Claims
- 1. A process for preparing a supported catalyst, said process comprising compositing a support material with one or more precursor salts and heating said composite at elevated temperature of at least about 150.degree. C., in the presence of sulfur and under oxygen-free conditions for a time sufficient to form said catalyst, wherein said precursor salt contains a tetrathiometallate anion of Mo, W or mixture thereof and a promoter metal cation selected from manganese and mixtures of manganese with Ni, Co, Zn, Cu or mixture thereof wherein said promoter metals are chelated by a ligand or mixture thereof, at least one of which is a neutral, nitrogen-containing polydentate ligand.
- 2. The process of claim 1 containing at least two of said promoter metals.
- 3. The process of either of claims 1 or 9 wherein said ligand is selected from the group consisting of alkyl amines, aryl amines, nitrogen heterocycles and mixtures thereof.
- 4. The process of claim 3 wherein said support material comprises one or more refractory inorganic oxides.
- 5. The process of claim 4 wherein said ligand comprises an alkyl amine.
- 6. The process of claim 5 formed in the presence of excess sulfur.
- 7. The process of claim 6 wherein said oxygen-free conditions comprise a mixture of H.sub.2 and H.sub.2 S.
- 8. A process for preparing a supported catalyst, said process comprising compositing an inorganic refractory oxide support material with one or more precursor salts and heating said composite at elevated temperature of at least about 150.degree. C., in the presence of sulfur and under oxygen-free conditions for a time sufficient to form said catalyst, wherein said precursor salt is of the formula (ML)(Mo.sub.y W.sub.1-y S.sub.4) wherein M comprises at least one metal selected from the group consisting of (a) divalent manganese and (b) mixtures of divalent manganese with one or more metals selected from the group consisting of divalent Ni, Co, Cu, Zn and mixture thereof, wherein y is any value ranging from 0 to 1 and wherein L is a nitrogen-containing ligand or mixtures thereof, at least one of which is a chelating polydentate ligand.
- 9. The process of claim 8 wherein said precursor salt is formed in the presence of a slurry of particles of support material.
- 10. The process of either of claims 8 or 9 wherein ligand L is selected from the group consisting of alkyl amines, aryl amines, nitrogen heterocycles and mixtures thereof.
Parent Case Info
This is a division of application Ser. No. 687,534, filed Dec. 28, 1984, now U.S. Pat. No. 4,668,376.
US Referenced Citations (4)
Divisions (1)
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Number |
Date |
Country |
Parent |
687534 |
Dec 1984 |
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