Claims
- 1. A process for preparing perfluoro(lower)alkylbenzene derivatives which comprises contacting a lower alkylbenzene compound of the formula: ##STR4## wherein R is lower alkyl and R.sub.1, R.sub.2 and R.sub.3 are each hydrogen, trichloromethyl, nitro, cyano or halogen, but wherein all of R.sub.1, R.sub.2 and R.sub.3 are not hydrogen at the same time and when one of R.sub.1, R.sub.2 and R.sub.3 is nitro, each of the other two is not nitro, with hydrogen fluoride in the presence of chlorine in the absence of a catalyst and in the gaseous phase at an elevated temperature to give the corresponding perfluoro(lower)alkylbenzene compound of the formula: ##STR5## wherein R' is perfluoro(lower)alkyl and R.sub.1 ', R.sub.2 ' and R.sub.3 ' are each hydrogen, trifluoromethyl, nitro, cyano or halogen, but all of R.sub.1 ', R.sub.2 ' and R.sub.3 ' are not hydrogen at the same time and when one of R.sub.1 ', R.sub.2 ' and R.sub.3 ' is nitro, each of the other two is not nitro.
- 2. The process according to claim 1, wherein hydrogen fluoride is used in a molar ratio of 3 to 15 with respect to the lower alkylbenzene compound.
- 3. The process according to claim 1, wherein chlorine is used in a molar ratio of about 2 to 15 with respect to the lower alkylbenzene compound.
- 4. The process according to claim 1, wherein the contact is effected at a temperature of about 350.degree. to 600.degree. C.
- 5. The process according to claim 4, wherein the temperature is from about 450.degree. to 600.degree. C.
- 6. The process according to claim 1, wherein the contact is effected for a period of about 5 to 40 seconds.
- 7. The process according to claim 1, wherein the contact is effected in the presence of a gaseous diluent.
- 8. The process according to claim 1, wherein R.sub.1, R.sub.2 and R.sub.3 are each hydrogen, trichloromethyl or halogen.
Priority Claims (1)
Number |
Date |
Country |
Kind |
51-159034 |
Dec 1976 |
JPX |
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Parent Case Info
This is a continuation-in-part application of our copending application Ser. No. 864,804 filed Dec. 27, 1977 now U.S. Pat. No. 4,367,350.
US Referenced Citations (5)
Continuation in Parts (1)
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Number |
Date |
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Parent |
864804 |
Dec 1977 |
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