Claims
- 1. In the polymerization of an anionically polymerizable monomer using a polymerization system comprising a monomer and a polymerization solvent wherein an organometallic compound polymerization initiator, soluble in said polymerization system having the formula:
- MeR.sub.x
- wherein Me is a metal selected from the group consisting of Groups I and II of the Periodic Test; R represents an alkyl or aryl group, or an aliphatic or aromatic hydrocarbon residue; and the integer x is 1 or 2; is added to said system, the improvement which comprises adding said polymerization initiator to said polymerization system as a solution comprising said polymerization initiator dissolved in a high viscosity solvent having a viscosity
- greater than 1 cp at room temperature and which is at least one member selected from the group consisting of n-hexylbenzene, n-butylbenzene, decalin, 1,2,3,4-tetrahydronaphthalene, liquid paraffin, and a mixture of liquid paraffin and benzene, wherein polymerization is subsequently initiated as the initiator dissolves in said polymerization system.
- 2. The polymerization of claim 1, wherein said high viscosity solvent does not inhibit the anionic polymerization.
- 3. The polymerization of claim 1, wherein the high viscosity solvent is at least one member selected from the group consisting of hexylbenzene, decalin, 1,2,3,4-tetrahydronaphthalene, and liquid paraffin.
- 4. The polymerization of claim 1, wherein the monomer and the solvent for polymerization are purified by dehydrating with a dehydrating agent in vacuum or in an inert gas and then distilling the monomer or the solvent.
- 5. The polymerization of claim 1, wherein the solution of the organometallic compound is added dropwise to the polymerization system so as to first react with impurities contained in the polymerization system until initiation of the polymerization ensues.
- 6. The polymerization of claim 1, wherein the concentration of the organometallic compound is in the range of 10.sup.1 -10.sup.-7 mole/l and wherein the amount of the monomer in the polymerization system is in the range of 0.5-20 wt.%.
Priority Claims (1)
Number |
Date |
Country |
Kind |
50-34950 |
Mar 1975 |
JPX |
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Parent Case Info
This application is a continuation in part of Ser. No. 614,777, filed Sept. 19, 1975, now abandoned.
US Referenced Citations (5)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
614777 |
Sep 1975 |
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