Claims
- 1. A pressure saturator comprising:
- first and second elements configured to define a saturating zone therebetween;
- means for passing a substrate through the saturating zone with a first side of the substrate adjacent the first element;
- means for introducing a liquid saturant into the saturating zone such that the saturant contacts a second side of the substrate and impregnates the substrate as the substrate passes through the saturating zone; and
- a belt interposed between the substrate and the first element and in contact with the first side of the substrate;
- said belt comprising means for receiving gases and at least some of any excess saturant from the first side of the substrate as the saturant enters the substrate in the saturating zone, thereby protecting the first element from contact with the saturant.
- 2. The invention of claim 1 wherein the belt is configured as a closed loop.
- 3. The invention of claim 2 wherein the invention further comprises means for cleaning the belt after it leaves and before it re-enters the saturating zone.
- 4. The invention of claim 3 wherein the invention further comprises means for drying the belt after it leaves the cleaning means.
- 5. The invention of claim 1 wherein the first element defines an array of grooves configured to conduct gases from the belt out of the saturating zone.
- 6. The invention of claim 1 wherein the first element comprises a mandrel.
- 7. The invention of claim 1 wherein the belt comprises a porous portion, and wherein the porous portion comprises the gas receiving means.
- 8. The invention of claim 1 wherein the gas receiving means comprises an array of slots formed in the belt and positioned adjacent the first side of the substrate.
- 9. The invention of claim 8 wherein the belt is configured as a closed loop, wherein the invention comprises means for cleaning the belt after it leaves and before it re-enters the saturating zone, and wherein the cleaning means bends the belt across its width to open the slots and facilitate cleaning.
- 10. A pressure saturator comprising:
- a first and second opposed, rigid elements configured to define a converging chamber therebetween, said chamber having an entrance region and an exit region, wherein the chamber converges in depth from a relatively greater depth at the entrance region to a relatively smaller depth at the exit region, and wherein the second element is substantially fixed in place during use;
- means for passing a substrate through the chamber from the entrance region to the exit region adjacent the first chamber defining element;
- means for introducing a liquid saturant into the chamber between the substrate and the second chamber defining element;
- a belt; and
- means for passing the belt through the chamber with the belt interposed between the substrate and the first chamber defining element;
- said belt comprising means for receiving gases and at least some of any excess saturant from the substrate as the saturant enters the substrate in the converging chamber, said chamber shaped and configured such that movement of the saturant in the chamber pressurizes the saturant at the exit region to a higher pressure than at the entrance region.
- 11. The invention of claim 10 wherein the belt is configured as a closed loop.
- 12. The invention of claim 11 wherein the invention further comprises means for cleaning the belt after it leaves and before it re-enters the chamber.
- 13. The invention of claim 12 wherein the invention further comprises means for drying the belt after it leaves the cleaning means.
- 14. The invention of claim 10 wherein the first element defines an array of grooves configured to conduct gases from the belt out of the chamber.
- 15. The invention of claim 10 wherein the first element comprises a mandrel.
- 16. The invention of claim 10 wherein the belt comprises a porous portion, and wherein the porous portion comprises the gas receiving means.
- 17. The invention of claim 10 wherein the gas receiving means comprises an array of slots formed in the belt and positioned adjacent the substrate.
- 18. The invention of claim 17 wherein the belt is configured as a closed loop, wherein the invention comprises means for cleaning the belt after it leaves and before it re-enters the saturating zone, and wherein the cleaning means bends the belt across its width to open the slots and facilitate cleaning.
- 19. A method for removing gases and excess saturant from a substrate during saturation, said method comprising the following steps:
- (a) introducing a liquid saturant into a saturating zone defined between two elements;
- (b) passing a substrate through the zone with a first side of the substrate positioned adjacent a first one of the elements while pressurizing the saturant in the zone to impregnate the saturant into a second side of the substrate, opposed to the first side; and
- (c) passing a gas receiving belt through the zone between the substrate and the first element to cause gases and at least some of any excess saturant to enter the belt.
- 20. The method of claim 19 wherein the belt is configured in a closed loop and the belt is recycled through the zone in step (c).
- 21. The invention of claim 20 wherein the method further comprises the step of cleaning the belt after it leaves and before it re-enters the zone.
- 22. The method of claim 21 further comprising the step of drying the belt after it leaves the cleaning step.
- 23. The method of claim 19 wherein the first element comprises a mandrel.
- 24. The method of claim 19 wherein the first element defines an array of grooves configured to conduct gases from the belt out of the zone.
- 25. The method of claim 19 wherein the substrate is a self supporting, porous, substantially air dry substrate prior to step (b).
- 26. The method of claim 19 wherein the gas receiving belt comprises a porous material that is passed through the zone in contact with the first side of the substrate in step (c).
- 27. The method of claim 19 wherein the gas receiving belt defines an array of gas receiving slots positioned in contact with the first side of the substrate when the belt is passed through the zone in step (c).
- 28. The method of claim 27 wherein the belt is configured in a closed loop and is recycled through the zone in step (c); wherein the method further comprises the step of cleaning the belt after it leaves and before it re-enters the zone; and wherein the cleaning step comprises the sub-step of bending the belt across its width to open the slots and facilitate cleaning.
- 29. A method for removing gases and excess saturant from a substrate during saturation, said method comprising the following steps:
- (a) introducing a liquid saturant into a saturating chamber defined between two elements, said chamber defining an entrance zone and an exit zone and converging in depth from a greater depth in the entrance zone to a lesser depth in the exit zone;
- (b) passing a substrate through the chamber with a first side of the substrate positioned adjacent a first one of the chamber defining elements, said chamber shaped such that movement of the substrate and the saturant through the chamber pressurizes the saturant to a greater pressure in the exit zone than the entrance zone to impregnate the saturant into a second side of the substrate, opposed to the first side; and
- (c) passing a gas receiving belt through the chamber between the substrate and the first chamber defining element to cause gases and at least some of any excess saturant to enter the belt.
- 30. The method of claim 29 wherein the belt is configured in a closed loop and the belt is recycled through the chamber in step (c).
- 31. The method of claim 30 wherein the method further comprises the step of cleaning the belt after it leaves and before it re-enters the chamber.
- 32. The method of claim 31 further comprising the step of drying the belt after it leaves the cleaning step.
- 33. The method of claim 29 wherein the first chamber defining element comprises a mandrel.
- 34. The method of claim 29 wherein the first chamber defining element defines an array of grooves configured to conduct gases from the belt out of the chamber.
- 35. The method of claim 29 wherein the substrate is a self supporting, porous, substantially air dry substrate prior to step (b).
- 36. The invention of claim 29 wherein the gas receiving belt comprises a porous material that is passed through the zone in contact with the first side of the substrate in step (c).
- 37. The method of claim 29 wherein the gas receiving belt defines an array of gas receiving slots positioned in contact with the first side of the substrate when the belt is passed through the zone in step (c).
- 38. The method of claim 37 wherein the belt is configured in a closed loop and is recycled through the zone in step (c); wherein the method further comprises the step of cleaning the belt after it leaves and before it re-enters the zone; and wherein the cleaning step comprises the sub-step of bending the belt across its width to open the slots and facilitate cleaning.
CROSS REFERENCE TO RELATED APPLICATION
This is a continuation-in-part of copending U.S. patent application Ser. No. 07/230,742, filed Aug. 9, 1988 now abandoned.
US Referenced Citations (10)
Non-Patent Literature Citations (2)
Entry |
Beloit Tri-Nip Press, Paper Machine Division, Beloit Corporation, Beloit, Wis. "efficient water removal with minimum downtime for felt changing". |
Beloit Extended Nip Press for Board Grades, Paper Machine Division, Beloit, Wis. "increased water removal for superior productivity and profitablility". |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
230742 |
Aug 1988 |
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