Polymer composition for stereolithography

Information

  • Patent Grant
  • 11421066
  • Patent Number
    11,421,066
  • Date Filed
    Friday, October 30, 2020
    3 years ago
  • Date Issued
    Tuesday, August 23, 2022
    a year ago
Abstract
An object of the present invention is to provide a novel polymer composition for stereolithography that is capable of suitably providing an elastic molded product by stereolithography. A polymer composition for stereolithography containing a liquid polymer and a monomer, the polymer composition for stereolithography having a viscosity of 3,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec−1.
Description
FIELD OF INVENTION

The present invention relates to a polymer composition for stereolithography, an elastic molded product that is a cured product of the polymer composition, and a method for producing an elastic molded product using the polymer composition.


BACKGROUND

In recent years, three-dimensional additive manufacturing devices (so-called 3D printers) are put to practical use, which are used to laminate and cure a resin based on designed data of a three-dimensional structure to produce a three-dimensional structure. Generally known three-dimensional structures produced using three-dimensional additive manufacturing devices include three-dimensional structures made from resins. Meanwhile, three-dimensional structures (elastic molded products) having lower temperature dependency of the elastic modulus and smaller compression set than before, if produced, are expected to be used for applications different from those in the past.


SUMMARY of INVENTION

For example, WO 2017/154335 discloses a rubber composition containing a liquid rubber, which is intended for three-dimensional additive manufacturing. The rubber composition can be applied to a three-dimensional additive manufacturing device to suitably produce an elastic molded product.


In stereolithography techniques such as Stereolithography Apparatus (SLA), Digital Light Processing (DLP), and Liquid Crystal Display (LCD), layers of a liquid composition for stereolithography having a thickness of about 0.01 to 0.5 mm are sequentially laminated and cured so that the composition may be subjected to three-dimensional stereolithography. Therefore, the composition for stereolithography is required to have low-viscosity properties in a room temperature (for example, about 25° C.) environment. Moreover, an elastic molded product that is a cured product of the composition for stereolithography is required to exhibit rubber properties.


Under these circumstances, a principal object of the present invention is to provide a novel polymer composition for stereolithography that is capable of suitably providing an elastic molded product by stereolithography. Further objects of the present invention are to provide an elastic molded product that is a cured product of the polymer composition for stereolithography, and a method for producing an elastic molded product using the polymer composition.


The present inventors intensively studied to achieve the above-mentioned objects. As a result, they found that a polymer composition as described below can suitably provide an elastic molded product by stereolithography: a polymer composition containing a liquid polymer and a monomer, and having a viscosity of 3,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec−1. The present invention was completed as a result of further studies based on these findings.


More specifically, the present invention provides the following aspects.


Item 1. A polymer composition for stereolithography containing:


a liquid polymer; and


a monomer,


the polymer composition for stereolithography having a viscosity of 3,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 am and a shear rate of 100 sec−1.


Item 2. The polymer composition for stereolithography according to item 1, wherein the liquid polymer has a (meth)acryloyl group.


Item 3. The polymer composition for stereolithography according to item 1 or 2, wherein the liquid polymer includes at least one of liquid isoprene having a (meth)acryloyl group and liquid isobutylene having a (meth)acryloyl group.


Item 4. The polymer composition for stereolithography according to any one of items 1 to 3, wherein the liquid polymer has a number average molecular weight of 5,000 or more and 500,000 or less.


Item 5. The polymer composition for stereolithography according to any one of items 1 to 4, wherein the liquid polymer has a viscosity of 100 mPa·s or more and 1,000,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec−1.


Item 6. The polymer composition for stereolithography according to any one of items 1 to 5, having a content rate of the liquid polymer of 15 mass % or more and 70 mass % or less.


Item 7. The polymer composition for stereolithography according to any one of items 1 to 6, having a percentage of the monomer of 30 mass % or more and 85 mass % or less based on 100 mass % in total of the liquid polymer and the monomer.


Item 8. The polymer composition for stereolithography according to any one of items 1 to 7, further containing an oligomer, and having a percentage of the monomer of 30 mass % or more and 90 mass % or less based on 100 mass % in total of the liquid polymer, the monomer, and the oligomer.


Item 9. The polymer composition for stereolithography according to any one of items 1 to 8, further containing an oligomer, and having a total percentage of the monomer and the oligomer of 30 mass % or more and 90 mass % or less based on 100 mass % in total of the liquid polymer, the monomer, and the oligomer.


Item 10. The polymer composition for stereolithography according to item 8 or 9, wherein the oligomer is at least one of urethane (meth)acrylate and epoxy (meth)acrylate.


Item 11. The polymer composition for stereolithography according to any one of items 8 to 10, wherein the oligomer includes a (meth)acrylate.


Item 12. The polymer composition for stereolithography according to any one of items 1 to 11, wherein the monomer is at least one of monofunctional to tetrafunctional monomers.


Item 13. The polymer composition for stereolithography according to any one of items 1 to 12, wherein the monomer includes a (meth)acrylate.


Item 14. An elastic molded product, which is a cured product of the polymer composition for stereolithography according to any one of items 1 to 13.


Item 15. A method for producing an elastic molded product, the method including:


supplying the polymer composition for stereolithography according to any one of items 1 to 13 onto a molding table, and curing the polymer composition for stereolithography by light irradiation to form a first layer of a cured product;


supplying, onto the first layer of the cured product, the polymer composition for stereolithography for forming a second layer of a cured product, and curing the polymer composition for stereolithography by light irradiation to form the second layer of the cured product; and


repeating a step similar to the step of forming the second layer of the cured product until an N-th layer is formed to produce an elastic molded product having a three-dimensional shape.


The present invention can provide a novel polymer composition for stereolithography that is capable of suitably providing an elastic molded product by stereolithography. The present invention can also provide an elastic molded product that is a cured product of the polymer composition for stereolithography, and a method for producing an elastic molded product using the polymer composition.


DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The polymer co position for stereolithography of the present invention contains a liquid polymer and a monomer, and has a viscosity of 3,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec−1. Since the polymer composition for stereolithography of the present invention has the above-mentioned feature, the polymer composition is capable of suitably providing an elastic molded product by stereolithography. In the following, the polymer composition for stereolithography of the present invention, an elastic molded product that is a cured product of the polymer composition, and a method for producing an elastic molded product using the polymer composition will be described in detail.


In the present invention, the “polymer con position for stereolithography” means a polymer composition used in a stereolithography technique in which a polymer composition is repeatedly laminated and photocured based on, for example, designed data of a three-dimensional structure using a three-dimensional additive manufacturing device (a so-called 3D printer) for the stereolithography technique to produce a three-dimensional structure. Various stereolithography techniques such as Stereolithography Apparatus (SLA), Digital Light Processing (DLP), and Liquid Crystal Display (LCD) are known. Since the polymer composition for stereolithography of the present invention has low viscosity at room temperature (25° C.) and is capable of being suitably cured by light irradiation to provide an elastic molded product, the polymer composition can be suitably used for producing an elastic molded product by a stereolithography technique.


In the present invention, the term “(meth)acryloyl group” means “an acryloyl group or a methacryloyl group”, and terms similar to the above are similarly interpreted. In addition, herein, numerical values joined by the word “to” mean a numerical range including the numerical values before and after the word “to” as the lower and upper limits, respectively. When a plurality of lower limits and a plurality of upper limits are separately described, it is possible to select any numerical values of the lower and upper limits and join the numerical values by the word “to”.


<Polymer Composition for Stereolithography>


The polymer composition for stereolithography of the present invention contains a liquid polymer as a polymer and a monomer, and is cured by light irradiation into an elastic molded product.


The polymer composition for stereolithography of the present invention has a viscosity of 3,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 2.5 mm and a shear rate of 100 sec−1. From the viewpoint of allowing an elastic molded product that is a cured product of the polymer composition to exhibit excellent properties while ensuring a viscosity suitable for stereolithography in a room temperature environment, the viscosity is preferably 2,500 mPa·s or less, more preferably 2,000 mPa·s or less. The lower limit of the viscosity is, for example, 5 mPa·s or more, preferably 10 mPa·s or more, more preferably 20 mPa·s or more, still more preferably 30 mPa·s or more.


In general, the stereolithography technique includes a step of sequentially laminating and photocuring a polymer composition for stereolithography on a flat surface called a molding table (stage) of a stereolithography device. In this step, the thickness of one layer in the laminate during curing of the polymer composition for stereolithography is controlled to about 0.01 to 0.5 mm, and then the polymer composition is irradiated with light (UV light) to form a photocured layer (cured product) having a thickness of about 0.01 to 0.5 mm. Immediately after the photocuring, the molding table moves to produce a gap having a width of about 0.01 to 0.5 mm that is the same as the thickness of the above-mentioned layer, the polymer composition for stereolithography flows into the gap, and the polymer composition is irradiated with light to form a photocured layer (cured product). Repetition of this process gradually laminates the photocured layers to increase the thickness of the elastic molded product. If the polymer composition for stereolithography has a viscosity exceeding 3,000 mPa·s, the polymer composition hardly flows into the gap having a width of about 0.01 to 0.5 mm, and it is difficult to suitably form a photocured layer. Although it is possible to slow the movement speed of the molding table until sufficient amount of the polymer composition for stereolithography flows into the gap, the slow movement speed may lower the productivity. Moreover, wiggling of the molding table may apply high shear force to the polymer composition for stereolithography to damage the structure during the stereolithography.


The liquid polymer is not particularly limited, and a known polymer can be used. The liquid polymer can also be a commercially available polymer. Specific examples of the liquid polymer include liquid butadiene, a liquid styrene-butadiene copolymer, a liquid isoprene-butadiene copolymer, liquid isoprene, liquid hydrogenated isoprene, a liquid isoprene-styrene copolymer, and liquid isobutylene. Among these, from the viewpoint of allowing an elastic molded product that is a cured product of the polymer composition to exhibit excellent properties (for example, the Shore hardness, tensile strength at break, tensile elongation at break, compression set, and cyclic fatigue properties described later) while ensuring a viscosity suitable for stereolithography, liquid polymers crosslinkable by light irradiation and having an unsaturated bond such as a (meth)acryloyl group and a vinyl group, and liquid polymers having a cyclic ether, such as an epoxy compound and an oxetane compound are preferred. In particular, liquid polymers having a (meth)acryloyl group are preferred. The liquid polymer is particularly preferably liquid isoprene having a (meth)acryloyl group and liquid isobutylene having a (meth)acryloyl group from the viewpoint of improving the tensile strength at break and the tensile elongation at break of the elastic molded product. The polymer composition for stereolithography may contain a single liquid polymer or two or more liquid polymers.


The content of the liquid polymer in the polymer composition for stereolithography of the present invention is not particularly limited. From the viewpoint of allowing an elastic molded product that is a cured product of the polymer composition to exhibit excellent properties while ensuring a viscosity suitable for stereolithography in a room temperature environment, the content of the liquid polymer is, for example, 5 mass % or more, preferably 10 mass % or more, more preferably 15 mass % or more, still more preferably 20 mass % or more, particularly preferably 35 mass % or more. Further, from the same viewpoint, the upper limit of the content of the liquid polymer in the polymer composition for stereolithography of the present invention is, for example, 75 mass % or less, preferably 70 mass % or less, more preferably 65 mass % or less, still more preferably 60 mass % or less.


The polymer composition for stereolithography of the present invention may contain a polymer component (for example, a diluent polymer) different from the liquid polymer. From the viewpoint of allowing an elastic molded product that is a cured product of the polymer composition to exhibit excellent properties while ensuring a viscosity suitable for stereolithography in a room temperature environment, the content of the polymer component other than the liquid polymer is preferably 15 mass % or less, more preferably 10 mass % or less, still more preferably 5 mass % or less, particularly preferably 0 mass %.


The number average molecular weight (Mn) of the liquid polymer is not particularly limited. From the same viewpoint, the number average molecular weight of the liquid polymer is preferably 500 or more, more preferably about 5,000 to 500,000, still more preferably about 5,000 to 400,000, about 5,000 to 50,000, or about 5,000 to 40,000.


The number average molecular weight (Mn) of the liquid polymer is a value in terms of standard polystyrene, and is measured using a gel permeation chromatograph.


From the same viewpoint, the viscosity of the liquid polymer that is measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec−1 is preferably 100 to 1,000,000 mPa·s, more preferably 100 to 500,000 mPa·s, still more preferably 10,000 to 450,000 mPa·s.


The monomer contained in the polymer composition for stereolithography of the present invention is not particularly limited as long as it is a photopolymerizable monomer that is curable by light irradiation. Examples of the monomer include monofunctional monomers and polyfunctional monomers (for example, a bifunctional monomer, a bifunctional monomer, and a tetrafunctional monomer). From the viewpoint of allowing an elastic molded product that is a cured product of the polymer composition to exhibit excellent properties while ensuring a viscosity suitable for stereolithography, preferred examples of the monomer include monofunctional to tetrafunctional monomers. Use of a monofunctional monomer is preferred from the viewpoint of reducing the viscosity of the polymer composition for stereolithography in a room temperature environment. Use of a polyfunctional monomer is preferred from the viewpoint of allowing the elastic molded product to exhibit excellent properties. The monomer contained in the polymer composition for stereolithography of the present invention may be a single monomer or two or more monomers.


From the viewpoint of allowing an elastic molded product that is a cured product of the polymer composition to exhibit excellent properties while ensuring a viscosity suitable for stereolithography as well as excellent photocuring reactivity, the monomer preferably includes a (meth)acrylate.


Preferred examples of the monofunctional monomer include monofunctional acrylates. Specific examples of the monofunctional monomer include ethoxylated nonylphenol acrylate, methyl 2-allyloxymethyl acrylate, isostearyl acrylate, m-phenoxybenzyl acrylate, dicyclopentanyl acrylate, isobornyl acrylate, phenoxyethyl (meth)acrylate, phenoxy-2-methylethyl (meth)acrylate, phenoxyethoxyethyl (meth)acrylate, 3-phenoxy-2-hydroxypropyl (meth)acrylate, 2-phenylphenoxyethyl (meth)acrylate, 4-phenylphenoxyethyl (meth)acrylate, 3-(2-phenylphenyl)-2-hydroxypropyl (meth)acrylate, a (meth)acrylate of p-cumylphenol reacted with ethylene oxide, 2-bromophenoxyethyl (meth)acrylate, 2,4-dibromophenoxyethyl (meth)acrylate, 2,4,6-tribromophenoxyethyl (meth)acrylate, phenoxy (meth)acrylate modified with two or more moles of ethylene oxide or propylene oxide, isobornyl (meth)acrylate, bornyl (meth)acrylate, tricyclodecanyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dicyclopentenyl (meth)acrylate, cyclohexyl (meth)acrylate, 4-butylcyclohexyl (meth)acrylate, acryloyl morpholine, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, t-butyl (meth)acrylate, amyl (meth)acrylate, isoamyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, octyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, isostearyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, butoxyethyl (meth)acrylate, ethoxydiethylene glycol (meth)acrylate, polyethylene glycol mono(meth)acrylate, polypropylene glycol mono(meth)acrylate, methoxyethylene glycol (meth)acrylate, ethoxyethyl (meth)acrylate, methoxypolyethylene glycol (meth)acrylate, methoxypolypropylene glycol (meth)acrylate, diacetone (meth)acrylamide, isobutoxy methyl (meth)acrylamide, N,N-dimethyl (meth)acrylamide, t-octyl (meth)acrylamide, dimethylaminoethyl (meth)acrylate, diethylaminoethyl (meth)acrylate, 7-amino-3,7-dimethyloctyl (meth)acrylate, N,N-diethyl (meth)acrylamide, N,N-dimethylaminopropyl (meth)acrylamide, hydroxybutyl vinyl ether, lauryl vinyl ether, cetyl vinyl ether, 2-ethylhexyl vinyl ether, polyoxyethylene nonylphenyl ether (meth)acrylate, and vinyl monomers (for example, N-vinylpyrrolidone, N-vinylcaprolactam, vinylimidazole, and vinylpyridine).


Specific examples of the polyfunctional monomer include polyethylene glycol di(meth)acrylate, dipropylene glycol diacrylate, propoxylated pentyl glycol diacrylate, propoxylated glyceryl triacrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, ethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, trimethylolpropane trioxyethyl (meth)acrylate, tris(2-hydroxyethyl) isocyanurate tri(meth)acrylate, tris(acryloyloxy) isocyanurate, bis(hydroxymethyl) tricyclodecane di(meth)acrylate, dipentaerythritol hexa(meth)acrylate, a di(meth)acrylate of a diol that is an adduct of bisphenol A with polyethylene oxide or propylene oxide, a di(meth)acrylate of a diol that is an adduct of hydrogenated bisphenol A with ethylene oxide or propylene oxide, epoxy (meth)acrylate obtained by adding a (meth)acrylate to diglycidyl ether of bisphenol A, and triethylene glycol divinyl ether.


From the viewpoint of allowing an elastic molded product that is a cured product of the polymer composition to exhibit excellent properties while ensuring a viscosity suitable for stereolithography in a room temperature environment, the polymer composition for stereolithography of the present invention preferably has a percentage of the monomer of, for example, 95 mass % or less, preferably about 30 to 85 mass %, more preferably about 40 to 80 mass %, still more preferably about 50 to 70 mass % based on 100 mass % in total of the liquid polymer and the monomer. A higher percentage of the monomer (and the oligomer described later) in the polymer composition for stereolithography reduces the compression set of the elastic molded product.


The polymer composition for stereolithography of the present invention may further contain an oligomer, and preferably contains an oligomer. An “oligomer” is a polymer including, for example, about 10 to 100 monomers bonded together. The oligomer contained in the polymer composition for stereolithography of the present invention is not particularly limited as long as it is curable by light irradiation. The oligomer preferably includes a (meth)acrylate. For example, urethane (meth)acrylate (an oligomer obtained by reacting an isocyanate group with a hydroxyl group and having a urethane bond and an acrylic group) and epoxy (meth)acrylate (an oligomer obtained by reacting an epoxy resin with (meth)acrylic acid) are suitable, and other oligomers to which a (meth)acrylate is added can also be used. The oligomer used may be a single oligomer or two or more oligomers in combination.


When the polymer composition for stereolithography of the present invention contains an oligomer, from the viewpoint of allowing an elastic molded product that is a cured product of the polymer composition to exhibit excellent properties while ensuring a viscosity suitable for stereolithography in a room temperature environment, the polymer composition for stereolithography of the present invention preferably has a percentage of the oligomer of about 30 to 90 mass %, more preferably about 40 to 80 mass %, still more preferably about 50 to 70 mass % based on 100 mass % in total of the liquid polymer, the monomer, and tire oligomer. Presence of the oligomer in the polymer composition for stereolithography can reduce the compression set of the elastic molded product. When the polymer composition for stereolithography of the present invention contains an oligomer, from the viewpoint of allowing an elastic molded product that is a cured product of the polymer composition to exhibit excellent properties while ensuring a viscosity suitable for stereolithography in a room temperature environment, the polymer composition for stereolithography of the present invention preferably has a total percentage of the monomer and the oligomer of about 30 to 90 mass %, more preferably about 40 to 80 mass %, still more preferably about 50 to 70 mass % based on 100 mass % in total of the liquid polymer, the monomer, and the oligomer. As described above, a higher percentage of the monomer and the oligomer in the polymer composition for stereolithography reduces the compression set of the elastic molded product.


In the polymer composition for stereolithography of the present invention, the monomer and the oligomer each serve as a reactive diluent that adjusts the properties of the cured elastic molded product while adjusting the viscosity in a room temperature environment.


The polymer composition for stereolithography of the present invention preferably contains a photopolymerization initiator. Addition of the photopolymerization initiator promotes the curing of the above-mentioned polymer composition for stereolithography. The photopolymerization initiator is not particularly limited, and a known photopolymerization initiator that generates radicals by light irradiation can be used. Examples of suitable photopolymerization initiators include alkylphenone photopolymerization initiators (for example, 2-hydroxy-2-methylpropiophenone, 2,2-dimethoxy-2-phenylacetophenone, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-4′-(2-hydroxyethoxy)-2-methylpropiophenone, 2-(4-(methylthio)benzoyl)-2-(4-morpholinyl)propane, 2-(dimethylamino)-1-(4-morpholinophenyl)-2-benzyl-1-butanone, and 2-(dimethylamino)-2-(4-methylbenzyl)-1-(4-morpholinophenyl)butan-1-one), acylphosphine oxide photopolymerization initiators (for example, bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide and 2,4,6-trimethylbenzoyl-diphenyl phosphine oxide), and oxime ester photopolymerization initiators (for example, 1,2-octanedione,1-(4-(phenylthio)-,2-(O-benzoyloxime)) and ethanone,1-(9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl)-,1-(O-acetyloxime)). In a stereolithography technique, a light source having a peak wavelength of light intensity in a wavelength region of 390 nm to 410 nm, in particular, a light source having a peak wavelength of light intensity in a wavelength region of 405 nm is mainly used. Therefore, it is preferable that the photopolymerization initiator be one that initiates radical polymerization of the polymer composition for stereolithography by light irradiation from such a light source. The photopolymerization initiator used may be a single photopolymerization initiator or two or more photopolymerization initiators in combination. From the viewpoint of suitably curing the polymer composition for stereolithography in a stereolithography technique in which the light source as described above is used, the polymer composition for stereolithography of the present invention preferably contains at least two photopolymerization initiators different in absorption band. For example, it is preferred to use a photopolymerization initiator having an absorption band in a wavelength region of 405 nm and a photopolymerization initiator having an absorption band in a wavelength region of 300 to 380 nm in combination.


The content of the photopolymerization initiator is preferably about 0.5 to 10 parts by mass, more preferably about 1 to 7 parts by mass based on 100 parts by mass of the liquid polymer.


The polymer composition for stereolithography of the present invention may further contain various additives as long as the effects of the present invention are not impaired. The additives are not particularly limited, and examples thereof include known additives added to the composition for stereolithography, such as diluent polymers, photosensitizers, fillers, UV blockers, dyes, pigments, leveling agents, flow regulators, defoamers, plasticizers, polymerization inhibitors, flame retardants, dispersion stabilizers, storage stabilizers, antioxidants, metals, metal oxides, metal salts, and ceramics. The additive contained in the polymer composition for stereolithography of the present invention may be a single additive or two or more additives. The total of content rates of additives contained in the polymer composition for stereolithography is preferably 5 mass % or less, more preferably 3 mass % or less, and may be 0 mass %.


The polymer composition for stereolithography of the present invention can be easily produced by mixing the liquid polymer, the monomer, and the oligomer, the photopolymerization initiator, and various additives that are optionally added.


<Elastic Molded Product>


The elastic molded product of the present invention is a cured product of the above-mentioned polymer composition for stereolithography. Specifically, the elastic molded product is obtained by curing the polymer composition for stereolithography by light irradiation.


The elastic molded product of the present invention may have a Shore A hardness appropriately determined according to the hardness required of a final product. The Shore A hardness is preferably 25 or more, more preferably within the range of 25 to 90 from the viewpoint of exhibiting excellent properties. That is, as for the polymer composition for stereolithography of the present invention, it is preferable that an elastic molded product (having a shape of a compressed ball of a diameter φ of 29×12.5 mm according to JIS K6262:2013) produced from the polymer composition by DLP stereolithography under conditions of a temperature of 25° C., a UV wavelength of 405 nm, a lamination pitch of 0.05 mm, a UV irradiation time of 20 seconds per layer, and a UV illuminance of 5.0 mW/cm2 have a Shore A hardness of 25 or more, more preferably 25 to 90. In the present invention, the Shore A hardness of the elastic molded product is a value measured according to the method prescribed in JIS K6253-3:2012.


The tensile strength at break of the elastic molded product of the present invention may be appropriately determined according to the tensile strength at break required of a final product, and is preferably 5.0 MPa or more, more preferably 5.5 MPa or more. That is, as for the polymer composition for stereolithography of the present invention, it is preferable that an elastic molded product (having a shape of a dumbbell No. 3 test piece according to JIS K6251:2017) produced from the polymer composition by DLP stereolithography insider conditions of a temperature of 25° C., a UV wavelength of 405 nm, a lamination pitch of 0.05 mm, a UV irradiation time of 20 seconds per layer, and a UV illuminance of 5.0 mW/cm2 have a tensile strength at break of 5.0 MPa or more, more preferably 5.5 MPa or more. In the present invention, the tensile strength at break of the elastic molded product is a value measured according to the method prescribed in JIS K6251:2017. The upper limit of the tensile strength at break of the elastic molded product is, for example, 50 MPa or less, or 15.0 MPa or less.


The tensile elongation at break of the elastic molded product of the present invention may be appropriately determined according to the tensile elongation at break required of a final product, and is preferably 30% or more, more preferably 70% or more, still more preferably 100% or more. That is, as for the polymer composition for stereolithography of the present invention, it is preferable that an elastic molded product (having a shape of a dumbbell No. 3 test piece according to JIS K6251:2017) produced from the polymer composition by DLP stereolithography under conditions of a temperature of 25° C., a UV wavelength of 405 nm, a lamination pitch of 0.05 mm, a UV irradiation time of 20 seconds per layer, and a UV illuminance of 5.0 mW/cm2 have a tensile elongation at break of 30% or more, more preferably 70% or more, still more preferably 100% or more. In the present invention, the tensile elongation at break of the elastic molded product is a value measured according to the method prescribed in JIS K6251:2017. The upper limit of the tensile elongation at break of the elastic molded product is, for example, 1000% or less.


The compression set of the elastic molded product of the present invention may be appropriately determined according to the compression set required of a final product. However, from the viewpoint of exhibiting excellent properties, the compression set which is measured after a lapse of 0.5 hours from the process of compressing the elastic molded product by 25% at a temperature of 23° C. for 22 hours and then releasing the compression according to the method prescribed in JIS K6262:2013, is preferably 10% or less, more preferably 7% or less, still more preferably 5% or less. That is, as for the polymer composition for stereolithography of the present invention, it is preferable that an elastic molded product (having a shape of a compressed ball of a diameter φ of 29×12.5 mm according to JIS K6262:2013) produced from the polymer composition by DLP stereolithography under conditions of a temperature of 25° C., a UV wavelength of 405 nm, a lamination pitch of 0.05 mm, a UV irradiation time of 20 seconds per layer, and a UV illuminance of 5.0 mW/cm2 have a compression set of 10% or less, more preferably 7% or less, still more preferably 5% or less.


The shape of the elastic molded product of the present invention is not particularly limited, and the polymer composition for stereolithography can be formed into a desired shape by stereolithography.


The method for producing the elastic molded product of the present invention is not particularly limited, and the elastic molded product can be produced by a known stereolithography technique using the above-mentioned polymer composition for stereolithography as a raw material. The details of the method for producing the elastic molded product of the present invention are as described in the following section of <Method for producing elastic molded product>.


<Method for Producing Elastic Molded Product>


The method for producing the elastic molded product of the present invention can be suitably perforated by using, in a conventionally known stereolithography technique in which a liquid resin is used as a raw material, the polymer composition for stereolithography of the present invention instead of a liquid resin. Specifically, for example, in various stereolithography techniques such as Stereolithography Apparatus (SLA), Digital Light Processing (DLP), and Liquid Crystal Display (LCD), the elastic molded product can be produced from the polymer composition for stereolithography of the present invention as a raw material instead of a liquid resin.


The elastic molded product of the present invention can be suitably produced, for example, by a method including: supplying the polymer composition for stereolithography of the present invention onto a molding table, and curing the polymer composition for stereolithography by light irradiation to form a first layer of a cured product, supplying, onto the first layer of the cured product, the polymer composition for stereolithography for forming a second layer of a cured product, and curing the polymer composition for stereolithography by light irradiation to form the second layer of the cured product; and repeating a step similar to the step of flaming the second layer of the cured product until an N-th layer is formed to produce an elastic molded product (stereolithography product) having a three-dimensional shape. In the stereolithography technique, a known 3D printer can be used, and the 3D printer can be a commercially available product.


In the stereolithography technique, the thickness of one layer in the laminate during curing of the polymer composition for stereolithography is, for example, about 0.01 to 0.5 mm. The emitted light is generally ultraviolet light, and preferably includes light having a wavelength of 405 nm. Further, the illuminance of the emitted light is generally about 0.1 to 100 mW/cm2 in a measurement wavelength range of 405 nm. The light irradiation time for curing one layer of the polymer composition for stereolithography varies depending on the type of stereolithography, and is appropriately adjusted. For example, in the case of the DLP stereolithography, the light irradiation time is about 1 to 60 seconds. The elastic molded product of the present invention is preferably produced in an environment around room temperature (for example, 20 to 30° C.).


After the above-mentioned stereolithography, optionally, a general secondary treatment such as irradiation with a high-pressure mercury lamp, irradiation with a metal halide lamp, irradiation with a UV-LED, and heating can be additionally performed. These secondary treatments can modify the surface after stereolithography, improve the strength, and promote the curing. The secondary treatment may be performed together with stereolithography, although it is not always necessary depending on the conditions of stereolithography.







EXAMPLES

Hereinafter, examples of the present invention will be described. However, the present invention is not limited to the following examples. Details of materials used in the examples and comparative examples are shown in Table 1.













TABLE 1








Number






average





molecular
Viscosity





weight
at 25° C.


Material
Product name
Manufacturer
(Mn)
mPa · s





















Liquid
Methacryloyl
ester compound (98%) of maleic anhy-
UC-102M
KURARAY CO., LTD.
17,000
60,000


polymer
group-
dride adduct of isoprene polymer and 2-
UC-203M

35,000
400,000



containing
hydroxyethyl methacrylate polyisobutylene
EP400V
KANEKA
90,000
1,000,000



liquid polymer
having acryloyl groups or both terminals

CORPORATION


Monomer
Mono-
ethoxylated nonylphenol acrylate
SR504
ARKEMA K.K.
450
100



functional
methyl 2-allyloxymethyl acrylate
AOMA
NIPPON SHOKUBAI
156
1.6



acrylate


CO., LTD.




isostearyl acrylate
ISTA
OSAKA ORGANIC
324
17






CHEMICAL






INDUSTRY LTD.




m-phenoxybenzyl acrylate
LIGHT
KYOEISHA
254
15





ACRYLATE
CHEMICAL





POB-A
Co., LTD.




dicyclopentanyl acrylate
FA-513AS
Hitachi Chemical
206
17






Company, Ltd.




isobornyl acrylate
IBXA
OSAKA ORGANIC
208
9






CHEMICAL






INDUSTRY LTD.



Bifunc-
polyethylene glycol diacrylate
SR344
ARKEMA K.K.
508
57



tional
dipropylene glycol diacrylate
SR508

242
10



acrylate
propoxylated neopentyl glycol diacrylate
SR9003

328
15



Trifunc-
propoxylated glyceryl triacrylate
SR9020

428
95



tional



acrylate


Oligomer
Urethane
aromatic urethane acrylate oligomer
CN992


5,000



acrylate
aliphatic urethane acrylate oligomer
CN966


60,000




aliphatic urethane acrylate oligomer
CN8881

4,000
200,000




polyurethane acrylate/acrylic monomer
BEAMSET
ARAKAWA

170,000





505A-6
CHEMICAL






INDUSTRIES, LTD.


Diluent
Liquid BR
butadiene polymer compound
L-BR302
KURARAY CO., LTD.
5,500
1,200


polymer


Photopoly-
Alkylphenone
2-hydroxy-2-methylpropiophenone
Omnirad
BASF SE
164
25


merization


(Irgacure) 1173


initiator
Acylphosphine
Bis(2,4,6-trimethylbenzoyl)phenylphosphine
Omnirad

419




oxide
oxide
(Irgacure) 819



Monoacylphos-
2,4,6-trimethylbenzoyl-diphenyl phosphine
Omnirad

348




phine oxide
oxide
(Irgacure) TPO


Photo-
Thioxanthone
2-isopropylthioxanthone
ITX
Tokyo Chemical




sensitizer



Industry Co., Ltd.



Benzophenone
4,4′-bis(diethylamino)benzophenone
EMK: TR-EMK
CHANGZHOU TRONLY





Acridine
9-phenylacridine
9-PA: TR-
NEW ELECTRONIC







PAG-101
MATERIALS CO., LTD.






(Changzhou, China)



Anthracene
9,10-bis(octanoyloxy)anthracene
DBA:
Kawasaki Kasei







ANTHRACURE
Chemicals Ltd.





UVS-581


UV blocker

2,2′-(2,5-thiophenediyl)bis(5-tert-
Mayzo, Inc.
Mayzo, Inc.






butylbenzoxazole)


Vulcanized
Pulverized
SBR compound
VR-1
SRI




rubber
vulcanized



rubber (particle



size: 85 μm)












Filler
Silica
Nipsil VN3
Tosoh Corporation




Coupling
Silane coupling agent
Y9936
Momentive Performance




agent


Materials Inc.









Examples 1 to 31 and Comparative Examples 1 to 6

(Production of Polymer Compositions for Stereolithography)


The materials were mixed and defoamed with a planetary centrifugal mixer at each mixing ratio (parts by mass) shown in Tables 2 to 4 to produce a polymer composition for stereolithography. The components were uniformly mixed. In Tables 2 to 4, “−” indicates that the relevant component is not added.


(Viscosity of Polymer Compositions for Stereolithography)


As for each polymer composition for stereolithography obtained in each of the examples and comparative examples, the viscosity was measured in an environment of a temperature of 25° C. (with an error of ±2° C.) and a relative humidity of 50% using an E-type viscometer (MCR301 manufactured by Anton Paar GmbH) under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec−1. The results are shown in Tables 2 to 4.


(Production of Elastic Molded Products)


Using each polymer composition for stereolithography obtained in each of the examples and comparative examples, elastic molded products were produced by DLP stereolithography. Specifically, using a 3D printer equipped with a light source (UV-LED) having a peak wavelength of 405 nm, elastic molded products were produced under conditions of a temperature of 25° C., a lamination pitch of 0.05 mm, an irradiation time of 20 seconds per layer, and an illuminance of 5.0 mW/cm2 at the wavelength of 405 nm. In each of the examples and comparative examples, elastic molded products having three types of shapes were produced. The first one is an elastic molded product having a shape of a dumbbell No. 3 test piece according to JIS K6251:2017 used in the tensile test described later, the second one is an elastic molded product having a shape of a compressed ball of a diameter φ of 29×12.5 mm according to JIS K6262:2013 used in the measurement of the hardness and compression set described later, and the third one is an elastic molded product test piece according to JIS K6260:2017 (dimensions: length of 150 mm, width of 25 mm, radius of curvature of central groove of 2.38 mm, and thickness of 6.3 mm) used in the cyclic fatigue test described later.


Note, however, that no elastic molded product was produced from the polymer compositions for stereolithography obtained in Comparative Examples 1 to 6 under the above-mentioned conditions due to high viscosity. Therefore, elastic molded products were obtained by increasing the temperature of the liquid composition to 40 to 80° C. to lower the apparent viscosity, or changing the up-down length of the stage during formation of one layer to about 10 times the normal length to form the layer at a speed of one-tenth the normal speed. When a commercially available 3D printer is used as it is, it is difficult to produce the elastic molded products of Comparative Examples 1 to 6 under such conditions. Even if the elastic molded products can be produced, the productivity is very low. Further, since the upper limit of the temperature control in a commercially available 3D printer is about 30° C., it is difficult to produce the elastic molded products of Comparative Examples 1 to 6 using a commercially available 3D printer.


(Hardness of Elastic Molded Products)


As for the elastic molded products (having a shape of a compressed ball of a diameter φ of 29×12.5 mm according to JIS K6252:2013) obtained in the examples and comparative examples, the Shore A hardness was measured according to the method prescribed in JOS K6253-3:2012. The results are shown in Tables 2 to 4.


(Tensile Test of Elastic Molded Products)


As for the elastic molded products (having a shape of a dumbbell No. 3 test piece according to JIS K6251:2017) obtained in the examples and comparative examples, the tensile strength at break and the tensile elongation at break were measured according to the prescription of JIS K6251:2017. The results are shown in Tables 2 to 4. It is determined that the larger the value of the tensile strength at break is, the higher the strength of the elastic molded product is, and the larger the value of the tensile elongation at break is, the easier the elastic molded product is to be elongated and the better the mechanical properties of the elastic molded product are.


(Compression Set)


The elastic molded products (having a shape of a compressed ball of a diameter φ of 29×12.5 mm according to JIS K6262:2013) obtained in the examples and comparative examples were compressed by 25% at a temperature of 23° C. for 22 hours, the compression was released, and then the compression set was measured after a lapse of 0.5 hours from the above-mentioned process according to the prescription of JIS K6262:2013. The results are shown in Tables 2 to 4. It is determined that the smaller the value of the compression set is, the better the restoring force of the elastic molded product is.


(Cyclic Fatigue Test)


The elastic molded products (test pieces according to JIS K6260:2017 (dimensions: length of 150 mm, width of 25 mm, radius of curvature of central groove of 2.38 mm, and thickness of 6.3 mm)) obtained in the examples and comparative examples were subjected to a cyclic fatigue test using a DeMattia flex tester according to the prescription of JIS K6260:2017. A cut was made in the central groove of the test piece, and the test piece was repeatedly flexed at 5 Hz with a strain of 50% applied to the central groove. The degree of growth of the crack during the flexing was measured. The crack growth (times/mm) is calculated by the following equation. The number of flexes until the crack grew by 1 mm was counted. The results are shown in Tables 2 to 4. It is determined that the larger the value is, the longer it takes for the crack to grow by 1 mm, and the better the result of the cyclic fatigue test (flexural crack growth resistance) is.

Crack growth (times/mm)=number of flexes (times)/length of crack (mm)


(Production Time of Elastic Molded Products)


The time taken for the production of the elastic molded product (molding time for producing a 2-mm-thick sample) was measured. The results are shown in Tables 2 to 4, in which “very good” means a production time of 25 minutes or less, “good” means a production time more than 25 minutes and 60 minutes or less, and “poor” means a production time of 60 minutes or more or that no elastic molded product was produced by DLP stereolithography.











TABLE 2









Examples






















1
2
3
4
5
6
7
8





Polymer
Liquid
Methac-
UC102M
50
15
70
50
50
50
50
50


composi-
polymer
ryloyl
(isoprene


tion for

group-
skeleton)


stereoli-

containing
UC203M










thography

liquid
(isoprene




polymer
skeleton)



Monomer
Mono-
ethoxylated
50
85
30









func-
nonylphenol




tional
acrylate




acrylate
methyl 2-



50









allyloxymethyl





acrylate





isostearyl




50








acrylate





m-phenoxybenzyl





50







acrylate





dicyclopentanyl






50






acrylate





isobornyl







50





acrylate




Bifunc-
polyethylene












tional
glycol




acrylate
diacrylate





dipropylene













glycol





diacrylate





propoxylated













neopentyl





glycol





diacrylate




Trifunc-
propoxylated












tional
glyceryl




acrylate
triacrylate



Oligomer
Urethane
aromatic












acrylate
urethane





acrylate





oligomer





aliphatic













urethane





acrylate





oligomer





polyurethane













acrylate/





acrylic





monomer



Diluent
Liquid BR
butadiene











polymer

polymer





compound



Photo-
Alkyl-
2-hydroxy-2-
1.5
1.5
1,5
1.5
1.5
1.5
1.5
1.5



polymer-
phenone
methyl-



ization

propiophenone



initiator
Acylphos-
Bis(2,4,6-
0.3
0.3
0.3
0.3
0.3
0.3
0.3
0.3




phine
trimethylben-




oxide
zoyl)phenylphos-





phine oxide




Mono-
2,4,6-












acylphos-
trimethylben-




phine
zoyl-diphenyl




oxide
phosphine





oxide



Photo-
Thio-
2-isopropylthio-











sensitizer
xanthone
xanthone




Benzo-
4,4′-bis(diethyl-












phenone
amino)benzo-





phenone




Acridine
9-phenyl-













acridine




Anthra-
9,10-bis(octa-












cene
noyloxy)anthra-





cene



UV

2,2′-(2,5-thiophene-











blocker

diyl)bis(5-tert-butyl-





benzoxazole)



Vulcanized
Pulverized
SBR compound











rubber
vulcanized




rubber




(particle




size: 85 μm)


















Filler
Silica











Coupling
Silane coupling agent











agent



Viscosity
mPa × s
1,800
100
3,000
1,200
1,400
1,400
1,400
1,300



at 23° C.
















Elastic
Hardness (Shore A)
53
58
49
62
54
52
65
63


molded
Tensile strength at break (MPa)
6.5
7.8
5.8
7.2
6.7
6.3
11.0
10.5


product
Tensile elongation at break (%)
140
70
180
110
120
100
110
130



Compression set (%)
3.0
3.5
2.2
3.2
2.9
2.8
3.3
3.2



Cyclic fatigue (crack growth
8,000
500
11,000
6,000
8,000
8,000
6,000
6,000



(times/min))



Production time
very
very
good
very
very
very
very
very




good
good

good
good
good
good
good












Examples





















9
10
11
12
13
14
15





Polymer
Liquid
Methac-
UC102M
50
50
50
50
50
50



composi-
polymer
ryloyl
(isoprene


tion for

group-
skeleton)


stereoli-

containing
UC203M






50


thography

liquid
(isoprene




polymer
skeleton)



Monomer
Mono-
ethoxylated
30
30
30
40
45
45
50




func-
nonylphenol




tional
acrylate




acrylate
methyl 2-












allyloxymethyl





acrylate





isostearyl












acrylate





m-phenoxybenzyl












acrylate





dicyclopentanyl












acrylate





isobornyl












acrylate




Bifunc-
polyethylene
20










tional
glycol




acrylate
diacrylate





dipropylene

20










glycol





diacrylate





propoxylated


20









neopentyl





glycol





diacrylate




Trifunc-
propoxylated



10







tional
glyceryl




acrylate
triacrylate



Oligomer
Urethane
aromatic




5






acrylate
urethane





acrylate





oligomer





aliphatic





5






urethane





acrylate





oligomer





polyurethane












acrylate/





acrylic





monomer



Diluent
Liquid BR
butadiene










polymer

polymer





compound



Photo-
Alkyl-
2-hydroxy-2-
15
1.5
1.5
1.5
1.5
1.5
1.5



polymer-
phenone
methyl-



ization

propiophenone



initiator
Acylphos-
Bis(2,4,6-
0.3
0.3
0.3
0.3
0.3
0.3
0.3




phine
trimethylben-




oxide
zoyl)phenylphos-





phine oxide




Mono-
2,4,6-











acylphos-
trimethylben-




phine
zoyl-diphenyl




oxide
phosphine





oxide



Photo-
Thio-
2-isopropylthio-










sensitizer
xanthone
xanthone




Benzo-
4,4′-bis(diethyl-











phenone
amino)benzo-





phenone




Acridine
9-phenyl-












acridine




Anthra-
9,10-bis(octa-











cene
noyloxy)anthra-





cene



UV

2,2′-(2,5-thiophene-










blocker

diyl)bis(5-tert-butyl-





benzoxazole)



Vulcanized
Pulverized
SBR compound










rubber
vulcanized




rubber




(particle




size: 85 μm)

















Filler
Silica










Coupling
Silane coupling agent










agent



Viscosity
mPa · s
1,500
1,300
1,300
1,800
2,100
2,500
2,300



at 23° C.















Elastic
Hardness (Shore A)
53
58
54
53
54
52
55


molded
Tensile strength at break (MPa)
6.7
9.5
7.3
7.5
7.0
6.3
6.8


product
Tensile elongation at break (%)
160
130
120
150
150
170
190



Compression set (%)
3.0
3.3
3.1
3.0
3.1
2.9
2.5



Cyclic fatigue (crack growth
8,000
6,000
8,000
8,000
11,000
11,000
11,000



(times/min))



Production time
very
very
very
very
very
very
very




good
good
good
good
good
good
good


















TABLE 3









Examples





















16
17
18
19
20
21
22





Polymer
Liquid
Methac-
UC102M

50
50
50
50
50
50


composi-
polymer
ryloyl
(isoprene


tion for

group-
skeleton)


stereoli-

containing


thography

liquid




polymer




Liquid
UC203M
50










polymer
(isoprene





skeleton)



Monomer
Mono-
ethoxylated
50
50
50
50
50
50
50




func-
nonylphenol




tional
acrylate




acrylate
methyl 2-












allyloxymethyl





acrylate





isostearyl












acrylate





m-phenoxybenzyl












acrylate





dicyclopentanyl












acrylate





isobornyl












acrylate




Bifunc-
polyethylene











tional
glycol




acrylate
diacrylate





dipropylene












glycol





diacrylate





propoxylated












neopentyl





glycol





diacrylate




Trifunc-
propoxylated











tional
glyceryl




acrylate
triacrylate



Oligomer
Urethane
aromatic











acrylate
urethane





acrylate





oligomer





aliphatic












urethane





acrylate





oligomer





polyurethane












acrylate/





acrylic





monomer



Diluent
Liquid BR
butadiene
10









polymer

polymer





compound



Photo-
Alkyl-
2-hydroxy-2-
1.5
1.5
1.5
1.5
1.5
1.5
1.5



polymer-
phenone
methyl-





propiophenone



ization
Acylphos-
Bis(2,4,6-
0.3

0.3
0.3
0.3
0.3
0.3



initiator
phine
trimethylben-




oxide
zoyl)phenylphos-





phine oxide




Mono-
2,4,6-

0.6









acylphos-
trimethylben-




phine
zoyl-diphenyl




oxide
phosphine





oxide



Photo-
Thio-
2-isopropylthio-


0.05







sensitizer
xanthone
xanthone




Benzo-
4,4′-bis(diethyl-



0.05







phenone
amino)benzo-





phenone




Acridine
9-phenyl-




0.05







acridine




Anthra-
9,10-bis(octa-





0.05





cene
noyloxy)anthra-





cene



UV

2,2′-(2,5-thiophene-






0.01



blocker

diyl)bis(5-tert-butyl-





benzoxazole)



Vulcanized
Pulverized
SBR compound










rubber
vulcanized




rubber




(particle




size: 85 μm)

















Filler
Silica










Coupling
Silane coupling agent










agent



Viscosity
mPa · s
2,000
1,800
1,800
1,800
1,800
1,800
1,800



at 23° C.















Elastic
Hardness (Shore A)
53
53
53
53
53
53
53


molded
Tensile strength at break (MPa)
6.4
6.3
6.8
6.7
6.6
7.2
6.3


product
Tensile elongation at break (%)
170
120
150
140
140
180
140



Compression set (%)
2.3
2.9
2.8
2.9
2.9
2.6
2.9



Cyclic fatigue (crack growth
11,000
8,000
8,000
9,000
8,000
11,000
8,000



(times/min))



Production time
very
very
very
very
very
very
very




good
good
good
good
good
good
good













Examples
Comparative Examples






















23
24
1
2
3
4
5
6





Polymer
Liquid
Methac-
UC102M
50
5
80







composi-
polymer
ryloyl
(isoprene


tion for

group-
skeleton)


stereoli-

containing


thography

liquid




polymer




Liquid
UC203M



100
100
100
100
100




polymer
(isoprene





skeleton)



Monomer
Mono-
ethoxylated
50
95
20









func-
nonylphenol




tional
acrylate




acrylate
methyl 2-













allyloxymethyl





acrylate





isostearyl













acrylate





m-phenoxybenzyl













acrylate





dicyclopentanyl













acrylate





isobornyl







5.0





acrylate




Bifunc-
polyethylene












tional
glycol




acrylate
diacrylate





dipropylene













glycol





diacrylate





propoxylated













neopentyl





glycol





diacrylate




Trifunc-
propoxylated












tional
glyceryl




acrylate
triacrylate



Oligomer
Urethane
aromatic












acrylate
urethane





acrylate





oligomer





aliphatic













urethane





acrylate





oligomer





polyurethane




10








acrylate/





acrylic





monomer



Diluent
Liquid BR
butadiene











polymer

polymer





compound



Photo-
Alkyl-
2-hydroxy-2-
1.5
1.5
1.5
3.3
3.0
3.0
3.0
3.0



polymer-
phenone
methyl-





propiophenone



ization
Acylphos-
Bis(2,4,6-
2
0.0
0.0
0.0
0.0
0.0
0.0
0.0



initiator
phine
trimethylben-




oxide
zoyl)phenylphos-





phine oxide




Mono-
2,4,6-












acylphos-
trimethylben-




phine
zoyl-diphenyl




oxide
phosphine





oxide



Photo-
Thio-
2-isopropylthio-











sensitizer
xanthone
xanthone




Benzo-
4,4′-bis(diethyl-












phenone
amino)benzo-





phenone




Acridine
9-phenyl-













acridine




Anthra-
9,10-bis(octa-












cene
noyloxy)anthra-





cene



UV

2,2′-(2,5-thiophene-











blocker

diyl)bis(5-tert-butyl-





benzoxazole)



Vulcanized
Pulverized
SBR compound



50







rubber
vulcanized




rubber




(particle




size: 85 μm)


















Filler
Silica





10





Coupling
Silane coupling agent





0.2





agent



Viscosity
mPa · s
1,850
50
5,500
990,000
300,000
220,000
450,000
80,000



at 23° C.
















Elastic
Hardness (Shore A)
54
64
43
28
32
35
26
36


molded
Tensile strength at break (MPa)
7.9
8.3
1.5
1.0
1.3
1.2
0.8
0.8


product
Tensile elongation at break (%)
120
30
180
170
130
100
130
80,000



Compression set (%)
2.4
3.8
3.7
1.4
3.7
0.3
1.4
1.2



Cyclic fatigue (crack growth
13,000
100
400
100
400
400
300
100



(times/min))



Production time
very
very
poor
poor
poor
poor
poor
poor




good
good


















TABLE 4









Examples















25
26
27
28
29
30
31





















Polymer
Liquid
Methac-
UC102M
50
50
20



25


composi-
polymer
ryloyl
(isoprene


tion for

group-
skeleton)


stereoli-

containing
UC400V



50
50
50
25


thography

liquid
(isoprene




polymer
skeleton)



Monomer
Mono-
ethoxylated











functional
nonylphenol




acrylate
acrylate





methyl 2-












allyloxymethyl





acrylate





isostearyl acrylate












m-phenoxybenzyl












acrylate





dicyclopentanyl












acrylate





isobornyl acrylate
50
30
30
50
30
30
30




Bifunctional
polyethylene glycol











acrylate
diacrylate





dipropylene glycol












diacrylate





propoxylated












neopentyl





glycol diacrylate




Trifunctional
propoxylated











acrylate
glyceryl





triacrylate



Oligomer
Urethane
aromatic urethane











acrylate
acrylate oligomer





aliphatic urethane












acrylate oligomer





polyurethane acrylate/












acrylic monomer





aliphatic urethane

20
50

20
50
20





acrylate oligomer



Diluent
Liquid BR
butadiene polymer










polymer

compound



Photo-
Alkyl-
2-hydroxy-2-methyl-
1.5
1.5
1.5
1.5
1.5
1.5
1.5



polymer-
phenone
propiophenone



ization
Acylphos-
Bis(2,4,6-trimethylben-
0.7
0.7
0.7
0.7
0.7
0.7
0.7



initiator
phine oxide
zoyl)phenylphosphine oxide




Mono-
2,4,6-trimethylbenzoyl-











acylphos-
diphenyl phosphine oxide




phine oxide



Photo-
Thio-
2-isopropylthioxanthone










sensitizer
xanthone




Benzo-
4,4′-bis(diethyl-











phenone
amino)benzo-





phenone




Acridine
9-phenyl-












acridine




Anthra-
9,10-bis(octa-











cene
noyloxy)anthra-





cene



UV

2,2′-(2,5-thiophene-










blocker

diyl)bis(5-tert-butyl-





benzoxazole)



Vulcanized
Pulverized
SBR compound










rubber
vulcanized




rubber




(particle




size: 85 μm)

















Filler
Silica










Coupling
Silane coupling agent










agent



Viscosity
mPa · s
1,300
1,500
2,100
2,100
2,300
2,900
2,100



at 23° C.















Elastic
Hardness (Shore A)
63
83
79
88
90
85
80


molded
Tensile strength at break (MPa)
10.5
11.0
14.0
13.5
15.0
18.0
16.0


product
Tensile elongation at break (%)
130
180
250
280
330
370
350



Compression set (%)
3.2
3.8
4.5
8.5
7.2
5.5
5.2



Cyclic fatigue (crack growth (times/min))
6,000
6,000
4,000
4,000
4,000
6,000
6,000



Production time
very
very
very
very
very
very
very




good
good
good
good
good
good
good









As shown in Tables 2 to 4, the polymer compositions for stereolithography of Examples 1 to 31 contain a liquid polymer and a monomer, and have a viscosity at a temperature of 25° C. of 3,000 mPa·s or less. The polymer compositions for stereolithography of Examples 1 to 31 have a low viscosity at room temperature, and can be suitably used in stereolithography techniques such as the SLA, the DLP, and the LCD to produce a desired elastic molded product. In addition, the obtained elastic molded products are satisfactory in various physical properties such as the hardness, tensile strength at break, tensile elongation at break, compression set, and cyclic fatigue.

Claims
  • 1. A polymer composition for stereolithography comprising: a liquid polymer;a monomer; andat least two photopolymerization initiators different in absorption band;wherein the polymer composition for stereolithography has a viscosity of 3,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec−1, andwherein the liquid polymer includes at least one of a liquid isoprene having a (meth)acryloyl group and a liquid isobutylene having a (meth)acryloyl group.
  • 2. The polymer composition for stereolithography according to claim 1, wherein the liquid polymer includes the liquid isoprene having the (meth)acryloyl group.
  • 3. The polymer composition for stereolithography according to claim 1, wherein the liquid polymer has a number average molecular weight of 5,000 or more and 500,000 or less, wherein the number average molecular weight of the liquid polymer is a value in terms of standard polystyrene, and is measured using a gel permeation chromatograph.
  • 4. The polymer composition for stereolithography according to claim 1, wherein the liquid polymer has a viscosity of 100 mPa·s or more and 1,000,000 mPa·s or less, the viscosity being measured in an environment of a temperature of 25° C. and a relative humidity of 50% using an E-type viscometer under conditions of a cone plate diameter φ of 25 mm and a shear rate of 100 sec−1.
  • 5. The polymer composition for stereolithography according to claim 1, having a content rate of the liquid polymer of 15 mass % or more and 70 mass % or less.
  • 6. The polymer composition for stereolithography according to claim 1, having a percentage of the monomer of 30 mass % or more and 85 mass % or less based on 100 mass % in total of the liquid polymer and the monomer.
  • 7. The polymer composition for stereolithography according to claim 1, further comprising an oligomer, and having a percentage of the monomer of 30 mass % or more and 90 mass % or less based on 100 mass % in total of the liquid polymer, the monomer, and the oligomer.
  • 8. The polymer composition for stereolithography according to claim 1, further comprising an oligomer, and having a total percentage of the monomer and the oligomer of 30 mass % or more and 90 mass % or less based on 100 mass % in total of the liquid polymer, the monomer, and the oligomer.
  • 9. The polymer composition for stereolithography according to claim 8, wherein the oligomer is at least one of urethane (meth)acrylate and epoxy (meth)acrylate.
  • 10. The polymer composition for stereolithography according to claim 7, wherein the oligomer includes a (meth)acrylate.
  • 11. The polymer composition for stereolithography according to claim 1, wherein the monomer is at least one of monofunctional to tetrafunctional monomers.
  • 12. The polymer composition for stereolithography according to claim 1, wherein the monomer includes a (meth)acrylate.
  • 13. An elastic molded product, which is a cured product of the polymer composition for stereolithography according to claim 1.
  • 14. A method for producing an elastic molded product, the method comprising: supplying the polymer composition for stereolithography according to claim 1 onto a molding table, and curing the polymer composition for stereolithography by light irradiation to form a first layer of a cured product;supplying, onto the first layer of the cured product, the polymer composition for stereolithography for forming a second layer of a cured product, and curing the polymer composition for stereolithography by light irradiation to form the second layer of the cured product; andrepeating the step of forming the second layer of the cured product until an N-th layer is formed to produce an elastic molded product having a three-dimensional shape.
Priority Claims (2)
Number Date Country Kind
JP2019-199723 Nov 2019 JP national
JP2020-158613 Sep 2020 JP national
US Referenced Citations (3)
Number Name Date Kind
20150368388 Kurata Dec 2015 A1
20160145452 Fong May 2016 A1
20190010311 Yoshinaga et al. Jan 2019 A1
Foreign Referenced Citations (2)
Number Date Country
WO 2017154335 Sep 2017 WO
WO-2018165090 Sep 2018 WO
Related Publications (1)
Number Date Country
20210130523 A1 May 2021 US