Claims
- 1. A method of a producing compound semiconductor materials comprising producing an adduct of an organometallic compound M(R.sup.1).sub.3, where M is either indium or gallium and R.sup.1 is either methyl or ethyl, and where the adduct is of formula M(R.sup.1).sub.3. L, by the steps of:
- (i) electrolysing, using a sacrificial anode of the metal M, a solution containing components 1 and 2 as follows:
- component 1: one or more organomagnesium halide compounds R.sup.1 MgX where X is a halide radical selected from Cl, Br and I and where R.sup.1 is as defined above;
- component 2: a polar aprotic liquid which is a solvent for component 1, which provides the source of the radical L, and which is selected from the group consisting of tetrahydrofuran, diethyl either, di-n-propyl ether, di-n-butyl ether, di-n-pentyl ether, di-isopentyl ether, diphenyl ether, and alkyl phenyl ethers having from 1 to 7 carbon atoms in the alkyl group; and
- (ii) converting the adduct M(R.sup.1).sub.3. L formed by the electrolysis into a further product from which a semiconductor compound may be obtained.
- 2. A method as claimed in claim 1 and which comprises, prior to the electrolysis, the step of producing the compound R.sup.1 MgX by addition of excess of the compound R.sup.1 X to a suspension of magnesium in an ethereal solvent.
- 3. A method as claimed in claim 1 and wherein the concentration of component 1 in component 2 is between 0.01 and 5 mole/liter.
- 4. A method as in claim 1 wherein step (ii) is practiced utilizing a radical exchange reaction with a further less volatile solvent to form an adduct with said further solvent.
- 5. A method as in claim 4 further comprising the step of decomposing the further product obtained in step (ii) to form said semiconductor compound.
- 6. A method as in claim 1 wherein step (ii) is practiced utilizing a radical exchange reaction with a Group V containing species to form an adduct with said Group V containing species.
- 7. A method as in claim 6 further comprising the step of decomposing the further product obtained in step (ii) to form said semiconductor compound.
- 8. A method as in claim 1 wherein step (ii) is practiced by distilling the solution above the adduct decomposition temperature to separate the organometallic compound M(R.sup.1).sub.3 from the radical provided by the polar aprotic liquid, component 2.
- 9. A method as in claim 8 further comprising the step of decomposing the further product obtained in step (ii) to form said semiconductor compound.
- 10. A method as claimed in claim 8 and wherein M(R.sup.1).sub.3 is trimethyl indium and the distillation follows the addition of benzene to the adduct.
- 11. A method as claimed in claim 8 and wherein M(R.sup.1).sub.3 is trimethylgallium and the distillation is at a temperature above the adduct dissociation temperature, the trimethylgallium being collected by fractionation.
- 12. A method as claimed in claim 1 and wherein the solution electrolysed additionally contains a third component, component 3, which is one or more organic halides R.sup.1 X.sub.A where R.sup.1 is as defined in claim 1 and X.sub.A is a halid radical, the polar aprotic liquid being a solvent also for component 3.
- 13. A method as claimed in claim 12 and wherein X.sub.A is the same as X.
Priority Claims (2)
Number |
Date |
Country |
Kind |
8223418 |
Aug 1982 |
GBX |
|
8305166 |
Feb 1983 |
GBX |
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Parent Case Info
This is a continuation of application of Ser. No. 521,828, filed Aug. 10, 1983, now abandoned.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
3164538 |
Ziegler et al. |
Jan 1965 |
|
3391066 |
Baithwaite |
Jul 1968 |
|
Foreign Referenced Citations (1)
Number |
Date |
Country |
0080844 |
Jun 1983 |
EPX |
Non-Patent Literature Citations (2)
Entry |
"Chemical Abstracts", vol. 93, No. 6, Synthetic High Polymers, Fred W. Billmeyer, Aug. 11, 1980. |
"Chemical Abstracts", vol. 81, No. 14, Synthetic High Polymers, Fred W. Billmeyer, Oct. 7, 1974. |
Continuations (1)
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Number |
Date |
Country |
Parent |
521828 |
Aug 1983 |
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