.87
1.287



26
TiO2
35.27
0.877



27
SiO2
79.75
1.155



28
TiO2
31.22
0.776



29
SiO2
280.41
4.062



30
TiO2
31.47
0.782



31
SiO2
89.89
1.302



32
TiO2
95.96
2.385



33
SiO2
69.04
1.000

















TABLE 2







Example 2














Physical film




Layer

thickness
QWOT



No.
Material
d (nm)
(4 · n · d/λ)
















1
TX
169.7
3.555



2
MgF2
263.76
3.608



3
TX
38.96
0.816



4
SiO2
94.45
1.368



5
TX
40.59
0.851



6
MgF2
106.31
1.454



7
TX
42.69
0.894



8
SiO2
97.01
1.405



9
TX
39.52
0.828



10
SiO2
87.8
1.272



11
TX
39.26
0.823



12
MgF2
103.89
1.421



13
TX
39.6
0.830



14
SiO2
107.87
1.563



15
TX
60.45
1.266



16
MgF2
179.6
2.457



17
TX
20.82
0.436



18
SiO2
195.14
2.827



19
TX
18.29
0.383



20
MgF2
177.36
2.426



21
TX
58.69
1.230



22
SiO2
122.25
1.771



23
TX
53.07
1.112



24
SiO2
364.74
5.283



25
TX
74.08
1.552

















TABLE 3







Example 1











θ






(°)
Rs (θ)
Tp (θ)
(1A): Rs(45)/Rs(θ)
(1B): Tp(45)/Tp(θ)














40
99.954
98.921
1.000
1.008


41
99.974
99.475
1.000
1.002


42
99.989
99.928
1.000
0.997


43
99.995
99.397
1.000
1.003


44
99.997
99.102
1.000
1.006


45
99.998
99.668
1.000
1.000


46
99.999
99.634
1.000
1.000


47
100.000
99.337
1.000
1.003


48
100.000
99.876
1.000
0.998


49
100.000
99.306
1.000
1.004


50
100.000
98.746
1.000
1.009
















TABLE 4







Example 2











θ






(°)
Rs (θ)
Tp (θ)
(1A): Rs(45)/Rs(θ)
(1B): Tp(45)/Tp(θ)














40
98.181
94.420
1.015
1.013


41
98.915
95.145
1.008
1.005


42
99.357
95.898
1.003
0.997


43
99.555
96.272
1.001
1.993


44
99.641
95.287
1.000
1.004


45
99.679
95.628
1.000
1.000


46
99.694
97.733
1.000
0.978


47
99.689
96.687
1.000
0.989


48
99.548
96.584
1.001
0.990


49
99.630
97.456
1.000
0.981


50
99.666
94.110
1.000
1.016









Although the present invention has been fully described by way of examples with reference to the accompanying drawings, it is to be noted that various changes and modifications will be apparent to those skilled in the art. Therefore, unless such changes and modifications depart from the scope of the present invention, they should be construed as being included therein.

Claims
  • 1. A polarizing beam splitter comprising: a substrate; and,a multilayer structure having: a film made of a high-refractivity material; and,a film made of a low-refractivity material,the film made of a high-refractivity material and the film made of the low-refractivity material being alternately stacked on the substrate,the multilayer structure satisfying the following conditional expressions 1A, 1B, and 1C are satisfied in an entire range of 40≦θ≦50 (°) when an incidence angle with respect to a film surface in a particular wavelength is θ (°): 0.99≦Rs(45)/Rs(θ)≦1.04  1A0.96≦Tp(45)/Tp(θ)≦1.05  1BTp>90.00%  1Cwhere,Rs(θ): reflectivity of polarized light s at an incidence angle of θ;Tp(θ): transmissivity of polarized light p at an incidence angle of θ;Rs (45): reflectivity of polarized light s at the incidence angle of 45°; and,Tp(45): transmissivity of polarized light p at the incidence angle of 45°.
  • 2. A polarizing beam splitter as claimed in claim 1, wherein the multilayer structure has at least a stack comprising: a film made of a high-refractivity material satisfying the following conditional expression 2A; and,a film made of a low-refractivity material satisfying the following conditional expression 2B alternately stacked in at least two repetitive cycles, where: 0.7×λ/4≦H≦1×λ/4  2A1×λ/4≦L≦2×λ/4  2Bwhere,H: optical film thickness of film made of high-refractivity material;L: optical film thickness of film made of low-refractivity material; and,λ: central wavelength of split light.
  • 3. A polarizing beam splitter as claimed in claim 2, wherein the high-refractivity material is TiO2 and the low-refractivity material is SiO2.
  • 4. A polarizing beam splitter as claimed in claim 2, wherein the high-refractivity material is a blended material including TiO2 and the low-refractivity material is selected from the group consisting of SiO2 and MgF2.
  • 5. A polarizing beam splitter as claimed in claim 1, the multilayer structure further satisfying the condition that Tp≧94.11%.
  • 6. A polarizing beam splitter as claimed in claim 5, wherein the multilayer structure has at least a stack comprising: a film made of a high-refractivity material satisfying the following conditional expression 2A; and,a film made of a low-refractivity material satisfying the following conditional expression 2B alternately stacked in at least two repetitive cycles, where: 0.7×λ/4≦H≦1×λ/4  2A1×λ/4≦L≦2×λ/4  2Bwhere,H: optical film thickness of film made of high-refractivity material;L: optical film thickness of film made of low-refractivity material; and,λ: central wavelength of split light.
  • 7. A polarizing beam splitter as claimed in claim 5, wherein the multilayer structure has at least a stack comprising: a film made of a high-refractivity material satisfying the following conditional expression 2A; and,a film made of a low-refractivity material satisfying the following conditional expression 2B alternately stacked in at least six repetitive cycles, where: 0.7×λ/4≦H≦1×λ/4  2A1×λ/4≦L≦2×λ/4  2Bwhere,H: optical film thickness of film made of high-refractivity material;L: optical film thickness of film made of low-refractivity material; and,λ: central wavelength of split light.
  • 8. A polarizing beam splitter as claimed in claim 5, wherein the multilayer structure has at least a stack comprising: a film made of a high-refractivity material satisfying the following conditional expression 2A; and,a film made of a low-refractivity material satisfying the following conditional expression 2B alternately stacked in at least two repetitive cycles, where: 0.7×λ/4≦H≦1×λ/4  2A1×λ/4≦L≦2×λ/4  2Bwhere,H: optical film thickness of film made of high-refractivity material;L: optical film thickness of film made of low-refractivity material; and,λ: central wavelength of split light.
  • 9. A polarizing beam splitter as claimed in claim 5, wherein the multilayer structure has at least a stack comprising: a film made of a high-refractivity material satisfying the following conditional expression 2A; and,a film made of a low-refractivity material satisfying the following conditional expression 2B alternately stacked in at least six repetitive cycles, where: 0.7×λ/4≦H≦1×λ/4  2A1×λ/4≦L≦2×λ/4  2Bwhere,H: optical film thickness of film made of high-refractivity material;L: optical film thickness of film made of low-refractivity material; and,λ: central wavelength of split light.
  • 10. A polarizing beam splitter as claimed in claim 1, wherein the multilayer structure has at least a stack comprising: a film made of a high-refractivity material satisfying the following conditional expression 2A; and,a film made of a low-refractivity material satisfying the following conditional expression 2B alternately stacked in at least six repetitive cycles, where: 0.7×λ/4≦H≦1×λ/4  2A1×λ/4≦L≦2×λ/4  2Bwhere,H: optical film thickness of film made of high-refractivity material;L: optical film thickness of film made of low-refractivity material; and,λ : central wavelength of split light.
  • 11. A polarizing beam splitter as claimed in claim 10, wherein the high-refractivity material is TiO2 and the low-refractivity mater is SiO2.
  • 12. A polarizing beam splitter as claimed in claim 10, wherein the high-refractivity material is a blended material including TiO2 and the low-refractivity material is selected form the group consisting of SiO2 and MgF2.
  • 13. A polarizing beam splitter as claimed in claim 1, wherein a central wavelength of light being split by the polarizing beam splitter is 405 nm.
  • 14. A polarizing beam splitter as claimed in claim 1, wherein the multilayer structure has at least a stack comprising: a film made of a high-refractivity material satisfying the following conditional expression 2A; and,a film made of a low-refractivity material satisfying the following conditional expression 2B alternately stacked in at least two repetitive cycles, where: 0.7×λ/4≦H≦1×λ/4  2A1×λ/4≦L≦2×λ/4  2Bwhere,H: optical film thickness of film made of high-refractivity material;L: optical film thickness of film made of low-refractivity material; and,λ: central wavelength of split light.
  • 15. A polarizing beam splitter as claimed in claim 14, wherein the high-refractivity material is TiO2 and the low-refractivity material is SiO2.
  • 16. A polarizing beam splitter as claimed in claim 14, wherein the high-refractivity material is a blended material including TiO2 and the low-refractivity material is selected from the group consisting of SiO2 and MgF2.
  • 17. A polarizing beam splitter as claimed in claim 1, wherein the multilayer structure has at least a stack comprising: a film made of a high-refractivity material satisfying the following conditional expression 2A; and,a film made of a low-refractivity material satisfying the following conditional expression 2B alternately stacked in at least six repetitive cycles, where: 0.7×λ/4≦H<1×λ/4  2A1×λ/4<L≦2×λ/4  2Bwhere,H: optical film thickness of film made of high-refractivity material;L: optical film thickness of film made of low-refractivity material; and,λ: central wavelength of split light.
  • 18. A polarizing beam splitter as claimed in claim 17, wherein the high-refractivity material is TiO2 and the low-refractivity mater is SiO2.
  • 19. A polarizing beam splitter as claimed in claim 17, wherein the high-refractivity material is a blended material including TiO2 and the low-refractivity material is selected form the group consisting of SiO2 and MgF2.
Priority Claims (1)
Number Date Country Kind
2003-284722 Aug 2003 JP national
US Referenced Citations (3)
Number Name Date Kind
5973835 Tsou et al. Oct 1999 A
6014255 Van Der Wal et al. Jan 2000 A
6096375 Ouderkirk et al. Aug 2000 A
Foreign Referenced Citations (2)
Number Date Country
08-146218 Jun 1996 JP
09-184916 Jul 1997 JP
Related Publications (1)
Number Date Country
20050024725 A1 Feb 2005 US