Claims
- 1. A block copolymer of the formula
- --A--B).sub.m
- where A is a poly(aryl ether) block having no ketone linkages, B is a poly(aryl ether ketone) block, m is one or greater; the molecular weight of the blocks A and B is at least 500, and the weight ratio of the two blocks is in the range of about 5:95 to about 95:5.
- 2. A block copolymer as defined in claim 1 where the poly(aryl ether) blocks A are of the formula
- --O--E--O--E'--
- where E is the residuum of at least one dihydric phenols and E' is the residuum of at least on benzenoid compound having an inert electron withdrawing group in at least one of the positions ortho and para to the valence bonds.
- 3. A block copolymer as defined in claim 2 where the dihydric phenol is of the formula ##STR33## where Ar is a divalent aromatic group, R' and R" are inert substituents which are independently C.sub.1 to C.sub.4 alkyl groups, aryl groups, halogen atoms and C.sub.1 to C.sub.4 alkoxy groups; the d's are independently integers having a value of from 1 to 4; and R.sub.1 is selected from the group of --O--, --S--, --S--S--, --SO--, --SO.sub.2, alkylene, alkylidene, cycloalkylene, cycloalkylidene; the halogen or aryl substituted alkylene, alkylidene, cycloalkylene and cycloalkylidene; arylene, aromatic radicals fused to both Ar groups, and a chemical bond.
- 4. A block copolymer as defined in claim 2 where the dihydric phenol is hydroquinone or resorcinol.
- 5. A block copolymer as defined in claim 2 where the dihydric phenol is a naphthalene diol.
- 6. A block copolymer as defined in claims 3 or 4 where the dihydric phenol is one or more of the following ##STR34## where the R.sub.2 groups are independently hydrogen, lower alkyl, aryl or the halogen substituted derivatives thereof.
- 7. A block copolymer as defined in claim 2 where E' is the residuum of a dihalobenzenoid or a dinitrobenzenoid compound and wherein the inert electron withdrawing group is a monovalent group.
- 8. A block copolymer as defined in claim 7 where the monovalent electron withdrawing group is selected from nitro, halogen, phenyl sulfone, alkyl sulfone, cyano, trifluoromethyl and nitroso.
- 9. A block copolymer as defined in claim 2 where E' is the residuum of a dihalobenzenoid or a dinitrobenzenoid compound and wherein the inert electron withdrawing group is a divalent group.
- 10. A block copolymer as defined in claim 9 where the divalent electron withdrawing group is selected from ##STR35## where R"' is a hydrocarbon radical and A is halogen or hydrogen.
- 11. A block copolymer as defined in claims 8 or 10 where the dihalobenzenoid compound is one or more of the following ##STR36##
- 12. A block copolymer as defined in claim 2 where the poly(aryl ether) block has one or more repeating units of the formulae ##STR37##
- 13. A block copolymer as defined in claim 1 where the poly(aryl ether ketone) blocks are one or more of the formulae ##STR38## wherein Ar.sub.1 is a divalent aromatic radical which is independently phenylene, diphenyl ether diyl, biphenylene or naphthylene; X' is independently O, ##STR39## or a chemical bond; as is an integer of from 1 to 4; and b, c, d and e are 0 to 1.
- 14. A block copolymer as defined in claims 1 or 13 where the poly(aryl ether ketone) blocks are one or more of the formulae ##STR40##
Parent Case Info
This is a division of application Ser. No. 234,760, filed Aug. 22, 1988, now U.S. Pat. No. 4,968,758.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
4056511 |
Staniland |
Nov 1977 |
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Divisions (1)
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Number |
Date |
Country |
Parent |
734760 |
Aug 1988 |
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