Patent Application
20220402088
The present invention relates to a polishing apparatus and a polishing method for polishing a processed material with an endless abrasive belt, and a cleaning liquid supply device for supplying a cleaning liquid to the polishing apparatus.
Japanese Examined Patent Publication No. 51-12158 (Patent Document 1) describes a polishing apparatus for polishing a processed material with a rotating endless abrasive belt. The polishing apparatus includes a pressure-contact roll to be in pressure-contact with an abrasive surface of the abrasive belt, a backup roll arranged on the opposite side of the abrasive belt from the pressure-contact roll so as to be in pressure-contact with the pressure-contact roll via the abrasive belt, and a cleaning liquid supply device having multiple nozzles capable of supplying a cleaning liquid to the abrasive belt. Here, the pressure-contact roll and the backup roll are arranged downstream in the rotation direction of the abrasive belt with respect to the polishing processing position where the abrasive belt polishes the processed material. The cleaning liquid supply device is disposed upstream in the rotation direction of the abrasive belt with respect to the pressure-contact portion between the pressure-contact roll and the abrasive belt. Further, the plurality of nozzles is disposed along the extending direction of the pressure-contact roll, the abrasive belt, and the pressure-contact portion.
The polishing apparatus directly supply the cleaning liquid to the abrasive belt so as to decrease clogging in the abrasive belt and generation of frictional heat during polishing. In addition, the polishing apparatus removes the cleaning liquid stuck on the abrasive belt by using the pressure-contact roll so as to avoid the cleaning liquid from adhering to the processed material.
However, in the polishing apparatus described in the above-mentioned publication, the cleaning liquid hits differently at the abrasive surface of the abrasive belt that passes the positions facing the plurality of nozzles and at the abrasive surface of the abrasive belt that passes the positions located between the plurality of nozzles. As a result, uneven cleaning may occur on the abrasive surface. Further, the polishing apparatus described in the above-mentioned publication requires a relatively large discharge pressure and discharge amount of the liquid in order to cause the cleaning liquid to collide with the abrasive surface.
The present invention has been made in view of the above problems, and one of the objectives of the present invention is to provide a polishing apparatus and a polishing method that contribute to further improvement of polishing effects with a simple configuration. Another objective of the present invention is to provide a polishing apparatus and a polishing method that contribute to downsizing the apparatus. Further, another objective of the present invention is to provide a polishing apparatus and a polishing method that contribute to the improvement of economic efficiency. Furthermore, another objective of the present invention is to provide a cleaning liquid supply device that contributes to the improvement of cleaning effect of the abrasive belt.
A polishing apparatus, a polishing method, and a cleaning liquid supply device of the present invention have adopted the following means to achieve the above-mentioned objectives.
According to a preferred embodiment of the polishing apparatus according to the present invention, a polishing apparatus is configured for polishing a processed material by rotating an endless abrasive belt including an abrasive surface. The polishing apparatus includes a frame body, a first roll, a second roll, and a cleaning liquid supply pipe. The first roll is rotatably supported by the frame body so as to be in pressure-contact with the surface opposite to the abrasive surface. The second roll is disposed to be parallel to the first roll and face the abrasive surface, and is rotatably supported by the frame body so as to be in pressure-contact with the first roll via the abrasive belt. The cleaning liquid supply pipe has at least one discharge port for discharging a cleaning liquid and is supported by the frame body such that the discharge port faces the outer surface of the second roll.
According to the present invention, the cleaning liquid supplied from the discharge port to the outer surface of the second roll is supplied to the abrasive surface of the abrasive belt via the second roll. Here, the cleaning liquid discharged to the outer surface of the second roll spreads planarly over the outer surface of the second roll, and thereby the cleaning liquid can be supplied to a wide area of the abrasive surface. Thus, it is possible to well reduce the occurrence of uneven cleaning on the abrasive surface. As a result, the polishing effects of the polishing apparatus can be further improved. Since the improvement is achieved only by supplying the cleaning liquid from the discharge port to the outer surface of the second roll, the configuration is simple. As a prerequisite, the cleaning liquid supplied to the abrasive surface is well prevented from passing through the pressure-contact portion between the first roll and the second roll by the pressure-contact between the first roll and the second roll via the abrasive belt. Accordingly, it is possible to well prevent the abrasive belt that has some cleaning liquid stuck thereon from polishing a processed material.
According to another embodiment of the polishing apparatus according to the present invention, the discharge port is disposed above the second roll in the vertical direction, and also within a projection area of the second roll in a virtual projection plane when the second roll is viewed from above in the vertical direction.
According to the present embodiment, since the cleaning liquid can be supplied to the abrasive surface of the abrasive belt only by dropping the cleaning liquid from the discharge port, the cleaning liquid can be applied with smaller discharge pressure and amount as compared with the configuration in which the cleaning liquid is sprayed onto the second roll. As a result, the capacity of the pump for supplying the cleaning liquid can be smaller than that of the configuration in which the cleaning liquid is sprayed onto the second roll, and the pump can be downsized. In addition, the amount of cleaning liquid used can be reduced, and thereby economic efficiency can be improved.
According to another embodiment of the polishing apparatus according to the present invention, the polishing apparatus further includes a support frame arranged on the frame body so as to be movable in a direction toward and away from the first roll, and a first actuator mechanically connected to the support frame so as to move the support frame in the direction toward and away from the first roll. The second roll is rotatably supported by the support frame.
According to the present embodiment, a configuration can be achieved easily in which the second roll is pressed against and contacted with the first roll via the abrasive belt only when the abrasive belt needs to be cleaned.
According to another embodiment of the polishing apparatus according to the present invention, the polishing apparatus further includes a plate extending in the axial centerline direction of the second roll. The plate has a tip portion that is in contact with the outer surface of the second roll along the axial centerline direction of the second roll. The plate is disposed downstream in the rotation direction of the second roll with respect to a position of the projection of the discharge port in the virtual projection plane. Further, the tip portion of the plate has a plurality of notches. The plurality of notches is evenly arranged in the extending direction of the plate.
According to the present embodiment, a part of the cleaning liquid supplied from the discharge port to the outer surface of the second roll can be temporarily stored in the region defined by the plate and the outer surface of the second roll. Then, the stored cleaning liquid flows out downstream in the rotation direction of the second roll from the plurality of notches evenly arranged in the extending direction of the plate. Accordingly, the cleaning liquid almost uniformly adheres to the outer surface of the second roll, and the cleaning liquid can be supplied to a wide area of the abrasive surface. As a result, it is possible to further reduce the occurrence of uneven cleaning on the abrasive surface.
According to another embodiment of the polishing apparatus according to the present invention which includes the support frame movable in the direction toward and away from the first roll, the cleaning liquid supply pipe is supported by the support frame.
According to the present embodiment, the second roll and the cleaning liquid supply pipe can be integrated as a unit.
According to another embodiment of the polishing apparatus according to the present invention which includes the support frame movable in the direction toward and away from the first roll, the plate is supported by the support frame.
According to the present embodiment, the second roll and the plate can be integrated as a unit.
According to another embodiment of the polishing apparatus according to the present invention, the polishing apparatus further includes a third roll and a second actuator. The third roll is disposed to be parallel to the first and second rolls and to be in pressure-contact with the surface opposite to the abrasive surface of the belt. The third roll is also rotatably supported by the frame body. The second actuator is mechanically connected to at least one of the first and third rolls for rotating at least one of the first and third rolls. As such, by rotating at least one of the first and third rolls, the second actuator rotates the abrasive belt that is wound around the first and third rolls.
According to the present embodiment, the first and third rolls around which the abrasive belt is wound are used as backup rolls for the second roll, and thereby the number of components can be reduced as compared with a configuration in which a dedicated roll only for backing up the second roll is used.
According to another embodiment of the polishing apparatus according to the present invention, the polishing apparatus further includes a third actuator mechanically connected to the third roll. Here, the first roll is a contact roll that is able to be in pressure-contact with a processed material via the abrasive belt. The third roll is supported by the frame body so as to be movable in the direction toward and away from the first roll. The third actuator is able to move the third roll in the direction toward and away from the first roll.
According to the present embodiment, the tension of the abrasive belt can be adjusted by moving the third roll in the direction toward and away from the first roll. In this configuration, since the third roll moves, the second roll cannot be pressed against and contacted with the third roll, and the second roll needs to be brought into pressure contact with the first roll. In this case, the space between the second roll and a processed material becomes narrow, making it difficult to arrange the cleaning liquid supply device in the space. That is, it becomes difficult to clean the abrasive belt using a conventional cleaning liquid supply device that is configured to directly supply a cleaning liquid to the abrasive belt. However, according to the present embodiment, supplying the cleaning liquid to the outer surface of the second roll is all that is needed, which eliminates the arrangement of the cleaning liquid supply device in the narrow space. This improves the degree of freedom in arranging the cleaning liquid supply device.
According to another embodiment of the polishing apparatus according to the present invention, the polishing apparatus further includes a fourth actuator mechanically connected to the third roll. Here, the first roll is a contact roll that is able to be into pressure-contact with a processed material via an abrasive belt. The third roll is supported by the frame body such that one end thereof in the longitudinal direction is movable in a first direction that is orthogonal to both the longitudinal direction and the vertical direction. The fourth actuator is able to move, in the first direction, one end of the third roll in the longitudinal direction.
According to the present embodiment, by moving the third roll in the first direction, the positional displacement of the abrasive belt in the longitudinal direction of the first and third rolls can be corrected with respect to the first and third rolls. In this configuration, since one end of the third roll in the longitudinal direction is moved in the first direction, the second roll cannot be pressure against and contacted with the third roll, and the second roll needs to be brought in pressure-contact with the first roll. In this case, the space between the second roll and the processed material becomes narrow, making it difficult to arrange the cleaning liquid supply device in the space. That is, it becomes difficult to clean the abrasive belt using a conventional cleaning liquid supply device that is configured to directly supply a cleaning liquid to the abrasive belt. However, according to the present embodiment, supplying the cleaning liquid to the outer surface of the second roll is all that is needed, which eliminates the arrangement of the cleaning liquid supply device in the narrow space. This improves the degree of freedom in arranging the cleaning liquid supply device.
According to another embodiment of the polishing apparatus according to the present invention, the third roll is supported by the frame body via a self-aligning bearing. The fourth actuator is connected to the third roll via the self-aligning bearing.
According to the present embodiment, the self-aligning bearing can correct the misalignment between the axis centerline and the rotation axis of the third roll caused by the movement, in the first direction, of one end of the third roll in the longitudinal direction.
According to another embodiment of the polishing apparatus according to the present invention, the third roll is disposed above the first roll in the vertical direction.
According to the present embodiment, it is possible to prevent the polishing apparatus from increasing in size in the transport direction of a processed material and the direction orthogonal to both the transport direction and the vertical direction.
According to another embodiment of the polishing apparatus according to the present invention, the polishing apparatus further includes a cleaning liquid tray disposed, in the vertical direction, below a contact portion between the second roll and the abrasive surface.
According to the present embodiment, the cleaning liquid tray receives the cleaning liquid that has finished cleaning the abrasive surface of the abrasive belt.
According to another embodiment of the polishing apparatus according to the present invention, the polishing apparatus further includes air nozzles each having an air discharge opening directed to the center, in the extending direction, of the contact portion between the second roll and the abrasive surface. The air nozzles are arranged at both ends of the contact portion in the extending direction.
According to the present embodiment, the air discharged from the air nozzles can well decrease the cleaning liquid staying in the contact portion between the second roll and the abrasive surface of the abrasive belt and scattering to the outside of the contact portion.
According to another embodiment of the polishing apparatus according to the present invention, the outer surface of the second roll is covered with an elastic member.
According to the present embodiment, the elastic member can be elastically deformed to enter into between the abrasive grains on the abrasive surface of the abrasive belt, and at this time of point, the cleaning liquid can also enter into between the abrasive grains. This makes it possible to effectively clear the polishing debris residing between the abrasive grains. The cleaning liquid that has entered into between the abrasive grains is sufficiently scraped out by the elastic member that is elastically deformed to enter into between the abrasive grains, and thereby it is possible to effectively prevent the cleaning liquid from remaining on the abrasive surface of the abrasive belt.
According to a preferred embodiment of the polishing method according to the present invention, a polishing method for polishing a processed material is configured by rotating an endless abrasive belt having an abrasive surface. In the polishing method, (a) the abrasive belt is rotated, and (b) a second roll is brought into pressure-contact with a first roll via the abrasive belt, the first roll being disposed downstream in the rotation direction of the abrasive belt with respect to the pressure-contact portion between the abrasive surface of the abrasive belt and the processed material, wherein the abrasive belt has been wound around the first roll, (c) the cleaning liquid is supplied to the outer surface of the second roll, and (d) the second roll is pressed against and contacted with the first roll to remove the cleaning liquid stuck to the abrasive surface of the abrasive belt, and the abrasive belt is then pressed against and contacted with the processed material, so as to polish the processed material.
According to the present invention, the cleaning liquid is supplied to the outer surface of the second roll and then to the abrasive surface of the abrasive belt via the second roll. Here, since the cleaning liquid discharged to the outer surface of the second roll spreads planarly over the outer surface of the second roll, the cleaning liquid can be supplied to a wide area of the abrasive surface. Accordingly, it is possible to well reduce the occurrence of uneven cleaning on the abrasive surface. As a result, the polishing effects of the polishing apparatus can be further improved. Since the improvement is achieved only by supplying the cleaning liquid to the outer surface of the second roll, the configuration is simple. As a prerequisite, the cleaning liquid supplied to the abrasive surface is sufficiently prevented from passing the pressure-contact portion between the first and second rolls by the pressure-contact of the first and second rolls via the abrasive belt. Thus, it is possible to well prevent the abrasive belt that has some cleaning liquid stuck thereon from polishing the processed material.
According to a preferred embodiment of the cleaning liquid supply device according to the present invention, a cleaning liquid supply device for supplying a cleaning liquid to a polishing apparatus is configured. The polishing apparatus includes a frame body, a wound roll rotatably supported by the frame body such that an abrasive belt can be wound around the wound roll, and a pressure-contact roll rotatably supported by the frame body so as to be in pressure-contact with the wound roll via the abrasive belt. The cleaning liquid supply device includes a cleaning liquid supply pipe and a pump. The cleaning liquid supply pipe has at least one discharge port for discharging the cleaning liquid. Further, the cleaning liquid supply pipe is disposed such that the discharge port faces the outer surface of the pressure-contact roll. Furthermore, the pump is connected to the cleaning liquid supply pipe such that the cleaning liquid can be supplied to the cleaning liquid supply pipe.
According to the present invention, the cleaning liquid supplied to the outer surface of the pressure-contact roll is supplied to the abrasive surface of the abrasive belt via the pressure-contact roll. Here, since the cleaning liquid discharged to the outer surface of the pressure-contact roll spreads planarly on the outer surface of the pressure-contact roll, the cleaning liquid can be supplied to a wide area of the abrasive surface. Thus, it is possible to well reduce the occurrence of uneven cleaning on the abrasive surface. As a result, the polishing effects of the polishing apparatus can be further improved. Since the improvement is achieved only by supplying the cleaning liquid to the outer surface of the pressure-contact roll, the configuration is simple. As a prerequisite, the cleaning liquid supplied to the abrasive surface is sufficiently prevented from passing through the pressure-contact portion between the wound roll and the pressure-contact roll by the pressure-contact between the wound roll and the pressure-contact roll via the abrasive belt. It is possible to well prevent the abrasive belt that has some cleaning liquid stuck thereon from polishing the polishing of the processed material.
According to the present invention, the polishing effects can be further improved with a simple configuration of the polishing apparatus. In addition, downsizing of the apparatus can be achieved. Furthermore, it is possible to improve the economic efficiency.
Next, the best mode for carrying out the present invention will be described with reference to examples.
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The upper roll 6 is supported by the self-aligning ball bearings 18a and 18b, so that the centerline of the rotation axis becomes parallel to the extending direction of the beam 4b. Note that, the extension and retraction of the piston rod (not shown) of the air cylinder 20 causes only the self-aligning ball bearing 18a to be moved relative to the support base 14a in the extension and retraction direction of the piston rod (not shown), resulting in that one end of the upper roll 6 in the longitudinal direction is moved in a direction (the left-right direction in
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Next, the operations of the polishing apparatus 1 configured as described above, particularly the operations to clean the abrasive belt PB will be described. In order to polish a processed material Vn such as plywood by the polishing apparatus 1, first, an abrasive belt PB is attached to the polishing apparatus 1. To attach the abrasive belt PB to the polishing apparatus 1, first, the air cylinders 16 and 16 are driven in the direction in which the piston rods 16a and 16a retract. As a result, the upper roll 6 supported by the support bases 14a and 14b via the self-aligning ball bearings 18a and 18b is moved in a direction toward the upper surface of the beam 4b, that is, in the direction approaching the contact roll 8, resulting in reduction of the distance between the centerline of the rotation axis of the upper roll 6 and the centerline of the rotation axis of the contact roll 8. At this point of time, the air cylinders 31 and 31 are driven in the direction in which the piston rod 31a retracts, so as to move the drain roll 10 to the cleaning standby position.
In the above-described state, the abrasive belt PB is hung on both the upper roll 6 and the contact roll 8. After that, the air cylinders 16 and 16 are driven in the direction in which the piston rods 16a and 16a extend. As a result, the upper roll 6 is moved upward in the vertical direction together with the self-aligning ball bearings 18a and 18b and the support bases 14a and 14b, resulting in increase of the distance between the rotation axis centerline of the upper roll 6 and the rotation axis centerline of the contact roll 8. When a predetermined tension is applied to the abrasive belt PB, the driving of the air cylinders 16 and 16 is continued so that the state (a state in which the predetermined tension is applied to the abrasive belt PB) is maintained. At this point of time, the air cylinders 31 and 31 are driven in the direction in which the piston rod 31a extends, so as to move the drain roll 10 to the cleaning position. In this way, the attachment of the abrasive belt PB onto the polishing apparatus 1 is completed.
Subsequently, the motor M is driven. The driving of the motor M causes the rotating shaft 24 to rotate, and the rotation of the rotating shaft 24 is transmitted to the contact roll 8 via the V-belt VFLT. As a result, the contact roll 8 rotates clockwise in
Meanwhile, the drain roll 10 is moved to the cleaning position to be in pressure-contact with the contact roll 8 via the abrasive belt PB. As a result, the drain roll 10 is driven counterclockwise in
When the preparation for starting polishing work is completed, a motor (not shown) is then driven to rotate the support rolls SR1 and SR2 (clockwise in
At the point of time, polishing debris, which has been generated by polishing the processed material Vn, adheres to the surface (abrasive surface) of the abrasive belt PB. However, in the polishing apparatus of the present embodiment, when the abrasive belt PB having the polishing debris stuck thereon passes through the contact portion 90 between the drain roll 10 and the abrasive belt PB, the polishing water CW stuck to the outer surface of the drain roll 10 is used to wash away the polishing debris from the surface (abrasive surface) of the abrasive belt PB.
Here, the polishing apparatus 1 of the present embodiment is configured to supply the cleaning water CW from the plurality of discharge ports 70a to the outer surface of the drain roll 10, and thereby the cleaning water CW spreads planarly and evenly on the outer surface of the drain roll 10. That is, on the outer surface of the drain roll 10, the cleaning water adheres to at least the portion located, in the rotation direction of the drain roll 10, downstream the dropping position of the cleaning water CW through the plurality of discharge ports 70a, sufficiently and evenly over the longitudinal direction of the drain roll 10, along with the rotation of the drain roll 10.
Most of the cleaning water CW stuck to the outer surface of the drain roll 10 is carried, while remaining on the outer surface of the drain roll 10, to the contact portion 90 between the drain roll 10 and the abrasive belt PB (see
Further, since the outer surface of the drain roll 10 and the outer surface of the contact roll 8 are coated with elastic members 8b and 10b, respectively, it is believed that the cleaning water CW easily enters into between the abrasive grains of the surface (abrasive surface) of the abrasive belt PB due to the elastic deformation of the elastic members 8b and 10b. As a result, it is believed that the surface (abrasive surface) of the abrasive belt PB can be cleaned more effectively. Note that the cleaning water CW that has entered into between the abrasive grains is sufficiently scraped out by the elastic member 10b that is elastically deformed and enters into between the abrasive grains, and thereby the cleaning water CW can be effectively prevented from remaining on the surface (abrasive surface) of the abrasive belt PB.
Further, the polishing apparatus 1 of the present embodiment has a configuration in which the pipe 70 is disposed directly above the drain roll 10. Thus, the cleaning water CW can be sufficiently and evenly supplied to the surface (abrasive surface) of the abrasive belt PB only by dropping the cleaning water from the plurality of discharge ports 70a. Thus, the pressure and amount of the cleaning water to be discharged can be reduced as compared with the case with a configuration in which the cleaning water CW is sprayed onto the abrasive belt PB and/or the drain roll 10. As a result, the capacity of the pump P can be reduced, and the pump P can be downsized. In addition, since the amount of the cleaning water used can be reduced, economic efficiency can be improved.
As described above, the abrasive surface washed with the cleaning water CW is pressed against and contacted with the processed material Vn again by the rotation of the abrasive belt PB, and the surface of the processed material Vn is polished, so that a good processing state ca be maintained. In this way, the processed material Vn whose surface has been polished is further conveyed to the right in
The cleaning water CW that washed the abrasive surface or did not adhere to the outer surface of the drain roll 10 goes into the drainage receiver 34, and then foreign substances such as polishing debris were removed from the water by a filter (not shown). After that, the water is sent to the pump P again. In this way, the cleaning water CW is reused for resource saving.
While the polishing work by the abrasive belt PB is continued, the abrasive belt PB may be positionally displaced in the longitudinal direction of to the upper roll 6 (the left-right direction in
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Thus, when both the sensors 60a and 60b detect the abrasive belt PB, a control device (not shown) determines that the abrasive belt PB has been positionally displaced and moved to the left side (the side edge PBs1 side) in
Then, when the abrasive belt PB has been moved to the left side (the side edge PBs1 side) in
Further, when the abrasive belt PB has been moved to the right side (the side edge PBs2 side) in
In this way, while the abrasive belt PB is rotating (running), the above-mentioned operations are repeated, so that the abrasive belt PB is maintained to be hung on the upper roll 6 and the contact roll 8 in an appropriate positional relationship.
In the present embodiment, the rotating shafts 6a and 6a of the upper roll 6 are supported by the self-aligning ball bearings 18a and 18b. Thus, when the piston rod (not shown) of the air cylinder 20 is driven to extend and retract, the axis centerlines of the shafts 6a and 6a and the axis centerlines of the self-aligning ball bearings 18a and 18b coincide with each other. Accordingly, the upper roll 6 does not fail to rotate.
According to the polishing apparatus 1 of the first example of the present invention described above, in order to supply the cleaning water CW to the outer surface of the drain roll 10 from the pipe 70 arranged directly above the drain roll 10, the cleaning water CW adheres planarly and evenly to the outer surface in the longitudinal direction, along with the rotation of the drain roll 10. The cleaning water CW sufficiently stuck to the outer surface of the drain roll 10 is carried to the contact portion 90 between the drain roll 10 and the abrasive belt PB, and cleans the abrasive surface of the abrasive belt PB. Accordingly, it is possible to well reduce the occurrence of uneven cleaning on the surface. Thereby, the polishing effects of the polishing apparatus 1 can be further improved.
Since supplying the cleaning water CW from the plurality of discharge ports 70a to the outer surface of the drain roll 10 is all that is needed, the configuration is simple. Further, since the cleaning water CW can be sufficiently and evenly supplied to the abrasive surface only by dropping cleaning water from a plurality of discharge ports 70a, the pressure and amount of the cleaning water to be discharged can be reduced as compared with the case with a configuration in which the cleaning water CW is sprayed onto the abrasive belt PB and/or the drain roll 10. As a result, the capacity of the pump P can be reduced, and the pump P can be downsized. In addition, since the amount of the cleaning water CW used can be decreased, economic efficiency can be improved.
Furthermore, since the upper roll 6 is configured to move in the vertical direction and in the direction orthogonal to both the vertical direction and the longitudinal direction of the beam 4b, it is necessary to press the drain roll 10 against and contact with the contact roll 8. However, it is not necessary to arrange the cleaning water supply device 12 in the narrow space between the contact roll 8 and a processed material Vn, and thereby the degree of freedom in the arrangement of the cleaning water supply device 12 can be improved.
As described above, the cleaning water CW supplied to the abrasive surface can be well prevented from passing through the contact portion 90 between the drain roll 10 and the abrasive belt PB by the pressure-contact between the drain roll 10 and the contact roll 8 via the abrasive belt PB. Thus, it is possible to sufficiently decrease the chance that a processed material is polished by the abrasive belt PB having the cleaning water stuck thereto.
According to the polishing apparatus 1 of the first example of the present invention, since the drain roll 10, the pipe 70, and the drainage receiver 34 are set on the mounting table 30, the drain rolls 10, the pipe 70, and the drainage receiver 34 can be integrated as a unit. That is, the unit of the unitized drain roll 10, the pipe 70, and the drainage receiver 34 can be assembled easily to the polishing apparatus 1 that does not have the function for cleaning the abrasive belt PB.
According to the polishing apparatus 1 of the first embodiment of the present invention, since the contact roll 8 is used as a backup roll of the drain roll 10, the necessity of a dedicated roll only for backing up the drain roll 10 is eliminated. This avoids an increase in the number of components.
Further, according to the polishing apparatus 1 of the first embodiment of the present invention, the upper roll 6 is disposed above the contact roll 8 in the vertical direction, and the upper roll 6 is moved in the vertical direction to adjust the tension of the abrasive belt PB. This configuration can avoid the size of the polishing apparatus 1 from increasing in the transport direction of a processed material Vn (the horizontal direction, and the left-right direction in
Further, according to the polishing apparatus 1 of the first embodiment of the present invention, the elastic members 8b and 10b cover the outer surface of the drain roll 10 and the outer surface of the contact roll 8, respectively. Thereby, it is believed that the elastic deformation of the elastic members 8b and 10b facilitates the entrance of the cleaning water CW into between the abrasive grains on the abrasive surface of the abrasive belt PB. As a result, it is believed that the abrasive surface can be cleaned more effectively. Note that, the cleaning water CW that has entered into between the abrasive grains is sufficiently scraped out by the elastic member 10b that is elastically deformed and enters into between the abrasive grains, and thereby it is possible to effectively prevent the cleaning liquid from remaining on the abrasive surface of the abrasive belt.
Next, a polishing apparatus 100 of a second embodiment of the present invention will be described. As shown in
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In the polishing apparatus 100 of the second embodiment configured in this way, as shown in
A part of the cleaning water CW supplied from the plurality of discharge ports 70a of the pipe 70 to the outer surface (point CWP) of the drain roll 10 flows out through the plurality of slits 120 in the rotation direction of the drain roll 10 and is carried, while adhering to the outer surface of the drain roll 10, to the contact portion 90 between the drain roll 10 and the abrasive belt PB. Here, upstream (rear side) of the drain roll 10 in the rotational direction with respect to the plate 120, the cleaning water CW is stored to be distributed over the entire longitudinal direction of the drain roll 10. As such, a substantially equal amount of cleaning water CW flows out through each of the slits 122. Further, since the plurality of slits 120 are arranged at equal intervals in the longitudinal direction of the plate 120, it is possible to well reduce the occurrence of variation in the amount of the cleaning water CW to adhere to the drainer roll 10 in the longitudinal direction. As a result, the cleaning water CW can be caused to adhere to the outer surface of the drain roll 10 almost uniformly, so that a substantially uniform amount of cleaning water can be supplied to the contact portion 90 over the extending direction. Thus, cleaning away can be achieved. It is possible to further reduce the occurrence of uneven cleaning on the abrasive belt PB.
Next, a polishing apparatus 200 of a third embodiment of the present invention will be described. As shown in
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In the polishing apparatus 200 of the third embodiment having the above-described configuration, when the cleaning water CW is supplied from the plurality of discharge ports 70a of the pipe 70 to the outer surface (at the point CWP) of the drain roll 10, an air pump (not shown) is driven so that air is discharged from the air discharge openings 220a, 220a of the air nozzles 220, 220. As a result, it is possible to well decrease the scattering of the cleaning water CW to the outside the contact portion 90, that is, away from the extending direction of the contact portion 90, wherein the cleaning water CW has been supplied to the outer surface of the draining roll 10 and carried to the contact portion 90 between the draining roll 10 and the abrasive belt PB while adhering to the outer surface of the draining roll 10.
In the first example, the second example, and the third example, the contact roll 8 is used as a backup roll of the drain roll 10, but the present invention is not limited to this configuration. For example, the upper roll 6 may be used as a backup roll for the drain roll 10 in a configuration in which the upper roll 6 does not move relative to the beam 4b, that is, the upper roll 6 reciprocates in the vertical direction (the up-down direction in
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In the first example, the second example, and the third example, the pipe 70 is disposed above the drain roll 10. Specifically, the plurality of discharge ports 70a are arranged to be within the projection area of the drain roll 10 in a virtual projection plane when the polishing apparatus 1 is viewed from above in the vertical direction, but the present invention is not limited to this configuration. The pipe 70 may be in any arrangement as long as the cleaning liquid CW can be supplied to the outer surface of the upper 6: for example, a configuration is possible in which the pipe 70 is disposed on the side opposite the contact roll 8 (just beside the drain roll 10) with respect to the drain roll 10.
In the first example, the second example, and the third example, the drain roll 10, the pipe 70, and the drainage receiver 34 are able to be reciprocated between the cleaning position and cleaning standby position, but the present invention is not limited to this configuration. For example, a configuration is possible in which only one of the drain roll 10, the pipe 70, and the drainage receiver 34 is reciprocated between the cleaning position and cleaning standby position. Alternatively, all of the drain roll 10, the pipe 70, and the drainage receiver 34 may be secured to the cleaning standby position.
In the first example, the second example, and the third example, the contact roll 8 and the upper roll 6 are arranged in a substantially straight line in the vertical direction, but the present invention is not limited to this configuration. The contact roll 8 and the upper roll 6 are in any positional relationship with each other: for example, a configuration is possible in which the contact roll 8 and the upper roll 6 are arranged in a substantially straight line in the extending direction of a straight line that is at an angle to the vertical direction. Alternatively, the contact roll 8 and the upper roll 6 may be arranged in a substantially straight line in the horizontal direction.
In the first example, the second example, and the third example, the upper roll 6 is relatively moved with respect to the beam 4b in order to generate tension in the abrasive belt PB, but the present invention is not limited to this configuration. For example, a configuration is possible in which a dedicated roll for generating tension in the abrasive belt PB is used.
In the first example, the second example, and the third example, one end of the upper roll 6 in the longitudinal direction is relatively moved with respect to the beam 4b so as to correct the displacement of the abrasive belt PB (the positional displacement in the longitudinal direction of the upper roll 6). However, the present invention is not limited to the configuration. For example, a configuration is possible in which a dedicated mechanism for correcting the displacement of the abrasive belt PB is separately mounted.
In the first example, the second example, and the third example, the abrasive belt PB is rotated only by the two rolls of the contact roll 8 and the upper roll 6, but the number of rolls around which the abrasive belt PB is wound may be one, or three, or more.
The present embodiment shows an example of an embodiment for carrying out the present invention. Therefore, the present invention is not limited to the configuration of the present embodiment. The correspondence between each element of the present embodiment and each element of the present invention is shown below.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2019-214333 | Nov 2019 | JP | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/JP2020/034815 | 9/15/2020 | WO |
