Claims
- 1. A polyamide-imide polymer selected from the group consisting of polyamide-imide-imide polymers having the structure I: ##STR23## and polyamide-imide-amide polymers having the structure: ##STR24## wherein in each of structures I and II, and A' are independently divalent aromatic or aliphatic moieties, Z is selected from the group consisting of CF.sub.3 and ##STR25## wherein X is a non-interfering monovalent substituent selected from the group consisting of hydrogen, chloro, fluoro, C.sub.1 to C.sub.4 alkyl, C.sub.1 to C.sub.4 alkoxy, hydroxy and phenyl, R is a tetravalent phenylene, naphthalene or bis-phenylene radical wherein each pair of carbonyl groups are attached to adjacent carbon atoms in the ring moiety, the terms (a), (b), (c), (d) and (e) are equal to the mole fraction of each recurring unit in the polymer chain and (a) ranges from about 0.05 to about 0.95, (b) ranges from about 0.05 to about 0.95, with the proviso that the sum of (a) and (b) is equal to 1.00, (c) ranges from about 0.05 to about 0.90, (d) ranges from about 0.05 to about 0.90, (e) ranges from about 0.05 to about 0.90, with the proviso that the sum of (c), (d), and (e) is equal to 1.00, said polymers further characterized as having a polymer inherent viscosity of at least about 0.05 dl/g as measured from a solution of the polymer in dimethyl acetamide at 25.degree. C. at a polymer concentration of 0.5 weight percent.
- 2. The polymers of claim 1 wherein structure I is: ##STR26## and structure II is: ##STR27##
- 3. The polymers of claim 2 wherein at least one A is the aromatic divalent radical of a phenylene, naphthalene, bis or polyphenylene compound selected from: ##STR28## wherein R' is a divalent moiety independently selected from a covalent carbon to carbon bond, methylene, ethylene, propylene, isopropylene, hexafluoroisopropylidene, 1-phenyl-2,2,2-trifluoroethylidene, dichloro and difluoroalkylenes having up to 3 carbons, oxy, thio, sulfinyl, sulfonyl, sulfonamido, carbonyl, oxydicarbonyl, oxydimethylene, sulfonyldioxy, carbonyldioxy, disilanylene, polysilanylene having up to 8 Si atoms disil- oxanylene, and a polysiloxanylene having up to 8 Si atoms.
- 4. The polymers of claim 3 where Z is CF.sub.3.
- 5. The polymers of claim 2 wherein A is an aromatic divalent radical of the formula: ##STR29##
- 6. The polymers of claim 5 wherein R' is oxygen.
- 7. The polymers of claim 5 wherein R' is ##STR30##
- 8. The polymers of claim 6 wherein Z is CF.sub.3.
- 9. The polymers of claim 7 wherein Z is CF.sub.3.
- 10. The polymer of claim 2 wherein said structure is I and R is a tetravalent aromatic radical having the structure: ##STR31## wherein R' is a divalent moiety independently selected from a covalent carbon to carbon bond, methylene, ethylene, propylene, isopropylene, hexafluoroisopropylidene, 1-phenyl-2,2,2-trifluoroethylidene, dichloro and difluoroalkylenes having up to 3 carbons, oxy, thio, sulfinyl, sulfonyl, sulfonamido, carbonyl, oxydicarbonyl, oxydimethylene, sulfonyldioxy, carbonyldioxy, disilanylene, -polysilanylene having up to 8 Si atoms disil- oxanylene, and a polysiloxanylene having up to 8 Si atoms.
- 11. The polymer of claim 10 wherein R is a tetravalent aromatic radical having the structure: ##STR32## wherein R' is CF.sub.3 C CF.sub.3, ##STR33## single bond, ##STR34##
- 12. The polymer of claim 11 wherein Z is CF.sub.3.
- 13. A process for preparing a polyamide-imide-imide polymer having the structure I of claim 2 comprising forming the polymer condensation product of a first monomer having the structure: ##STR35## a diamine monomer having the formula H.sub.2 N--A--NH.sub.2, and an aromatic dianhydride monomer having the structure: ##STR36##
- 14. A process for preparing a polyamide-imide-amide polymer having the structure II of claim 2 comprising forming the polymer condensation product of a first monomer having the structure: ##STR37## a diamine monomer having the formula H.sub.2 N--A--NH.sub.2 and a dicarboxylic acid or acid derivative thereof having the structure YOX--A--COY herein Y is OH, halogen or OR.sub.2, wherein R.sub.2 is C.sub.1 to C.sub.3 alkyl.
- 15. The process of claim 14 wherein the radical A in the diamine monomer is different from the radical A in the diacid monomer.
- 16. The process of claim 13 or 14 wherein Z is CF.sub.3.
Government Interests
This application is related to copending application Ser. No. (1376), filed in the United States Patent and Trademark Office on even date herewith.
US Referenced Citations (18)