Claims
- 1. A process for obtaining an improved corrosion-resistant gold plating on a substrate which comprises the following sequential plating steps:
- (a) electrodepositing a ductile, stress-free nickel coating on said substrate from an electroplating bath containing a nickel salt, an electrolyte selected from the group consisting of boric acid, and citric acid, ortho-formyl benzene sulfonic acid, and as a wetting agent, perfluorocyclohexyl potassium sulfonate; and
- (b) electrodepositing a base metal hardened gold coating on the resulting ductile, stress-free nickel plated substrate from an electroplating bath containing a gold salt, an electrolyte selected from the group consisting of acetic acid, citric acid, formic acid and mixtures thereof, and a metal salt hardener selected from the group consisting of cobalt, indium, nickel, zinc salts and mixtures thereof.
- 2. The process of claim 1 wherein the nickel salt is nickel sulfate and the electrolyte is boric acid.
- 3. The process of claim 1 wherein electroplating bath (a) is operated at a pH of 2 to 5.
- 4. The process of claim 1 wherein the electrodeposition steps (a) and (b) are carried out with insoluble anodes.
- 5. The process of claim 1 wherein the gold salt is a gold cyanide salt.
- 6. The process of claim 5 wherein said electroplating bath (b) utilizes potassium gold cyanide.
- 7. The process of claim 1 wherein said electroplating bath (b) utilizes acetic acid as the electrolyte.
- 8. The process of claim 1 wherein said electroplating bath (b) utilizes cobalt sulfate as the base metal salt.
- 9. The process of claim 1 wherein said electroplating bath (b) utilizes citric acid as the electrolyte.
- 10. The process of claim 1 wherein said electroplating bath (b) utilizes formic acid and citric acid as the electrolyte.
- 11. A substrate having formed thereon a cobalt-hardened gold/low stress nickel composite coating with improved corrosion resistance prepared by the process of claim 1.
Parent Case Info
The application is a continuation-in-part of application Ser. No. 202,410, filed Oct. 31, 1980 and now abandoned.
US Referenced Citations (4)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
202410 |
Oct 1980 |
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