POROUS POLYMERIC POLISHING BRISTLES AND METHODS FOR THEIR MANUFACTURE

FIELD OF DISCLOSURE

The present disclosure generally relates to manufacturing methods and resulting materials such as brushes, bristles, and pads suitable for use as polishing media. More particularly, the disclosure relates to polymer-based bristles used to construct brushes and pads for polishing work pieces having non-planar features, such as cell phone display screens exhibiting beveled or curved edges.

BACKGROUND OF THE DISCLOSURE

Polishing media such as pads are useful in a variety of applications including polishing glass workpieces by moving the pad relative to the workpiece (e.g., glass, Si wafer, sapphire wafer, etc.) being polished. This relative movement may be created by a rotating the polishing pad, by rotating the object being polished, or a combination of such movements. Other linear or any useful relative motion may be used between the polishing pad and the object being polished. In some embodiments, a force may be applied to press the polishing pad in contact with the wafer. The polishing may be performed to varying degrees such as to remove larger imperfections, to achieve a mirror finish and/or final flatness.

The polishing pad can be, for example, a polyurethane polishing pad. Typical polyurethane polishing pads are designed to be attached to a planar platen for polishing a planar work piece. However, increasingly, specialty glass workpieces are being used that have non-planar surfaces or that have surfaces comprising non-planar portions. Unfortunately, standard polyurethane polishing pads cannot effectively polish a non-planar workpiece. One of the reasons that typical polishing pads are unacceptable for non-planar work pieces is that they do not provide even polishing over the entire surface. Standard polishing pads are generally unable to maintain contact with the entire surface area of the non-planar workpiece. Therefore, over certain portions of the workpiece's surface, they are unable to remove scratches (relics of the work pieces' lapping process) or other imperfections. Additional advantages obtained from polishing include removing a damaged layer, thinning the material to reduce its weight and make it more bendable, and improve surface finish and tactile “feel” of the material.

In the ordinary course of polishing a non-planar surface with a planar polishing pad, the polishing pad will not be able to compress enough to effectively contact the entire surface area of the workpiece. The use of compressible planar polyurethane foam or a stacked, planar foam composite may help provide additional coverage but still does not contact all surface areas in cases of significant curvature. See, for example, U.S. Pat. No. 9,440,326, issued Sep. 13, 2016, and entitled “Non-planar Glass Polishing Pad and Method of Manufacture,” the entire disclosure of which is hereby incorporated by this reference. Use of typical polishing pads can work well to remove material from a planar surface. However, such polishing pads are generally not well suited to polish workpieces with nonplanar (e.g., curved) surfaces, such as rounded edges, or surfaces with other features thereon.

Chinese Patent No. 105458946A, entitled “Polishing Disk Used For Polishing Curved Materials” (registered Mar. 23, 2018) discloses polishing strips made of a flexible porous foaming material (e.g., polyurethane polishing leather) in which a polishing material is provided. The strips include gas pores resulting in 20%-90% porosity. However, prior art polishing bristles are unsatisfactory in that they exhibit high brittleness, high breakage, and low resiliency.

Improved polishing media and methods are thus needed which overcome the limitations of the prior art.

SUMMARY OF THE DISCLOSURE

Various embodiments of the present disclosure relate to polymeric bristles assembled into a polishing brush or pad, and methods for their manufacture. While the ways in which exemplary embodiments of the present disclosure address drawbacks of prior polishing media are discussed in more detail below, in general, various embodiments of the disclosure provide polishing bristles derived from porous polymer-based materials. Exemplary bristles and brushes can be used to polish relatively hard materials, such as glass, semiconductor materials and materials used in the fabrication of electronic devices, as well as materials having a hardness greater than the hardness of typical glass—e.g., toughened aluminosilicate glass or sapphire as well as metals.

To polish a workpiece having a non-planar surface, a polishing medium such as a brush made from densely packed bristles, is placed adjacent to the workpiece and moved relative to the workpiece surface. This relative movement can be created by: linear movement of the workpiece relative to the brush; rotating the brush; rotating the workpiece; orbital movement of the workpiece or brush; or a combination of such movements. A force can be applied to press the brush against the workpiece surface during the lapping or polishing process. A slurry, including abrasive particles, can also be used during the processing to facilitate material removal from the workpiece surface.

In accordance with additional embodiments of the disclosure, a method of manufacturing polymeric bristles is provided. An exemplary method includes the steps of mixing a pre-polymer, a curative, and a foaming agent (to impart porosity) to thereby form a polymer-based cake. Alternatively, pores may be formed using any suitable physical blowing agent (e.g., hydrofluoroether or HFE) or mechanical mechanism such as punching, scraping, cutting, broaching, and the like. The resulting volume may then be divided (e.g., cut) into individual bristles (or groups of bristles) of desired size and shape and the bristles attached to a plate, platen, or the like for use as a polishing brush or pad. Alternatively, the polymeric material may be extruded or otherwise formed into a continuous strand having a desired cross section, and cut into discrete lengths. Exemplary methods can further include adding in the range of 1% to 9% polyol into the mixture. In various embodiments, the bristles may be attached to the plate by sewing, wedging, tying, gluing, or combinations thereof, or otherwise secured. Other exemplary methods are described below.

Further exemplary embodiments of the disclosure include a method of removing material from a workpiece surface using porous bristles as described herein, a polishing apparatus as described herein, and/or polishing system as described herein.

BRIEF DESCRIPTION OF THE DRAWING FIGURES

A more complete understanding of the embodiments of the present disclosure may be derived by referring to the detailed description and claims when considered in connection with the following illustrative figures, and:

FIG. 1 illustrates a perspective view of a polishing brush interacting with a workpiece having a non-planar feature in accordance with various exemplary embodiments of the disclosure;

FIG. 2 illustrates a front elevation close up view of a polishing brush showing bristles secured directly to a plate in accordance with additional exemplary embodiments of the disclosure;

FIG. 3 illustrates an alternate view of a polishing brush showing bristles secured to a plate and further including a supplemental polishing medium between the distal ends of the bristles and the plate in accordance with further exemplary embodiments of the disclosure;

FIG. 4 illustrates a graph of removal rate versus bristle density under laboratory conditions in accordance with exemplary embodiments of the disclosure;

FIG. 5 illustrates a graph of lifetime breakage versus bristle density for two bristle materials under laboratory conditions in accordance with exemplary embodiments of the disclosure;

FIG. 6 illustrates a polishing system in accordance with exemplary embodiments of the disclosure;

FIG. 7 illustrates exemplary workpieces in accordance with exemplary embodiments of the disclosure;

FIG. 8 is a graph of wear rate versus density for two bristle materials in accordance with exemplary embodiments of the disclosure;

FIG. 9 is a graph of wear rate versus polyol concentration in accordance with exemplary embodiments of the disclosure; and

FIG. 10 is a graph of bristle density versus removal rate in accordance with exemplary embodiments of the disclosure.

It will be appreciated that elements in the figures are illustrated for simplicity and clarity and have not necessarily been drawn to scale. For example, the dimensions of some of the elements in the figures may be exaggerated relative to other elements to help to improve understanding of illustrated embodiments of the present disclosure.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

The description of exemplary embodiments of materials, media, brushes, bristles, systems, apparatus, and methods of forming and using the bristles provided below is merely exemplary and is intended for purposes of illustration only; the following description is not intended to limit the scope of the disclosure or the claims. Moreover, recitation of multiple embodiments having stated features, compositions, or properties is not intended to exclude other embodiments having additional features, compositions, or properties, or other embodiments incorporating different combinations of the stated features, compositions, or properties, unless otherwise noted herein.

Exemplary materials, media, apparatus, and systems as described herein can be used to polish surfaces of a workpiece, including a workpiece having a non-planar surface, a planar surface, or both. By way of examples, materials, media, apparatus, systems, and methods as described herein can be used to polish glass, such as display screens for hand-held devices, toughened aluminosilicate glass, semiconductor material, materials used to form electronic devices and/or hard-surface materials, such as sapphire (e.g., the A, C, or R planes of sapphire), other gem stones, such as emeralds and rubies, ceramics, plastics, semiconductors, metals, such as titanium, aluminum, steel, and similar materials. As used herein, the term “hard surface” or “hard-surface material” means a material having a hardness greater than the hardness of conventional hard silicate glass (e.g., greater than about 1550 HB Brinell scale or about 6 or 7 Moh's scale). For example, the materials, media, apparatus, and systems as described herein can be used to polish surfaces that have undergone grinding and/or lapping processes or for chemical-mechanical planarization processes and/or to control the thickness, shaping, surfacing, and/or smoothing of the workpiece.

By way of particular examples, the workpiece includes glass, such as toughened aluminosilicate glass, used in the manufacture of displays or covers for devices, such as smart phones or other personal electronic devices. The workpiece can include nonplanar surfaces, such as curved, beveled, or rounded edges, to provide a smooth surface and/or reduce a risk of chipping or cracking of the workpiece.

As noted above, typical polishing pads may not be particularly well suited for polishing curved edges of a workpiece. In contrast, various embodiments of brushes constructed from polymeric bristles (which may or may not be porous) and methods described herein can be used to polish surfaces that include nonplanar portions, such as curved edges, without compromising desired material removal rates from the workpiece surface.

FIG. 7 illustrates various example nonplanar workpieces. Throughout this description, the term nonplanar workpiece is intended to describe a workpiece having at least one surface that comprises at least one portion of that surface that is not planar with regard to another portion of the workpiece. Similarly, the term nonplanar surface is intended to mean a surface that comprises at least one portion of that surface that is not planar with respect to another portion of the surface. In an example embodiment, a nonplanar surface comprises at least one portion of the surface that is planar (a planar portion), e.g., portion 711A, and at least one portion whose surface is not in the same plane as the surface of the planar portion 711A (a nonplanar portion), e.g., portion 711.

Thus, in an example embodiment, the workpiece to be polished may comprise a workpiece (e.g., workpiece 701, 702, 703, or 704) having a flat portion in the middle of the workpiece (e.g., portion 711A in workpiece 701) and nonplanar portions (e.g., portions 711, 712, 713, 714) near the edges of the workpiece. For example, an area of a workpiece near the edges could have a rounded edge with a radius of curvature (e.g., rounded edges 713, 714), a bevel (e.g., edges 711, 712), a taper, a parabolic shape (e.g., edge 714), a rounded shape, or the like. An edge portion of the surface of the workpiece can include any suitable nonplanar shape.

A workpiece can include an edge that is at a 90-degree angle to a top surface (e.g., surface 711A) and a bottom surface (e.g., surface 711B) and those surfaces (711A and 711B) are typically flat and parallel. In an example embodiment, curved workpieces may differ in that one or more surfaces have a curvature that is described by one of the following: (1) edges have a radius of curvature slightly larger than the part height (“PH”) that then tapers into a surface that has a radius of curvature much larger than the PH which constitutes a nearly flat surface (the other surface is flat in this case); (2) one surface is flat with 90 degree edges that extend to approximately ½ of the PH where then a radius of curvature similar in size to the PH extends to the other surface where the remaining surface across the workpiece has a radius of curvature that is much larger than the PH and is nearly flat; and (3) one surface is flat and the other surface is made entirely of a curved surface (e.g., workpiece 706 and entirely curved surface 716) with a radius of curvature much larger than the PH. In each of the above three cases, the workpiece could have both sides curved in some combination of the above three examples. For example, workpiece 705 has both surfaces 715A, 715B curved over the entire surface of the workpiece. The glass workpieces, from a top (face) view could also be round, square, rectangular or some other geometry. In an example embodiment, the workpiece may have a non-continuous radius of curvature across an entire surface. Stated another way, the workpiece may have no planar portions.

In some embodiments, the workpiece to be polished may include surfaces that are set-back, inset, or otherwise offset relative to other surfaces located, for example, around the perimeter of the workpiece. Workpiece 707, for example, features a substantially planar surface 717 that is offset, by a small amount, from a surface 727 located on the same side of workpiece 707 as surface 717. In other embodiments, as illustrated with respect to workpiece 708, the internally offset surface 718 is displaced from the periphery surface 728 by a significant amount. In some embodiments, the workpiece does not have a generally rectangular shape (as shown in workpieces 707 and 708), but rather has a generally curvilinear shape, as illustrated in connection with workpiece 709. Workpiece 709 may correspond, for example, to an eyeglass lens having two opposing curved surfaces 719A and 719B.

In one example embodiment, PH is measured at the point of greatest thickness of the glass object before polishing. In another example embodiment, PH is less than or equal to the greatest thickness of the glass, but not less than the greatest minimum finished thickness of the glass. The PH can be, for example, from 0.01 inch to 1 inch or from 0.05 inch to 0.25 inch. Other part heights can also be used.

In accordance with various embodiments, porous (or non-porous or minimally porous) polymeric polishing bristles may be secured to a plate, pad, platen, or the like, and used to polish nonplanar surfaces. Stated another way, the polymeric bristles are configured to remove evidence of lapping damage or otherwise remove material on the nonplanar (e.g., curved, radiused, beveled) portions as well as on any planar portions of the workpiece more effectively, compared to pads that are not so configured.

FIG. 1 illustrates polishing media 100 in accordance with various examples of the disclosure. Polishing media 100 includes a plurality of individual bristles 101 each made from a polymer-based material and secured to a platen 104. As described in greater detail below, the bristles may be cut from a cake of polymer or inorganic material, extruded as a strand and cut into discrete segments, or molded, stamped, or otherwise derived from a volume of material.

The base material may be devoid of, substantially devoid of, or may include one or more fillers, abrasives, and/or microballoons. Exemplary fillers and abrasives include one or more polymeric and inorganic fillers, such as (inorganic) calcium carbonate, barium sulfate, cerium oxides, silicon oxides, aluminum oxides, zirconia, iron oxides, manganese dioxides, kaolin clays, montmorillonite clays, titanium oxides, silicon carbides, boron carbides, and diamond; (polymeric) polyurethane foam, epoxy, polystyrene, polyacrylic, polyimide, nylon, Kevlar, Teflon or other thermoplastic or thermoset materials. A size of the inorganic filler/abrasive particles can range from about 0.001 microns to about 1000 microns, or about 0.5 microns to about 100 microns in average diameter. Organic polymeric fillers can also include cylindrical fibers ranging from 50 to 50000 microns in length and 20 to 1000 microns in diameter. Fillers can also include glass or polymeric microspheres and microballoons. The polymeric soft polymer-based material can include zero (0) to about 80 wt. % (and preferably about 5 to 50%) filler/abrasive. Exemplary organic and/or inorganic fillers/abrasives may be about zero (0) wt. % or may range from about 15 wt. % to about 30 wt. % or about 20 wt. % to about 25 wt. % by weight of the soft polymer-based material.

In the illustrated example, the polymer material may comprise one or more of a polyurea, a polyurethane, and a polyurethane/polyurea hybrid material, any of which can be foamed or unformed. The polymer material may be formed into bristles from a bulk (e.g., cakes or sheets) of material—such as material typically used to form polishing pads (e.g., new or used polishing pad material), which may be foamed or otherwise prepared to impart any desired degree of porosity, for example using mechanical techniques such as cutting. In the present case, the bristles can be formed by cutting, stamping, molding, extruding, or otherwise converting the bulk polishing material into either discrete bristles or into a bulk cake of polishing material having bristles extending therefrom.

In various embodiments, bristles 100 are referred to herein as porous, in that they may (or may not) embody pores 110 which may be characterized by a pore diameter (or mean pore diameter) 111, for example on the order of 10 microns to several millimeters. During polishing, it is proposed that these pores may facilitate removal rate by delivering abrasive particles (on the order of 10 microns) contained in the slurry to local material removal sites on a workpiece 102 having one or more non-planar surfaces 103.

Various methods for manufacturing the polymer material from which the bristles are made are discussed in the following patents and patent applications, the entire disclosures of which are hereby incorporated into this disclosure by this reference: i) U.S. Pat. No. 9,440,326, issued Sep. 13, 2016, and entitled “Non-planar Glass Polishing Pad and Method of Manufacture;” ii) U.S. Pat. No. 9,649,741, issued May 16, 2017, and entitled “Polishing Material for Polishing Hard Surfaces, Media Including the Material, and Methods of Forming and Using Same;” iii) U.S. Pat. No. 9,050,697, issued Jun. 9, 2015, and entitled “Self-conditioning Polishing Pad and a Method of Making the Same;” iv) U.S. Publication No. 2017/0028526, published Feb. 2, 2017, and entitled “Polymeric Lapping Materials, Media and Systems Including Polymeric Lapping Material, and Methods of Forming and Using Same;” and v) U.S. Publication No. 2017/0258660, published Sep. 17, 2015, and entitled “Polyurea-Based Material, Polishing and Grinding Including the Polyurea-Based Material, and Methods of Forming and Using Same.”

FIG. 2 illustrates two embodiments (in a side-by-side, cut-away view) of a polishing medium 200, which includes bristles 204 extending from a rigid or flexible plate 206. Although not separately illustrated, the bristles in accordance with at least one embodiment of the disclosure may or may not include one or more of abrasive particles, micro-balloons, and/or various other constituents to fine tune the mechanical properties of the bristles. Exemplary lengths of the bristles 204 range from 0.3 inches to 14 inches, or 1.0 inch to 2.5 inches, or 1.0 to 3 inches, or 0.25 to 3 inches, and preferably about 1 inch as measured from a surface of a plate 206 or other surface to which the bristles 204 are attached or otherwise secured. A cross-sectional shape of the bristles can include a circle, ellipse square, rectangle, star, cross, triangle, or the like. An effective diameter of each bristle can range from 0.1 mm to 6 mm, or 0.5 mm to 4.0 mm, or 2.5 mm to 3.5 mm. A shape of a side profile (length) can be rectangular, triangular, or tapering. Bristles 204 can extend 0.1 to 2.0 inches from the soft polymer-based material 202 surface 208. Bristles 204 can comprise, consist of, or consist essentially of one or more of polyester, polyethylene, polypropylene, nylon and its various grades, animal hair, cut sections of nonwoven sheets, cut sections of polishing pads, polyurethane elastomer, and the like.

In some embodiments, as illustrated to the left in FIG. 2, plate 206 includes pairs of holes or openings (e.g., holes 211 and 212), through which groups of bristles (e.g., 6-10 individual bristles per group) may be sewn or threaded and folded back to form the polishing medium 200. In another embodiment, as illustrated to the right in FIG. 2, plate 206 includes holes or openings (e.g., hole 208) into which groups of bristles (e.g., 6-10 individual bristles) are at least partially inserted to thereby secure the groups of bristles 204 to form the polishing medium 200. In addition to the interference fit provided by holes 211, 212, and 208, one or more adhesives and/or other components (not illustrated) may be used to further secure bristles 204 to plate 206. It will be appreciated that FIG. 2 is not necessarily drawn to scale, and that the spacing, size, and locations of the various openings and bristle groups may vary depending upon various factors, such as the nature and size of the article being polished. Alternatively, the bristles and the base plate from which they extend may be formed from a single, integral block of material (e.g., using an injection molding or other casting technique).

In accordance with various embodiments, the bristles may be configured to polish any planar or non-planar surface, as well as workpieces having a combination of both planar and non-planar surfaces. Moreover, the bristle length, effective width, and morphological features of the bristles may be adapted to the size and shape of the workpiece. For example, the effective length of the bristles may be at least as long as the height of the workpiece being polished, with the bristle diameter adjusted accordingly to provide adequate stiffness.

FIG. 3 illustrates a polishing apparatus 300 in accordance with at least one embodiment of the disclosure. Polishing apparatus 300 includes a plate 306 and polishing media 308. In the illustrated example, polishing media 308 includes soft polymer-based material 302 and bristles 304 (which can be the same or a different material as polymer material 104 and/or bristles 204).

Plate 306 and plate 206 can include any suitable material, such as plastic; for example, one or more of polypropylene, polyethylene, polycarbonate, polyamide, polyimide or other common rigid engineering plastics, or a metal. Plate 306 can be used to provide structural support for polishing medium 308. Holes or apertures can be formed within plate 306 (e.g., as shown in FIG. 2) to facilitate attachment of bristles thereto and/or adhesion of soft polymer-based material 302 to plate 306. The soft polymer-based material 302 and/or the bristles 304 may include various fillers, abrasives, and/or microballoons 303 as discussed above in connection with FIG. 1.

As described in greater detail below, polymeric bristles may achieve higher material removal rates if they exhibit porosity, which may be imparted to the polymer material by adding a foaming agent or otherwise reducing the density below that of a completely solid, non-porous material. In this regard, references to the density of the bristle material are understood to refer to the density of the polymer material prior to the addition of any particulates or fillers, as described above.

FIG. 4 is a graph illustrating material removal rate or MRR (also referred to as stock removal rate of SRR, that is, the rate at which material is removed from an exemplary workpiece), versus the density of the polishing bristle material.

The data shown in FIG. 4 demonstrate that lower density bristle materials can be advantageous in that they tend to yield higher material removal rates (MMR). For example, bristle material densities in the range of 0.25 to 1.15, or 0.3 to 1.2, or 0.3 to 0.8, or 0.3 to 1.1, and more particularly in the range of 0.4 to 0.7, and most particularly in the range of 0.5 to 0.6 have been observed to yield material removal rates in the range of 0.06 to about 0.16, or in the range of 0.06 to about 0.30 (and particularly in the range of 0.8 to 0.12) millimeters per minute for substrates (workpieces) having material properties generally analogous to glass resistance displays of the type used in mobile telephones. In addition, as described below, lower density bristle materials tend to promote greater lifetime resistance to impulse breakage (also known as breakage survival).

More particularly, FIG. 5 is a graph illustrating breakage survival versus bristle density for two exemplary bristle materials. As shown, bristle material densities in the range of 0.3 to 0.7, and particularly in the range of 0.4 to 0.6, have been shown to exhibit high speed rotary impact survival values in the range of 50 to 1,200, and particularly in the range of 200 to 500 SEC (seconds).

In contrast to the higher removal rates and higher breakage values achieved using lower density bristle materials, it has also been observed that lower density bristle materials tend to exhibit lower wear resistance; that is, the bristles tend to degrade faster.

More particularly, FIG. 8 is a graph illustrating Taber wear rate versus bristle material density for two exemplary bristle material compositions. In the context of FIG. 8, the wear rate refers to a bristle's loss in mass or thickness (typically expressed in milligrams or millimeters removed) per number of cycles of abrasion (typically per thousand or ten thousand cycles). (See, ASTM D1044 and ASTM D4060). As shown, bristle material densities in the range of 0.25 to 1.15, and particularly in the range of 0.3 to 0.8 or 0.3 to 1.1, and more particularly in the range of 0.4 to 0.6 or 0.7, and most particularly in the range of 0.5 to 0.6, have been shown to exhibit wear rates in the range of 40 to 300 microns/hr.

With momentary reference to FIG. 9, the present inventors have also observed that a bristle material's wear resistance may be improved by incorporating additional polyol (e.g., in the form of PTMEG) into an isocyanate (NCO) prepolymer prior to combining the NCO with a curative. In this context, the supplemental polyol is separate from any polyol which is typically included as part of the liquid NCO prepolymer. FIG. 9 shows that wear resistance may be increasingly enhanced by incorporating PTMEG into the polymer used to make the bristle material in the range of 1% to 9% by weight of total solution (that is, the prepolymer, curative, and polyol combined).

Those skilled in the art will appreciate that polishing media are often rated or characterized in terms of three primary criteria: i) MRR; ii) wear rate; and iii) breakage. Depending on particular use cases, the desired values for these criteria may vary widely. It is thus possible to “tune” bristle properties to optimize their performance for particular applications.

In this regard, FIGS. 4, 5, 8, and 9 suggest that bristles made from lower density materials tend to exhibit higher removal rates and greater breakage resistance values, but also tend to exhibit higher wear rates (corresponding to lower wear resistance). In accordance with one aspect of the invention, the density of the material from which the bristles are made may be selected to optimize the bristles for use in their intended polishing environment. For example, if a particular polishing application requires a high removal rate and/or a high breakage resistance value but does not require a high wear resistance (such as when the polishing operation may be completed before the bristles undergo significant degradation), relatively low density materials may be employed (e.g., in the range of 0.2 to 0.6). In contrast, for polishing applications requiring bristles with high wear resistance (corresponding to longer polishing times) but which do not require high MMR and/or high breakage resistance values, correspondingly higher density bristle materials may be employed (e.g., in the range of 0.5 or 0.6 or above).

Various techniques may be employed to impart a desired porosity to the polymeric bristle material by controlling the density of the bristle material, for example by incorporating foaming agents, blowing agents, and/or microballoons (such as those supplied by Akzo Nobel, Amsterdam) into the polymeric material to influence porosity and, in particular, the size of the pores (often expressed in terms of mean diameter pore size). In various embodiments, the polymer material may be characterized by pore sizes in the range of 10 microns to 1 millimeter. In addition, the polymeric material may also include one or more surfactants (including fluorosurfactants).

Those skilled in the art will appreciate that the foregoing use cases are merely exemplary, and are intended to illustrate the notion that the composition of the bristle material, the relative concentrations of the various constituent components of the material, as well as the material density of the material may be configured to “tune” the morphology (particularly density and pore size) of the resulting bristles to optimize their effectiveness in their intended operating environment.

FIG. 6 illustrates an exemplary polishing system 600 in accordance with embodiments of the disclosure. Polishing system 600 can be used for polishing a workpiece 612—e.g., a workpiece having one or more profiles illustrated in FIG. 7. Polishing system 600 includes an apparatus 602, a carrier 608, and slurry 610, which can be dispensed from an optional slurry dispenser 616. Polishing system 600 can also include a plate 620 and/or a rotational arm 622. Apparatus 602, carrier 608, and slurry dispenser 616 can form part of a polishing machine or polisher.

Apparatus 602 includes a platen or plate 604 and one or more brushes 606 removably attached to platen 604. Apparatus 602 can rotate about an axis 618, as illustrated, and/or can perform other relative movement with respect to the workpiece 612 surface. In the illustrated embodiment, the brush 606 has a diameter in the range of 770 millimeters.

Carrier 608 can be configured to retain one or more workpieces (e.g., 612) during a polishing process. The carrier can include teeth that engage with, e.g., a platen of polishing system 600. Carrier 608 can rotate about axis 614, about axis 618, or employ other suitable movement. Carrier 608 can be formed of any suitable material. By way of examples, carrier 608 is formed of stainless steel and/or fiberglass.

The materials described herein from which the bristles (e.g., for medium 606) are made can be formed in a variety of ways, and may comprise one or more of a polyurea, a polyurethane, and a polyurethane/polyurea hybrid material, any of which can be foamed or otherwise configured to achieve a desired density.

Those skilled in the art will appreciate that suitable polymeric bristle materials may be made by combining an isocyanate prepolymer (NCO) with a suitable curative, such as a hydroxyl (OH) or an amine (NH₂) based curative. The NCO may be any suitable prepolymer such as H₁₂, NDI, PPDI, TODI, TMXDI, DMDI, DPDI, and 1,4-H₆XDI and oligomeric isocyanates, an MDI (methylene diphenyl diisocyanate), a TDI (toluene diisocyanate) polyether, an MDI or TDI polyester, and various polyether and polyester backbones including oligo- and polymeric diols, triols, tetrols, hexols, and mixtures of the foregoing. If desired, additional polyol (e.g., PTMEG) in the range of 2% to 9% by total weight may be added to the prepolymer immediately before combining it with the curative.

Classes of polyols that may be used to prepare suitable isocyanate functional prepolymers of the first component of the two-component composition used to prepare the cross-linked polyurethane include, but are not limited to: straight or branched chain alkane polyols, e.g., ethanediol, propanediol, propanediol, butanediol, butanediol, glycerol, neopentyl glycol, trimethylolethane, trimethylolpropane, di-trimethylolpropane, erythritol, pentaerythritol and di-pentaerythritol; polyalkylene glycols, e.g., di-, tri- and tetraethylene glycol, and di-, tri- and tetrapropylene glycol; cyclic alkane polyols, e.g., cyclopentanediol, cyclohexanediol, cyclohexanetriol, cyclohexanedimethanol, hydroxypropylcyclohexanol and cyclohexanediethanol; aromatic polyols, e.g., dihydroxybenzene, benzenetriol, hydroxybenzyl alcohol and dihydroxytoluene; bisphenols, e.g., isopropylidenediphenol; oxybisphenol, dihydroxybenzophenone, thiobisphenol, phenolphthlalein, bis(hydroxyphenyl)methane, (ethenediyl)bisphenol and sulfonylbisphenol; halogenated bisphenols, e.g., isopropylidenebis(dibromophenol), isopropylidenebis(dichlorophenol) and isopropylidenebis(tetrachlorophenol); alkoxylated bisphenols, e.g., alkoxylated isopropylidenediphenol having from 1 to 70 alkoxy groups, for example, ethoxy, propoxy, and butoxy groups; and biscyclohexanols, which can be prepared by hydrogenating the corresponding bisphenols, e.g., isopropylidene-biscyclohexanol, oxybiscyclohexanol, thiobiscyclohexanol and bis(hydroxycyclohexanol) methane.

Additional classes of polyols that may be used to prepare isocyanate functional polyurethane prepolymers include: Aminic, Mannich, Novolak, Resorincol, Acrylic, Polycarbonate and Melamine based systems. For example, higher polyalkylene glycols, such as polyethylene glycols having number average molecular weights (Mn) of, for example, from 200 to 4000; and hydroxy functional polyesters, such as those formed from the reaction of diols, such as butane diol, and diacids or diesters, e.g., adipic acid or diethyl adipate, and having an Mn of, for example, from 200 to 4000. In an embodiment of the present invention, the isocyanate functional polyurethane prepolymer is prepared from a diisocyanate, e.g., toluene diisocyanate, and a polyalkylene glycol, e.g., poly(tetrahydrofuran) with an M_nof 1000.

The functionality of the aforementioned prepolymers may be defined as the number of hydroxyl (or other isocyanate reactive chemical groups known in the art) per molecule of polyol. These can typically range from di-functional to octa-functional type structures, or blends thereof, to produce the desired physical and performance properties. In the specific case of polyols, the hydroxyl functionality can be primary, secondary or tertiary functionality, or blends thereof; most preferred are either primary or secondary functionality.

In accordance with various embodiments, removal rate (MRR/SRR) may be improved (increased) with increasing bristle density. Referring now to FIG. 10, desirable removal rates (e.g., above 8 μ/hr) may be achieved using bristle densities in the range of 0.6 to 0.9 (or 0.6 to 0.8) and above. Indeed, densities in the range of 1.0 to 1.2, for example about 1.15, may yield desirable removal rates using, for example, a polishing table rotating in the range of 200 RPM.

With continued reference to FIG. 10, densities in the range of 0.7 to 0.8 may yield removal rates in the range of 16 to 20. Higher densities may yield higher removal rates.

To improve wear and mitigate bristle breakage at higher bristle densities (e.g., corresponding to low or even zero porosity), the aforementioned chemistries may be adjusted to form custom pre-polymer compositions having lower NCO content (that is, fewer bonding sites).

By way of non-limiting example, the present inventors have determined that reducing the NCO content of the pre-polymer from about 8% to about 5% tends to increase the resiliency and reduce breakage in the finished bristles. Moreover, using a TDI polyester pre-polymer in lieu of an MDI polyurethane pre-polymer also tends to improve lifetime performance of the finished bristles. This may be particularly true with isotropic (homogeneous) bristles.

In various embodiments, the finished polymer cake may be cut into bristles which may be assembled together in a generally parallel arrangement and secured at one end of a plate to form a flexible brush. Exemplary lengths of the bristles range from 0.5 inch to 4 inches, or 1.0 inch to 3.0 inches or 2.0 inches to 2.5 inches, inches as measured from a surface of the plate or substrate to which the bristles are attached. A cross-sectional shape of the bristles can include a circle, square, rectangle, star, cross, triangle, or the like. An effective diameter of each bristle can range from 0.1 mm to 6 mm, or 0.5 mm to 4.0 mm, or 2.5 mm to 3.5 mm. A shape of a side profile (length) can be rectangular, triangular, tapered, or irregular. In a preferred embodiment, the bristles are about 3 mm by 3 mm and that portion of the bristle exposed from the platen may be about 25 mm long.

To achieve 25 mm bristle lengths, polymeric cakes may be formed which are 23 inches in length, 55 inches in height, and any desired width. The cake may then be sliced into sheets which are 23 inches in length, 55 inches in height, and 3 mm wide. These sheets may then be cut into smaller sheets which are 23 inches in length, 3 mm wide, and 80 mm in height. These smaller sheets may then be cut into 3 mm×3 mm×80 mm strips.

Each 3 mm×3 mm×80 mm strip may then be folded in half, and the apex sewn or stitched into holes formed in the platen, such that 25-30 mm of both folded halves extend from the platen surface.

In various embodiments the plate may be made from a plastic, such as polypropylene, polyethylene, polycarbonate, polyamide, polyimide or other common rigid or flexible engineering plastics, or a metal.

A polishing medium is provided which includes a plurality of porous polymeric bristles.

A polishing brush is provided which includes a plurality of bristles, wherein: each bristle comprises a porous polymeric material; each bristle comprises a constrained proximal end and an unconstrained distal end; and each bristle is disposed substantially parallel to the other bristles.

An apparatus is also provided for polishing a workpiece of the type characterized by at least one non-planar surface. The apparatus includes a base, and a plurality of bristles secured to and extending substantially orthogonally from the base. Alternatively, the outer bristles may be configured to extend at an acute angle relative to the interior bristles, to facilitate polishing corners or other tight spaces of a workpiece. In an embodiment, each bristle comprises a porous polymeric material.

In an embodiment, the polymeric material comprises at least one of a polyurea, a polyurethane, and a polyurethane/polyurea hybrid material.

In an embodiment, the polymeric material comprises one of a polyester polyurethane and a polyether polyurethane.

In an embodiment, the polymeric material comprises a density in the range of 0.3 to 1.2.

In an embodiment, the polymeric material comprises a density in the range of 0.4 to 0.7.

In an embodiment, the polymeric material is characterized by pores having a mean diameter in the range of 10 microns to 1 millimeter.

In an embodiment, the polymeric material further comprises polyether polyol in the range of 1% to 8% by weight.

In an embodiment, the polymeric material is foamed.

In an embodiment, the polymeric material comprises one of an MDI (methylene diphenyl diisocyanate) and a TDI (toluene diisocyanate) type polyether polyurethane.

In an embodiment, the polymeric material comprises one of an MDI and a TDI type polyester polyurethane.

In various embodiments, the polymeric material may include none, one, or two or more surfactants.

In an embodiment, at least one of the surfactants comprises a fluorosurfactant.

In an embodiment, each bristle has a length in the range of 1 to 3 inches, and an effective diameter in the range of 0.5 to 4 millimeters.

A method is provided for manufacturing bristles for use in polishing a workpiece which may include a non-planar surface. The method includes the steps of combining an isocyanate pre-polymer, a curative, and a foaming agent to form a volume of polymeric material, and thereafter separating the volume of polymeric material into a plurality of bristles. The foaming agent may be configured to impart a density to the polymeric material in the range of 0.3 to 1.2.

In an embodiment, the polymeric material is characterized by pores having a mean diameter in the range of 10 microns to 1 millimeter.

In an embodiment, the polymeric material comprises at least one of a polyurea, a polyurethane, and a polyurethane/polyurea hybrid material.

In an embodiment, the combining step further comprises adding polyether polyol in the range of 1% to 8% by weight.

In an embodiment, the pre-polymer comprises one of an MDI (methylene diphenyl diisocyanate) polyether polyurethane, a TDI (toluene diisocyanate) polyether polyurethane, and MDI polyester polyurethane, and a TDI polyester polyurethane.

In an embodiment, the method further includes securing the plurality of bristles to a plate to form a polishing brush, and attaching the polishing brush to a rotary platen.

A polishing bristle is provided which is made from the foregoing method.

A polishing brush is provided which includes a base plate and a plurality of bristles extending from the base plate. In an embodiment, each bristle comprises a foamed polymeric material characterized by: i) pores having a mean diameter in the range of 10 microns to 1 millimeter; and ii) a density in the range of 0.3 to 1.2.

Although exemplary embodiments of the present disclosure are set forth herein, it should be appreciated that the disclosure is not so limited. For example, although materials, media, apparatus, systems, and methods are described in connection with lapping hard-surface materials, the invention is not so limited—unless otherwise stated. In addition, the bristles described herein may be used for other purposes besides polishing, such as, for example, applying a coat of liquid to a surface, or cleaning a surface without removing material from the surface. Various modifications, variations, and enhancements of the materials, methods, and media set forth herein may be made without departing from the spirit and scope of this disclosure.

	Number	Date	Country
	62672524	May 2018	US
	62421187	Nov 2016	US

	Number	Date	Country
Parent	15989642	May 2018	US
Child	16798228		US
Parent	15808643	Nov 2017	US
Child	15989642		US

POROUS POLYMERIC POLISHING BRISTLES AND METHODS FOR THEIR MANUFACTURE

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