Claims
- 1. In a chemical vapor deposition apparatus comprising a furnace, a mandrel box mounted within the furnace and defining a vapor deposition zone, the box comprising a mandrel plate having a passage therein communicating with the deposition zone, a substrate holding frame removably mounted on said mandrel plate in overlapping relation to the passage and having an opening therein in alignment with said mandrel plate passage, and a back plate removably mounted on holding frame plate as a closure for the opening, the improvement comprising:
- a restraint-free substrate holding frame and back plane assembly having lips projecting toward each other from opposite boundaries of the opening in the frame and between the deposition zone and the back plate, the lips adapted for support of a substrate to be placed in the opening, the opening otherwise being larger than the substrate to be placed in said opening, and the distance between the lips and the back plate being larger than the thickness of the substrate.
- 2. The improved apparatus of claim 1 further characterized by shields projecting toward each other from opposite boundaries of the passage through the mandrel plate into the deposition zone and spaced apart from the holding frame.
Parent Case Info
This is a divisional of co-pending application Ser. No. 08/378,030 filed on Jan. 24, 1995.
US Referenced Citations (5)
Divisions (1)
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Number |
Date |
Country |
Parent |
378030 |
Jan 1995 |
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