Claims
- 1. A compound having the formula wherein R1 is a lower alkyl group.
- 2. The compound of claim 1, wherein R1 is methyl.
- 3. The compound of claim 1, wherein R1 is ethyl.
- 4. The compound of claim 1, wherein R1 is propyl.
- 5. The compound of claim 1, wherein R1 is butyl.
- 6. The compound of claim 1, wherein R1 is tert-butyl.
- 7. A compound having the formula
- 8. A compound having the formula wherein R1 is a lower alkyl group and R2 is a silyl protecting group.
- 9. The compound of claim 8, wherein R1 is methyl, ethyl, propyl, butyl or tert-butyl; and R2 is trimethylsilyl.
- 10. The compound of claim 8, wherein R1 is methyl, ethyl, propyl, butyl or tert-butyl; and R2 is triethylsilyl.
- 11. The compound of claim 8, wherein R1 is methyl, ethyl, propyl, butyl or tert-butyl; and R2 is tert-butyldimethylsilyl.
- 12. A compound having the formula
- 13. A compound having the formula wherein R1 is a silyl protecting group.
- 14. The compound of claim 13, wherein R1 is trimethylsilyl.
- 15. The compound of claim 13, wherein R1 is triethylsilyl.
- 16. The compound of claim 13, wherein R1 is tert-butyldimethylsilyl.
- 17. A compound having the formula wherein R1 is p-toluenesulfonyl (Ts), benzenesulfonyl, methanesulfonyl and R2 is a silyl protecting group.
- 18. The compound of claim 17, wherein R2 is trimethylsilyl.
- 19. The compound of claim 17, wherein R2 is triethylsilyl.
- 20. The compound of claim 17, wherein R2 is tert-butyldimethylsilyl.
- 21. A compound having the formula
- 22. A process for producing a compound having the formula comprisingi) reacting a compound having the formula with a compound having the formula in the presence of dicyclohexylamine, butyllithium, and hexamethylphosphoramide to yield a compound having the formula ii) reacting compound 4 with LiAlH4 to produce compound 5 having the formula iii) reacting the compound 5 with TsCl and pyridine to produce compound 6 having the formula iv) reacting compound 6 with LiBEt3H in the presence of tetrahydrofuran to produce compound 7 having the formula v) reacting compound 7 with PDC in the presence of CH2Cl2 to produce compound 8.
- 23. A process for producing a compound having the formula comprising reacting a compound having the formula with a compound having the formula in the presence of dicyclohexylamine, BuLi, and hexamethylphosphoramide.
- 24. A process for producing a compound having the formula comprising reacting compound 4 with LiAlH4.
- 25. A process for producing a compound having the formula comprising reacting the compound 5 with p-toluenesulfonyl chloride and pyridine.
- 26. A process for producing a compound having the formula comprising reacting the compound 6 with LiBEt3H in the presence of tetrahydrofuran.
Parent Case Info
This application claims benefit of Provisional Application 60/130,948, filed Apr. 26, 1999.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
8830885 |
Posner et al. |
Nov 1998 |
|
Foreign Referenced Citations (1)
Number |
Date |
Country |
808 833 |
Nov 1997 |
EP |
Non-Patent Literature Citations (1)
Entry |
Daniewski A. J. et al, J. Org. Chem. 53, pp 5534-5538 (1998). |
Provisional Applications (1)
|
Number |
Date |
Country |
|
60/130948 |
Apr 1999 |
US |