Claims
- 1. A polyamide resin composition obtained by a process comprising:mixing a polyamide-forming component with an apatite compound-forming component; and allowing to proceed polymerization of a polyamide and synthesis of an apatite compound, wherein said polyamide resin composition contains 0.5 to 50 wt. % of the apatite compound and when eluted with a phenol solvent and filtered, leaves 1 to 100 parts by weight of residual organic substances per 100 parts by weight of said apatite compound, said polyamide resin being selected from the group consisting of polycaprolactam (nylon 6), polytetramethylene adipamide (nylon 46), polyhexamethylene adipamide (nylon 66), polyhexamethylene sebacamide (nylon 610), polyhexamethylene dodecamide (nylon 612), polyundecamethylene adipamide (nylon 116), polyundecalactam (nylon 11), polydodecalactam (nylon 12), polytrimethylhexamethylene terephthalamide (nylon TMHT), polyhexamethylene isophthalamide (nylon 6I), polynonanemethylene terephthalamide (9T), polyhexamethylene terephthalamide (6T), polybis (4-aminocyclohexyl)methane dodecamide (nylon PACM12), polybis(3-methyl-aminocyclohexyl)methane dodecamide (nylondimethyl PACM12), polymethaxylylene adipamide (nylon MXD6) and polyundecamethylene hexahydroterephthalamide (nylon 11T(H)) and polyamide copolymers each containing at least two different polyamide components of said polyamide resins, and mixtures thereof.
- 2. The polyamide resin composition according to claim 1, wherein said polyamide has a weight-average molecular weight of 10,000 to 1,000,000.
- 3. The polyamide resin composition according to claim 1, wherein said organic substances comprise at least a polyamide.
- 4. The polyamide resin composition according to claim 1, wherein said apatite compound has an average particle size not greater than 1 μm.
- 5. The polyamide resin composition according to claim 1, wherein the molar ratio of the metal element(s) to phosphorus, both constituting the apatite compound, is from 0.9 to 10.0.
- 6. The polyamide resin composition according to claim 4, wherein said apatite compound is a crystalline apatite compound which has a (002) plane peak at a diffraction angle (2θ) of 25.5° to 26.5° and a (300) plane peak at a diffraction angle (2θ) of 32.5° to 33.5° as observed by wide-angle X-rays (CuKα: wavelength λ=1.542 Å) scattering.
- 7. The polyamide resin composition according to claim 4, wherein said apatite compound is represented by the following formula:A10-Z(HPO4)Z(PO4)6-Z(X)2-Z.nH2O Wherein 0≦z<2, 0≦n≦16, A represents a metal element and X represents an anion or an anionic compound.
- 8. The polyamide resin composition according to claim 5, wherein the metal element is at least one metal in Group 2A of the periodic table.
- 9. The polyamide resin composition according to claim 5, wherein the metal element is calcium.
- 10. A process for preparing a polyamide resin composition, which comprises mixing a polyamide-forming component with an apatite compound-forming component, allowing to proceed polymerization of a polyamide and synthesis of an apatite compound, to give a composition in which an apatite compound having an average particle size not greater than 1 μm is dispersed in a polyamide having a weight-average molecular weight of 10,000 to 1,000,000.
- 11. The process for preparing a polyamide composition according to claim 10, wherein said polyamide-forming component comprises at least one selected from the group consisting of polymerizable amino acids, polymerizable lactams polymerizable salts of diamines and dicarboxylic acids, and polymerizable oligomers of these compounds.
- 12. The process for preparing a polyamide resin composition according to claim 10, wherein said apatite compound-forming component comprises a phosphoric acid-based metal compound or a mixture of a phosphoric acid-based metal compound and a non-phosphoric acid-based metal compound.
- 13. The process for preparing a polyamide resin composition according to claim 10, wherein the molar ratio of the metal element(s) to phosphorus in said apatite compound-forming component is from 0.9 to 10.
- 14. The process for preparing a polyamide resin composition according to claim 10, wherein said apatite compound is a crystalline apatite compound having a (002) plane peak at a diffraction angle (2θ) of 25.5° to 26.5° and a (300) plane peak at a diffraction angle (2θ) of 32.5° to 33.5° as observed by wide-angle X-ray (CuKα: wavelength λ=1.542 Å) scattering.
- 15. The process for preparing a polyamide resin composition according to claim 10, wherein said apatite compound is represented by the following formula:A10-Z(HPO4)Z(PO4)6-Z(X)2-Z.nH2O wherein 0≦z<2, 0≦n≦16, A represents a metal element and X represents an anion or an anionic compound.
- 16. The process for preparing a polyamide resin composition according to claim 12, wherein the metal element is at least one metal in Group 2A of the periodic table.
- 17. The process for preparing a polyamide resin composition according to claim 12, wherein the metal element is calcium.
- 18. The process for preparing a polyamide resin composition according to claim 10, wherein said polymerization of the polyamide and said synthesis of the apatite compound are carried out at a temperature of 40° C. to 300° C.
- 19. A polyamide resin composition which contains 0.5 to 50 wt. % of an apatite compound and which, when eluted with a phenol solvent and filtered, leaves 1 to 100 parts by weight of residual organic substances per 100 parts by weight of said apatite compound;wherein the polyamide resin composition is prepared by a process which comprises mixing a polyamide-forming component with an apatite compound-forming component, allowing to proceed polymerization of a polyamide and synthesis of an apatite compound, to give a composition in which an apatite compound having an average particle size not greater than 1 μm is dispersed in a polyamide having a weight-average molecular weight of 10,000 to 1,000,000.
Priority Claims (1)
Number |
Date |
Country |
Kind |
10-237373 |
Aug 1998 |
JP |
|
Parent Case Info
This application is the national phase under 35 U.S.C. § 371 of PCT International Application No. PCT/JP99/03657 which has an International filing date of Jul. 7, 1999, which designated the United States of America.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
PCT/JP99/03657 |
|
WO |
00 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO00/11088 |
3/2/2000 |
WO |
A |
US Referenced Citations (7)
Foreign Referenced Citations (5)
Number |
Date |
Country |
A63132810 |
Jun 1988 |
JP |
A1501289 |
May 1989 |
JP |
A2234763 |
Sep 1990 |
JP |
A3217454 |
Sep 1991 |
JP |
A11199771 |
Jul 1999 |
JP |