Claims
- 1. A polyimide containing siloxane groups and having repeating units selected from the group consisting of ##STR31## wherein the catenation of the nitrogen group is selected from the group consisting of: (A) meta and para, (B) meta-meta, para-para, and meta-para and (C) as shown; and wherein Ar is a radical selected from the group consisting of: ##STR32## wherein Y is a band or is a substituent selected from the group consisting of:
- O, S, SO.sub.2, CH.sub.2, O.dbd.C, C(CH.sub.3).sub.2, C(CF.sub.3).sub.2, Si(CH.sub.3).sub.2, Si(CH.sub.2 CF.sub.2 CF.sub.3).sub.2 ;
- wherein X is a bond or is a substituent selected from the group consisting of: ##STR33## wherein Z is a substituent selected from the group consisting of: ##STR34## wherein R is a substituent selected from the group consisting of:
- CH.sub.3, CH.sub.2 CH.sub.3, (CH.sub.2).sub.2 CH.sub.3, CH(CH.sub.3).sub.2, C.sub.6 H.sub.5, (CH.sub.2).sub.2 CF.sub.3 ;
- wherein Ar' is a substitute selected from the group consisting of: ##STR35## wherein n is an integer between 1 and 1000; and wherein m is an integer between 1 and 1000.
- 2. A copolyimide containing a random mixture of pendent hydroxy and siloxane groups and having repeating units selected from the group consisting of: ##STR36## wherein the catenation of the nitrogen group is selected from the group consisting of:
- (A) meta and para and (B) meta-meta, para-para, and meta-para; wherein Ar is a radical selected from the group consisting of: ##STR37## wherein Y is a bond or is a substituent selected from the group consisting of:
- O, S, SO.sub.2, CH.sub.2, O.dbd.C, C(CH.sub.3).sub.2, C(CF.sub.3).sub.2, Si(CH.sub.3).sub.2, Si(CH.sub.2 CF.sub.2 CF.sub.3).sub.2 ;
- wherein X is a bond or is a substituent selected from the group consisting of: ##STR38## wherein Z is a substituent selected from the group consisting of: ##STR39## wherein R is a substituent selected from the group consisting of:
- CH.sub.3, CH.sub.3 CH.sub.2, (CH.sub.2).sub.2 CH.sub.3, CH(CH.sub.3).sub.2, C.sub.6 H.sub.5, (CH.sub.2).sub.2 CF.sub.3 ;
- wherein Ar' is a substituent selected from the group consisting of: ##STR40## wherein p is a fraction (percentage) between 0.01 and 0.99; wherein q is a fraction (percentage) equal to 1 minus p;
- wherein n is an integer between 1 and 1000; and
- wherein m is an integer between 1 and 1000.
- 3. The polyimide containing pendent siloxane groups of claim 1, wherein the repeating unit is (A) and Z is selected from the group consisting of: ##STR41##
- 4. The random copolyimide containing pendent siloxane groups of claim 2, wherein the repeating unit is (A) and Z is selected from the group consisting of: ##STR42##
- 5. The polyimide containing pendent siloxane groups of claim 1, wherein the repeating unit is (B) and Z is: ##STR43##
- 6. The polyimide containing pendent siloxane groups of claim 5, wherein Ar is selected from the group consisting of: ##STR44##
- 7. The polyimide containing pendent siloxane groups of claim 6, where X is a bond.
- 8. The random copolyimide containing pendent siloxane groups of claim 2, wherein the repeating unit is (B) and Z is selected from the groups consisting of: ##STR45##
- 9. A process for synthesizing polyimides and random copolyimides containing pendent siloxane groups, which process comprises reacting a member selected from the group consisting of a chloroterminated silicon compound, a chloroterminated silicon oligomer, a hydrogen terminated compound, and a hydrogen terminated oligomer with a polyimide containing hydroxy groups in the presence of a platinic acid catalyst under ambient reaction conditions in a solvent selected from the group consisting of:
- N,N-dimethylacetamide,
- N-methylpyrrolidinone,
- sulfolane,
- N-cyclohexylpyrrolidinone,
- dimethylsulfoxide,
- toluene, and
- bis(2-methoxyethyl)ether.
- 10. A polyimide containing pendent siloxane groups and having a structure selected from the group consisting of: ##STR46##
- 11. A random copolyimide containing pendent siloxane groups and having a structure selected from the group consisting of: ##STR47##
ORIGIN OF INVENTION
The invention described herein was made by employees of the United States Government and may be manufactured and used by or for the Government for governmental purposes without the payment of any royalties thereon or thereof.
US Referenced Citations (7)