Claims
- 1. The process of epimerizing a compound having the formula ##STR11## wherein the symbol indicated as a curved broken line represents the following: ##STR12## wherein R.sub.1 is an easily removable ester blockingg group; R' is hydrogen, halo, loweralkanoyloxy, carbamoyloxy, furyl, thiazolyl, thiazolyl, thiadiazolyl, pyrrolyl, or tetrazolyl; each of which can be substituted with a lower alkyl substituent of 1-6 carbon atoms; R" is phenyl, furyl, thienyl, thiazolyl, thiadiazolyl, pyridyl, pyrazolyl, or tetrazolyl; R'" is loweralkanoyl; R.sup.5 is loweralkyl; and Y is PO(OH).sub.2 (OR.sup.4), SO.sub.2 (OH) or SO.sub.2 NH.sub.2 in which R.sup.4 is loweralkyl;
- a. which comprises reacting the compound above with an aromatic or aliphatic aldehyde or ketone to yield an intermediate of the formula ##STR13## wherein the broken curved line is as defined, and R.sup.2 is lower-alkyl or phenyl and R.sup.3 is hydrogen, loweralkyl or phenyl;
- b. and treating the latter intermediate with a base sufficiently strong to convert the aldimino compound to its anionic form said treatment conducted in the presence of an aprotic solvent and the optional presence of a dipolar aprotic co-solvent, followed by addition of a molecular excess of acid, a carboxylic acid having from 1-5 carbon atoms;
- c. and reacting the compound thereby produced with acid in the optional presence of an amine, and recovering the product, ##STR14## wherein the curved broken line is as defined above.
- 2. The process of Step (A) of claim 1 wherein a solvent is employed.
- 3. The process of claim 2 wherein the solvent is methylene chloride.
- 4. The process of claim 2 wherein the reaction is conducted at ambient temperature.
- 5. The process of Step (A) of claim 1 wherein the reactants are employed in approximately equimolar amounts.
- 6. The process of Step (B) of claim 1 wherein the aprotic solvent is tetrahydrofuran.
- 7. The process of Step (B) of claim 1 wherein the dipolar aprotic solvent is dimethylformamide, dimethylsulfoxide, hexamethylphosphoramide N-methyl pyrrolidone, or dimethylacetamide.
- 8. The process of Step (B) of claim 1 wherein the strong base is an organosodium, organopotassium or organolithium compound.
- 9. The process of claim 8 wherein the strong base is phenyl lithium, t-butyl lithium or n-butyl lithium.
- 10. The process of claim 1 in which the acid is acetic acid.
- 11. The process of Step (C) of claim 1 wherein the amine is aniline, phenylhydrazine, or 2,4-dinitrophenylhydrazine.
- 12. The process of Step (C) of claim 1 wherein the acid is hydrochloric acid or p-toluenesulfonic acid.
- 13. The process of Step (C) of claim 1 wherein aniline hydrochloride is used as the amine in the presence of acid.
- 14. The process of step (C) of claim 1 wherein the amine if is 2,4-dinitrophenylhydrazine and the acid is p-toluenesulfonic acid.
- 15. The process of Step (C) of claim 1 wherein an alcoholic solvent is used.
- 16. The process of Step (B) of claim 1 wherein the solvent is a lower alcohol having 1-5 carbon atoms.
- 17. The process of claim 1 wherein R.sub.1 is alkyl, of from 1-20 carbon atoms, phthalimidomethyl, succinimidomethyl, phenacyl, p-bromophenacyl, 2,2,2-trichloroethyl, 2-methylthioethyl, 2-(p-methylphenyl)-ethyl, methoxymethyl, p-methoxyphenoxymethyl, benzyloxymethyl, benzyl, p-nitrobenzyl, p-methoxybenzyl, 3,5-dinitrobenzyl, 2,4,6-trimethylbenzyl or 3,5-dichloro-4-hydroxy-benzyl, benzhydryl, p-methoxybenzhydryl, or trimethylsilyl.
- 18. The process of claim 17 wherein R.sub.1 is methyl, tertiary butyl, phenacyl, p-bromophenacyl, 2,2,2-trichloroethyl, p-methoxybenzyl, benzyl, benzhydryl, methoxymethyl, and p-methoxyphenoxymethyl.
- 19. The process of claim 1 wherein the R' is 5-methyl-1,3,4-thiadiazolyl-2-yl or 1-methyl-tetrazol-5yl.
- 20. The process of claim 1 wherein the R" is substituted with lower alkyl of 1-6 carbon atoms, or lower alkoxy of 1-6 carbon atoms.
- 21. The process of claim 1 wherein R'" is loweralkanoyl having 2-6 carbon atoms.
- 22. The process of claim 1 wherein R.sup.5 is C.sub.1 -C.sub.3 straight or branched chain alkyl.
RELATIONS TO OTHER APPLICATIONS
This application is a continuation of U.S. application Ser. No. 436,014 filed Jan. 23, 1974 now abandoned which was a continuation-in-part of U.S. application Ser. No. 350,543, filed Apr. 16, 1973, now abandoned, which was a continuation-in-part of U.S. application Ser. No. 267,858, filed June 30, 1972, now abandoned; this application is also a continuation-in-part of copending U.S. application Nos. 303,906, filed Nov. 6, 1972; 306,066, filed Nov. 13, 1972; 314,484, filed Dec. 12, 1972; 319,945, filed Dec. 29, 1972; and 340,804, filed Mar. 13, 1973; all now abandoned.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
3719667 |
Gutowski |
Mar 1973 |
|
Related Publications (5)
|
Number |
Date |
Country |
|
303906 |
Nov 1972 |
|
|
306066 |
Nov 1972 |
|
|
314484 |
Dec 1972 |
|
|
319945 |
Dec 1972 |
|
|
340804 |
Mar 1973 |
|
Continuations (1)
|
Number |
Date |
Country |
Parent |
436014 |
Jan 1974 |
|
Continuation in Parts (2)
|
Number |
Date |
Country |
Parent |
350543 |
Apr 1973 |
|
Parent |
267858 |
Jun 1972 |
|