1. Field of the Invention
The present invention relates to a process and apparatus for enriching a crude ammonia stream having metal impurities and/or gas impurities and/or moisture therein.
2. Description of the Prior Art
In semiconductor manufacturing, ammonia is used to remove a wide variety of contaminants, including moisture, gas impurities, and metals. Gas impurities include oxygen, nitrogen, hydrogen, carbon monoxide, and carbon dioxide. Metals include sodium, potassium, aluminum, calcium, iron, nickel, chromium, copper, manganese, and zinc.
It would be desirable to recover and recycle ammonia used in semiconductor manufacturing. Recovery and recycle would save raw material costs and reduce process effluent. The presence of contaminants in the ammonia prevents direct recovery and recycle.
U.S. Pat. No. 6,065,306 describes a method for removing contaminants from crude ammonia streams. A crude ammonia stream is enriched by removal of moisture via a temperature swing adsorption unit and removal of gas impurities via a gas separation membrane.
It would be desirable to have a process and apparatus for recovering and recycling ammonia. It would further be desirable to have a process and apparatus for enriching a crude ammonia stream. It would still be further desirable to have a process and apparatus for removing moisture, metals, and gas impurities from a crude ammonia stream. It would still be further desirable to have a process and apparatus for enriching a crude ammonia stream in a semiconductor manufacturing process.
It was surprisingly found there could be a process and apparatus for recovering and recycling ammonia. It was further surprisingly found there could be a process and apparatus for recovering and recycling ammonia in a semiconductor manufacturing process. It was still further surprisingly found there could be a process and apparatus for enriching a crude ammonia stream. It was yet further surprisingly found there could be a process and apparatus for enriching ammonia and removing moisture, metal impurities, and gas impurities.
A process for enriching a crude ammonia stream having moisture and/or metal impurities and/or gas impurities therein. The crude ammonia stream is condensed to form a crude liquid ammonia stream. A distillation membrane or pervaporation membrane is contacted with the crude liquid ammonia stream to form an enriched ammonia vapor stream, which is removed as a permeate. When the crude ammonia stream originates from a manufacturing tool, the enriched ammonia vapor stream may be recycled to the manufacturing tool.
A process for enriching a crude ammonia stream having moisture and/or metal impurities and/or gas impurities therein. The process has the following steps: a) conveying the crude ammonia stream to a first separator maintained under conditions sufficient to form a first crude ammonia liquid stream and a first crude ammonia vapor stream; b) contacting a gas separation membrane with the first crude ammonia vapor stream to form a first enriched ammonia vapor stream removed as a permeate; c) conveying the first enriched ammonia vapor stream to the first separator; d) conveying the first crude ammonia liquid stream to a second separator maintained under conditions sufficient to form a second crude ammonia liquid stream and a second enriched ammonia vapor stream as a product stream; e) contacting a gas distillation membrane with the second crude ammonia liquid stream to form a third enriched ammonia vapor stream removed as a permeate; and f) conveying the third enriched ammonia vapor stream to said first separator.
An apparatus for enriching a crude ammonia stream having moisture and/or metal impurities and/or gas impurities therein. The apparatus has a) a condenser for condensing the crude ammonia stream to form a crude liquid ammonia stream and b) a distillation membrane or pervaporation membrane that separates a permeate stream of an enriched ammonia vapor from said crude liquid ammonia stream.
An apparatus for enriching a crude ammonia stream having moisture and/or metal impurities and/or gas impurities therein. The apparatus has a) a first separator which is capable of forming a first crude ammonia liquid stream and a first crude ammonia vapor stream; b) a gas separation membrane which is capable of separating a first enriched ammonia vapor stream from the first crude ammonia vapor; c) a first conduit for conveying the first enriched ammonia vapor stream to the first separator; d) a second conduit for conveying said first crude ammonia liquid stream to a second separator wherein the second separator is capable of separating a second crude ammonia liquid stream and a second enriched ammonia vapor stream as a product stream from said first crude ammonia liquid stream; e) a gas distillation membrane which is capable of separating from said second crude ammonia liquid stream a third enriched ammonia vapor stream; and f) a third conduit for conveying the third enriched ammonia vapor stream to the first separator.
Embodiments of the present invention are generally illustrated by reference to the several figures herein.
When originating from manufacturing tooling, crude ammonia typically takes the form of a vapor. The vapor can be condensed to a substantially liquid state by reducing temperature and/or raising pressure. The condensing means (condenser) can take the form of any condensing and/or pressure vessel wherein temperature and/or pressure and/or volume can be regulated. The temperature range will typically vary from about −30° C. to about 10° C. The pressure range will typically vary from about 1.18 to about 6.075 atmospheres absolute. The crude ammonia liquid can take any known thermodynamic form, such a critical liquid or a conventional liquid.
After condensation, the crude ammonia liquid is contacted with a distillation membrane or pervaporation membrane to yield an enriched ammonia vapor. The distillation membrane or pervaporation membrane evolves ammonia vapor but retains a substantial proportion of metal impurities and/or moisture as a retentate.
Pervaporation membranes typically operate by adsorbing liquid at the retentate side, diffusing through the membranes, and then desorbing at the permeate side. Distillation membranes typically operate by evaporation and diffusion through the membrane microporous structure. The operating temperature range will typically vary from about −30° C. to about 10° C. At −30° C., the operating pressure range will typically be at least about 1.18 atmospheres absolute. At 10° C., the operating pressure will typically be at least about 6.075 atmospheres absolute. Preferably, the operating temperature of the membrane is in a range of about 0° C. to about 5° C. at a pressure selected such that the ammonia at the temperature will liquefy. For membrane distillation, at any operating temperature, the ammonia pressure should not exceed ammonia intrusion pressures of selected membranes at which ammonia would penetrate into the membrane microporous structure.
Distillation membranes are typically comprised of microporous materials, including microporous polymers. Distillation membrane materials are hydrophobic. The surface of the membranes typically cannot be wetted by water and ammonia. Typical pore size of microporous membranes ranges from about 0.1 to about 100 microns. The preferred membrane pore size ranges from about 0.1 to about 5 microns. The most preferred membrane pore size is about 0.2 microns. The microporous membranes can be made by various polymers, including polyvinylidene fluoride (PVDF), Teflon (PTFE), and polypropylene.
Pervaporation membrane materials are typically dense materials of the kind used in gas separation membranes. If a pervaporation membrane is used, there are no intrusion pressure limitations since there is no intrusion pressure for dense membranes.
The enriched ammonia vapor exiting the distillation membrane or pervaporation membrane module may then optionally be further enriched by passing it through a gas separation module to form a further-enriched ammonia vapor by removing a substantial proportion of the gas impurities. The module has a gas separation membrane that permits the passage of ammonia vapor but retains a substantial proportion of gas impurities as a retentate. Gas separation membranes are typically comprised of dense membranes made of polymeric materials. A preferred material is NAFION® polymer (E.I. du Pont de Nemours and Co.). NAFION® is a copolymer of tetrafluoroethylene and perfluoro 3,6-dioxa-4-methyl-7-octene-sulfonic acid. Another useful material is ethane-propene terpolymer and polychloroprene.
In the gas separation module, the contaminated ammonia product stream is compressed with a process compressor or other means to raise the feed pressure to a pressure calculated to prevent the ammonia from liquefying at the temperature at which the process will be conducted. The process may be conducted at temperatures ranging from between about −30° C. to about 30° C. Preferably, the temperatures range from −30° C. to 10° C. At −30° C., the pressure should be less than about 1.18 atmospheres absolute. At 10° C., the pressure should be less than about 6.075 atmospheres absolute. The most preferred temperature range is about 0° C. to about 5° C. The ammonia stream is cooled prior to its introduction into the at least one membrane. If the process is carried out at sub-ambient temperatures, the compressed feed stream can be cooled within a heat exchanger. One type of heat exchanger, for example, is a two pass, plate-fin device in which a liquid coolant, such as obtained from a liquid coolant tank, is fed as a coolant stream through the heat exchanger. The cooled feed stream is fed to a membrane module, which can be housed within a cold box filled with insulating materials. The gas separation module can be a single module or unit or be a series of two or more of such modules or units.
If recycle of ammonia is desired, the enriched ammonia vapor is conveyed directly or indirectly to the manufacturing tool by any means known in the art. Typically, enriched ammonia vapor exiting the distillation membrane, pervaporation membrane, or the gas separation membrane will be of relatively low temperature and pressure. Also, some ammonia will have been lost in retentate streams and other process losses. Thus, it is desirable to transform the enriched ammonia vapor to a higher temperature and pressure and replenish lost ammonia prior to return to the manufacturing tool.
In a preferred process, enriched ammonia vapor exiting the distillation membrane, pervaporation membrane, or the gas separation membrane is condensed and makeup ammonia added thereto to form an enriched ammonia liquid. The enriched ammonia liquid is then vaporized and conveyed to the manufacturing tool for use. The condensing means employed to form the enriched ammonia liquid may be any condensing means (condenser) known in the art, including those condensing means described above. A preferred condensing means for this application is a heat pump condenser. Condensing temperatures and pressures are as described above. The vaporizing means employed to form the enriched ammonia vapor may be any vaporizing means known in the art such as a heat pump vaporizer or a two-pass, plate fin heat exchanger. A preferred vaporizing means is a heat pump vaporizer.
Although crude ammonia streams encountered in industrial practice will vary in contaminate content, a typical crude ammonia exiting semiconductor manufacturing tooling will typically have about 100 parts per million of impurities in the feed. Such impurities typically include nitrogen, oxygen, hydrogen, carbon monoxide, carbon dioxide, hydrocarbons, organics, moisture, and metals. Processed ammonia product streams from processes of the present invention will typically have about 10 parts per million or less of such impurities.
An embodiment of the apparatus of the present invention is seen in
Another embodiment of the apparatus of the present invention is seen in
Another embodiment of the apparatus of the present invention is seen in
Another embodiment of the process of the present invention is seen in the
A first separator of the type disclosed in
A second separator of the type disclosed in
In the vaporizer of the type disclosed in
The process of the present invention operates continuously or semi-continuously as desired. Continuous operation is preferred.
It will be apparent to one skilled in the art that the process and apparatus of the present invention may have or employ ancillary equipment such as pumps, compressors, flow regulators, digital or analog gauges, thermocouples, and the like.
The present invention is useful in semiconductor manufacturing processes. The present invention is particularly useful in gallium nitride semiconductor manufacturing processes. The present invention is also useful in other manufacturing processes that employ ammonia as a cleaner and remover.
The following are non-limiting examples of the present invention. Unless otherwise indicated, all percentages and parts are by weight.
Tests were carried out to investigate the potential performance of the gas separation membranes as described in this invention. For a pressure across a membrane (fabricated from a Nafion® polymer) at about 0.5 atmospheres, the ammonia permeability was found to increase from about 16778 barrer to about 45015 barrer as the operating temperature was reduced from about 23° C. to about 4° C. The permeability enhancement due to decreasing temperature increases with increasing drive force (or feed pressure for a given downstream pressure).
Further tests were conducted to determine the permeation of impurities. These results are summarized in the following table.
As can be seen from the foregoing, the percent recovery of ammonia and ammonia purity increases with decreasing temperature.
It should be understood that the foregoing description is only illustrative of the present invention. Various alternatives and modifications can be devised by those skilled in the art without departing from the invention. Accordingly, the present invention is intended to embrace all such alternatives, modifications and variances that fall within the scope of the appended claims.
The present application claims priority from U.S. Provisional Application 60/494,729, filed Aug. 13, 2003.
Number | Date | Country | |
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60494729 | Aug 2003 | US |