Portion of a display panel with a graphical user interface

Information

  • Patent Grant
  • D977504
  • Patent Number
    D977,504
  • Date Filed
    Wednesday, July 22, 2020
    4 years ago
  • Date Issued
    Tuesday, February 7, 2023
    a year ago
  • US Classifications
    Field of Search
    • US
    • D14 485-495
    • CPC
    • H01L22/20
    • H01L22/12
    • G06F3/048
    • G06F3/0481
    • G06F3/04817
    • G06F3/0482
    • G06F3/0483
    • G06F3/04842
    • G06F3/0485
    • G06F3/04855
    • G06F3/0486
    • G06F3/0488
    • G06F3/04886
    • G06F40/103
    • G06F40/106
    • G01B15/02
    • G01B2210/56
    • G01N2223/6116
    • G03F7/70616
    • G03F9/7003
  • International Classifications
    • 1404
    • Term of Grant
      15Years
Abstract
Description


FIG. 1 is a front view of a portion of a display panel with a graphical user interface showing our new design in a first image.



FIG. 2 is a front view of a portion of a display panel with a graphical user interface showing our new design in a second image; and,



FIG. 3 is a front view of a portion of a display panel with a graphical user interface showing our new design in a third image.


The broken lines including the showing of a portion of a display panel with the illustrated graphical user interface and the portions of the graphical user interface are included for the purpose of illustrating environmental structure and form no part of the claimed design.


The appearance of the transitional image sequentially transitions between the images shown in FIGS. 1-3. No ornamental aspects are associated with the process or period in which one image transitions to another image.


Claims
  • The ornamental design for a portion of a display panel with a graphical user interface, as shown and described.
US Referenced Citations (46)
Number Name Date Kind
5226118 Baker Jul 1993 A
5427878 Corliss Jun 1995 A
D605652 Plaisted Dec 2009 S
D618695 Bennett Jun 2010 S
8257546 Davis et al. Sep 2012 B2
D756371 Bertnick May 2016 S
D766940 Napper Sep 2016 S
D767612 Hemsley Sep 2016 S
D781300 Rhodes Mar 2017 S
D819066 Anderson May 2018 S
D829749 Kang Oct 2018 S
D874481 Kumar Feb 2020 S
D884015 Walfridsson et al. May 2020 S
D890799 Heffernan et al. Jul 2020 S
D892143 Dascola Aug 2020 S
D897372 Levy Sep 2020 S
D914703 Capela Mar 2021 S
D924910 Laumann Jul 2021 S
D928818 Yuk Aug 2021 S
D937861 Torrance Dec 2021 S
D938465 Shen Dec 2021 S
D940169 Boutros Jan 2022 S
D941851 Anderson Jan 2022 S
D946019 Swango Mar 2022 S
D948543 Friedland Apr 2022 S
D960913 Kiikkala Aug 2022 S
D961605 Starr Aug 2022 S
20020018217 Weber-Grabau et al. Feb 2002 A1
20050041255 Hyun et al. Feb 2005 A1
20050187649 Funk et al. Aug 2005 A1
20070134829 Wilke Jun 2007 A1
20110172952 Ummethala et al. Jul 2011 A1
20150004721 Akimoto et al. Jan 2015 A1
20160077025 Zhang et al. Mar 2016 A1
20160313658 Bringoltz et al. Oct 2016 A1
20170038201 Bozdog Feb 2017 A1
20180150052 Cherian May 2018 A1
20190064751 Oh Feb 2019 A1
20190121928 Wu et al. Apr 2019 A1
20190286075 Yennie et al. Sep 2019 A1
20190347527 Bhaviripudi et al. Nov 2019 A1
20200083070 Clark et al. Mar 2020 A1
20200110341 Mossavat et al. Apr 2020 A1
20200110390 Banna Apr 2020 A1
20220026817 Ummethala Jan 2022 A1
20220246457 Sundar Aug 2022 A1
Foreign Referenced Citations (13)
Number Date Country
305860013 Jun 2020 CN
306604020 Jun 2021 CN
2020-004817 Jan 2002 JP
2018037559 Mar 2018 JP
D1644619 Aug 2019 JP
D1651220 Jan 2020 JP
D1659894 May 2020 JP
D1664109 Jul 2020 JP
101910268 Oct 2018 KR
0229393 Apr 2002 WO
2012099907 Jul 2012 WO
2019200015 Oct 2019 WO
020094325 May 2020 WO
Non-Patent Literature Citations (8)
Entry
“Production-centric Yield Management for Wafer Manufacturing” Jan. 5, 2018, Synopisis, site visited Jan. 6, 2022: https://www.synopsys.com/content/dam/synopsys/silicon/datasheets/odyssey-ds.pdf (Year: 2018).
Zalusky, Sarah et al. “Developing a Non-destructive Manufacturing Test to Detect Crystal Defects in Semiconductor Wafers” Apr. 8, 2020, JKI, site visited Sep. 2, 2022: https://www.jki.net/femtometrix-case-study (Year: 2020).
Ronald L. Allen et al.,“Application of neural networks to plasma etch end point detection”, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 14, 498 (1996), pp. 498-503.
PCT International Search Report and Written Opinion for International Application No. PCT/US2021/048061 dated Dec. 17, 2021, 9 pages.
PCT International Search Report and Written Opinion for International Application No. PCT/US2021/042646 dated Nov. 2, 2021,10 pages.
PCT International Search Report and Written Opinion for International Application No. PCT/US2021/042639 dated Nov. 11, 2021,10 pages.
PCT International Search Report and Written Opinion for International Application No. PCT/US2021/042643 dated Nov. 11, 2021,9 pages.
Taiwan Search report of Taiwan Application No. 110300382 dated Sep. 27, 2021, 7 pages.