The invention concerns a method for measurement of impedance of electronic circuits in which the input of the electronic circuit is acted upon with a high-frequency ac voltage with a measurement frequency f as test signal and from the reaction of the circuit to the test signal the impedance Z of the circuit is determined, in which a parameter S, which represents the value
at a stipulated reference impedance Z0, is produced by means of an analyzer with a reference impedance Z0, and the impedance Z is determined from this parameter S with
Both during the production process of electronic components and functional testing at the end of the production process it is often necessary to measure impedances of electronic circuits within an electronic component. A circuit arrangement being tested is ordinarily referred to as DUT (device under test).
Such impedances can be obtained as pure ohmic resistances R. Generally the impedances Z, however, are complex in nature, as expressed in the relation Z=R+jX, in which R is the real part (resistance) and X the imaginary part (reactance).
For example, the impedance of the circuit is determined by a capacitance C. If only capacitance has an effect on the impedance, then the real part equals zero. The impedance Z is then calculated as follows:
Ordinarily capacitance measurement occurs by acting on the circuit or circuit input with a dc voltage or ac voltage up to 30 MHz. The magnitude of the capacitance can be determined by means of the time behavior of the measurement voltage.
The increasing miniaturization during production of electronic components has meant that dielectrics are becoming increasingly thinner. This means that the leakage currents through the dielectric are becoming larger. Such leakage currents have the drawback that they distort the measurement result for capacitance measurement. This is described in “Evaluation of MOS Capacitor Oxide C-V Characteristics Using the Agilent 4294A,” Agilent Technologies, Inc., 2002, 5988-5102EN and especially page 29 there.
To counter this problem, impedances are increasingly being measured at higher frequencies in the range above 100 MHz. This means that the propagation region of the voltage in the capacitance is changed so that only the electromagnetic field still acts there and the leakage currents are minimized so that no electron loss occurs. The transmission and/or reflection factor is then measured (similarly to light). The ratio of transmitted and received wave magnitudes is then formed from the transmitted and received wave and produced as parameter S. This method is described in the presentation of different additional measurement methods in “Integrating high-frequency capacitance measurement for monitoring process variation of equivalent oxide thickness of ultrathin gate dielectrics,” Keithley Instruments Inc., 2004, No. 24744041KGW. It is assumed that the measurement error on the reference impedance Z0 is minimal.
This type of measurement ordinarily occurs in a vector-network analyzer. These measurement instruments have a known error ΔS for parameter S. However, it has been shown that, contrary to the assumption in the prior art, the error minimum does not lie constantly at the same reference impedance. Instead, for a specific DUT this error ΔS is also dependent on the measurement frequency so that the measurement results obtained in this way are only marginally suitable.
Determination of ΔS ordinarily occurs with a method as described in EA-10/12-EA Guidelines on the Evaluation of Vector Network Analyzers (VNA), European Cooperation for Accreditation, May 2000 and in Application Note “What is your Measurement Accuracy? Vector Network Analyzer,” Anritsu Microwave Measurement Division, Morgan Hill, Calif., September 2001.
The task of the invention now consists of minimizing the error during measurement of impedances by determining parameter S.
This task is solved according to the invention with the features of Claim 1. The dependent Claims 2 to 1 [sic] provide favorable embodiments of the method according to the invention.
The invention is further described below by means of a practical example. This practical example pertains to capacitance measurement in MOSFET with thin gate oxides.
In the corresponding drawings
By means of a vector network analyzer (VNA) an impedance ZDUT of an electronic circuit (not further shown) within an electronic component (DUT=device under test) is determined via parameter S, as shown in
The measured impedance value is
As shown in
The error for the impedance
follows from this.
It is found that the impedance ZDUT being measured is dependent on the measurement frequency. The parameter S of the circuit being measured is also dependent on the impedance ZDUT being measured. Consequently, the measurement accuracy of the vector network analyzer depends on parameter S.
As shown in
As is apparent from
As shown in
Number | Date | Country | Kind |
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10 2006 015 849.0 | Apr 2006 | DE | national |