Claims
- 1. The process of forming mercaptoalkylsilicon compounds which comprises reacting at a temperature of about 100.degree.C. to about 300.degree.C. a silicon containing compound having the following radical bonded directly to a silicon atom thereof: ##EQU6## wherein R' and R" are monovalent hydrocarbon radicals, R'" is hydrogen or a monovalent hydrocarbon radical, R.sup.V is a divalent hydrocarbon radical in which the carbon atom thereof bonded to sulfur is methylene; in the presence of an acidic Friedel-Crafts or transistion metal halide catalyst, whereby to form a silicon compound having the radical HSR.sup.V -- bonded directly to such silicon atom thereof.
- 2. The process of claim 1 wherein R.sup.V is ##EQU7##
- 3. The process of claim 1 wherein the silicon compound has the following formula: ##EQU8## wherein R, R', R", R'" and R.sup.V are as defined previous, R.sup.1 is any monovalent organic group bonded to silicon by a carbon to silicon bond; R.sup.2 can be hydrogen and/or R.sup.1 ; R.sup.3 is bonded directly to silicon and is a hydrolyzable and/or condensible radical such as halide, hydroxyl, alkoxy, aryloxy, acyloxy, and the like; R.sup.4 is directly bonded to silicon-bonded oxygen and is one or more of hydrogen, alkyl, aryl, and acyl; m is 0 or 1; a is 0, 1 or 2; b is 0, 1, 2 or 3; o is 0 or 1; p is equal to 3-a when m is 0 and when m is 0; and q is 0 when p is equal to 3-a and q is 0 or a positive number when m is 1.
- 4. The process of claim 2 wherein the Si atom has three hydrolyzable groups bonded to it.
- 5. The process of claim 4 wherein the hydrolyzable groups are chlorine or alkoxy.
- 6. The process of claim 5 wherein the hydrolyzable groups are methoxy, ethoxy, or beta-methoxyethoxy.
- 7. The process of claim 6 wherein the catalyst is cobalt chloride.
- 8. The process of claim 6 wherein the catalyst is aluminum chloride.
- 9. The process of claim 6 wherein the catalyst is zinc chloride.
- 10. The process of claim 9 wherein there is also added hydrogen chloride.
Parent Case Info
This is a continuation of application Ser. No. 280,232 filed Aug. 14, 1972, now abandoned.
US Referenced Citations (3)
Continuations (1)
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Number |
Date |
Country |
Parent |
280232 |
Aug 1972 |
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