Claims
- 1. A process for the preparation of a stable, crystalline compound having the formula ##STR42## wherein X is HCl or HI which is substantially free of the .DELTA..sup.2 isomer, which comprises treating the compound of formula ##STR43## in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with a (lower) alkanol to remove the silyl groups, followed by acidification with HCl or HI to form the hydrochloride or hydroiodide salt of the compound of formula I.
- 2. The process of Claim 1 wherein the (lower) alkanol is methanol.
- 3. A process for the preparation of a stable, crystalline compound having the formula ##STR44## wherein X is HCl or HI which is substantially free of the .DELTA..sup.2 isomer, comprising the steps of:
- (a) reacting the compound of formula IIIa ##STR45## in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with a compound of the formula ##STR46## to produce the compound of formula II ##STR47## and (b) treating the compound of formula II in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with a (lower) alkanol to remove the silyl groups, followed by acidification with HCl or HI to form the hydrochloride or hydroiodide salt of the compound of formula I.
- 4. A process for the preparation of a stable, crystalline compound of the formula ##STR48## in which X is HCl or HI, which is substantially free of the .DELTA..sup.2 isomer, comprising the steps of:
- (a) treating the compound of formula ##STR49## in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with at least one equivalent of iodotrimethylsilane per equivalent of compound IVa to produce the compound of formula IIIa ##STR50## (b) reacting the compound of formula IIIa, in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with a compound of the formula ##STR51## to produce the compound of formula ##STR52## and (c) treating the compound of formula II in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with a (lower) alkanol to remove the silyl groups, followed by acidification with HCl or HI to form the hydrochloride or hydroiodide salt of the compound of formula I.
- 5. A process for the preparation of a stable, crystalline compound of formula I ##STR53## wherein X is HCl or HI which is substantially free of the .DELTA..sup.2 isomer, comprising the steps of:
- (a) treating the compound of formula V ##STR54## in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with at least one equivalent of hexamethyldisilazane per equivalent of compound V and a catalytic amount of iodotrimethylsilane to produce the compound of formula IVa ##STR55## (b) treating the compound of formula IVa in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with at least one equivalent of iodotrimethylsilane per equivalent of compound IVa to produce the compound of formula IIIa ##STR56## (c) reacting the compound of formula IIIa in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with a compound of the formula ##STR57## to produce the compound of formula ##STR58## and (d) treating the compound of formula II in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with a (lower) alkanol to remove the silyl groups, followed by acidification with HCl or HI to form the hydrochloride or hydroiodide salt of the compound of formula I.
- 6. A process for the preparation of a stable, crystalline compound of the formula I ##STR59## wherein X is HCl or HI which is substantially free of the .DELTA..sup.2 isomer, which comprises treating a solution of the compound of formula IVa ##STR60## in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with at least one equivalent of a compound of the formula ##STR61## then with at least one equivalent of iodotrimethylsilane per equivalent of compound IVa, followed by treatment with a (lower) alkanol to remove the silyl groups, and acidification with HCl or HI to form the hydrochloride or hydroiodide salt of the compound of formula I.
- 7. A process for the preparation of a stable, crystalline compound of the formula I ##STR62## wherein X is HCl or HI which is substantially free of the .DELTA..sup.2 isomer, which comprises treating the compound of formula IVa ##STR63## in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with the compound of formula ##STR64## in 1,1,2-trichlorotrifluoroethane or 1,1,1-trichlorotrifluoroethane, followed by treatment with a (lower) alkanol to remove the silyl groups, and acidification with HCl or HI to form the hydrochloride or hydroiodide salt of the compound of formula I.
- 8. A process for the preparation of a stable, crystalline compound of the formula I ##STR65## wherein X is HCl or HI which is substantially free of the .DELTA..sup.2 isomer, which comprises treating the compound of formula V ##STR66## in 1,1,2-trichlorotrifluoroethane (Freon TF) or 1,1,1-trichlorotrifluoroethane with at least one equivalent of hexamethyldisilazane per equivalent of compound V and a catalytic amount of iodotrimethylsilane, and then with the compound of formula ##STR67## in 1,1,2-trichlorotrifluorethane (Freon TF) or 1,1,1-trichlorotrifluoroethane, followed by treatment with a (lower) alkanol to remove the silyl groups, and acidification with HCl or HI to form the hydrochloride or hydroiodide salt of the compound of formula I.
CROSS-REFERENCE TO RELATED APPLICATION
This application is a continuation-in-part of our co-pending application Ser. No. 882,107 filed July 11, 1986 which is a continuation-in-part of our co-pending application Ser. No. 767,561, filed Aug. 20, 1985.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
102e Date |
371c Date |
PCT/US86/01637 |
8/12/1986 |
|
|
3/23/1987 |
3/23/1987 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO87/01116 |
2/26/1987 |
|
|
US Referenced Citations (10)
Foreign Referenced Citations (4)
Number |
Date |
Country |
0074268 |
Mar 1983 |
EPX |
843343 |
Oct 1984 |
ZAX |
853829 |
Jan 1986 |
ZAX |
WO8603204 |
Jun 1986 |
WOX |
Continuation in Parts (2)
|
Number |
Date |
Country |
Parent |
882107 |
Jul 1986 |
|
Parent |
767561 |
Aug 1985 |
|