Claims
- 1. A process for preparing a ceramic material with reduced carbon level comprising
- (A) heating a silicon-containing preceramic polymer at a temperature of about 550.degree.-800.degree. C. in an ammonia-containing atmosphere for a time sufficient to reduce the carbon level of the silicon-containing preceramic polymer wherein said ammonia-containing atmosphere contains 0-99 volume percent inert atmosphere and 1-100 volume percent ammonia and then
- (B) heating the material formed in step (A) to a temperature of 900-1500.degree. C. in an inert atmosphere, vacuum, or in the presence of ammonia gas until a ceramic material with reduced carbon level is obtained.
- 2. A process as defined in claim 1 wherein said ammonia-containing atmosphere contains 0-78 volume percent inert gas and 22-100 volume percent ammonia.
- 3. A process as defined in claim 1 wherein said silicon-containing preceramic polymer is a polycarbosilane.
- 4. A process as defined in claim 2 wherein said silicon-containing preceramic polymer is a polycarbosilane.
- 5. A process as defined in claim 3 wherein said polycarbosilane is prepared by thermally decomposing and polycondensing a polysilane or polysilanes by heating said polysilane or polysilanes at a temperature of 300.degree.-700.degree. C. in an inert gas, hydrogen, or vacuum wherein said polysilane or polysilanes are selected from the group consisting of cyclic polysilanes of the general formula
- (R.sup.1 R.sup.2 Si).sub.n
- and linear polysilanes of the general formula ##STR2## where n is greater than or equal to 4; where m is greater than or equal to 2; and where R.sup.1, R.sup.2, R.sup.3, and R.sup.4 are independently selected from the group consisting of hydrogen, alkyl groups containing 1 to 4 carbon atoms, phenyl, --Si(R.sup.5).sub.3 groups where R.sup.5 is a alkyl group containing 1 to 4 carbon atoms, and halogen atoms.
- 6. A process as defined in claim 4 wherein said polycarbosilane is prepared by thermally decomposing and polycondensing a polysilane or polysilanes by heating said polysilane or polysilanes at a temperature of 300.degree.-700.degree. C. in an inert gas, hydrogen, or vacuum wherein said polysilane or polysilanes are selected from the group consisting of cyclic polysilanes of the general formula
- (R.sup.1 R.sup.2 Si).sub.n
- and linear polysilanes of the general formula ##STR3## where n is greater than or equal to 4; where m is greater than or equal to 2; and where R.sup.1, R.sup.2, R.sup.3, and R.sup.4 are independently selected from the group consisting of hydrogen, alkyl groups containing 1 to 4 carbon atoms, phenyl, --Si(R.sup.5)3 groups where R.sup.5 is a alkyl group containing 1 to 4 carbon atoms, and halogen atoms.
- 7. A process as defined in claim 1 wherein said silicon-containing preceramic polymer is a polysilazane.
- 8. A process as defined in claim 2 wherein said silicon-containing preceramic polymer is a polysilazane.
- 9. A process as defined in claim 7 wherein said polysilazane is prepared by prepared by contacting and reacting in an inert, essentially anhydrous, atmosphere, an organochlorosilane or a mixture of organochlorosilanes of the general formula
- R'.sub.c SiCl.sub.(4-c)
- with a disilazane having the general formula
- (R.sub.3 Si).sub.2 NH
- at a temperature in the range of 25.degree. C. to 300.degree. C. while distilling byproduced volatile products, wherein R' is selected from the group consisting of vinyl, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; and c has a value of 1 or 2.
- 10. A process as defined in claim 8 wherein said polysilazane is prepared by contacting and reacting in an inert, essentially anhydrous, atmosphere, an organochlorosilane or a mixture of organochlorosilanes of the general formula
- R'.sub.c SiCl.sub.(4-c)
- with a disilazane having the general formula
- (R.sub.3 Si).sub.2 NH
- at a temperature in the range of 25.degree. C. to 300.degree. C. while distilling byproduced volatile products, wherein R' is selected from the group consisting of vinyl, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; and c has a value of 1 or 2.
- 11. A process as defined in claim 7 wherein said polysilazane is prepared by contacting and reacting in an inert, essentially anhydrous, atmosphere, a chlorine-containing disilane or a mixture of chlorine-containing disilanes, of the general formula
- (Cl.sub.d R'.sub.e Si).sub.2
- with a disilazane having the general formula
- (R.sub.3 Si).sub.2 NH
- at a temperature in the range of 25.degree. C. to 300.degree. C. while distilling byproduced volatile products, wherein R' is selected from the group consisting of vinyl, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; d has a value of 0.5-3; e has a value of 0-2.5 and the sum of (d+e) is equal to three.
- 12. A process as defined in claim 8 wherein said polysilazane is prepared by contacting and reacting in an inert, essentially anhydrous, atmosphere, a chlorine-containing disilane or a mixture of chlorine-containing disilanes, of the general formula
- (Cl.sub.d R'.sub.e Si).sub.2
- with a disilazane having the general formula
- (R.sub.3 Si).sub.2 NH
- at a temperature in the range of 25.degree. C. to 300.degree. C. while distilling byproduced volatile products, wherein R' is selected from the group consisting of vinyl, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; d has a value of 0.5-3; e has a value of 0-2.5 and the sum of (d+e) is equal to three.
- 13. A process as defined in claim 7 wherein said polysilazane is prepared by contacting and reacting in an inert, essentially anhydrous, atmosphere, a mixture of (1) chlorine-containing disilane or a mixture of chlorine-containing disilanes, of the general formula
- (Cl.sub.d R'.sub.e Si).sub.2
- and (2) an organochlorosilane or a mixture of organochlorosilanes of the general formula
- R'.sub.c SiCl.sub.(4-c)
- with a disilazane having the general formula
- (R.sub.3 Si).sub.2 NH
- at a temperature in the range of 25.degree. C. to 300.degree. C. while distilling byproduced volatile products, wherein R' is selected from the group consisting of vinyl, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; d has a value of 0.5-3; e has a value of 0-2.5; the sum of (d+e) is equal to three; and c has a value of 1 or 2.
- 14. A process as defined in claim 8 wherein said polysilazane is prepared by contacting and reacting in an inert, essentially anhydrous, atmosphere, a mixture of (1) chlorine-containing disilane or a mixture of chlorine-containing disilanes, of the general formula
- (Cl.sub.d R'.sub.e Si).sub.2
- and (2) an organochlorosilane or a mixture of organochlorosilanes of the general formula
- R'.sub.c SiCl.sub.(4-c)
- with a disilazane having the general formula
- (R.sub.3 Si).sub.2 NH
- at a temperature in the range of 25.degree. C. to 300.degree. C. while distilling byproduced volatile products, wherein R' is selected from the group consisting of vinyl, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; d has a value of 0.5-3; e has a value of 0-2.5; the sum of (d+e) is equal to three; and c has a value of 1 or 2.
- 15. A process as defined in claim 7 wherein said polysilazanes is prepared by contacting and reacting in an inert, essentially anhydrous atmosphere, trichlorosilane with a disilazane at a temperature in the range of 25.degree. C. to 300.degree. C. while removing byproduced volatile products, wherein said disilazane has the general formula
- (R.sub.3 Si).sub.2 NH
- where R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms.
- 16. A process as defined in claim 8 wherein said polysilazanes is prepared by contacting and reacting in an inert, essentially anhydrous atmosphere, trichlorosilane with a disilazane at a temperature in the range of 25.degree. C. to 300.degree. C. while removing byproduced volatile products, wherein said disilazane has the general formula
- (R.sub.3 Si).sub.2 NH
- where R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms.
- 17. A process as defined in claim 1 wherein said silicon-containing preceramic polymer is a polysilane.
- 18. A process as defined in claim 2 wherein said silicon-containing preceramic polymer is a polysilane.
- 19. A process as defined in claim 1 wherein said silicon-containing preceramic polymer is an organosilsesquioxane-containing sol-gel.
- 20. A process as defined in claim 2 wherein said silicon-containing preceramic polymer is an organosilsesquioxane-containing sol-gel.
- 21. A process as defined in claim 1 wherein said silicon-containing preceramic polymer is an organopolysiloxane.
- 22. A process as defined in claim 2 wherein said silicon-containing preceramic polymer is an organopolysiloxane.
- 23. A process for preparing a ceramic material with reduced carbon levels comprising heating a silicon-containing preceramic polymer in the presence of ammonia gas in a thermally staged sequence up to and including temperatures in excess of 900.degree. C. to obtain a ceramic material with reduced carbon levels.
- 24. A process as defined in claim 23 wherein said silicon-containing preceramic polymer is selected from the group consisting of polycarbosilanes, polysilazanes, polysilanes, organosilsesquioxane-containing sol-gels, and organopolysiloxanes.
- 25. A process as defined in claim 23 wherein said silicon-containing preceramic polymer is a polycarbosilane prepared by thermally decomposing and polycondensing a polysilane or polysilanes by heating said polysilane or polysilanes at a temperature of 300.degree.-700.degree. C. in an inert gas, hydrogen, or vacuum wherein said polysilane or polysilanes are selected from the group consisting of cyclic polysilanes of the general formula
- (R.sup.1 R.sup.2 Si).sub.n
- and linear polysilanes of the general formula ##STR4## where n is greater than or equal to 4; where m is greater than or equal to 2; and where R.sup.1, R.sup.2, R.sup.3, and R.sup.4 are independently selected from the group consisting of hydrogen, alkyl groups containing 1 to 4 carbon atoms, phenyl, --Si(R.sup.5).sub.3 groups where R.sup.5 is a alkyl group containing 1 to 4 carbon atoms, and halogen atoms.
- 26. A process as defined in claim 23 wherein said silicon-containing preceramic polymer is a polysilazane prepared by contacting and reacting in an inert, essentially anhydrous, atmosphere, an organochlorosilane or a mixture of organochlorosilanes of the general formula
- R'.sub.c SiCl.sub.(4-c)
- with a disilazane having the general formula
- (R.sub.3 Si).sub.2 NH
- at a temperature in the range of 25.degree. C. to 300.degree. C. while distilling byproduced volatile products, wherein R' is selected from the group consisting of vinyl, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms, and c has a value of 1 or 2.
- 27. A process as defined in claim 23 wherein said silicon-containing preceramic polymer is a polysilazane prepared by contacting and reacting in an inert, essentially anhydrous, atmosphere, a chlorine-containing disilane or a mixture of chlorine-containing disilanes, of the general formula
- (Cl.sub.d R'.sub.e Si ).sub.2
- with a disilazane having the general formula
- (R.sub.3 Si).sub.2 NH
- at a temperature in the range of 25.degree. C. to 300.degree. C. while distilling byproduced volatile products, wherein R' is selected from the group consisting of vinyl, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; d has a value of 0.5-3; e has a value of 0-2.5 and the sum of (d+e) is equal to three.
- 28. A process as defined in claim 23 wherein said silicon-containing preceramic polymer is a polysilazane prepared by contacting and reacting in an inert, essentially anhydrous, atmosphere, a mixture of (1) chlorine-containing disilane or a mixture of chlorine-containing disilanes, of the general formula
- (Cl.sub.d R'.sub.e Si).sub.2
- and (2) an organochlorosilane or a mixture of organochlorosilanes of the general formula
- R'.sub.c SiCl.sub.(4-c)
- with a disilazane having the general formula
- (R.sub.3 Si).sub.2 NH
- at a temperature in the range of 25.degree. C. to 300.degree. C. while distilling byproduced volatile products, wherein R' is selected from the group consisting of vinyl, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; R is selected from the group consisting of vinyl, hydrogen, phenyl, and alkyl radicals containing 1 to 3 carbon atoms; d has a value of 0.5-3; e has a value of 0-2.5; the sum of (d+e) is equal to three; and c has a value of 1 or 2.
- 29. A process as defined in claim 23 wherein said silicon-containing preceramic polymer is a polysilazane prepared by contacting and reacting in an inert, essentially anhydrous atmosphere, trichlorosilane with a disilazane at a temperature in the range of 25.degree. C. to 300.degree. C. while removing byproduced volatile products, wherein said disilazane has the general formula
- (R.sub.3 Si).sub.2 NH
- where R is selected from the group consisting of vinyl, hydrogen, phenyl and alkyl radicals containing 1 to 3 carbon atoms.
Government Interests
The Government has rights in this invention pursuant to contract No. F33615-83-C-5006 awarded by the United States Air Force.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
4336215 |
Yajima et al. |
Jun 1982 |
|
4405589 |
Iwai et al. |
Sep 1983 |
|
4517168 |
Kawahito et al. |
May 1985 |
|