Claims
- 1. A process for consolidating, that is, adhering a solid material or article which exhibits at least one area of low cohesion exhibiting a mechanical strength value lower than 700 kg/cm.sup.2 with respect to stretching or lower than 100 kg/cm.sup.2 with respect to compression, the said solid material or article being associated with at least one structural discontinuity having a section dimension ranging from 0.01 micron to 100 microns, pervious from the outside and communicating with the outside through a port equal in size to or less than the size of the section dimension of the structural discontinuity, which process comprises:
- (a) introducing into said low-cohesion area associated with a structural discontinuity vapors of at least one para-xylylene monomer or monomeric derivative thereof corresponding to formula I: ##STR4## wherein X represents a C.sub.1 -C.sub.6 alkyl group, a C.sub.6 -C.sub.10 aryl group, a C.sub.7 -C.sub.16 aralkyl group, a halogen-alkyl or halogen-aralkyl group, an acetoxy, alkenyl, aminoalkyl, arylamino, cyano, alkoxy, hydroxy, nitro group, a halogen atom, a sulphonic radical or a sulphonic ester, or a phosphorus-based substituent, a sulphonic, sulphuric, or alkyl-sulphoxide group, or a hydrogen atom, and m is an integer ranging from 0 to 4, including operating under vacuum at a pressure ranging from approximately 0.01 to 1 mm Hg; so the penetration depths of the vapors inside of the structural discontinuity are from one millimeter to one centimeter, and
- (b) polymerizing said monomer vapors in situ inside said area of low-cohesion associated with said structural discontinuity to adhere to said structural discontinuity, thereby restoring said solid material or article substantially to its original condition.
- 2. The process according to claim 1, wherein the para-xylylene monomer or monomeric derivative of formula (1) is obtained by pyrolysis, at a temperature higher than 400.degree. C., of the corresponding (2,2)-para-cyclophane of formula (II): ##STR5## wherein X and X', either alike or different from each other, represent C.sub.1 -C.sub.6 alkyl, C.sub.6 -C.sub.10 aryl, C.sub.7 -C.sub.16 aralkyl, halogenalkyl or halogen-aralkyl, acetoxy, alkenyl, aminoalkyl, arylamino, cyano, alkoxy, hydroxy, nitro group, atoms of halogens, sulphonic radicals and sulphonic esters, phosphorus-based substituents, sulphonic, sulphuric, alkyl-sulphoxide groups, or hydrogen atoms, and m and n, either equal to or different from each other, are integers ranging from 0 to 4.
- 3. The process according to claim 1, wherein the para-xylylene monomer is selected from the group consisting of dichloro-p-xylylene, cyano-p-xylylene, iodo-p-xylyene, fluoro-p-xylylene, hydroxymethyl-p-xylylene, ethyl-p-xylylene, methyl-p-xylylene, aminomethyl-p-xylylene, carbomethoxy-p-xylylene, and mixtures thereof.
- 4. The process according to claim 1, wherein the para-xylylene polymer of the monomer having formula (I) is utilized in association with at least one adhesion-promoting agent.
- 5. A solid material or article or manufacture exhibiting at least one area of low cohesion associated with at least one structural discontinuity having a section dimension ranging from 0.01 micron to 100 microns, which is consolidated by at least one para-xylylene polymer directly formed inside said structural discontinuity, and containing at least one of the following repeating units: ##STR6## wherein X and X', alike or different from each other, represent a C.sub.1 -C.sub.6 alkyl group, a C.sub.6 -C.sub.10 aryl group, a C.sub.7 -C.sub.16 aralkyl group, a halogen-alkyl or halogen-aralkyl group, an acetoxy, alkenyl, aminoalkyl, arylamino, cyano, alkoxy, hydroxy, nitro group, a halogen atom, a sulphonic radical or sulphonic ester, or a phosphorus-based substituent, a sulphonic, sulphuric, or alkylsulphoxide group, or a hydrogen atom, and m and n are integers ranging from 0 to 4.
- 6. The process according to claim 1, wherein the para-xylylene monomer or monomer derivative displays a high diffusion rate and the absence of significant viscosity phenomena.
Priority Claims (1)
Number |
Date |
Country |
Kind |
22718 A/86 |
Dec 1986 |
ITX |
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Parent Case Info
This application is a Continuation of application Ser. No. 134,846, filed Dec. 14, 1987, now abandoned.
US Referenced Citations (13)
Non-Patent Literature Citations (1)
Entry |
Kirk-Othmer, Encyclopedia of Chemical Technology, Third Edition, vol. 24 pp. 746-747, John Wiley & Sons. |
Continuations (1)
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Number |
Date |
Country |
Parent |
134846 |
Dec 1987 |
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