The present specification generally relates to apparatuses and methods for positioning substrates and, more specifically, to apparatuses and methods for radially positioning substrates and reducing physical contact with the substrates.
In different industries, substrates, such as glass or silicon wafers used in semiconductor processing, are utilized and, in doing so, subjected to handling, chucking, centering, and inspection. For example, in some instances, substrates may be positioned on an end effector of a robot to be transported. In other instances, a substrate may be positioned within an interferometer, such as a Fizeau interferometer, for measuring one or both surfaces of the substrate.
Specifically, thin, large-diameter substrates are extremely sensitive to external influences, such as floor vibrations, airflow, acoustics, temperature, and humidity. Thus, in positioning the substrate with respect to either an end effector of a robot or an interferometer, contact with the substrate itself can result in inaccurate measurement readings or even damage to the substrate itself.
Accordingly, a need exists for alternative substrate positioning devices for substrates that reduce contact with the substrate.
According to a first aspect disclosed herein, a substrate positioning device comprises a first mounting frame; and a plurality of centering devices coupled to the first mounting frame and spaced apart from one another, each centering device comprising a mount, a flexure element coupled to the mount and having a radial edge, and an adjustment member coupled to the mount, the adjustment member actuatable between a retracted state and an extended state for pivoting the flexure element between a first position and a second position with respect to the mount, wherein each centering device is separately actuatable to move the flexure element of a respective centering device with respect to an edge of a substrate thereby radially positioning the substrate with respect to the first mounting frame.
According to a second aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to the first aspect, and further comprises a first support including at least one first gas inlet, the first mounting frame being coupled to the first support.
According to a third aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to the first or second aspects, wherein the plurality of centering devices are positioned between the first support and a second support including at least one second gas inlet.
According to a fourth aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to any of the first through third aspects, wherein the plurality of centering devices are equidistantly spaced apart from one another along the first mounting frame.
According to a fifth aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to any of the first through fourth aspects, wherein the flexure element includes a drive arm; a preload arm; a fixed arm; a leg interconnecting the drive arm and the preload arm; and a leaf hinge interconnecting the preload arm and the fixed arm, wherein the drive arm, the preload arm, and the leg pivot with respect to the mount about the leaf hinge when the adjustment member moves between the retracted state and the extended state and the flexure element moves between the first position and the second position, respectively.
According to a sixth aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to any of the first through fifth aspects, wherein each centering device comprises a biasing member biasing the preload arm, wherein: the biasing member moves toward an expanded state and biases the drive arm toward the mount when the adjustment member moves toward the retracted state; the preload arm causes the biasing member to move toward a compressed state when the adjustment member moves toward the extended state.
According to a seventh aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to any of the first through sixth aspects, wherein the adjustment member extends through the mount and is coupled to the drive arm such that the flexure element is moved toward the second position and away from the mount when the adjustment member moves toward the extended state, and the flexure element is moved toward the first position and toward the mount when the adjustment member moves toward the retracted state.
According to an eighth aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to any of the first through seventh aspects, wherein the adjustment member is an adjustment screw.
According to a ninth aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to any of the first through eighth aspects, and further comprises an adjustment sensor for measuring movement of the adjustment member between the retracted state and the extended state.
According to a tenth aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to any of the first through ninth aspects, and further comprises a tab provided on a radial edge of the flexure element for contacting the edge of the substrate.
According to an eleventh aspect disclosed herein, a substrate positioning device comprises a first mounting frame; and a plurality of centering devices coupled to the first mounting frame and spaced apart from one another, each centering device including a mount, a flexure element, and an adjustment member actuatable between a retracted state and an extended state for pivoting the flexure element between a first position and a second position with respect to the mount, and a radial air bearing extending from the flexure element, wherein: the radial air bearing forms an air cushion between the radial air bearing and an edge of a substrate; and each centering device is separately actuatable to move the flexure element of a respective centering device with respect to the edge of the substrate thereby radially positioning the substrate with respect to the first mounting frame.
According to a twelfth aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to the eleventh aspect, and further comprises a first support including at least one first gas inlet, the first mounting frame being coupled to the first support.
According to a thirteenth aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to the eleventh or twelfth aspects, wherein the plurality of centering devices are equidistantly spaced apart from one another along the first mounting frame.
According to a fourteenth aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to any one of the eleventh through thirteenth aspects, wherein each radial air bearing includes a radial cavity, each radial air bearing including a first flow channel delivering a flow of air to the radial cavity.
According to a fifteenth aspect disclosed herein, a substrate positioning device includes the substrate positioning device according to any one of the eleventh through fourteenth aspects, wherein each radial air bearing includes a radial cavity, each radial air bearing including a first flow channel delivering a flow of air to the radial cavity.
According to a sixteenth aspect disclosed herein, an interferometer includes the substrate positioning device of any of the eleventh through fifteenth aspects.
According to a seventeenth aspect disclosed herein, a method for radially positioning a substrate comprises positioning a substrate with respect to a first mounting frame; coupling a plurality of centering devices to the first mounting frame, each centering device including a mount, a flexure element having a radial edge and positionable between a first position and a second position, and an adjustment member actuatable between a retracted state and an extended state for pivoting the flexure element with respect to the mount; and actuating at least one of the centering devices to move the flexure element from the first position to the second position and toward an edge of the substrate to radially position the substrate with respect to the first mounting frame.
According to an eighteenth aspect disclosed herein, a method for radially positioning a substrate according to the seventeenth aspect, further comprises positioning the substrate between the first mounting frame and a second mounting frame, the flexure element of each of the plurality of centering devices positioned between the first mounting frame and the second mounting frame.
According to a nineteenth aspect disclosed herein, a method for radially positioning a substrate according to the seventeenth or eighteenth aspects, wherein each centering device includes an adjustment sensor, the adjustment sensors measuring a distance of a respective flexure element between the first position and the second position and corresponding this distance to a radial position of the substrate.
According to a twentieth aspect disclosed herein, a method for radially positioning a substrate according to any one of the seventeenth through nineteenth aspects, wherein each of the centering devices includes a radial air bearing for radially positioning the substrate with respect to the first mounting frame, and forming an air cushion between each of the radial air bearings and the edge of the substrate.
These and additional features provided by the embodiments described herein will be more fully understood in view of the following detailed description, in conjunction with the drawings.
The embodiments set forth in the drawings are illustrative and exemplary in nature and not intended to limit the subject matter defined by the claims. The following detailed description of the illustrative embodiments can be understood when read in conjunction with the following drawings, where like structure is indicated with like reference numerals and in which:
Embodiments described herein are directed to substrate positioning devices that include centering devices arranged around a substrate for radially positioning the substrate with respect to the substrate positioning device.
An embodiment of the substrate positioning device with a plurality of centering devices is depicted in
Ranges can be expressed herein as from “about” one particular value, and/or to “about” another particular value. When such a range is expressed, another embodiment includes from the one particular value and/or to the other particular value. Similarly, when values are expressed as approximations, by use of the antecedent “about,” it will be understood that the particular value forms another embodiment. It will be further understood that the endpoints of each of the ranges are significant both in relation to the other endpoint, and independently of the other endpoint.
Directional terms as used herein—for example up, down, right, left, front, back, top, bottom—are made only with reference to the figures as drawn and are not intended to imply ab solute orientation.
Unless otherwise expressly stated, it is in no way intended that any method set forth herein be construed as requiring that its steps be performed in a specific order, nor that with any apparatus specific orientations be required. Accordingly, where a method claim does not actually recite an order to be followed by its steps, or that any apparatus claim does not actually recite an order or orientation to individual components, or it is not otherwise specifically stated in the claims or description that the steps are to be limited to a specific order, or that a specific order or orientation to components of an apparatus is not recited, it is in no way intended that an order or orientation be inferred, in any respect. This holds for any possible non-express basis for interpretation, including: matters of logic with respect to arrangement of steps, operational flow, order of components, or orientation of components; plain meaning derived from grammatical organization or punctuation, and; the number or type of embodiments described in the specification.
As used herein, the singular forms “a,” “an” and “the” include plural referents unless the context clearly dictates otherwise. Thus, for example, reference to “a” component includes aspects having two or more such components, unless the context clearly indicates otherwise.
Referring now to
It is appreciated that the substrate positioning device 10 is suitable for positioning substrates and other objects having varying shapes and sizes. The substrate 16 illustrated herein has a circular geometry. Accordingly, the mounting frame 14 also has a circular geometry corresponding to the substrate 16. However, it should be understood that the substrate 16 may have different geometries and that the mounting frame 14 may have a corresponding geometry for receiving the substrate 16. As such, it is not meant for reference to the shape and size of the substrate 16 to be limiting.
In the embodiment depicted in
As discussed in more detail below, and illustrated in
Still referring to
The centering devices 12 are mounted to the edge surface 22 of the mounting frame 14 using any suitable means, such as rivets, screws, clamps, welding, adhesive, and the like. In some embodiments, the centering devices 12 are mounted to the edge surface 22 of the mounting frame 14 using screws inserted through the centering devices 12 and into the mounting apertures 24 of the mounting frame 14.
Each centering device 12 is substantially similar in structure and operation and, thus, only one centering device 12 will be described in detail throughout the ensuing description. Thus, reference to an individual centering device 12 is equally applicable to each of the centering devices 12.
Referring now to
In embodiments, the flexure element 38 of the centering device 12 extends substantially orthogonal to the interior surface 40 of the mount 36 and cantilevered thereto to pivot in a direction A1 and a direction A2 substantially orthogonal to the interior surface 40 of the mount 36, as discussed in more detail herein. The flexure element 38 includes a drive arm 54, a preload arm 56, a leaf hinge 58, and a fixed arm 60. The flexure element 38 includes a leg 66 interconnecting the drive arm 54 and the preload arm 56. The drive arm 54 has a first end 62 and a second end 64. In embodiments, the drive arm 54 is coupled to the mount 36 by the adjustment member 52 at the first end 62 thereof. Alternatively, in embodiments, the first end 62 of the drive arm 54 may abut against the adjustment member 52 and not be fixed thereto. The drive arm 54 extends in the radial direction with respect to the substrate 16 (
The leg 66 of the flexure element 38 has a first end 68 and a second end 70 interconnecting the drive arm 54 at the second end 64 thereof to the preload arm 56. The preload arm 56 has a first end 72 and a second end 74, the second end 74 thereof being fixed to the second end 70 of the leg 66. The first end 72 is positioned and extends adjacent the end surface 44 of the mount 36 and is movable therealong in a direction B1 and a direction B2, as discussed in more detail herein. Thus, the drive arm 54 and the preload arm 56 are fixed to one another by the leg 66 of the flexure element 38. As such, radial movement of the drive arm 54 in the direction A1 and the direction A2 with respect to the adjustment receiving block 48 and the interior surface 40 of the mount 36 causes corresponding movement to the preload arm 56 along the end surface 44 of the mount 36 in the direction B1 and the direction B2, respectively.
The fixed arm 60 has a first end 76 and a second end 78. The first end 76 of the fixed arm 60 is fixed to the end surface 44 of the mount 36 by any suitable means. Specifically, as shown in
In some embodiments, flexure element 38 including the drive arm 54, the leg 66, the preload arm 56, the fixed arm 60, and the leaf hinge 58 are integrally formed with one another as a one piece, monolithic structure formed of the same material. Specifically, the flexure element 38 may be a monolithic structure formed from the same material and having a constant thickness throughout. Still referring to
The centering device 12 includes a biasing member 90, such as a spring or the like, for biasing the first end 72 of the preload arm 56 toward a first position in the direction B2, as shown in
In some embodiments, the centering device 12 includes a cover 100 positioned over the end surface 44 of the mount 36 between the interior surface 40 and the exterior surface 42 thereof. As shown in
As noted above, the centering device 12 includes an adjustment member 52 extending through the bore 50 of the adjustment receiving block 48 for adjusting the position of the flexure element 38. In the first position, as shown in
It should be appreciated that the adjustment member 52 may be any suitable device for extending the drive arm 54 forward in the direction A1 (i.e., the extended state) and retracting the drive arm 54 to return to its initial position (i.e., the retracted state) in the direction A2. In some embodiments, the adjustment member 52 is a threaded rod or fastener. More particularly, the adjustment member 52 may be a fine thread adjustment screw to allow the adjustment member 52 to be manually adjusted by rotating an accessible end of the adjustment screw from the exterior surface 42 of the mount 36. In other embodiments, the adjustment member 52 may be an actuator such as, for example, a piezo actuator, a voice coil actuator, pneumatic actuator, or any other suitable linear actuator for extending and retracting within the bore 50 of the adjustment receiving block 48 to control movement of the flexure element 38.
When the adjustment member 52 is an actuator, the adjustment member 52 may be automatically operated based on a number of different measurement devices. In some embodiments, an adjustment sensor 114 is provided proximate the adjustment member 52 for measuring operation of the adjustment member 52. The adjustment sensor 114 may be provided between the adjustment receiving block 48 and the first end 62 of the drive arm 54 on either the adjustment receiving block 48 or the drive arm 54 for measuring distance therebetween. In another embodiment, the adjustment sensor 114 may be provided on the adjustment receiving block 48 opposite the first end 62 of the drive arm 54 for measuring extension and retraction of the adjustment member 52 through the bore 50 of the adjustment receiving block 48. The adjustment sensor 114 may be any suitable sensor for measuring distance such as, for example, a linear variable displacement transducer (LVDT), a capacitance displacement sensor, a laser displacement sensor, an eddy current sensor, a confocal sensor, a magneto-inductive distance sensor, or the like. Alternatively, in some embodiments, the adjustment member 52 may include an internal adjustment sensor, such as those identified above, to eliminate the need for an adjustment sensor provided externally of the adjustment member 52 on the adjustment block 48 or the drive arm 54.
Referring now to
Referring now to
As used herein, the term “axial” or an “axial direction” is to be understood as referring to a direction extending substantially perpendicular to a plane defining the first surface 116 or the second surface 118 of the substrate 16. As such, axial movement of the substrate 16 refers to the substrate 16 moving in a linear direction toward or away from the first support 30 within the substrate positioning device 10. In addition, the term “radial” or a “radial direction” as used herein is to be understood as referring to a direction extending substantially parallel to a plane defining the first surface 116 or the second surface 118 of the substrate 16. As such, radial movement of the substrate 16 refers to the substrate 16 moving in a linear direction toward or away from the centering device 12 and radial movement of the flexure element 38 refers to the flexure element 38 moving toward or away from the mount 36 and the substrate 16.
As shown in
The first bearing base 122 is generally a circular member, but may have any suitable geometry corresponding to the first bearing land 120. The first bearing base 122 has an inner surface 138, an outer surface 139, and an edge surface 142. In some embodiments, the inner surface 138 of the first bearing base 122 is coupled to the outer surface 128 of the first bearing land 120 proximate the edge surface 142 of the first bearing base 122 using any suitable means such as rivets, screws, clamps, welding, adhesive, and the like. In some embodiments, the first bearing base 122 may be coupled to the first bearing land 120 at the edge surface 142 of the first bearing base 122.
In various embodiments, at least part of the first support 30 may be formed from glass or another optically-transparent material. In some embodiments, the first bearing base 122 may be a glass substrate and the first bearing base 122 can be an optical reference. In some embodiments, the optical reference can include a Fizeau wedge mounted within a bezel or other annular housing.
The first support 30 includes at least one gas inlet in fluid communication with the first bearing pocket 124. In some embodiments, a first gas inlet 144 extends through the first bearing base 122 and into the first bearing pocket 124. However, it is to be appreciated that the first gas inlet 144 may alternatively be arranged to extend through the first bearing land 120 and into the first bearing pocket 124. In some embodiments, a plurality of first gas inlets 144 may be provided in either or both of the first bearing land 120 and the first bearing base 122.
As shown in
As shown in
In this embodiment, the mounting frame 14 and the second mounting frame 32 are coupled to one another by any suitable means, such as mechanical fasteners (not shown) and provide a gap 140 between the mounting frame 14 and the second mounting frame 32. The flexure element 38 of the centering device 12 is positioned within the gap 140 without restricting radial movement of the flexure element 38 between mounting frame 14 and the second mounting frame 32. In some embodiments, the substrate 16 may have a diameter larger than the inner diameter of the mounting frame 14. As such, the outer edge 136 of the substrate 16 may be received within the gap 140. It should be appreciated that utilizing the second support 33 provides for measurements to be taken of both the first surface 116 and the second surface 118 of the substrate 16.
In embodiments in which both the first support 30 and the second support are provided, the flow of air into the first bearing pocket 124 and the second bearing pocket 154 can be adjusted with respect to one another to adjust the axial position of the substrate 16. As such, the gas flowing through the first gas inlet 144 provides a first pressure force in the first bearing pocket 124 and the gas flowing through the second gas inlet 156 provides a second pressure force in the second bearing pocket 154. The particular values for each of the first pressure force and the second pressure force can vary depending on the specific embodiment and can depend at least on the mass of the substrate 16. In embodiments, each of the first pressure force and the second pressure force are selected to support the substrate 16 between the first support 30 and the second support 33 without contact between the opposite first and second surfaces 116, 118 of the substrate 16 and the first support 30 and the second support 33. In some embodiments, the first pressure force is equal to the second pressure force. In some embodiments, the first pressure force is different from the second pressure force. For example, the first pressure force can be greater than the second pressure force or the first pressure force can be less than the second pressure force.
Referring now to
It should be appreciated that the above embodiments utilizing the tab 88 on the flexure element 38 facilitates adjusting the radial position of the substrate 16 by contacting the outer edge 136 of the substrate 16. However, it may be desirable to entirely avoid contact with the substrate 16 when adjusting the position of the substrate 16 to avoid damaging the substrate 16 or contaminating the substrate 16, and ensuring that the measurements taken are accurate with the least amount of interference.
Thus, as shown in
Referring now to
The radial air bearing 204 includes a body 206 having a first surface 208, a second surface 210, a first end 212, a second end 214, an interior surface 216, and an exterior surface 218. As shown, the radial air bearing 204 is provided proximate the leg 66 of the flexure element 38. In some embodiments, the exterior surface 218 of the body 206 includes a pair of teeth 220, 222 extending toward the mount 36 for securing the radial air bearing 204 to the flexure element 38. The teeth 220, 222 of the radial air bearing 204 may be fixed to the flexure element 38 by any suitable means such as, for example, mechanical fasteners, welding, adhesives, and the like. In some embodiments, the radial air bearing 204 is integrally formed with the flexure element 38 as a one piece, monolithic structure formed of the same material.
As shown in
The radial air bearing 204 includes a first flow channel 228 having a first end 230 extending from the recess wall 224 defining the radial cavity 226 toward the flexure element 38 at a second end 232. A supply flow channel 234 is provided having a first end 236 extending from the second end 232 of the first flow channel 228 to a second end 238 terminating at the exterior surface 218 of the body 206 of the radial air bearing 204. As shown, the supply flow channel 234 extends through one of the teeth 220. However, it should be appreciated that, in some embodiments, the supply flow channel 234 extends through the leg 66 of the flexure element 38. In some embodiments, the diameter of the supply flow channel 234 is greater than the diameter of the first flow channel 228 to regulate and deliver the flow of a gaseous fluid such as, for example, air, through the supply flow channel 234 and the first flow channel 228 into the radial cavity 226.
In some embodiments, the distance between radial cavities 226 of opposing radial air bearings 204 may be less than the diameter of the substrate. Thus, as shown, the outer edge 136 of the substrate 16 is received within the radial cavity 226 of the radial air bearing 204. However, there is a space provided between the substrate 16 and the radial cavity 226 of the radial air bearing 204 to prevent physical contact with the substrate 16.
In use, a constant flow of air is delivered to the radial cavity 226 to form an air cushion between the outer edge 136 of the substrate 16 and the recess wall 224 of the radial cavity 226. The adjustment member 52 and the flexure element 38, as shown in
As shown in
As shown in
It is to be understood that the first flow channel 228, the second flow channel 240, the third flow channel 246, and the supply flow channel 234 may each comprise a rigid member extending through the radial air bearing 204 or may be defined by a bore formed through the body 206 of the radial air bearing 204. In some embodiments, the radial air bearing 204 comprises a porous material such that it is a porous air bearing. When the radial air bearing 204 is a porous air bearing, air flowing through the first flow channel 228, the second flow channel 240, and the third flow channel 246 is dispersed throughout the body 206 of the radial air bearing 204 to more efficiently flow through the radial cavity 226 formed in the interior surface 216 of the radial air bearing 204.
As shown in
The upper and lower interferometers 302, 304 respective first and second illuminators 306, 308, which can include customary light sources 310, 312 and beam shapers 314, 316 for outputting coherent first and second measuring beams 318, 320. For example, the light sources 310, 312 can be semiconductor diode lasers, and the beam shapers 314, 316 can include beam expanders and conditioners for affecting distributions of light within the measuring beams 318, 320.
Within their respective upper and lower interferometers 302, 304, the first and second measuring beams 318, 320 propagate through first and second shutters 322, 324 to first and second beam splitters 326, 328, where the first and second measuring beams 318, 320 are directed (e.g., transmitted) into first and second measurement arms 330, 332. Opening and closing of the first and second shutters 322, 324 can be coordinated by a common processor/controller 400 for alternately blocking the propagation of one or the other of the first and second measuring beams 318, 320 to prevent light from one interferometer 302, 304 from mixing with the light from the other interferometer 302, 304. The first and second beam splitters 326, 328 can take the form of pellicle beam splitters, beam splitter cubes, or beam splitter plates based on splitting amplitude or polarization.
The measurement arms 330, 332 include dual functioning optics 334, 336 within housings 338, 340, which contribute to both illuminating and imaging the substrate 16. The illuminating function of the dual optics 334, 336 generally provides for sizing and shaping respective wavefronts of the measuring beams 318, 320 to nominally match the shapes of the opposite side surfaces of the substrate 16.
The first and second measurement arms 330, 332 also include the first support 30 and the second support 33, which may include reference optics (e.g., Fizeau wedges) having reference surface for reflecting portions of the first and second measuring beams 318, 320 as reference beams. The reference optics are selected to be transmissive within the range of frequencies propagated by the interferometers 302, 304. Remaining portions of the measuring beams 318, 320 propagate through the first support 30 and the second support 33, and certain transverse sections of the remaining portions of the measuring beams 318, 320 reflect from the opposite side surfaces of the substrate 16 as test object beams.
A first reflected test object beams and a first reference beam both propagate along a common optical pathway through the measurement arm 330 to the beam splitter 326, where at least portions of the beams are directed (e.g., reflected) into a recording arm 342 of the upper interferometer 302. Similarly, a second reflected test object beam and a second reference beam both propagate along a common optical pathway through the measurement arm 332 to the beam splitter 328, where at least portions of the beams are directed (e.g., reflected) into a recording arm 344 of the lower interferometer 304.
Within the recording arm 342, the interference patterns formed at the second support 33 are imaged onto a detector surface 346 of a camera 348. Similarly, within the recording arm 344, the interference patterns formed at the first support 30 are imaged onto a detector surface 350 of a camera 352. The detector surfaces 346, 350 can include detector arrays for measuring beam intensity throughout a field of view encompassing the opposite side surfaces of the substrate 16. The dual optics 334, 336 can contribute to the formation of the referenced images onto the detector surface 346, 350. However, the cameras 348, 352 can include or be associated with imaging optics 354, 356 for resizing or otherwise completing the imaging of the referenced images onto the detector surfaces 346, 350.
The housing 338 of the measurement arm 330 has no direct physical connection to the second support 33 independently of the mounting. Instead, the housing 338 of the measurement arm 330 is mounted via a flange 358 and a collar 360 to a base 362, which preferably has a substantial mass (e.g., as a granite slap or steel plate) to isolate the upper interferometer 302 from environmental disturbances. The substrate positioning device 10, however, is connected through a collar 364 to the housing 340 of the measurement arm 332, and the housing 340 of the measurement arm 332 is connected through a flange 366 to the base 362.
From the above, it is to be appreciated that defined herein is a substrate positioning device for radially positioning a substrate by selectively actuating at least one centering device of a plurality of centering devices. This provides a substrate positioning device that may radially position a substrate while limiting contact to opposite surfaces of the substrate.
While particular embodiments have been illustrated and described herein, it should be understood that various other changes and modifications may be made without departing from the scope of the claimed subject matter. Moreover, although various aspects of the claimed subject matter have been described herein, such aspects need not be utilized in combination. It is therefore intended that the appended claims cover all such changes and modifications that are within the scope of the claimed subject matter.
This application claims the benefit of priority under 35 U.S.C. § 119 of U.S. Provisional Application Ser. No. 63/000,852 filed on Mar. 27, 2020, the content of which is relied upon and incorporated herein by reference in its entirety.
Number | Date | Country | |
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63000852 | Mar 2020 | US |