This invention relates to fluid transfer and printing devices. More particularly, the invention relates to improved fluid transfer and printing devices and methods and apparatus for producing same.
Microarray technology is emerging as one of the principal and fundamental investigational tools for a very wide variety of biological problems. Although the preparation of DNA microarrays for use in many types of analysis is one of the main applications today, it is clear that the basic concept of easily obtaining huge amounts of data from a rapid and relatively simple-to-use platform is set to penetrate most areas of biology and may find comparably broad use in chemistry and material science. Such diverse areas of biology including, without limitation, genetics, population biology, immunology, rational drug design, genetic engineering and therapies, protein engineering, developmental biology and structural biology, would benefit from a rapid infusion of an inexpensive version of microarray technology. As with many other areas of technology, the true power of microarray technology will only become fully utilized when it is efficiently coupled to other related or complementary technology. For example, the coupling of an inexpensive, and easy to use microarray technology to amplification techniques may allow an almost “real time” look into the biochemical machinery and mechanisms of a single cell as a function of time after various biochemical challenges.
In order to derive maximum benefit from a young technology area such as that of microarrays, the technology needs to be simple, inexpensive to purchase and use and be of reasonable physical size. For microarray technology, this translates into a system that should give better performance than the best current system, in a more compact format at a much lower price.
Many embodiments of microarray-based experiments involve the following basic and common steps: after defining the question or problem to be addressed by the microarray based experiment, a sample is bound to a substrate, such as a glass slide treated with a reagent capable of covalently bonding the DNA to the glass substrate. The sample to be tested is then applied to the substrate.
There are three common methods used for applying a sample to a substrate, each with its own compliment of advantages and disadvantages. Some of the more important parameters for various dispensing devices are summarized in Table I below.
It is clear from the data in Table 1 that microspotting pins are a competitive technology in terms of speed, quality and cost. Accordingly, a large portion of these arrays are accomplished with high precision metal microspotting pins. Unfortunately, the metal microspotting pins are individually machined at costs up to $400 each. The high cost of the pins prohibit many laboratories from using microspotting pin technology. Moreover, the metal pins are susceptible to bending damage and complex features which may further the utility of the pins can not be fabricated using traditional machine shop fabrication methods.
Accordingly, improved and inexpensive fluid transfer and printing devices and methods and apparatus for producing same, are needed for use in microarray and other fluid transfer and printing applications.
In one embodiment, an apparatus for fluid transfer, the apparatus comprising a pin microfabricated from a polymeric material, the pin for transferring a predetermined volume of a fluid, the pin having a tip and a fluid reservoir communicating with the tip.
In another embodiment, a pin comprising a tip and a fluid reservoir communicating with the tip, wherein the pin is microfabricated from a polymeric material and is operative for transferring a predetermined volume of a fluid.
In a further embodiment, a holder for use in fluid transfer and printing, the holder comprising a first member and a first aperture formed in the first member for receiving a microfabricated pin for transferring a predetermined volume of a fluid, wherein the holder is microfabricated from a polymeric material.
In a still a further embodiment, a dispensing tray for use in fluid transfer and printing, the dispensing tray comprising a well for holding a fluid to be transferred by a microfabricated pin for transferring a predetermined volume of a fluid, wherein the tray is microfabricated from a polymeric material.
In yet another embodiment, a method comprising steps of forming a positive mold of an article such as a printhead or pin using a bulk micromachining process, forming a negative mold of the article from the positive mold using an electroforming process, and forming the article from a polymeric material in the negative mold, the polymeric article being operative for fluid transfer and printing.
The polymeric printhead 100 may be molded in a negative embossing mold which is fabricated in a method that uses a micromachining process. In one embodiment, the micromachining process may be a bulk micromachining process. Bulk micromachining involves the selective removal of defined regions of a substrate, on a millimeter to nanometer scale, to form a micro-mechanical structure by an etching process. The substrate may be a single crystal silicon wafer or other suitable substrate material. The use of bulk micromachining allows the one or more pins 120 of the printhead 100 to be precisely molded with the requisite feature sizes, and to a lesser extent surface finish, such that a print fluid contained in the printing reservoir 124 of the pin 120 can be passively dispensed from the print tip 126 of the pin 120 in a desired manner. In addition, the negative embossing mold can be made much less expensively using bulk micromachining and electroforming, and the mold can be made considerably faster and with a much higher precision and accuracy, than making a mold by traditional die making techniques.
Etching is the primary means by which a third dimension of a bulk micromachined structure is obtained from a planar photolithographic process. In the case of the printhead 100, the print tip 126, the flexible spring 130 and the printing fluid reservoir 124 are all three dimensional structures. There are generally two basic methods for etching the substrate: anisotropic wet etching and dry etching. In both etching methods, the pattern to be etched in the substrate may be defined by a photolithographic process. The very high accuracy and precision with which a photomask may be prepared is reflected in the accuracy and precision of the substrates to be etched.
The negative embossing mold used for molding the printhead may be fabricated from a “positive” master mold. The positive master mold has the same geometry as the final polymer part to be molded. In one exemplary embodiment, the positive master mold may be partially or entirely bulk micromachined from a silicon wafer using wet and dry etching methods. The anisotropic wet etching method, in some exemplary embodiments comprises etching in aqueous potassium hydroxide (KOH) at 80° C. When the substrate comprises a single crystal silicon wafer, the KOH etchant attacks the <100> planes of the silicon wafer many times faster than the <111> planes, and therefore, may be used to etch square-shape depressions or trenches with ˜55° <111> sidewalls, into (100) the single crystal silicon wafer. The wet etching method allows many silicon wafers to be inexpensively etched in parallel, however, the etchant only cuts along certain crystallographic planes and not at arbitrary angles.
A very selective dry etching method is Deep Reactive Ion Etching (DRIE). DRIE is well known in bulk micromachining art for its ability to etch very high aspect ratio trenches. The DRIE method uses a plasma technique whereby an etching system rapidly pulses etchant and passivator gasses alternatively over the wafer or substrate. This etch can cut a narrow (<10 to ˜500 micron [μ or μm=10−6 m=10−3 mm] wide) trench through a wafer substrate up to 500μ deep, such as the earlier mentioned single crystal silicon wafer, with sidewalls vertical to within a few degrees over the depth of the cut. The DRIE method may be used to etch, with very high precision, any arbitrary shape into the substrate, however, only one substrate at a time may be processed. Reactive Ion Etching (RIE) is somewhat similar to DRIE in that it cuts a pattern with a plasma, however, the features etched by RIE are isotropic since the etching step is present but not the passivation steps found in DRIE methodologies. Hence, RIE is typically used for etching features that have relatively shallow etch depths or where vertical sidewalls on the etched trenches are not important.
The positive master mold may be used for fabricating the negative embossing mold. In one embodiment where the positive master mold is at least partially fabricated from silicon, the negative embossing mold may be fabricated by plating the positive master mold, after suitable pretreatment to render the silicon more highly conductive, with a relatively thick (0.5 mm to several millimeters) layer of a metal. This process is also known as electroforming. In an exemplary embodiment, plating may be performed by a conventional electrodeposition process. In one preferred embodiment, the negative embossing mold is electroformed from a Ni—Co alloy.
The polymeric printhead, which has the same features as the positive master mold, may be molded in the negative embossing mold using any suitable molding process. Any suitable polymeric material including, without limitation, polycarbonates and polymethylmethacrylates, polyolefins, polyetherketones or any other thermoplastic polymers may be used for molding the printhead.
An embodiment of a method of making the printhead will now be described. For illustrative purposes only, the method will be described as it relates to making printhead 100 collectively shown in
The embodiment of the method commences with the fabrication of the positive master mold 300 (
To create the positive master mold the silicon wafer 200 is selectively patterned photolithographically to expose one or more regions on the wafer surface which will be etched. A protective layer of silicon dioxide (not shown) is selectively removed by means of exposing certain regions of the oxide in a standard photolithographic process followed by dissolution of the exposed oxide from a first side 210 of the wafer 200. The exposed regions of bare silicon are then etched on the first side 210 of the wafer 200 to create a series of depressions or trenches (mold features) which may be configured and dimensioned to form the printing tips of the pins during the molding process. In a preferred embodiment, patterning may be performed by photolithographically transferring the depression design to the first side of the wafer via a photoresist etch-mask 220, as shown in the plan and cross-sectional views of
Next, a protective layer of silicon dioxide (not shown) may be formed e.g., thermally grown over the patterned first side 210 of the silicon wafer 200. The wafer 200 is then flipped over and the protective layer of silicon dioxide (not shown) is removed from the opposite, second side 240 of the wafer 200. The second side 240 of the wafer 200 is patterned to form the remaining mold features, which in one embodiment (e.g., the embodiment shown in
To complete the positive master mold 300, the mold sections 310a, 310b may be bonded to a base substrate or wafer 330. In one embodiment where the mold sections 310a, 310b are composed silicon, an anodic bonding process may be used to attach the mold sections 310a, 310b to a base substrate made of a glass having the substantially the same thermal expansion coefficient as the material of the mold sections 310a, 310b, e.g., silicon. Several types of borosilicate glasses, such as Corning 7740, are suitable for the base substrate or wafer 330. The anodic bonding process is well known to those skilled in the micromachining art, and comprises, in one embodiment, forming (e.g., thermally growing) a silicon dioxide (oxide) layer over the silicon mold sections 310a, 310b and configuring the mold sections 310a, 310b as an anode in a solid state electrochemical cell with the base substrate 330 (composed of e.g., borosilicate glass) configured as a cathode. Next, a voltage (e.g., ˜500V at 400-450° C.) is applied between the mold sections 310a, 310b and the base substrate 330, which causes sodium ions in the glass base substrate in the vicinity of the silicon-glass interface to migrate toward the base substrate cathode and the sodium depleted region chemically bonds to the oxide on the silicon mold sections 310a, 310b anode thereby forming a continuous hermetic seal.
The completed positive master mold 330 is used in the next step of the method for fabricating the negative embossing mold 400. In one embodiment, the negative embossing mold may be fabricated by forming a relatively thick layer (from about 0.2 mm to several mm thick) of a metal on all surfaces of the embossments (mold sections 310a, 310b) of the positive master mold 300, and separating the metal layer, which forms the negative embossing mold 400, from the positive master mold 300. The completed negative embossing mold 400 is shown in the plan and cross-sectional views of
In order to function as the cathode in the electroforming process, the master mold is rendered more highly conductive by the vapor deposition of a conductive metal all over the surfaces of the mold onto which the electroform will be grown. In one embodiment, the layer of metal forming the negative embossing mold 400 may be formed by a two step process. In the first step, a thin metal film (about 50-100 nm), such as gold, is deposited on the surfaces of the embossments (mold sections 310a, 310b) and other surfaces of the positive master mold 300. The thin metal layer sensitizes or primes the embossment surfaces (and the other surfaces) of the positive master mold 300, thereby making the initial deposit of the thick layer of metal, which will form the three-dimensional printhead feature molding depressions 410a, 410b of the negative embossing mold 400, smoother and more uniform. The thin metal layer may also act as a “mold release agent” to aid in releasing the negative embossing mold from the positive master mold. In the second step, the positive master mold 300 with the thin layer of metal deposited thereon, is used as a cathode in an electroforming process to deposit the relatively thick metal layer. In one embodiment, the relatively thick metal layer may be composed of a Ni—Co alloy.
The completed negative embossing mold 400 is then used in a suitable molding process, such as compression molding, injection molding, resin casting, rolling, embossing, and stamping, to mold the polymeric printhead 100. For example and not limitation, if compression molding is selected for the molding process, the raw polymeric material 550 is deposited into the mold 400, as shown in
Referring to
During molding of the polymeric printhead components, the embossing mold and platens are maintained at temperatures generally 30-70° C. above the glass transitions temperature of the polymer with pressures in the 100-20,000 lbs/in2 range on embossing mold. To conserve the intricate features produced using this mold making technique, the molded printhead component or sections (parts) and the embossing mold must be separated before significant contraction can occur. When molding intricate features in a heated press using materials with different thermal expansion properties such as metal embossing mold and molded polymeric parts, the contraction of the molded parts and the mold at different rates can deform the features of the molded parts from the corresponding features of the mold relative to each other. This relative movement can cause deformation of the features replicated in the molded sections by the embossing mold and can be prevented by separating the molded parts before cooling is complete. It is often necessary to use a mold release agent, such as a silicone compound, to ensure that molded polymeric parts retain all of their fine features when separated from the embossing mold.
As shown in
As mentioned earlier, the polymeric printhead 100 may be molded as a single component (not shown) or in multiple sections 100a, 100b as shown in the front/rear elevational views of
In some embodiments, as collectively shown in
In order to greatly improve the quality and reduce the number of missing spots when, for example, printing DNA or protein microarrays, it is necessary that the pins be individually compliant. This is necessary to accommodate any roughness on the surface of the substrate and to provide the appropriate degree of pressure on the print tips. There is an ideal printing pressure, neither too light or too strong, to obtain the best spot morphology. In the case of the polymeric pins, the individual compliance is provided by the associated springs coupling the pins to the printhead member as shown in
The pins (of the printhead) must wet in order to take up the printing fluid even though the print tips may be submerged into a source plate well (not shown). It is possible to make an acrylic surface that retains good wetting properties for at least weeks or longer. This may be accomplished in one embodiment, by washing the pins for several days in ethanol, to remove any small polymer fragments or plasticizer, and then treating the pins in an O2 plasma. Silicone polymers such as polydimethylsiloxane (PDMS) cannot be rendered hydrophilic for more than a few days presumably due to the migration of hydrophobic chains or short polymer pieces from the bulk. It is believed that well washed, highly crosslinked acrylates will be less susceptible to this problem.
To further enhance the wetting ability of the pins, some embodiments of the printhead may be molded from a polymeric material comprising a mixture of polymethylmethacrylate and poly(hydroxyethyl)methacrylate. In other embodiments, the wetting ability of the pins may be enhanced by applying surface grafting techniques to the pins. This may be accomplished either by reacting the pins with an appropriate silane or by grafting another polymer such as polyvinylalcohol onto the surface of the pins.
One of ordinary skill in the art will appreciate the ease, low cost and short time with which the negative embossing mold can be formed from the positive master mold. Thus, a very substantial benefit may be gained from the above described method, both design and manufacturing perspectives.
One of ordinary skill in the art will of course appreciate that the shape and dimensions of the pin 820 may be varied. For example, the rectangular shaft 822 prevents the pin 820 from rotating in correspondingly shape slots 842 of a pin holder to be described further on. In other embodiments, the shaft 22 can be square, or be cylindrical and provided with other means which prevents rotation in the pin holder.
As best shown in
The structures of the printing tip section 824 including but not limited to the reservoir 828, channel 830, and/or the dispensing tip 832, are configured and dimensioned to optimized the fluid transfer process (e.g., microspotting process).
The configuration and dimensions of the print tip section of the pins disclosed herein may be adjusted so that the volume of liquid sample deposited by the pin and/or the area of the spotted liquid sample (spot) can be varied as desired. It is contemplated that the configuration and dimensions of the printing tip section can be adjusted so that the volume of liquid sample deposited by each pin can be as large as about 0.1 milliliters (mL), as minute as about 10−4 picoliter (pL), or any volume between about 0.1 mL and 10−4 pL. Similarly, the configuration and dimensions of the printing tip section can be adjusted so that the area of the spotted liquid sample (spot) deposited by each pin can be as large as about 10 square millimeters (mm2), as minute as about 10−6 square microns (μm2), or any area between about 10 mm2 and about 10−6 μm2.
One of ordinary skill in the art will of course appreciate that the printing tip section of the pins disclosed herein may be configured in various other ways to optimize the fluid transfer process. For example, the surface or surfaces making up the dispensing tips may be smooth, textured, concave, convex, include one or more pores, channels, or nozzles or combinations of the same. Further, the printing tip section may be designed such that the entire shaft of the pin does not have to be submersed into the stock solution to be spotted, thereby obviating the time and material wasting pre-spotting procedure.
Additional increases in microarray printing speed may be realized using a multi-well dispensing tray 860.
The pin embodied in
In addition to microarray printing, the printhead and pins may be used in fluid transfer applications alone. For example, a polymeric pin may be used by dipping it into a solution A to pick up a specific volume of reagent. The pin may then be removed from solution A and dipped into another solution B for a time sufficient for the reagent to diffuse into solution B.
The polymeric printhead and pins may be used in many uses and applications. For example, the polymeric printhead and pins may be used in biology in microfluidic manipulation applications wherein the polymeric printhead and pins may be used to transfer of small volumes of assorted materials, including but not limited to: nucleic acids (DNA and RNA, oligos) for printing microarrays, analysis of concentration, transfections/transformations, PCR (polymerise chain reaction), restriction enzyme analysis, qPCR/Taqman assays, sequencing reactions, DNA synthesis, in vitro transcription, translation of RNA, reverse transcription, and site-directed mutagenesis; proteins for protein arrays including antibody arrays, Elisas, Western blots, Dot blots, Far Western blots, peptides and protein domains, lectins, disease antigens, diagnostic markers, etc., and protein and peptide labeling; cells and other biologically relevant molecules for yeast, bacteria, larger cells with varying tip size, tissues, cell lysates, secretions, and phospholipids and lipids; and other materials such as drugs (compound library distribution), chemicals, and isotopes. The polymeric printhead and pins may also be used in screens for protein crystallization conditions and the like; colorimetric/light or other detection assays for enzymatic or other protein activity, i.e. Xgal, pyrene for actin polymerization, alkaline phosphatase/BCIP, fluorimetry, anisotropy, etc.; assays to determine concentrations of substances, i.e. BCA, Coomassie, Bradford, Syber Green, etc.; growth of cell cultures en masse; miniaturization of preexisting assays; and cherry-picking to retrieve substances from arrays.
Other methods may be used for fabricating the polymeric printheads and pins. For example, the polymeric printheads and pins may be fabricated using laser cutting methods. Laser cutting may be used to cut polymers such as polyimide, polyacrylic wafers to make the printheads and pins. Laser cutting may be used to make pins with relatively larger tips in the range of 200-600 microns or higher which can be used for making low density arrays for diagnostics. The polymeric printheads and pins may be fabricated from polymeric films and sheets using E-beam cutting methods, die cutting and computer numerically controlled (CNC) cutting (for making fluid transfer pins which do not require fine featured tips, and micro grit blasting (which selectively remove regions from acrylic films and sheets).
In other embodiments, the negative embossing mold may be made from the positive master mold by casting the mold from molten metal, hard plastics, such as PEEK, with relatively high melting points, including thermoset polymers.
Although the invention has been described in terms of exemplary embodiments, it is not limited thereto. Rather, the appended claims should be construed broadly, to include other variants and embodiments of the invention, which may be made by those skilled in the art without departing from the scope and range of equivalents of the invention.
This application claims the benefit of U.S. Provisional Application No. 60/661,833, filed on Mar. 1, 2005, the entire disclosure of which is incorporated herein by reference. U.S. Patent Publication 20030166263 A1, entitled MICROFABRICATED SPOTTING APPARATUS FOR PRODUCING LOW COST MICROARRAYS.
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/US06/07248 | 3/1/2006 | WO | 00 | 4/1/2008 |
Number | Date | Country | |
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60661833 | Mar 2005 | US |