Claims
- 1. A polymerizable composition comprising:
(a) a major amount of a radically polymerizable first monomer represented by the following general formula, R—[—O—C(O)—O—R1]i wherein R is a polyvalent residue of a polyol having at least two hydroxy groups, R1 is an allyl group, and i is a whole number from 2 to 4; and (b) a minor amount of a radically polymerizable second monomer represented by the following general formula, 3 wherein R2 is a polyvalent linking group that is free of urethane linkages; R3 is a residue of a material having a single hydroxy group and at least one allyl group, R3 being free of urethane linkages; and j is a number from 2 to 4.
- 2. The polymerizable composition of claim 1 wherein second monomer (b) is present in said composition in an amount at least sufficient such that a polymerizate of said composition is substantially free of tinting defects.
- 3. The polymerizable composition of claim 2 wherein said second monomer (b) is present in said composition in an amount of from 0.1 percent by weight to 49 percent by weight, based on the total weight of said polymerizable composition.
- 4. The polymerizable composition of claim 2 wherein said second monomer (b) is present in said composition in an amount of from 0.1 percent by weight to 10 percent by weight, based on the total weight of said polymerizable composition.
- 5. The polymerizable composition of claim 1 wherein R2 is a residue of a polyisocyanate selected from aromatic polyisocyanates, aliphatic polyisocyanates, cycloaliphatic polyisocyanates and mixtures thereof; and the material of which R3 is a residue is selected from, aromatic alcohols, aliphatic alcohols, cycloaliphatic alcohols, poly(alkylene glycols), each having at least one allyl group, and mixtures thereof.
- 6. The polymerizable composition of claim 5 wherein R2 is a residue of a cycloaliphatic diisocyanate selected from isophorone diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, bis(isocyanatomethyl)cyclohexane, bis(isocyanatocyclohexyl)methane, bis(isocyanatocyclohexyl)-2,2-propane, bis(isocyanatocyclohexyl)-1,2-ethane, and mixtures thereof, and j is 2.
- 7. The polymerizable composition of claim 5 wherein the material of which R3 is a residue is selected from C2-C4 alkylene glycol allyl ether, poly(C2-C4 alkylene glycol) allyl ether, trimethylol propane di(allyl ether), trimethylol ethane di(allyl ether), pentaerythritol tri(allyl ether), di-trimethylolpropane tri(allyl ether) and mixtures thereof.
- 8. The polymerizable composition of claim 7 wherein the material of which R3 is a residue is selected from poly(ethylene glycol) allyl ether, poly(1,2-propylene glycol) allyl ether and mixtures thereof.
- 9. The polymerizable composition of claim 1 wherein R is a residue of a poly(C2-C4 alkylene glycol), and i is 2.
- 10. The polymerizable composition of claim 9 wherein R is a residue of diethylene glycol.
- 11. A polymerizable composition comprising:
(a) a major amount of a radically polymerizable first monomer represented by the following general formula, R—[—O—C(O)—O—R1]i wherein R is a divalent residue of a poly(C2-C4 alkylene glycol), R1 is an allyl group, and i is 2; and (b) a minor amount of a radically polymerizable second monomer represented by the following general formula, 4 wherein R2 is a divalent linking group that is free of urethane linkages; R3 is a residue of a material having a single hydroxy group and at least one allyl group, R3 being free of urethane linkages; and j is 2.
- 12. The polymerizable composition of claim 11 wherein said second monomer (b) is present in said composition in an amount at least sufficient such that a polymerizate of said composition is substantially free of tinting defects.
- 13. The polymerizable composition of claim 11 wherein R2 is a residue of a cycloaliphatic diisocyanate selected from isophorone diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, bis(isocyanatomethyl)cyclohexane, bis(isocyanatocyclohexyl)methane, bis(isocyanatocyclohexyl)-2,2-propane, bis(isocyanatocyclohexyl)-1,2-ethane, and mixtures thereof.
- 14. The polymerizable composition of claim 13 wherein the material of which R3 is a residue is selected from a poly(C2-C4 alkylene glycol) allyl ether, trimethylol propane di(allyl ether), trimethylol ethane di(allyl ether), and mixtures thereof.
- 15. The composition of claim 14 wherein R is a residue of diethylene glycol, and the material of which R3 is a residue is poly(1,2-propylene glycol) allyl ether.
- 16. The polymerizate of claim 1.
- 17. The polymerizate of claim 11.
- 18. The polymerizate of claim 17 wherein said polymerizate is a lens having a positive diopter.
- 19. A polymerizable composition comprising:
(a) a major amount of a radically polymerizable first monomer represented by the following general formula, R—[—O—C(O)—O—R1]i wherein R is a polyvalent residue of a polyol having at least two hydroxy groups, R1 is an allyl group, and i is a whole number from 2 to 4; and (b) a radically polymerizable second monomer present in said composition in an amount of from 0.1 percent by weight to 10 percent by weight based on the total weight of said polymerizable composition, such that a polymerizate of said composition is substantially free of tinting defects, said radically polymerizable second monomer represented by the following general formula, 5 wherein R2 is a residue of a cycloaliphatic diisocyanate selected from the group consisting of isophorone diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, bis(is6cyanatomethyl)cyclohexane, bis(isocyanatocyclohexyl)methane, bis(isocyanatocyclohexyl)-2,2-propane, bis(isocyanatocyclohexyl)-1,2-ethane, and mixtures thereof; and the material of which R3 is a residue is selected from the group consisting of aromatic alcohols, aliphatic alcohols, cycloaliphatic alcohols, poly(alkylene glycols)having a single hydroxy group, each having at least one allyl group, and mixtures thereof, R3 being free of urethane linkages; and j is 2.
- 20. The polymerizable composition of claim 19 wherein the material of which R3 is a residue is selected from the group consisting of C2-C4 alkylene glycol allyl ether, poly(C2-C4 alkylene glycol) allyl ether, trimethylol propane di(allyl ether), trimethylol ethane di(allyl ether), pentaerythritol tri(allyl ether), di-trimethylolpropane tri(allyl ether) and mixtures thereof.
- 21. The polymerizable composition of claim 20 wherein the material of which R3 is a residue is selected from the group consisting of poly(ethylene glycol)allyl ether, poly(1,2-propylene glycol)allyl ether and mixtures thereof.
- 22. A polymerizable composition comprising:
(a) a major amount of a radically polymerizable first monomer represented by the following general formula, R—[—O—C(O)—O—R1]i wherein R is a polyvalent residue of a polyol having at least two hydroxy groups, R1 is an allyl group, and i is a whole number from 2 to 4; and (b) a radically polymerizable second monomer present in said composition in an amount of from 0.1 percent by weight to 10 percent by weight based on the total weight of said polymerizable composition, such that a polymerizate of said composition is substantially free of tinting defects, said radically polymerizable second monomer represented by the following general formula, 6 wherein R2 is a residue of a cycloaliphatic diisocyanate selected from the group consisting of isophorone diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, bis(isocyanatomethyl)cyclohexane, bis(isocyanatocyclohexyl)methane, bis(isocyanatocyclohexyl)-2,2-propane, bis(isocyanatocyclohexyl)-1,2-ethane, and mixtures thereof; and the material of which R3 is a residue is selected from the group consisting of C2-C4 alkylene glycol allyl ether, poly(C2-C4 alkylene glycol) allyl ether, trimethylol propane di(allyl ether), trimethylol ethane di(allyl ether), pentaerythritol tri(allyl ether), di-trimethylolpropane tri(allyl ether) and mixtures thereof, R3 being free of urethane linkages; and j is 2.
- 23. The polymerizable composition of claim 22 wherein the material of which R3 is a residue is selected from the group consisting of poly(ethylene glycol)allyl ether, poly(1,2-propylene glycol)allyl ether and mixtures thereof.
- 24. A polymerizable composition comprising:
(a) a major amount of a radically polymerizable first monomer represented by the following general formula, R—[—O—C(O)—O—R1]i wherein R is a polyvalent residue of a polyol having at least two hydroxy groups, R1 is an allyl group, and i is a whole number from 2 to 4; and (b) a radically polymerizable second monomer present in said composition in an amount of from 0.1 percent by weight to 10 percent by weight based on the total weight of said polymerizable composition, such that a polymerizate of said composition is substantially free of tinting defects, said radically polymerizable second monomer represented by the following general formula, 7 wherein R2 is a residue of a cycloaliphatic diisocyanate selected from the group consisting of isophorone diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, bis(isocyanatomethyl)cyclohexane, bis(isocyanatocyclohexyl)methane, bis(isocyanatocyclohexyl)-2,2-propane, bis(isocyanatocyclohexyl)-1,2-ethane, and mixtures thereof; and the material of which R3 is a residue is selected from the group consisting of poly(ethylene glycol)allyl ether, poly(1,2-propylene glycol)allyl ether and mixtures thereof, R3 being free of urethane linkages; and j is 2.
- 25. A polymerizable composition comprising:
(a) a major amount of a radically polymerizable first monomer represented by the following general formula, R—[—O—C(O)—O—R1]i wherein R is a divalent residue of a poly(C2-C4 alkylene glycol), R1 is an allyl group, and i is 2; and (b) a radically polymerizable second monomer present in said composition in an amount at least sufficient such that a polymerizate of said composition is substantially free of tinting defects, said radically polymerizable second monomer represented by the following general formula, 8 wherein R2 is a residue of a cycloaliphatic diisocyanate selected from isophorone diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, bis(isocyanatomethyl)cyclohexane, bis(isocyanatocyclohexyl)methane, bis(isocyanatocyclohexyl)-2,2-propane, bis(isocyanatocyclohexyl)-1,2-ethane, and mixtures thereof, R2 being free of urethane linkages; R3 is a residue of a material having a single hydroxy group and at least one allyl group, R3 being free of urethane linkages; and j is 2.
- 26. A polymerizable composition comprising:
(a) a major amount of a radically polymerizable first monomer represented by the following general formula, R—[—O—C(O)—O—R1]i wherein R is a divalent residue of a poly(C2-C4 alkylene glycol), R1 is an allyl group, and i is 2; and (b) a radically polymerizable second monomer present in said composition in an amount at least sufficient such that a polymerizate of said composition is substantially free of tinting defects, said radically polymerizable second monomer represented by the following general formula, 9 wherein R2 is a residue of a cycloaliphatic diisocyanate selected from isophorone diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, bis(isocyanatomethyl)cyclohexane, bis(isocyanatocyclohexyl)methane, bis(isocyanatocyclohexyl)-2,2-propane, bis(isocyanatocyclohexyl)-1,2-ethane, and mixtures thereof, R2 being free of urethane linkages; R3 is a residue of a material chosen from poly(C2-C4 alkylene glycol) allyl ether, trimethylol propane di(allyl ether), trimethylol ethane di(allyl ether) and mixtures thereof, R3 being free of urethane linkages; and j is 2.
- 27. A polymerizable composition comprising:
(a) a major amount of a radically polymerizable first monomer represented by the following general formula, R—[—O—C(O)—O—R1]i wherein R is a residue of diethylene glycol, R1 is an allyl group, and i is 2; and (b) a radically polymerizable second monomer present in said composition in an amount at least sufficient such that a polymerizate of said composition is substantially free of tinting defects, said radically polymerizable second monomer represented by the following general formula, 10 wherein R2 is a residue of a cycloaliphatic diisocyanate selected from isophorone diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, bis(isocyanatomethyl)cyclohexane, bis(isocyanatocyclohexyl)methane, bis(isocyanatocyclohexyl)-2,2-propane, bis(isocyanatocyclohexyl)-1,2-ethane, and mixtures thereof, R2 being free of urethane linkages; R3 is a residue of poly(1,2-propylene glycol) allyl ether, R3 being free of urethane linkages; and j is 2.
- 28. A photochromic article comprising a polymerizate of a polymerizable composition comprising:
(a) a major amount of a radically polymerizable first monomer represented by the following general formula, R—[—O—C(O)—O—R1]i wherein R is a polyvalent residue of a polyol having at least two hydroxy groups, R1 is an allyl group, and i is a whole number from 2 to 4; and (b) a minor amount of a radically polymerizable second monomer represented by the following general formula, 11 wherein R2 is a polyvalent linking group that is free of urethane linkages; R3 is a residue of a material having a single hydroxy group and at least one allyl group, R3 being free of urethane linkages; and j is a number from 2 to 4.
- 29. A photochromic article adapted to be free of tinting defects comprising an at least partially cured substrate, at least a photochromic amount of a photochromic substance and a tinting defect inhibiting additive.
- 30. The photochromic article of claim 29 wherein said photochromic substance is at least partially imbibed into said substrate.
- 31. The photochromic article of claim 29 wherein said substrate is at least partially coated with a coating composition comprising at least a photochromic amount of a photochromic substance.
- 32. The photochromic article of claim 29 wherein said tinting defect inhibiting additive is present in an amount such that a polymerizate of said composition is substantially free of tinting defects.
- 33. A photochromic article adapted to be free of tinting defects comprising at least a photochromic amount of a photochromic substance, a tinting defect inhibiting additive, and an at least partially cured substrate comprising:
(a) a major amount of a radically polymerizable first monomer represented by the following general formula, R—[—O—C(O)—O—R1]i wherein R is a polyvalent residue of a polyol having at least two hydroxy groups, R1 is an allyl group, and i is a whole number from 2 to 4; and (b) a minor amount of a radically polymerizable second monomer represented by the following general formula, 12 wherein R2 is a polyvalent linking group that is free of urethane linkages; R3 is a residue of a material having a single hydroxy group and at least one allyl group, R3 being free of urethane linkages; and j is a number from 2 to 4.
- 34. A photochromic article adapted to be free of tinting defects comprising an at least partially cured substrate comprising diethylene glycol bis(allyl carbonate) monomer, at least a photochromic amount of a photochromic substance and a tinting defect inhibiting additive.
- 35. The photochromic article of claim 34 wherein said photochromic substance is at least partially imbibed into said substrate.
- 36. The photochromic article of claim 34 wherein said photochromic substance comprises at least one naphthopyran.
- 37. The photochromic article of claim 34 wherein said photochromic substance is chosen from spiro(indoline)naphthoxazines, spiro(indoline)benzoxazines, benzopyrans, naphthopyrans, organo-metal dithizonates, fulgides and fulgimides, and mixtures thereof.
- 38. A photochromic article adapted to be free of tinting defects comprising at least a partially cured substrate, a photochromic amount of a photochromic material wherein said photochromic material is at least partially imbibed into said substrate, and a tinting defect inhibiting additive.
- 39. A photochromic article adapted to be free of tinting defects comprising at least a partially cured substate wherein said substrate is at least partially coated with a coating composition comprising at least a photochromic amount of a photochromic material, and a tinting defect inhibiting additive.
Parent Case Info
[0001] This application is a Continuation-In-Part (CIP) of U.S. patent application having Ser. No. 09/459,796 which was filed on Dec. 13, 1999 and is pending in the United States Patent and Trademark Office.
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
09459796 |
Dec 1999 |
US |
Child |
10336118 |
Apr 2003 |
US |