Claims
- 1. A process for preparing perhaloether compounds with ether end groups having the general formula: ##STR11## wherein: A and B, which may be equal to or different from each other, are R.sub.x O or F, provided that A and B are not simultaneously F, and
- R.sub.x is a straight or branched perhaloalkyl radical containing from 1 to 10 carbon atoms;
- R.sub.f is a straight or branched perhaloalkyl radical containing from 1 to 10 carbon atoms;
- X represents a fluorine atom or a radical R.sub.f ;
- m is 0 or an integer from 1 to 2;
- l is 0 or an integer from 1 to 2 and m+l=2;
- said process comprising: reacting at least one fluorooxy compound R.sub.x --OF, wherein R.sub.x is a straight or branched perhaloalkyl radical containing from 1 to 10 carbon atoms, with a perfluoroolefin in a liquid phase, said liquid phase containing the whole amount of perfluoroolefin to be reacted and optionally containing an organic solvent inert to said perfluoroolefin, the temperature of said liquid phase being maintained in the range of from -120.degree. to -30.degree. C., by continuously feeding to the liquid phase a stream of an inert gas and a gaseous stream of said at least one fluorooxy compound, said perfluoroolefin being selected from the group consisting of
- a) one perfluoromonoolefin selected from the group consisting of CF.sub.2 .dbd.CF.sub.2 ; and R--CF.dbd.CF.sub.2 wherein R is a perfluoroalkyl group containing 1 to 4 carbon atoms,
- b) one perfluoroalkylvinylether of the formula CF.sub.2 .dbd.CF--O--R.sub.f, wherein R.sub.f represents a straight or branched perfluoroalkyl group containing from 1 to 10 carbon atoms,
- and
- c) one perfluoromonoolefin and one perfluoroalkylvinylether as defined above.
- 2. The process according to claim 1, wherein the perhaloalkyl radical R.sub.f contains from 1 to 2 carbon atoms.
- 3. The process according to claim 2, wherein X is selected from the group consisting of F and CF.sub.3.
- 4. The process, according to claim 1 wherein the at least one fluoroxy compound R.sub.x --OF contains 1 to 3 carbon atoms, and the halogen component of the at least one fluoro compound is selected from the group consisting of chlorine, fluorine, bromine, iodine and a mixture of chlorine and fluorine.
- 5. The process, according to claim 4, wherein the halogen component of the fluoroxy compound is selected from fluorine or a mixture of chlorine and fluorine.
- 6. The process according to claim 1 wherein the perfluoromonoolefin is selected from the group consisting of perfluoropropene and tetrafluoroethylene.
- 7. The process, according to claim 1 wherein the inert gas is fed in admixture with the fluoroxy compound in the gaseous stream.
- 8. The process according to claim 1 wherein the inert gas is selected from the group consisting of nitrogen, helium, argon, CF.sub.4, C.sub.2 F.sub.6 mixtures thereof.
- 9. The process, according to claim 1, wherein the organic solvent is composed of at least a straight or cyclic fluorocarbon or chlorofluorocarbon.
- 10. The process, according to claim 9, wherein the organic solvent is selected from the group consisting of CFCl.sub.3 ; CF.sub.2 Cl.sub.2 ; cyclic C.sub.4 F.sub.8 ; CF.sub.3 CF.sub.2 Cl; CF.sub.2 Cl--CFCl.sub.2 ; CF.sub.2 Cl--CF.sub.2 Cl.
- 11. The process, according to claim 1, wherein the temperature ranges from -100.degree. C. to -30.degree. C.
- 12. The process according to claim 1 wherein the volume ratio of the at least one fluoroxy compound, in the gaseous stream, to the inert gas ranges from 0.01 to 5.
- 13. The process according to claim 1, wherein the at least one fluoroxy compound is fed to the liquid phase at a flowrate ranging from 0.01 to 5 moles per hour per liter of liquid phase.
- 14. The process according to claim 13, wherein the at least one fluoroxy compound is fed to the liquid phase at a flowrate ranging from 0.05 to 2 moles per hour per liter of liquid phase.
Priority Claims (1)
Number |
Date |
Country |
Kind |
20917 A/89 |
Jun 1989 |
ITX |
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Parent Case Info
This application is a continuation of application Ser. No. 08/283,614, filed Aug. 1, 1994 (abandoned), which in turn is a continuation of application Ser. No. 08/038,188 filed Mar. 29,1993 (abandoned) which in turn is a continuation of application Ser. No. 07/722,408 filed Jun. 20, 1991 (abandoned), which in turn is a continuation of application Ser. No. 07/540,639 filed Jun. 19, 1990 (abandoned).
US Referenced Citations (20)
Foreign Referenced Citations (1)
Number |
Date |
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267627 A |
May 1988 |
EPX |
Continuations (4)
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Date |
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283614 |
Aug 1994 |
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38188 |
Mar 1993 |
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722408 |
Jun 1991 |
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540639 |
Jun 1990 |
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